公开(公告)号：US20240172435A1

公开(公告)日：2024-05-23

申请号：US18424190

申请日：2024-01-26

申请人： SK hynix Inc.

发明人： Nam Jae LEE

IPC分类号： H10B41/35 ,  H10B41/10 ,  H10B41/20 ,  H10B43/10 ,  H10B43/20 ,  H10B43/35

CPC分类号： H10B41/35 ,  H10B41/10 ,  H10B41/20 ,  H10B43/10 ,  H10B43/20 ,  H10B43/35

摘要： A semiconductor device includes a stacked body including a conductive pattern and an insulating pattern, a cell plug passing through the stacked body, a semiconductor layer, a peripheral transistor arranged on the semiconductor layer, a first conductor coupling the peripheral transistor to the cell plug, a second conductor coupled to the conductive pattern, a pass plug coupled to the second conductor, and a pass gate surrounding the pass plug, wherein the pass gate is arranged at substantially a same level as the semiconductor layer.

公开(公告)号：US11991879B2

公开(公告)日：2024-05-21

申请号：US17155441

申请日：2021-01-22

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Yoo-cheol Shin ,  Young-woo Park ,  Jae-duk Lee

IPC分类号： H01L27/11578 ,  H01L29/66 ,  H01L29/788 ,  H01L29/792 ,  H10B41/20 ,  H10B41/27 ,  H10B41/40 ,  H10B43/20 ,  H10B43/27 ,  H10B43/35 ,  H10B43/40

CPC分类号： H10B43/20 ,  H01L29/66825 ,  H01L29/66833 ,  H01L29/7889 ,  H01L29/7926 ,  H10B41/20 ,  H10B41/27 ,  H10B41/40 ,  H10B43/27 ,  H10B43/35 ,  H10B43/40

摘要： A semiconductor device includes a peripheral circuit region on a substrate, a polysilicon layer on the peripheral circuit region, a memory cell array region on the polysilicon layer and overlapping the peripheral circuit region, the peripheral circuit region being under the memory cell array region, an upper interconnection layer on the memory cell array region, and a vertical contact through the memory cell array region and the polysilicon layer, the vertical contact connecting the upper interconnection layer to the peripheral circuit region.

公开(公告)号：US11984165B2

公开(公告)日：2024-05-14

申请号：US17752662

申请日：2022-05-24

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Chun-Ying Lee ,  Chia-En Huang ,  Chieh Lee

IPC分类号： G11C16/08 ,  G11C16/04 ,  H10B41/20 ,  H10B43/20

CPC分类号： G11C16/08 ,  G11C16/0483 ,  H10B41/20 ,  H10B43/20

摘要： A memory device includes a plurality of word lines (WLs). The memory device includes a plurality of drivers that are each configured to control a corresponding one of the plurality of WLs and each comprise a first transistor having a first conductive type and a second transistor having a second conductive type. The first transistor of a first one of the drivers is formed in a first well of a substrate, and the second transistor of the first driver is formed in a second well of the substrate. The first well is spaced apart from the second well.

公开(公告)号：US11974438B2

公开(公告)日：2024-04-30

申请号：US17903315

申请日：2022-09-06

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Haemin Lee ,  Jongwon Kim ,  Shinhwan Kang ,  Kohji Kanamori ,  Jeehoon Han

IPC分类号： H10B43/35 ,  H10B41/27 ,  H10B41/30 ,  H10B43/20

CPC分类号： H10B43/35 ,  H10B41/27 ,  H10B41/30 ,  H10B43/20

摘要： A semiconductor device includes a first stack group having first interlayer insulating layers and first gate layers, alternately and repeatedly stacked on a substrate and a second stack group comprising second interlayer insulating layers and second gate layers, alternately and repeatedly stacked on the first stack group. Separation structures pass through the first and second stack groups and include a first separation region and a second separation region. A vertical structure passes through the first and second stack groups and includes a first vertical region and a second vertical region. A conductive line is electrically connected to the vertical structure on the second stack group. A distance between an upper end of the first vertical region and an upper surface of the substrate is greater than a distance between an upper end of the first separation region and an upper surface of the substrate.

公开(公告)号：US20240135993A1

公开(公告)日：2024-04-25

申请号：US18492625

申请日：2023-10-22

申请人： Fu-Chang Hsu

发明人： Fu-Chang Hsu

IPC分类号： G11C16/04 ,  H10B41/10 ,  H10B41/20 ,  H10B41/35 ,  H10B43/10 ,  H10B43/20 ,  H10B43/35

CPC分类号： G11C16/0483 ,  H10B41/10 ,  H10B41/20 ,  H10B41/35 ,  H10B43/10 ,  H10B43/20 ,  H10B43/35

摘要： Various 3D array structures and processes are disclosed. In an embodiment, a word line staircase structure is provided that includes a plurality of word line layers alternately deposited with a plurality of insulating layers to form a stack and a first word line stairstep that includes all the layers of the stack. The staircase structure also includes one or more additional word line stairsteps such that each successive additional word line stairstep is formed to include less layers of the stack than the preceding word line stairstep to form the word line staircase structure. The stairstep structure also includes multiple contact holes formed in each word line stairstep to contact multiple word line layers within that word line stairstep.

公开(公告)号：US11968831B2

公开(公告)日：2024-04-23

申请号：US17931929

申请日：2022-09-14

申请人： MACRONIX INTERNATIONAL CO., LTD.

发明人： Be-Shan Tseng

IPC分类号： H10B43/20 ,  H10B41/35 ,  H10B41/41 ,  H10B43/10

CPC分类号： H10B43/20 ,  H10B41/35 ,  H10B41/41 ,  H10B43/10

摘要： A memory device includes a substrate, a first dielectric structure, a second dielectric structure, a channel structure, a source structure, and a drain structure. The first dielectric structure and the second dielectric structure are disposed on the substrate, and are spaced apart from each other in a first direction. The channel structure interconnects the first dielectric structure and the second dielectric structure. The source structure and the drain structure are on opposite ends of the channel structure, and are respectively embedded in the first dielectric structure and the second dielectric structure, wherein a ratio in length along the first direction of the source structure to the first dielectric structure is between 0.3 and 0.4.

公开(公告)号：US20240128116A1

公开(公告)日：2024-04-18

申请号：US18542761

申请日：2023-12-17

申请人： Monolithic 3D Inc.

发明人： Zvi Or-Bach ,  Brian Cronquist ,  Deepak C. Sekar

IPC分类号： H01L21/683 ,  G11C8/16 ,  H01L21/74 ,  H01L21/762 ,  H01L21/768 ,  H01L21/822 ,  H01L21/8238 ,  H01L21/84 ,  H01L23/48 ,  H01L23/525 ,  H01L27/02 ,  H01L27/06 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/118 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788 ,  H01L29/792 ,  H10B10/00 ,  H10B12/00 ,  H10B20/00 ,  H10B41/20 ,  H10B41/40 ,  H10B41/41 ,  H10B43/20 ,  H10B43/40

CPC分类号： H01L21/6835 ,  G11C8/16 ,  H01L21/743 ,  H01L21/76254 ,  H01L21/76898 ,  H01L21/8221 ,  H01L21/823828 ,  H01L21/84 ,  H01L23/481 ,  H01L23/5252 ,  H01L27/0207 ,  H01L27/0688 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/11807 ,  H01L27/11898 ,  H01L27/1203 ,  H01L29/4236 ,  H01L29/66272 ,  H01L29/66621 ,  H01L29/66825 ,  H01L29/66833 ,  H01L29/66901 ,  H01L29/78 ,  H01L29/7841 ,  H01L29/7843 ,  H01L29/7881 ,  H01L29/792 ,  H10B10/00 ,  H10B10/125 ,  H10B12/053 ,  H10B12/09 ,  H10B12/20 ,  H10B12/50 ,  H10B20/00 ,  H10B41/20 ,  H10B41/40 ,  H10B41/41 ,  H10B43/20 ,  H10B43/40 ,  H01L23/3677 ,  H01L2924/13062

摘要： 3D semiconductor device including: first level including first single-crystal transistors; a plurality of memory control circuits formed from at least a portion of the first single-crystal transistors; first metal layer disposed atop the first single-crystal transistors; a second metal layer disposed atop the first metal layer; a second level disposed atop the second metal layer includes second transistors and a memory array of first memory cells; third level including second memory cells which include some third transistors, which themselves include a metal gate and is disposed above the second level; a third metal layer disposed above the third level; a fourth metal layer disposed above the third metal layer; a connective path from the third metal layer to the second metal layer with a thru second level via of a diameter less than 800 nm which also passes thru the memory array, adjust memory cell write voltages based on temperature information.

公开(公告)号：US11961560B2

公开(公告)日：2024-04-16

申请号：US17096245

申请日：2020-11-12

申请人： Samsung Electronics Co., Ltd.

发明人： Myunghun Lee ,  Sangwan Nam ,  Taemin Ok

IPC分类号： H01L23/528 ,  G11C16/04 ,  G11C16/26 ,  H10B41/27 ,  H10B41/40 ,  H10B41/50 ,  H10B43/10 ,  H10B43/20 ,  H10B43/27 ,  H10B43/40 ,  H10B43/50

CPC分类号： G11C16/0483 ,  G11C16/26 ,  H01L23/528 ,  H10B41/27 ,  H10B41/40 ,  H10B41/50 ,  H10B43/10 ,  H10B43/20 ,  H10B43/27 ,  H10B43/40 ,  H10B43/50

摘要： An integrated circuit device includes a peripheral circuit structure including a lower substrate, an arc protection diode in the lower substrate, and a common source line driver connected to the arc protection diode, a conductive plate on the peripheral circuit structure, a cell array structure overlapping the peripheral circuit structure in a vertical direction with the conductive plate therebetween, and a first wiring structure connected between the arc protection diode and the conductive plate.

公开(公告)号：US11956976B2

公开(公告)日：2024-04-09

申请号：US18234368

申请日：2023-08-15

申请人： Monolithic 3D Inc.

发明人： Deepak C. Sekar ,  Zvi Or-Bach

IPC分类号： H10B63/00 ,  H01L21/268 ,  H01L21/683 ,  H01L21/762 ,  H01L21/822 ,  H01L21/84 ,  H01L27/06 ,  H01L27/12 ,  H01L29/423 ,  H01L29/78 ,  H10B10/00 ,  H10B12/00 ,  H10B41/20 ,  H10B41/41 ,  H10B43/20 ,  H10B61/00 ,  H01L27/105 ,  H10B41/40 ,  H10B43/40 ,  H10N70/00 ,  H10N70/20

CPC分类号： H10B63/84 ,  H01L21/268 ,  H01L21/6835 ,  H01L21/76254 ,  H01L21/8221 ,  H01L21/84 ,  H01L21/845 ,  H01L27/0688 ,  H01L27/1203 ,  H01L27/1211 ,  H01L29/42392 ,  H01L29/7841 ,  H01L29/785 ,  H10B10/00 ,  H10B12/20 ,  H10B12/50 ,  H10B41/20 ,  H10B41/41 ,  H10B43/20 ,  H10B61/22 ,  H10B63/30 ,  H10B63/845 ,  H01L27/105 ,  H01L2029/7857 ,  H01L2221/6835 ,  H10B12/056 ,  H10B12/36 ,  H10B41/40 ,  H10B43/40 ,  H10N70/20 ,  H10N70/823 ,  H10N70/8833

摘要： A semiconductor device including: a plurality of transistors, where at least one of the transistors includes a first single crystal source, channel, and drain, where at least one of the transistors includes a second single crystal source, channel, and drain, where the second single crystal source, channel, and drain is disposed above the first single crystal source, channel, and drain, where at least one of the transistors includes a third single crystal source, channel, and drain, where the third single crystal source, channel, and drain is disposed above the second single crystal source, channel, and drain, where at least one of the transistors includes a fourth single crystal source, channel, and drain, where the fourth single crystal source, channel, and drain is disposed above the third single crystal source, channel, and drain, and where the fourth drain is aligned to the first drain with less than 40 nm misalignment.

公开(公告)号：US20240112942A1

公开(公告)日：2024-04-04

申请号：US18527269

申请日：2023-12-02

申请人： Monolithic 3D Inc.

发明人： Zvi Or-Bach ,  Brian Cronquist ,  Deepak C. Sekar

IPC分类号： H01L21/683 ,  G11C8/16 ,  H01L21/74 ,  H01L21/762 ,  H01L21/768 ,  H01L21/822 ,  H01L21/8238 ,  H01L21/84 ,  H01L23/48 ,  H01L23/525 ,  H01L27/02 ,  H01L27/06 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/118 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788 ,  H01L29/792 ,  H10B10/00 ,  H10B12/00 ,  H10B20/00 ,  H10B41/20 ,  H10B41/40 ,  H10B41/41 ,  H10B43/20 ,  H10B43/40

CPC分类号： H01L21/6835 ,  G11C8/16 ,  H01L21/743 ,  H01L21/76254 ,  H01L21/76898 ,  H01L21/8221 ,  H01L21/823828 ,  H01L21/84 ,  H01L23/481 ,  H01L23/5252 ,  H01L27/0207 ,  H01L27/0688 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/11807 ,  H01L27/11898 ,  H01L27/1203 ,  H01L29/4236 ,  H01L29/66272 ,  H01L29/66621 ,  H01L29/66825 ,  H01L29/66833 ,  H01L29/66901 ,  H01L29/78 ,  H01L29/7841 ,  H01L29/7843 ,  H01L29/7881 ,  H01L29/792 ,  H10B10/00 ,  H10B10/125 ,  H10B12/053 ,  H10B12/09 ,  H10B12/20 ,  H10B12/50 ,  H10B20/00 ,  H10B41/20 ,  H10B41/40 ,  H10B41/41 ,  H10B43/20 ,  H10B43/40 ,  H01L23/3677 ,  H01L2924/13062

摘要： A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including first transistors, where each of the first transistors includes a single crystal channel; first metal layers interconnecting at least the first transistors; a second metal layer overlaying the first metal layers; a first oxide layer disposed over the second metal layer; a second oxide layer disposed over the first oxide layer; and a second level including at least one array of memory cells and second transistors, where each of the memory cells includes at least one of the second transistors, where the second level overlays the first level, where at least one of the second transistors includes at least two independent gates, where the second level is directly bonded to the first level, and where the bonded includes direct oxide-to-oxide bonds.