公开(公告)号：US09312093B1

公开(公告)日：2016-04-12

申请号：US14321921

申请日：2014-07-02

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Joerg Fober ,  Edgar Fichter ,  Kai Schubert ,  Dirk Preikszas ,  Christian Hendrich ,  Momme Mommsen ,  Michael Schnell ,  Lorenz Lechner

IPC: H01J37/26 ,  H01J37/147

CPC classification number: H01J37/1471 ,  H01J37/24 ,  H01J37/26 ,  H01J2237/0266 ,  H01J2237/032 ,  H01J2237/1504 ,  H01J2237/153

Abstract: A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.

Abstract translation: 粒子束装置包括用于产生具有带电粒子的粒子束的束发生器和具有第一电极和第二电极的电极单元，其中第一电极与第二电极相互作用，特别是用于引导，成形，对准或校正 粒子束。 此外，粒子束装置包括使用电连接与第一电极和第二电极中的至少一个连接的低通滤波器。 另外，粒子束装置包括具有用于粒子束通过的开口的安装单元，其中至少一个低通滤波器，第一电极和第二电极布置在安装单元处。 电极单元可以包括多于两个电极，例如多达16个电极。

公开(公告)号：US20140138542A1

公开(公告)日：2014-05-22

申请号：US14232526

申请日：2012-07-19

Applicant: Hiromi Inada ,  Kuniyasu Nakamura

Inventor： Hiromi Inada ,  Kuniyasu Nakamura

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/263 ,  G01N23/2206 ,  H01J37/153 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0455 ,  H01J2237/0492 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/225 ,  H01J2237/226 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2611 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope according to the present invention includes an electron lens system having a small spherical aberration coefficient for enabling three-dimensional observation of a 0.1 nm atomic size structure. The scanning transmission electron microscope according to the present invention also includes an aperture capable of changing an illumination angle; an illumination electron lens system capable of changing the probe size of an electron beam probe and the illumination angle; a secondary electron detector (9); a transmission electron detector (13); a forward scattered electron beam detector (12); a focusing unit (16); an image processor for identifying image contrast; an image processor for computing image sharpness; a processor for three-dimensional reconstruction of an image; and a mixer (18) for mixing a secondary electron signal and a specimen forward scattered electron signal.

Abstract translation: 根据本发明的扫描透射电子显微镜包括具有小球面像差系数的电子透镜系统，用于实现0.1nm原子尺寸结构的三维观察。 根据本发明的扫描透射电子显微镜还包括能够改变照明角度的孔; 能够改变电子束探头的探头尺寸和照明角度的照明电子透镜系统; 二次电子检测器（9）; 透射电子检测器（13）; 前向散射电子束检测器（12）; 聚焦单元（16）; 用于识别图像对比度的图像处理器; 用于计算图像清晰度的图像处理器; 用于图像的三维重建的处理器; 以及用于混合二次电子信号和样本前向散射电子信号的混合器（18）。

公开(公告)号：US20130300854A1

公开(公告)日：2013-11-14

申请号：US13981326

申请日：2011-11-02

Applicant: Shuangqi Dong ,  Norio Sato ,  Susumu Koyama

Inventor： Shuangqi Dong ,  Norio Sato ,  Susumu Koyama

IPC: H04N5/217

CPC classification number: H04N5/217 ,  H01J37/222 ,  H01J37/26 ,  H01J2237/153

Abstract: A charged particle microscope corrects distortion in an image caused by effects of drift in the sampling stage by measuring the correction reference image in a shorter time than the observation image, making corrections by comparing the shape of the observation image with the shape of the correction reference image, and reducing distortion in the observation images. The reference image for distortion correction is measured at the same position and magnification as when acquiring images for observation. In order to reduce effects from drift, the reference image is at this time measured within a shorter time than the essential observation image. The shape of the observation image is corrected by comparing the shapes of the reference image and observation image, and correcting the shape of the observation image to match the reference image.

Abstract translation: 带电粒子显微镜通过在比观察图像更短的时间内测量校正参考图像来校正由采样阶段的漂移效应引起的图像中的失真，通过将观察图像的形状与校正基准的形状进行比较来进行校正 图像，减少观察图像的失真。 与获取观察图像时相同的位置和倍率测量用于失真校正的参考图像。 为了减少漂移的影响，此时在比基本观察图像更短的时间内测量参考图像。 通过比较参考图像和观察图像的形状以及校正观察图像的形状以匹配参考图像来校正观察图像的形状。

公开(公告)号：US08378299B2

公开(公告)日：2013-02-19

申请号：US13045068

申请日：2011-03-10

Applicant: Jürgen Frosien

Inventor： Jürgen Frosien

IPC: G01B15/00

CPC classification number: H01J37/147 ,  H01J37/1471 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/04756 ,  H01J2237/1514 ,  H01J2237/153 ,  H01J2237/24465 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A column for a charged particle beam device is described. The column includes a charged particle emitter for emitting a primary charged particle beam as one source of the primary charged particle beam; a biprism adapted for acting on the primary charged particle beam so that two virtual sources are generated; and a charged particle beam optics adapted to focus the charged particle beam simultaneously on two positions of a specimen corresponding to images of the two virtual sources.

Abstract translation: 描述带电粒子束装置的柱。 该柱包括用于发射初级带电粒子束作为初级带电粒子束的一个源的带电粒子发射器; 适于作用于初级带电粒子束的双棱镜，从而产生两个虚拟源; 以及带电粒子束光学器件，其适于将带电粒子束同时聚焦在对应于两个虚拟源的图像的样本的两个位置上。

公开(公告)号：US20120217393A1

公开(公告)日：2012-08-30

申请号：US13505951

申请日：2010-11-01

Applicant: Nobuhiro Okai ,  Yasunari Sohda

Inventor： Nobuhiro Okai ,  Yasunari Sohda

IPC: H01J37/26

CPC classification number: H01J37/04 ,  H01J37/026 ,  H01J37/14 ,  H01J37/145 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0044 ,  H01J2237/121 ,  H01J2237/153

Abstract: A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.

Abstract translation: 扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移，同时在观察绝缘体样品时抑制分辨率劣化。 电子显微镜包括电子源和物镜，其聚焦从电子源发射的电子束，其使用从照射电子束的样品产生的二次信号来提供图像。 在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

公开(公告)号：US07663102B2

公开(公告)日：2010-02-16

申请号：US10593246

申请日：2005-02-17

Applicant: Juergen Frosien

Inventor： Juergen Frosien

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/0453 ,  H01J2237/153

Abstract: The present invention relates to charged particle beam devices. The devices comprise an emitter for emitting charged particles; an aperture arrangement with at least two apertures for separating the emitted charged particles into at least two independent charged particle beams; and an objective lens for focusing the at least two independent charged particle beams, whereby the independent charged particle beams are focused onto the same location within the focal plane.

Abstract translation: 本发明涉及带电粒子束装置。 这些装置包括用于发射带电粒子的发射器; 具有至少两个孔的孔布置，用于将发射的带电粒子分离成至少两个独立的带电粒子束; 以及用于聚焦至少两个独立带电粒子束的物镜，由此独立带电粒子束聚焦到焦平面内的相同位置上。

公开(公告)号：US07605381B2

公开(公告)日：2009-10-20

申请号：US10734261

申请日：2003-12-15

Applicant: Mitsugu Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

Inventor： Mitsugu Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

IPC: H01L21/027

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/153

Abstract: An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

公开(公告)号：US07405402B1

公开(公告)日：2008-07-29

申请号：US11360930

申请日：2006-02-22

Applicant: Srinivas Vedula ,  Amir Azordegan ,  Laurence Hordon ,  Alan D. Brodie ,  Gian Francesco Lorusso ,  Takuji Tada

Inventor： Srinivas Vedula ,  Amir Azordegan ,  Laurence Hordon ,  Alan D. Brodie ,  Gian Francesco Lorusso ,  Takuji Tada

IPC: G01N23/00 ,  G21K7/00 ,  H01J3/14

CPC classification number: G01N23/04 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/0492 ,  H01J2237/153 ,  H01J2237/2817

Abstract: One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the electrons emitted by the electron source so as to form an electron beam. A condenser lens system is configured to receive the electron beam and to reduce its numerical aperture to an ultra-low numerical aperture. An objective lens is configured to focus the ultra-low numerical aperture beam onto the substrate surface. Other embodiments are also disclosed.

Abstract translation: 一个实施例涉及用于衬底表面的自动成像的电子束装置。 电子源被配置为发射电子，并且枪形透镜被配置为聚焦由电子源发射的电子以形成电子束。 聚光透镜系统被配置为接收电子束并且将其数值孔径减小到超低数值孔径。 物镜被配置为将超低数值孔径光束聚焦到衬底表面上。 还公开了其他实施例。

公开(公告)号：US20080142723A1

公开(公告)日：2008-06-19

申请号：US11959966

申请日：2007-12-19

Applicant: Kazuya Goto

Inventor： Kazuya Goto

IPC: H01J3/18

CPC classification number: H01J37/153 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/153 ,  H01J2237/28

Abstract: A charged-particle beam system has a demagnifying lens for reducing the dimensions of an electron beam produced from an electron beam source, an objective lens for focusing the demagnified beam onto the surface of a target, a first deflector located before the demagnifying lens, a second deflector placed such that the deflection field produced by it is totally or partially superimposed on the objective lens field, and a third deflector located in a stage following the second deflector. An image of the light source is created by the demagnifying lens. An image of the light source image is formed on the target by the objective lens.

Abstract translation: 带电粒子束系统具有用于减小从电子束源产生的电子束的尺寸的缩小透镜，用于将缩小的光束聚焦到目标表面上的物镜，位于缩小透镜之前的第一偏转器， 第二偏转器被放置成使得其产生的偏转场全部或部分地叠加在物镜视场上，而第三偏转器位于跟随第二偏转器的阶段中。 光源的图像由缩小透镜产生。 通过物镜在目标上形成光源图像的图像。

公开(公告)号：US07288772B2

公开(公告)日：2007-10-30

申请号：US11116697

申请日：2005-04-27

Applicant: John W. Elmer ,  Todd A. Palmer ,  Alan T. Teruya ,  Chris C. Walton

Inventor： John W. Elmer ,  Todd A. Palmer ,  Alan T. Teruya ,  Chris C. Walton

IPC: G01J1/00 ,  G03C5/00 ,  G01R13/00

CPC classification number: H01J37/315 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/153 ,  H01J2237/30433 ,  H01J2237/317

Abstract: An apparatus for characterization of a micro beam comprising a micro modified Faraday cup assembly including a first layer of material, a second layer of material operatively connected to the first layer of material, a third layer of material operatively connected to the second layer of material, and a fourth layer of material operatively connected to the third layer of material. The first layer of material comprises an electrical conducting material and has at least one first layer radial slit extending through the first layer. An electrical ground is connected to the first layer. The second layer of material comprises an insulating material and has at least one second layer radial slit corresponding to the first layer radial slit in the first layer of material. The second layer radial slit extends through the second layer. The third layer of material comprises a conducting material and has at least one third layer radial slit corresponding to the second layer radial slit in the second layer of material. The third layer radial slit extends through the third layer. The fourth layer of material comprises an electrical conducting material but does not have slits. An electrical measuring device is connected to the fourth layer. The micro modified Faraday cup assembly is positioned to be swept by the micro beam.

Abstract translation: 一种用于表征微束的装置，包括微修改的法拉第杯组件，其包括第一材料层，可操作地连接到第一材料层的第二材料层，与第二材料层可操作地连接的第三层材料， 以及可操作地连接到第三层材料的第四层材料。 第一层材料包括导电材料，并且具有延伸穿过第一层的至少一个第一层径向狭缝。 电接地连接到第一层。 第二层材料包括绝缘材料，并且具有至少一个与第一层材料中的第一层径向狭缝相对应的第二层径向狭缝。 第二层径向狭缝延伸穿过第二层。 第三层材料包括导电材料，并且具有与第二层材料中的第二层径向狭缝相对应的至少一个第三层径向狭缝。 第三层径向狭缝延伸穿过第三层。 第四层材料包括导电材料，但不具有狭缝。 电测量装置连接到第四层。 微改装的法拉第杯组件定位成被微梁扫过。