METHODS FOR FABRICATING MICRO-DEVICES
    73.
    发明申请
    METHODS FOR FABRICATING MICRO-DEVICES 审中-公开
    用于制造微型器件的方法

    公开(公告)号:US20170043147A1

    公开(公告)日:2017-02-16

    申请号:US15275776

    申请日:2016-09-26

    Inventor: Chris Yu

    Abstract: The present invention provides methods utilizing current nano-technological processes for fabricating a range of micro-devices with significantly expanded capabilities, unique functionalities at microscopic levels, enhanced degree of flexibilities, reduced costs and improved performance in the fields of bioscience and medicine. Such fabricated micro-devices have significant improvements in many areas over the existing, conventional methods, which include, but are not limited to reduced overall costs, early disease detection, targeted drug delivery, targeted disease treatment and reduced degree of invasiveness in treatment.

    Abstract translation: 本发明提供了利用当前纳米技术方法制造具有显着扩展的能力的微量器件的范围,在微观水平上的独特功能,增强的柔性程度,降低的成本以及在生物科学和医学领域中改进的性能的方法。 这种制造的微器件在现有的常规方法中在许多领域具有显着的改进,其包括但不限于降低总体成本,早期疾病检测,靶向药物递送,靶向疾病治疗和降低的治疗侵袭程度。

    DNA SEQUENCING USING MOSFET TRANSISTORS
    74.
    发明申请
    DNA SEQUENCING USING MOSFET TRANSISTORS 审中-公开
    使用MOSFET晶体管测序DNA

    公开(公告)号:US20160203258A1

    公开(公告)日:2016-07-14

    申请号:US14596284

    申请日:2015-01-14

    Abstract: Embodiments of the invention include a method for fabricating a semiconductor device, the resulting structure, and a method for using the resulting structure. A substrate is provided. A hard mask layer is patterned over at least a portion of the substrate. Regions of the substrate not protected by the hard mask are doped to form a source region and a drain region. The hard mask layer is removed. A dielectric layer is deposited on the substrate. An insulative layer is deposited on the dielectric layer. A nano-channel is created by etching a portion of the insulative layer which passes over the source region and the drain region.

    Abstract translation: 本发明的实施例包括制造半导体器件的方法,所得结构以及使用所得结构的方法。 提供基板。 在掩模的至少一部分上形成硬掩模层。 不经硬掩模保护的衬底的区域被掺杂以形成源极区域和漏极区域。 去除硬掩模层。 介电层沉积在基片上。 绝缘层沉积在电介质层上。 通过蚀刻通过源极区域和漏极区域的绝缘层的一部分来产生纳米通道。

    METHODS FOR FABRICATING MICRO-DEVICES
    76.
    发明申请
    METHODS FOR FABRICATING MICRO-DEVICES 有权
    用于制造微型器件的方法

    公开(公告)号:US20140299574A1

    公开(公告)日:2014-10-09

    申请号:US14292396

    申请日:2014-05-30

    Inventor: CHRIS YU

    Abstract: The present invention provides methods utilizing current nano-technological processes for fabricating a range of micro-devices with significantly expanded capabilities, unique functionalities at microscopic levels, enhanced degree of flexibilities, reduced costs and improved performance in the fields of bioscience and medicine. Such fabricated micro-devices have significant improvements in many areas over the existing, conventional methods, which include, but are not limited to reduced overall costs, early disease detection, targeted drug delivery, targeted disease treatment and reduced degree of invasiveness in treatment. Compared with existing, conventional approaches, the said inventive approach disclosed in this patent application is much more microscopic, sensitive, accurate, precise, flexible and effective.

    Abstract translation: 本发明提供了利用当前纳米技术方法制造具有显着扩展的能力的微量器件的范围,在微观水平上的独特功能,增强的柔性程度,降低的成本以及在生物科学和医学领域中改进的性能的方法。 这种制造的微器件在现有的常规方法中在许多领域具有显着的改进,其包括但不限于降低总体成本,早期疾病检测,靶向药物递送,靶向疾病治疗和降低的治疗侵袭程度。 与现有的常规方法相比,本专利申请中公开的所述发明方法更微观,灵敏,准确,精确,灵活和有效。

    Method for Functionalising Fluid Lines Contained in a Micromechanical Device, Micromechanical Device Including Functionalised Lines, and Method for Manufacturing Same
    77.
    发明申请
    Method for Functionalising Fluid Lines Contained in a Micromechanical Device, Micromechanical Device Including Functionalised Lines, and Method for Manufacturing Same 有权
    包含在机械装置中的流体线的功能化方法,包括功能化线的微机械装置及其制造方法

    公开(公告)号:US20130149196A1

    公开(公告)日:2013-06-13

    申请号:US13805491

    申请日:2011-06-29

    Abstract: The present invention relates to a method for functionalising fluid lines (1b) in a micromechanical device, the walls of which include an opaque layer. For this purpose, the invention provides a method for functionalising a micromechanical device provided with a fluid line including a peripheral wall (5) having a surface (2) outside the line and an inner surface (3) defining a space (1b) in which a fluid can circulate, the peripheral wall at least partially including a silicon layer (5a). The method includes the following steps: a) providing a device, the peripheral wall (5) of which at least partially includes a silicon layer (5a) having, at least locally, a thickness (e) of more than 100 nm and less than 200 nm, advantageously of 160 to 180 nm; c) silanising at least the inner surface of the fluid line; d) the localised, selective photo-deprotection on at least the inner surface of the silanised device by exposing the peripheral wall (5) at the point at which said wall has a thickness (e) of more than 100 nm and less than 200 nm, advantageously of 160 to 180 nm.

    Abstract translation: 本发明涉及一种在微机械装置中功能化流体管线(1b)的方法,其中壁部包括不透明层。 为此,本发明提供了一种功能化微机械装置的方法,该微机械装置具有流体管线,该流体管线包括具有在管线外部的表面(2)的周壁(5)和限定空间(1b)的内表面(3),其中 流体可以循环,周壁至少部分地包括硅层(5a)。 该方法包括以下步骤:a)提供一种器件,其外围壁(5)至少部分地包括硅层(5a),该硅层至少局部地具有大于100nm的厚度(e)并且小于 200nm,有利地为160〜180nm; c)至少对流体管线的内表面进行硅烷化; d)通过在所述壁的厚度(e)大于100nm且小于200nm的点处暴露周壁(5),至少在硅烷化装置的内表面上进行局部选择性光 - 去保护 ,有利地为160至180nm。

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