Abstract:
A variable capacitor is formed from a pair of electrodes and a dielectric interposed between the electrodes over a substrate, and an external input is detected by changing capacitance of the variable capacitor by a physical or electrical force. Specifically, a variable capacitor and a sense amplifier are provided over the same substrate, and the sense amplifier reads the change of capacitance of the variable capacitor and transmits a signal in accordance with the input to a control circuit.
Abstract:
An object of the present invention is to provide a semiconductor device combining transistors integrating on a same substrate transistors including an oxide semiconductor in their channel formation region and transistors including non-oxide semiconductor in their channel formation region. An application of the present invention is to realize substantially non-volatile semiconductor memories which do not require specific erasing operation and do not suffer from damages due to repeated writing operation. Furthermore, the semiconductor device is well adapted to store multivalued data. Manufacturing methods, application circuits and driving/reading methods are explained in details in the description.
Abstract:
A semiconductor with reduced area is provided. A first transistor includes a first conductor, a first insulator over the first conductor, an oxide semiconductor provided over the first insulator so as to overlap with the first conductor, a second insulator over the oxide semiconductor, a second conductor over the second insulator, and a third conductor and a fourth conductor in contact with the oxide semiconductor. The oxide semiconductor includes a region overlapping with the first region and not overlapping with the second region, and a region not overlapping with the first conductor and overlapping with the second conductor in a region positioned between the third conductor and the fourth conductor when viewed from above. The second transistor is a p-channel transistor. A layer in which the first transistor is provided and a layer in which the second transistor is provided are stacked together.
Abstract:
An object of the present invention is to provide a semiconductor device having a novel structure in which in a data storing time, stored data can be stored even when power is not supplied, and there is no limitation on the number of writing. A semiconductor device includes a first transistor including a first source electrode and a first drain electrode; a first channel formation region for which an oxide semiconductor material is used and to which the first source electrode and the first drain electrode are electrically connected; a first gate insulating layer over the first channel formation region; and a first gate electrode over the first gate insulating layer. One of the first source electrode and the first drain electrode of the first transistor and one electrode of a capacitor are electrically connected to each other.
Abstract:
Provided is a semiconductor device having a memory cell array, which is capable of existing in three power-gating states depending on a non-access period to the memory cell array. The memory cell array includes a plurality of memory cells which each have an SRAM and a nonvolatile memory portion having a transistor with an oxide semiconductor in a channel region. The three power-gating states includes: a first state in which a power-gating to the memory cell array is performed; a second state in which the power-gating is performed on the memory cell array and peripheral circuits which control the memory cell array; and a third state in which, in addition to the memory cell array and the peripheral circuits, a power supply voltage supplying circuit is subjected to the power gating.
Abstract:
An object is to provide a semiconductor device having a novel structure with a high degree of integration. A semiconductor device includes a semiconductor layer having a channel formation region, a source electrode and a drain electrode electrically connected to the channel formation region, a gate electrode overlapping with the channel formation region, and a gate insulating layer between the channel formation region and the gate electrode. A portion of a side surface of the semiconductor layer having the channel formation region and a portion of a side surface of the source electrode or the drain electrode are substantially aligned with each other when seen from a planar direction.
Abstract:
Of a wireless communication system, an RF tag which can operate normally even when a communication distance is extremely short, like the case where the RF tag is in contact with a reader/writer, whereby the reliability is improved. The RF tag which communicates data by wireless communication includes a comparison circuit which compares electric power supplied from outside with reference electric power and a protection circuit portion which is operated when the electric power supplied from outside is higher than the reference electric power in the comparison circuit.
Abstract:
A bootstrap circuit of which the capacitance of a bootstrap capacitor is small and which requires a shorter precharge period is provided. The bootstrap circuit includes transistors M41 and M42, capacitors BSC1 and BSC2, an inverter INV41, and keeper circuits 43 and 44. A signal OSG with a high voltage is generated from an input signal OSG_IN. As the signal OSG_IN is made a high level, a node SWG is made a high level by BSC1. After a signal BSE1 is made a high level and the node SWG is made a low level by the keeper circuit 44, a signal BSE2 is made a high level. By the capacitance coupling of BSC2, a voltage of an output terminal 22 increases.
Abstract:
A manufacturing method of a semiconductor device in which the threshold is corrected is provided. In a semiconductor device including a plurality of transistors each includes a semiconductor, a source or drain electrode electrically connected to the semiconductor, a gate electrode, and a charge trap layer between the gate electrode and the semiconductor, electrons are trapped in the charge trap layer by performing heat treatment and, simultaneously, keeping a potential of the gate electrode higher than that of the source or drain electrode for 1 second or more. By this process, the threshold increases and Icut decreases. A circuit for supplying a signal to the gate electrode and a circuit for supplying a signal to the source or drain electrode are electrically separated from each other. The process is performed in the state where the potential of the former circuit is set higher than the potential of the latter circuit.
Abstract:
An object of the present invention is to provide a semiconductor device combining transistors integrating on a same substrate transistors including an oxide semiconductor in their channel formation region and transistors including non-oxide semiconductor in their channel formation region. An application of the present invention is to realize substantially non-volatile semiconductor memories which do not require specific erasing operation and do not suffer from damages due to repeated writing operation. Furthermore, the semiconductor device is well adapted to store multivalued data. Manufacturing methods, application circuits and driving/reading methods are explained in details in the description.