公开(公告)号：US20080078955A1

公开(公告)日：2008-04-03

申请号：US11540449

申请日：2006-09-29

Applicant: Michael A. Graf ,  Edward C. Eisner ,  William F. DiVergilio ,  Daniel R. Tieger

Inventor： Michael A. Graf ,  Edward C. Eisner ,  William F. DiVergilio ,  Daniel R. Tieger

IPC: H01J37/317 ,  H01J37/302

CPC classification number: H01J37/3171 ,  H01J37/08 ,  H01J37/3045 ,  H01J2237/043 ,  H01J2237/082 ,  H01J2237/24535 ,  H01J2237/24564 ,  H01J2237/24578 ,  H01J2237/30455 ,  H01J2237/30472

Abstract: An ion beam is rapidly switched off during ion implantation on detecting a beam instability. The ion beam is generated or provided by a non-arc discharge based ion source, such as an electron gun ion source or an RF ion source. The ion beam is scanned across a workpiece from a starting location toward an ending location. During the scanning, one or more beam characteristics are monitored, such as beam current, beam flux, shape, and the like. An instability is detected when one or more of the beam characteristics deviate from acceptable values or levels. The ion beam is rapidly turned off on the detected instability.

Abstract translation: 在离子注入期间，在检测到光束不稳定性时，离子束被快速关闭。 离子束由非电弧放电型离子源（例如电子枪离子源或RF离子源）产生或提供。 离子束从起始位置朝向终止位置跨工件扫描。 在扫描期间，监视一个或多个光束特性，例如光束电流，光束通量，形状等。 当一个或多个光束特性偏离可接受的值或水平时，检测到不稳定性。 在检测到的不稳定性下，离子束快速关闭。

公开(公告)号：US20080073576A1

公开(公告)日：2008-03-27

申请号：US11506998

申请日：2006-08-18

Applicant: Teng-Chao Tao ,  Philip J. Ring

Inventor： Teng-Chao Tao ,  Philip J. Ring

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  H01J2237/002 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/16 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01L21/265 ,  H01L21/67213

Abstract: A system for controlling the temperature of a semiconductor workpiece processing tool and surrounding structure, thereby reducing the deposition rates within an ion implanter. A faraday flag structure comprising a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the and a base supporting the strike plate that includes a thermally conductive material surrounding at least a portion of an outer perimeter of the strike plate. The faraday flag structure base defines a conduit for routing coolant through the thermally conductive material surrounding the strike plate. Positioned below the faraday flag is a thermally controlled cold trap that receives and retains foreign material appearing in ion implanter.

Abstract translation: 一种用于控制半导体工件加工工具和周围结构的温度的系统，从而降低离子注入机内的沉积速率。 法拉第标志结构，其包括耦合到电路的导电冲击板，用于监测撞击撞击板的离子，以获得支撑击打板的指示和支撑击打板的基座，该基座包括导热材料，该导热材料围绕该导电材料的外周的至少一部分 打板 法拉第标志结构基座定义了用于通过围绕撞击板的导热材料布置冷却剂的导管。 位于法拉第标志下方的是一种热控冷阱，可以接收和保留出现在离子注入机中的异物。

公开(公告)号：US20080067444A1

公开(公告)日：2008-03-20

申请号：US11784709

申请日：2007-04-09

Applicant: Victor M. Benveniste ,  Edward C. Eisner ,  Bo H. Vanderberg

Inventor： Victor M. Benveniste ,  Edward C. Eisner ,  Bo H. Vanderberg

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  G21K5/04 ,  H01J37/304 ,  H01J2237/24507 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/31703

Abstract: One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam profiles are measured as the ion beam is scanned. A corrected scan rate is calculated based on the plurality of measured dynamic beam profiles of the scanned beam. The ion beam is scanned at the corrected scan rate to produce a corrected ribbon ion beam. Other methods and systems are also disclosed.

Abstract translation: 本发明的一个实施例涉及一种用于调整扫描离子束的带状光束通量的方法。 在该方法中，以扫描速率扫描离子束，并且当扫描离子束时测量多个动态光束分布。 基于扫描光束的多个测量的动态光束分布来计算校正的扫描速率。 以校正的扫描速率扫描离子束以产生校正的带状离子束。 还公开了其它方法和系统。

公开(公告)号：US20080067436A1

公开(公告)日：2008-03-20

申请号：US11523148

申请日：2006-09-19

Applicant: Bo H. Vanderberg ,  Robert D. Rathmell ,  Edward C. Eisner

Inventor： Bo H. Vanderberg ,  Robert D. Rathmell ,  Edward C. Eisner

IPC: H01J37/08

CPC classification number: H01J37/026 ,  H01J37/1475 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/055

Abstract: A magnetic scanner employs constant magnetic fields to mitigate zero field effects. The scanner includes an upper pole piece and a lower pole piece that generate an oscillatory time varying magnetic field across a path of an ion beam and deflect the ion beam in a scan direction. A set of entrance magnets are positioned about an entrance of the scanner and generate a constant entrance magnetic field across the path of the ion beam. A set of exit magnets are positioned about an exit of the scanner and generate a constant exit magnetic field across the path of the ion beam.

Abstract translation: 磁扫描仪采用恒定磁场来减轻零场效应。 该扫描器包括上极片和下极片，其在离子束的路径上产生振荡时变磁场并使扫描方向偏转离子束。 一组入口磁体围绕扫描器的入口定位，并且在离子束的路径上产生恒定的入射磁场。 一组出口磁体围绕扫描器的出口定位，并在离子束的路径上产生恒定的出射磁场。

公开(公告)号：US20070264105A1

公开(公告)日：2007-11-15

申请号：US11432923

申请日：2006-05-12

Applicant: Michel Pharand ,  Klaus Becker ,  Klaus Petry ,  Marvin LaFontaine ,  Michael Mitrano

Inventor： Michel Pharand ,  Klaus Becker ,  Klaus Petry ,  Marvin LaFontaine ,  Michael Mitrano

IPC: H01L21/677

CPC classification number: H01L21/67201 ,  H01L21/67265 ,  H01L21/67294 ,  H01L21/67748

Abstract: A combination load lock apparatus is provided, wherein a chamber is coupled to two or more valves in selective fluid communication with two or more respective volumes. A support member for supporting a workpiece is disposed within an interior portion of the chamber, wherein a translation apparatus is operably coupled thereto. The translation apparatus is operable to rotate and/or translate the workpiece on the support member about and/or along a first axis, wherein a detection apparatus associated with the chamber is operable to detect one or more characteristics of the workpiece during the rotation and/or translation thereof. The workpiece may be further rotated in a predetermined manner based on the one or more detected characteristics. A recess is further defined in the interior portion of the chamber, wherein the translation apparatus is operable to translate the workpiece into and out of the recess to reduce particulate contamination thereon.

Abstract translation: 提供一种组合式加载锁定装置，其中腔室与两个或更多个相应体积选择性流体连通的两个或更多个阀联接。 用于支撑工件的支撑构件设置在腔室的内部部分内，其中平移装置可操作地联接到其上。 翻译装置可操作以沿着第一轴线旋转和/或平移在支撑构件上的工件，其中与腔室相关联的检测装置可操作以在旋转期间检测工件的一个或多个特性，和/ 或其翻译。 可以基于一个或多个检测到的特性以预定方式进一步旋转工件。 在腔室的内部部分中进一步限定凹部，其中平移装置可操作以将工件平移到凹槽中并减少其中的颗粒污染物。

公开(公告)号：US20070262271A1

公开(公告)日：2007-11-15

申请号：US11432977

申请日：2006-05-12

Applicant: Joseph Ferrara ,  Patrick Splinter ,  Michael Graf ,  Victor Benveniste

Inventor： Joseph Ferrara ,  Patrick Splinter ,  Michael Graf ,  Victor Benveniste

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/0822 ,  H01J2237/20 ,  H01J2237/244 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/67213

Abstract: An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are positioned about a common process chamber. Each of the plurality of ion beamline assemblies are selectively isolated from the common process chamber, and the plurality of beamline intersect at a processing region of the process chamber. A scanning apparatus positioned within the common process chamber is operable to selectively translate a workpiece holder in one or more directions through each of the plurality of ion beamlines within the processing region, and a common dosimetry apparatus within the common process chamber is operable to measure one or more properties of each of the plurality of ion beamlines. A load lock chamber is operably coupled to the common process chamber for exchange of workpieces between the common process chamber and an external environment.

Abstract translation: 提供了用于将离子注入到工件中的离子注入簇工具，其中具有与其相关联的多个离子束线的多个束线组件围绕公共处理室定位。 多个离子束线组件中的每一个与公共处理室选择性地隔离，并且多个束线在处理室的处理区域相交。 定位在公共处理室内的扫描设备可操作以选择性地将工件保持器在一个或多个方向上通过处理区域内的多个离子束线中的每一个，并且公共处理室内的常见剂量测量装置可操作以测量一个 或更多的多个离子束线中的每一个的性质。 负载锁定室可操作地联接到公共处理室，用于在公共处理室和外部环境之间交换工件。

公开(公告)号：US07276712B2

公开(公告)日：2007-10-02

申请号：US11173494

申请日：2005-07-01

Applicant: Joseph Ferrara

Inventor： Joseph Ferrara

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/3171 ,  H01J2237/166 ,  H01J2237/20228 ,  H01L21/26506 ,  H01L21/68764

Abstract: An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and an implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of an implantation surface of the workpiece by the ion beam. The implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece within an interior region of the implantation chamber, the workpiece support structure. The workpiece support structure includes a rotation member coupled to the implantation chamber for changing an implantation angle of the workpiece with respect to a portion of the ion beam within the implantation chamber. The workpiece support structure also includes a translation member movably coupled to the rotation member and supporting the workpiece for movement along a path of travel wherein at least some components of the translation member components are disposed within a reduced pressure translation member chamber. The translation member chamber is isolated from the implantation chamber interior region by a dynamic seal. A workpiece holder support arm of the translation member extends through the dynamic seal and into the implantation chamber.

公开(公告)号：US20070176123A1

公开(公告)日：2007-08-02

申请号：US11343760

申请日：2006-01-31

Applicant: Leonard Rubin ,  John Poate

Inventor： Leonard Rubin ,  John Poate

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/1416 ,  H01J37/1475 ,  H01J2237/002 ,  H01J2237/055

Abstract: An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. Various magnets located along the beamline are provided for manipulating the ion beam and ions. Ion beam implanters having magnets including superconducting magnet coils are disclosed.

Abstract translation: 离子束注入机包括用于产生沿束线移动的离子束的离子束源和真空或注入室，其中诸如硅晶片的工件被定位成与离子束相交以离子注入工件表面 通过离子束。 提供沿着束线设置的各种磁体用于操纵离子束和离子。 公开了具有包括超导磁体线圈的磁体的离子束注入机。

公开(公告)号：US20070164237A1

公开(公告)日：2007-07-19

申请号：US11334265

申请日：2006-01-18

Applicant: David Bernhardt

Inventor： David Bernhardt

IPC: H01J37/317

CPC classification number: H01J37/3172 ,  H01J37/248 ,  H01J2237/2487 ,  H01J2237/30411

Abstract: An improved HE LINAC-based ion implantation system is disclosed utilizing direct digital synthesis (DDS) techniques to obtain precise frequency and phase control and automated electrode voltage phase calibration. The DDS controller may be used on a multi-stage linear accelerator based implanter to digitally synchronize the frequency and phase of the electric fields to each electrode within each stage of the accelerator. The DDS controller includes digital phase synthesis (DPS) circuits for modulating the phase of the electric field to the electrodes, and a master oscillator that uses digital frequency synthesis or DFS to digitally synthesize a master frequency and phase applied to each of the DPS circuits. Also disclosed are methods for automatically phase and amplitude calibrating the RF electrode voltages of the stages.

Abstract translation: 公开了一种改进的基于HE LINAC的离子注入系统，其利用直接数字合成（DDS）技术来获得精确的频率和相位控制以及自动电极电压相位校准。 DDS控制器可以用在基于多级线性加速器的注入器上，以将加速器的每个阶段内的电场的频率和相位数字地同步到每个电极。 DDS控制器包括用于调制电极相位的数字相位合成（DPS）电路，以及使用数字频率合成或DFS的主振荡器来数字地合成施加到每个DPS电路的主频率和相位。 还公开了用于自动相位和幅度校准级的RF电极电压的方法。

公开(公告)号：US07239242B2

公开(公告)日：2007-07-03

申请号：US11043758

申请日：2005-01-26

Applicant: Debabrata Ghosh

Inventor： Debabrata Ghosh

IPC: G08B23/00

CPC classification number: G06K17/00

Abstract: The present invention facilitates operation of systems by managing and authenticating components, including parts and subsystems, present within a system. The present invention includes RFID tags individually associated with the components of the system. The RFID tags generally include at least a part number and a serial number for the components. One or more readers are present and communicate with the RFID tags via a wireless communication medium. A controller generates interrogatory signals, receives response signals from the RFID tags, and employs the received response signals to authenticate the components.

Abstract translation: 本发明通过管理和认证存在于系统内的部件（包括部件和子系统）来促进系统的操作。 本发明包括单独地与系统的部件相关联的RFID标签。 RFID标签通常至少包括用于组件的部件号和序列号。 存在一个或多个读取器并且经由无线通信介质与RFID标签通信。 控制器产生询问信号，从RFID标签接收响应信号，并采用接收到的响应信号来认证组件。