公开(公告)号：US20210050180A1

公开(公告)日：2021-02-18

申请号：US17043042

申请日：2019-03-29

Applicant: Tescan Brno, s.r.o. ,  Tescan Orsay Holding, A.S.

Inventor： Andrey Denisyuk ,  Pavel Dolezel

IPC: H01J37/20 ,  H01J37/305 ,  H01J37/28

Abstract: A device for creating and placing a lamella comprises a focused ion beam, a scanning electron microscope, a stage for placing at least two specimens enabling tilting, rotation and movement of the specimen. The device further comprises a manipulator terminated by a needle for attaching and transporting the specimen. The manipulator is positioned in a plane perpendicular to the axis of the tilt of the specimen, thereby enabling easy transportation and placing of the lamella into the specimen holder for a transmission electron microscope, so-called grid. The manipulator is adjusted to rotate the needle about its own axis. Thus, it enables inverting of the lamella and its polishing over a layer of semiconductor substrate, on which a semiconductor structure is formed, in case of creating the lamella from a semiconductor device.

公开(公告)号：US09782805B2

公开(公告)日：2017-10-10

申请号：US14608476

申请日：2015-01-29

Applicant: Masarykova univerzita ,  TESCAN ORSAY HOLDING, a.s.

Inventor： Pavel Stahel ,  Mirko Cernak ,  Zdenek Navratil ,  Jaroslav Jiruse ,  Jiri Fiala ,  Martin Hanicinec

IPC: B08B7/00 ,  G03F7/20

CPC classification number: B08B7/0035 ,  G03F7/70841 ,  G03F7/70925 ,  H01J2237/26 ,  H01J2237/28

Abstract: A method for reducing or removing organic and/or inorganic contamination from a vacuum system of imaging and analytical devices, wherein at least a portion of the area of the inner surface of the vacuum space of the vacuum system is provided with a photocatalytic layer, at least a portion of this photocatalytic layer being cooled to a temperature in the range of 0 K to 280 K, whereby the photocatalytic layer is afterwards at least partially irradiated by electromagnetic radiation, which activates a photocatalytic reaction of the photocatalytic layer with the adsorbed gases of the atmosphere of the inner vacuum space of the vacuum system, where this reaction decomposes the contaminants, reducing their concentration and/or the concentration of water in the inner vacuum space of the vacuum system.

公开(公告)号：US10832918B2

公开(公告)日：2020-11-10

申请号：US16044715

申请日：2018-07-25

Applicant: TESCAN Brno, s.r.o. ,  TESCAN ORSAY HOLDING a.s.

Inventor： Andrey Denisyuk ,  Sharang Sharang ,  Jozef Vincenc Obona

IPC: C23F4/00 ,  H01L21/3065 ,  H01J37/305 ,  H01L21/263 ,  H01L21/66

Abstract: A method of uniformly removing material from a sample surface includes the steps of sputtering by means of scanning the surface with a focused ion beam and a simultaneous observing of the sample during sputtering. Uniform sputtering of different materials is achieved by high-angle sputtering from multiple directions, wherein the directions are rotated relative to each other by a non-zero angle.

公开(公告)号：US20190074184A1

公开(公告)日：2019-03-07

申请号：US16044715

申请日：2018-07-25

Applicant: TESCAN Brno, s.r.o. ,  TESCAN ORSAY HOLDING a.s.

Inventor： Andrey Denisyuk ,  Sharang Sharang ,  Vincenc Jozef Obona

IPC: H01L21/3065 ,  H01L21/66 ,  H01L21/263 ,  C23F4/00

CPC classification number: H01L21/3065 ,  C23F4/00 ,  H01J37/3056 ,  H01J2237/3114 ,  H01J2237/31749 ,  H01L21/2633 ,  H01L22/12

Abstract: The subject matter of the invention is a method of uniformly removing material from a sample surface by sputtering by means of scanning the surface with a focused ion beam and a simultaneous observing of the sample during sputtering. Uniform sputtering of different materials is achieved by high-angle sputtering from multiple directions, wherein the directions are rotated relative to each other by a non-zero angle.

公开(公告)号：US20180012729A1

公开(公告)日：2018-01-11

申请号：US15700086

申请日：2017-09-09

Applicant: TESCAN ORSAY HOLDING, A.S.

Inventor： Filip LOPOUR ,  Tomas HRNCIR

IPC: H01J37/30 ,  G01N1/32

CPC classification number: H01J37/3005 ,  G01N1/32 ,  H01J2237/20207 ,  H01J2237/304 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An apparatus for processing a specimen with two or more particle beams, wherein the specimen has a milled side that is processed by a first particle beam and observed by a second particle beam. The specimen is milled during a first milling operation by the first particle beam with the specimen in a first position. Thereafter, the specimen tilts in a second position around an axis of tilt of the specimen. Thereafter, the specimen is milled during a second milling operation. Milling can be performed during continuous tilting of the specimen around the axis of tilt. The axis of tilt of the specimen intersects the milled side. In all the aforementioned positions of the specimen, the second particle beam impinges on the milled side, which enables monitoring of the milling in real time.

公开(公告)号：US20150279616A1

公开(公告)日：2015-10-01

申请号：US14667292

申请日：2015-03-24

Applicant: TESCAN ORSAY HOLDING, a.s. ,  WITec GmbH

Inventor： Jaroslav Jiruse ,  Olaf Hollricher ,  Martin Hanicinec

IPC: H01J37/28 ,  G01Q30/02 ,  H01J37/18 ,  G01N21/65 ,  H01J37/20

CPC classification number: H01J37/28 ,  G01J3/44 ,  G01N21/65 ,  G01N2201/061 ,  G01N2201/068 ,  G01Q30/025 ,  H01J37/18 ,  H01J37/20 ,  H01J37/226 ,  H01J37/228 ,  H01J37/26 ,  H01J2237/024 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2583 ,  H01J2237/2801 ,  H01J2237/2802

Abstract: A system uses number of analytical devices such as an electron microscope a Raman microscope, an ion beam column and a scanning probe microscope for sample analysis concurrent, consecutive or with the mutual correlation of the analysis performed by the different devices in the same sample area using the connection of the Raman microscope optical objective lens and objective manipulator, that significantly reduces time needed for analyzing by Raman microscope together with other devices and maintains high quality of the sensed signals comparable to stand alone analytical devices.

Abstract translation: 系统使用电子显微镜，拉曼显微镜，离子束柱和扫描探针显微镜等分析装置的数量，并行，连续或与相同样品区域中的不同装置进行的分析的相互关联，使用 拉曼显微镜光学物镜和物镜操纵器的连接，显着缩短了拉曼显微镜与其他设备一起分析所需的时间，并保持与独立分析设备相当的感测信号的高质量。

公开(公告)号：US10109457B2

公开(公告)日：2018-10-23

申请号：US14904409

申请日：2014-07-09

Applicant: TESCAN ORSAY HOLDING, A.S.

Inventor： Filip Lopour ,  Tomas Hrncir

IPC: G01N1/28 ,  H01J37/30 ,  G01N1/32

Abstract: A method and apparatus for processing a specimen with two or more particle beams, wherein the specimen has a milled side that is processed by a first particle beam and observed by a second particle beam. The specimen is milled during a first milling operation by the first particle beam with the specimen in a first position. Thereafter, the specimen tilts in a second position around an axis of tilt of the specimen. Thereafter, the specimen is milled during a second milling operation. Milling can be performed during continuous tilting of the specimen around the axis of tilt. The axis of tilt of the specimen intersects the milled side. In all the aforementioned positions of the specimen, the second particle beam impinges on the milled side, which enables monitoring of the milling in real time.

公开(公告)号：US20160148783A1

公开(公告)日：2016-05-26

申请号：US14904409

申请日：2014-07-09

Applicant: TESCAN ORSAY HOLDING, A.S.

Inventor： Filip LOPOUR ,  Tomas HRNCIR

IPC: H01J37/30

CPC classification number: H01J37/3005 ,  G01N1/32 ,  H01J2237/20207 ,  H01J2237/304 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A method and apparatus for processing a specimen with two or more particle beams, wherein the specimen has a milled side that is processed by a first particle beam and observed by a second particle beam. The specimen is milled during a first milling operation by the first particle beam with the specimen in a first position. Thereafter, the specimen tilts in a second position around an axis of tilt of the specimen. Thereafter, the specimen is milled during a second milling operation. Milling can be performed during continuous tilting of the specimen around the axis of tilt. The axis of tilt of the specimen intersects the milled side. In all the aforementioned positions of the specimen, the second particle beam impinges on the milled side, which enables monitoring of the milling in real time.

Abstract translation: 一种用于处理具有两个或更多个粒子束的样本的方法和装置，其中所述样本具有由第一粒子束处理并由第二粒子束观察的研磨侧。 样品在第一次研磨操作期间被第一粒子束研磨，样品处于第一位置。 此后，试样在试样的倾斜轴线的第二位置倾斜。 此后，在第二次研磨操作期间对样品进行研磨。 可以在试样围绕倾斜轴连续倾斜时进行铣削。 试样的倾斜轴与研磨侧相交。 在试样的所有前述位置上，第二粒子束照射在研磨侧上，这使得能够实时监测铣削。

公开(公告)号：US20150209841A1

公开(公告)日：2015-07-30

申请号：US14608476

申请日：2015-01-29

Applicant: Masarykova univerzita ,  TESCAN ORSAY HOLDING, a.s.

Inventor： Pavel STAHEL ,  Mirko CERNAK ,  Zdenek NAVRATIL ,  Jaroslav JIRUSE ,  Jiri FIALA ,  Martin HANICINEC

IPC: B08B7/00 ,  H01J37/32

CPC classification number: B08B7/0035 ,  G03F7/70841 ,  G03F7/70925 ,  H01J2237/26 ,  H01J2237/28

Abstract: A method for the treatment of inner surfaces of vacuum components and the device for carrying it out which enables the reduction of undesirable organic and inorganic contamination of vacuum systems not only in those that are being produced, but also enables the reduction of contamination in systems that are already in use, such as SEM, TEM, SEM-FIB, XPS, MALDI, SIMS and other analytical and inspection techniques. The proposed method for contaminant treatment derives benefit from a photocatalytic process, which is actually a chemical decomposition of contaminants using a photocatalytic material and electromagnetic radiation, the photocatalytic material being cooled simultaneously to a low temperature. The photocatalytic material is applied to the walls of the vacuum system or vacuum units, which are included in the system, in the form of a layer. If the material with photocatalytic properties is exposed to electromagnetic radiation having an appropriate wavelength, its surface is activated and a characteristic chemical reaction occurs. By using this method it is possible to decompose the contaminants so that they are finally converted to a gaseous phase, the gases being subsequently pumped out of the vacuum system. The inner surface covered with the photocatalytic layer is cooled to low temperatures, which facilitates the adsorption of the contaminants onto the surface covered with the photocatalytic layer and, consequently, increases the effectiveness of the decontamination process.

Abstract translation: 用于处理真空部件的内表面的方法和用于进行真空部件的装置，其能够减少真空系统的不期望的有机和无机污染物，不仅在生产中，而且还能够减少系统中的污染 已经在使用，如SEM，TEM，SEM-FIB，XPS，MALDI，SIMS等分析和检测技术。 所提出的污染物处理方法得益于光催化过程，其实际上是使用光催化材料和电磁辐射的污染物的化学分解，光催化材料同时被冷却到低温。 将光催化材料以层的形式施加到真空系统的壁或包括在系统中的真空单元。 如果具有光催化性能的材料暴露于具有适当波长的电磁辐射，其表面被激活并发生特征化学反应。 通过使用该方法，可以分解污染物，使得它们最终转化为气相，随后将气体泵出真空系统。 被光催化层覆盖的内表面被冷却到低温，这有助于污染物吸附到被光催化层覆盖的表面上，因此提高了净化过程的有效性。