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    Monolithic silicon EUV collector
    64.
    发明授权
    Monolithic silicon EUV collector 失效
    单片硅EUV收集器

    公开(公告)号：US06822251B1

    公开(公告)日：2004-11-23

    申请号：US10705410

    申请日：2003-11-10

    Applicant: Jonathan W. Arenberg ,  Frank R. Hassell

    Inventor： Jonathan W. Arenberg ,  Frank R. Hassell

    IPC: G01J100

    CPC classification number: G03F7/70891 ,  B82Y10/00 ,  F24S23/71 ,  F28F3/12 ,  G03F7/70033 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/065

    Abstract: A collector optic assembly for a EUV radiation source. The collector optic assembly includes an elliptical meniscus having a reflective Si/Mo coating for collecting and reflecting EUV radiation generated by the source. The meniscus is machined from a single piece of silicon. The collector optic assembly further includes a heat exchanger that includes cooling channels through which flows a liquid coolant. The heat exchanger is fabricated from a plurality of machined silicon sections fused together by a glass frit bonding process. The meniscus is fused to a front side of the heat exchanger by a glass frit bonding process. A liquid coolant inlet manifold and a liquid coolant outlet manifold are also each machined from a single silicon block and are mounted to a back side of the heat exchanger.

    Abstract translation: 用于EUV辐射源的收集器光学组件。 收集器光学组件包括具有反射Si / Mo涂层的椭圆形弯液面，用于收集和反射源产生的EUV辐射。 弯液面由一片硅片加工而成。 收集器光学组件还包括热交换器，其包括冷却通道，液体冷却剂通过冷却通道流动。 热交换器由多个通过玻璃料接合工艺熔合在一起的加工硅部分制成。 弯液面通过玻璃料接合工艺熔合到热交换器的前侧。 液体冷却剂入口歧管和液体冷却剂出口歧管也由单个硅块加工而成，并且安装在热交换器的背面。

    SOLID TARGET IRRADIATOR SYSTEM FOR RADIOISOTOPES PRODUCTION
    65.
    发明公开
    SOLID TARGET IRRADIATOR SYSTEM FOR RADIOISOTOPES PRODUCTION 审中-公开

    公开(公告)号：US20240242852A1

    公开(公告)日：2024-07-18

    申请号：US18560132

    申请日：2022-05-12

    Applicant: Best Theratronics Ltd.

    Inventor： William Zeev Gelbart

    IPC: G21G1/00 ,  G21G1/04 ,  G21K5/10

    CPC classification number: G21G1/0005 ,  G21G1/04 ,  G21K5/10 ,  G21K2201/065 ,  G21K2201/067

    Abstract: A solid target irradiator system (10, 210) includes a target carrier feeding assembly (20, 220) coupled to a base (11, 211) for sequentially feeding individual target carriers (50, 250) from a stack of target carriers contained in a target magazine (21, 221), a target loader assembly (60, 260) coupled to the base for selectively holding each target carrier in the target magazine for subsequent advancement and retraction of a held target carrier through the solid target irradiator system, a selectively moveable dissolution assembly (100, 300) coupled to the base and selectively engageable with the target loader assembly for dissolution of target material thereon; and an airlock assembly (80, 280) coupled to the base to prepare the target carrier for subsequent irradiation.

    Method and device for splitting a high-power light beam to provide simultaneous sub-beams to photolithography scanners
    66.
    发明授权
    Method and device for splitting a high-power light beam to provide simultaneous sub-beams to photolithography scanners 有权
    用于分割高功率光束以提供同时的子光束到光刻扫描仪的方法和装置

    公开(公告)号：US09541839B2

    公开(公告)日：2017-01-10

    申请号：US14637459

    申请日：2015-03-04

    Applicant: GLOBALFOUNDRIES Inc.

    Inventor： Erik Robert Hosler

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: G03F7/70033 ,  G03F7/70008 ,  G03F7/70208 ,  G03F7/70991 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/008

    Abstract: Methods for receiving a high-energy EUV beam and distributing EUV sub-beams to photolithography scanners and the resulting device are disclosed. Embodiments include receiving a high-energy primary EUV beam at a primary splitting optical assembly; splitting the primary EUV beam into primary EUV sub-beams; reflecting the primary EUV sub-beams to beam-splitting optical arrays; splitting the primary EUV sub-beams into secondary EUV sub-beams; reflecting the secondary EUV sub-beams to EUV distribution optical arrays; and distributing simultaneously the secondary EUV sub-beams to scanners.

    Abstract translation: 公开了用于接收高能EUV光束并将EUV子光束分布到光刻扫描仪和所得到的装置的方法。 实施例包括在主分裂光学组件处接收高能量的初级EUV光束; 将主EUV波束分为主EUV子波束; 将主要EUV子光束反射到分束光学阵列; 将主EUV子光束分成次级EUV子光束; 将次级EUV子光束反射到EUV分配光学阵列; 并且将次级EUV子光束同时分配到扫描仪。

    High heat load optics with a liquid metal interface for use in an extreme ultraviolet lithography system
    68.
    发明授权
    High heat load optics with a liquid metal interface for use in an extreme ultraviolet lithography system 有权
    具有用于极紫外光刻系统的液态金属界面的高热负荷光学元件

    公开(公告)号：US09041900B2

    公开(公告)日：2015-05-26

    申请号：US12261798

    申请日：2008-10-30

    Applicant: Alton H. Phillips

    Inventor： Alton H. Phillips

    IPC: G03B27/52 ,  G02B7/18 ,  G02B5/08 ,  G03F7/20 ,  G21K1/06

    CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

    Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred from the first mirror block to the heat exchanger.

    Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，可以在EUV光刻系统中使用的装置包括热交换器，反射镜组件和第一液态金属界面。 所述热交换器至少包括第一表面。 镜组件包括具有第一镜面的第一镜块以及至少第一孔。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 第一表面与液体金属接触，使得热量可以从第一反射镜块传递到热交换器。

    EUV collector with cooling device
    69.
    发明授权
    EUV collector with cooling device 有权
    EUV集电器带冷却装置

    公开(公告)号：US09007559B2

    公开(公告)日：2015-04-14

    申请号：US13214470

    申请日：2011-08-22

    Applicant: Michael Layh ,  Udo Dinger

    Inventor： Michael Layh ,  Udo Dinger

    IPC: G03B27/52 ,  G03B27/54 ,  G21K1/06 ,  G03F7/20

    CPC classification number: G21K1/06 ,  G03F7/70175 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

    Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.

    Abstract translation: 用于收集和发射来自EUV辐射源的辐射的EUV收集器包括至少一个收集器反射镜，用于反射相对于中心轴旋转对称的EUV辐射源的发射。 EUV收集器还包括用于冷却至少一个收集器反射镜的冷却装置。 冷却装置具有至少一个冷却元件，该冷却元件在每种情况下具有相对于收集器反射镜的过程，使得该过程的投影垂直于中心轴线的平面具有主方向，该主方向包围 相对于预定的优选方向为至多20°。 收集器传输改进的质量辐射以照亮物体场。

    Dual elliptical reflector with a co-located foci for curing optical fibers
    70.
    发明授权
    Dual elliptical reflector with a co-located foci for curing optical fibers 有权
    双椭圆形反射器，具有用于固化光纤的共定位焦点

    公开(公告)号：US08872137B2

    公开(公告)日：2014-10-28

    申请号：US13619837

    申请日：2012-09-14

    Applicant: Doug Childers

    Inventor： Doug Childers

    IPC: G21K5/00 ,  C03C25/12

    CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

    Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

    Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。

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