Metal coated markings on integrated circuit devices
    7.
    发明授权
    Metal coated markings on integrated circuit devices 有权
    集成电路设备上的金属涂层标记

    公开(公告)号:US06448632B1

    公开(公告)日:2002-09-10

    申请号:US09649264

    申请日:2000-08-28

    IPC分类号: H01L23552

    摘要: A semiconductor device comprising a mark located on a surface of the semiconductor device and a metal layer covering the marked surface and the mark. The metal layer functions to protect the semiconductor device from exposure to electromagnetic radiation and allows the mark to be visible for identification purposes. The present invention also pertains a method of manufacturing the semiconductor device as described. The method involves forming a mark on a semiconductor substrate surface of the device and covering the semiconductor substrate surface and the mark with a layer of metal so that the device is protected from exposure to electromagnetic radiation and allows the mark to be visible for identification purposes.

    摘要翻译: 一种半导体器件,包括位于半导体器件的表面上的标记和覆盖标记表面的金属层和标记。 金属层用于保护半导体器件免受电磁辐射的影响,并允许标记为了识别而可见。 本发明还涉及制造如上所述的半导体器件的方法。 该方法包括在器件的半导体衬底表面上形成标记,并用金属层覆盖半导体衬底表面和标记,使得器件免受暴露于电磁辐射的影响,并允许标记为识别目的而可见。