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81.发明授权Method and apparatus for angular-resolved spectroscopic lithography characterization 有权用于角分辨光谱光刻特征的方法和装置公开(公告)号：US07791732B2
公开(公告)日：2010-09-07
申请号：US11203418
申请日：2005-08-15
申请人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
发明人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
摘要翻译： 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。
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公开(公告)号：US20090213353A1
公开(公告)日：2009-08-27
申请号：US12412437
申请日：2009-03-27
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70308
摘要： Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
摘要翻译： 提供了一种用于促进使用多个可单独控制的元件来调制在聚焦元件阵列的每个聚焦元件处接收的辐射强度的方法和系统，以控制在其上聚焦的基底上的区域中的辐射强度 元素引导辐射。
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83.发明授权Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate 失效平版印刷设备和用于激发基板中的冲击波的减号表公开(公告)号：US07508494B2
公开(公告)日：2009-03-24
申请号：US11643952
申请日：2006-12-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
CPC分类号： G03F7/707 , H01L21/683
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括多个突起，其被构造和布置成支撑衬底的底部的对应部分，以及构造和布置成激发衬底中的冲击波的致动器。
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84.发明授权公开(公告)号：US07474384B2
公开(公告)日：2009-01-06
申请号：US10994201
申请日：2004-11-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Stephen Roux , Michael L. Nelson
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Stephen Roux , Michael L. Nelson
CPC分类号： G03F7/709 , G03F7/70258 , G03F7/70308
摘要： A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.
摘要翻译： 公开了一种用于光刻设备的光刻设备，设备制造方法和投影元件。 光刻设备具有用于提供脉冲辐射束的辐射系统，用于将光束赋予图案以形成图案化辐射束的图案形成装置，以及具有用于将图案化光束投影到目标部分的投影元件的投影系统 底物。 该装置还包括用于移动投影元件的致动器，用于移动在辐射系统的至少一个脉冲期间投影到基板上的图案化光束。 这可以进行以补偿保持基板的基板台与投影系统的空中图像之间的位置误差。 位置误差可能由于光刻设备的框架系统中的机械振动而发生。
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公开(公告)号：US20080297747A1
公开(公告)日：2008-12-04
申请号：US12170120
申请日：2008-07-09
申请人： Arno Jan BLEEKER , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
发明人： Arno Jan BLEEKER , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
摘要翻译： 一个或多个图形阵列通过高度调节结构安装到安装板，使得能够控制图案化阵列的有效表面的平坦度。 高度调节结构可以包括压电致动器或螺钉的阵列。 或者，可以将图案形成装置的背面抛光到光学平面度，并通过晶体结合键合到刚性安装体的光学平坦表面。
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86.发明申请Method of imaging radiation from an object on a detection device and an inspection device for inspecting an object 失效对来自检测装置上的物体的辐射进行成像的方法和用于检查物体的检查装置公开(公告)号：US20080230695A1
公开(公告)日：2008-09-25
申请号：US11727165
申请日：2007-03-23
申请人： Robert Snel , Arno Jan Bleeker , Hedser Van Brug
发明人： Robert Snel , Arno Jan Bleeker , Hedser Van Brug
CPC分类号： G01N21/94 , G01N21/8806 , G01N21/95623 , G01N2021/8822
摘要： A method of imaging radiation from an object on a detection device. The method includes directing a beam of coherent radiation to the object, scanning the beam of radiation over an angle in or out of a plane of incidence relative to the object, and imaging scattered radiation from the object on the detection device.
摘要翻译： 一种对来自检测装置上的物体的辐射成像的方法。 该方法包括将一束相干辐射引导到物体上，在相对于物体的入射平面内进入或离开角度扫描辐射束，以及对来自检测装置上物体的散射辐射进行成像。
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公开(公告)号：US07411652B2
公开(公告)日：2008-08-12
申请号：US10946333
申请日：2004-09-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
摘要翻译： 一个或多个图形阵列通过高度调节结构安装到安装板，使得能够控制图案化阵列的有效表面的平坦度。 高度调节结构可以包括压电致动器或螺钉的阵列。 或者，可以将图案形成装置的背面抛光到光学平面度，并通过晶体结合键合到刚性安装体的光学平坦表面。
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88.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07394524B2
公开(公告)日：2008-07-01
申请号：US11642988
申请日：2006-12-21
CPC分类号： G03F7/70358 , G03F7/70041 , G03F7/70425
摘要： Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
摘要翻译： 用于在辐射脉冲期间补偿光刻设备中的衬底的运动的装置和方法包括提供光学结构，其配置成与衬底同步地移动入射到衬底上的图案化的投影光束。
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89.发明授权Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam 有权光刻设备和器件制造方法限制用于对光束进行图案化的图案形成装置的一部分公开(公告)号：US07385677B2
公开(公告)日：2008-06-10
申请号：US11354027
申请日：2006-02-15
申请人： Arno Jan Bleeker
发明人： Arno Jan Bleeker
CPC分类号： G03F7/70066 , G03F7/70291 , G03F7/70425
摘要： A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.
摘要翻译： 使用系统和方法来限制用于对衬底进行图案化的可编程图案形成装置的比例。 这样做使得要暴露在基板上的重复图案的尺寸是通过图案化的光束在基板上暴露的图案的尺寸的整数倍。
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90.发明授权Spatial light modulator, lithographic apparatus and device manufacturing method 有权空间光调制器，光刻设备和器件制造方法公开(公告)号：US07321417B2
公开(公告)日：2008-01-22
申请号：US11642604
申请日：2006-12-21
申请人： Arno Jan Bleeker
发明人： Arno Jan Bleeker
CPC分类号： G03F7/70291 , G03F7/70283 , G03F7/70508
摘要： A spatial light modulator used to pattern a radiation beam comprises an array of pixels disposed on a support. Each pixel has a light modulating element for modulating the radiation beam and a control circuit that positions the light modulating elements according to a desired pattern. The control circuit is disposed on the opposite side of the support than the light modulating elements. The control circuit comprises at least one of a digital to analog converter, an analog to digital converter, an optical fiber input, and a processor.
摘要翻译： 用于对辐射束进行图案化的空间光调制器包括设置在支架上的像素阵列。 每个像素具有用于调制辐射束的光调制元件和根据所需图案定位光调制元件的控制电路。 控制电路设置在支撑体的与光调制元件相反的一侧。 控制电路包括数模转换器，模数转换器，光纤输入和处理器中的至少一个。
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