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    PLASMA REACTOR WITH ELECTRODE ASSEMBLY FOR MOVING SUBSTRATE
    71.
    发明申请
    PLASMA REACTOR WITH ELECTRODE ASSEMBLY FOR MOVING SUBSTRATE 审中-公开

    公开(公告)号：US20180374686A1

    公开(公告)日：2018-12-27

    申请号：US15630828

    申请日：2017-06-22

    Applicant: Applied Materials, Inc.

    Inventor： Kenneth S. Collins ,  Michael R. Rice ,  Kartik Ramaswamy ,  James D. Carducci

    IPC: H01J37/32 ,  C23C16/458 ,  C23C16/54

    Abstract: A processing tool for a plasma process includes a chamber body that has an interior space that provides a plasma chamber and that has a ceiling and an opening on a side opposite the ceiling, a workpiece support to hold a workpiece such that at least a portion of a front surface of the workpiece faces the opening, an actuator to generate relative motion between the chamber body and the workpiece support such that the opening moves laterally across the workpiece, a gas distributor to deliver a processing gas to the plasma chamber, an electrode assembly comprising a plurality of coplanar filaments extending laterally through the plasma chamber between the workpiece support and the ceiling, each of the plurality of filaments including a conductor, and a first RF power source to supply a first RF power to the conductors of the electrode assembly to form a plasma.

    PLASMA REACTOR WITH ELECTRODE ARRAY IN CEILING
    72.
    发明申请
    PLASMA REACTOR WITH ELECTRODE ARRAY IN CEILING 审中-公开

    公开(公告)号：US20180374685A1

    公开(公告)日：2018-12-27

    申请号：US15630658

    申请日：2017-06-22

    Applicant: Applied Materials, Inc.

    Inventor： Kenneth S. Collins ,  Michael R. Rice ,  Kartik Ramaswamy ,  James D. Carducci ,  Shahid Rauf ,  Kallol Bera

    IPC: H01J37/32 ,  C23C16/455

    Abstract: A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor to deliver a processing gas to the plasma chamber, a workpiece support to hold a workpiece, an electrode assembly comprising a plurality of conductors spaced apart from and extending laterally across the workpiece support in a parallel coplanar array, a first RF power source to supply a first RF power to the electrode assembly, and a dielectric bottom plate between the electrode assembly and the workpiece support, the dielectric bottom plate providing an RF window between the electrode assembly and the plasma chamber.

    Substrate support with switchable multizone heater
    77.
    发明授权
    Substrate support with switchable multizone heater 有权
    基板支持与可切换多区域加热器

    公开(公告)号：US09538583B2

    公开(公告)日：2017-01-03

    申请号：US13742639

    申请日：2013-01-16

    Applicant: APPLIED MATERIALS, INC.

    Inventor： Leon Volfovski ,  Mayur G. Kulkarni ,  Alex Minkovich ,  Michael R. Rice

    IPC: H05B3/68 ,  H05B3/26 ,  H01L21/67 ,  H05B1/02

    CPC classification number: H05B3/26 ,  H01L21/67103 ,  H05B1/0233

    Abstract: Embodiments of substrate supports with a heater are provided herein. In some embodiments, a substrate support may include a first member to distribute heat to a substrate when present above a first planar surface of the first member, a second member disposed beneath the first member, the second member including a plurality of resistive heating elements, wherein the plurality of resistive heating elements provide local temperature compensation to the first member to heat the substrate when present, a third member disposed beneath the second member, the third member including one or more base heating zones to provide a base temperature profile to the first member, and a fourth member disposed beneath the third member, the fourth member including a first set of electrical conductors coupled to each of the resistive heating elements.

    Abstract translation: 本文提供了具有加热器的基板支撑件的实施例。 在一些实施例中，衬底支撑件可以包括第一构件，用于当存在于第一构件的第一平面表面上方时将热量分配到衬底;第二构件，设置在第一构件下方，第二构件包括多个电阻加热元件， 其中所述多个电阻加热元件在存在时向所述第一构件提供局部温度补偿以加热所述基板，设置在所述第二构件下方的第三构件，所述第三构件包括一个或多个基座加热区以向所述第一构件提供基座温度曲线 以及设置在所述第三构件下方的第四构件，所述第四构件包括耦合到每个所述电阻加热元件的第一组电导体。

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