公开(公告)号：US08795032B2

公开(公告)日：2014-08-05

申请号：US12457175

申请日：2009-06-03

申请人： Mitsuru Miyazaki ,  Seiji Katsuoka ,  Naoki Matsuda ,  Junji Kunisawa ,  Kenichi Kobayashi ,  Hiroshi Sotozaki ,  Hiroyuki Shinozaki ,  Osamu Nabeya ,  Shinya Morisawa ,  Takahiro Ogawa ,  Natsuki Makino

发明人： Mitsuru Miyazaki ,  Seiji Katsuoka ,  Naoki Matsuda ,  Junji Kunisawa ,  Kenichi Kobayashi ,  Hiroshi Sotozaki ,  Hiroyuki Shinozaki ,  Osamu Nabeya ,  Shinya Morisawa ,  Takahiro Ogawa ,  Natsuki Makino

IPC分类号： B24B51/00

CPC分类号： B24B37/345 ,  H01L21/30625 ,  H01L21/67219 ,  H01L21/67739 ,  H01L21/67742 ,  H01L21/67754 ,  Y10T137/0318 ,  Y10T137/8593

摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.

摘要翻译： 公开了一种用于处理衬底的设备。 该装置包括：抛光部，其被配置为对基板进行抛光;移动机构，被配置为传送基板;以及清洁部，其构造成清洁和干燥被研磨的基板。 清洗部具有多个用于清洗多个基板的清洗线。 多个清洁线具有多个清洁模块和用于传送基板的多个传送机器人。

公开(公告)号：US08777198B2

公开(公告)日：2014-07-15

申请号：US13398216

申请日：2012-02-16

申请人： Masahiko Sekimoto ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

发明人： Masahiko Sekimoto ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

IPC分类号： B23Q1/00

CPC分类号： H01L21/67086 ,  H01L21/67051 ,  H01L21/687

摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.

摘要翻译： 基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。 基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。 基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。

公开(公告)号：US08487284B2

公开(公告)日：2013-07-16

申请号：US13356563

申请日：2012-01-23

申请人： Satoshi Tateshima ,  Takahiro Ogawa ,  Fernando Vinuela

发明人： Satoshi Tateshima ,  Takahiro Ogawa ,  Fernando Vinuela

IPC分类号： A61F2/82 ,  A61F2/90

CPC分类号： B29C59/165 ,  A61L27/04 ,  A61L27/50 ,  A61L29/02 ,  A61L29/14 ,  A61L31/022 ,  A61L31/14 ,  A61L2400/18 ,  B29C2035/0827 ,  B29L2031/753 ,  B29L2031/7534 ,  B29L2031/7542

摘要： The present invention provides endovascular devices and the methods of making and using the same. The endovascular device is a prohealing endovascular device that comprises a super hydrophilic surface. The super hydrophilic surface is generated by a method comprising a step of irradiating a surface of the endovascular device with a high energy radiation for a period of time to cause the surface to become super hydrophilic.

摘要翻译： 本发明提供血管内装置及其制造和使用方法。 血管内装置是包括超亲水表面的预热血管内装置。 超级亲水性表面通过包括以高能量辐射照射血管内装置的表面一段时间以使表面变得超亲水的步骤的方法产生。

公开(公告)号：US07796873B2

公开(公告)日：2010-09-14

申请号：US12044102

申请日：2008-03-07

申请人： Yukio Uenaka ,  Takahiro Ogawa

发明人： Yukio Uenaka ,  Takahiro Ogawa

IPC分类号： G03B17/00

CPC分类号： H04N5/23248 ,  H04N5/23287

摘要： An anti-shake apparatus (an image-stabilization apparatus) of a photographing device comprises a movable unit and a controller. The movable unit has an imaging device and is movable and rotatable for an anti-shake operation. The controller controls the movable unit for the anti-shake operation. The controller calculates a hand-shake angle caused by roll. The controller controls whether the anti-shake operation is performed for correcting hand-shake caused by roll, on the basis of the hand-shake angle caused by roll.

摘要翻译： 拍摄装置的防抖装置（图像稳定装置）包括可移动单元和控制器。 可移动单元具有成像装置，并且可移动并且可旋转以进行防抖操作。 控制器控制可动单元进行防抖操作。 控制器计算由滚动导致的手抖动角度。 控制器根据由滚动导致的手抖动角度来控制是否执行用于校正由滚动导致的手抖动的防抖操作。

公开(公告)号：US20090067959A1

公开(公告)日：2009-03-12

申请号：US11665963

申请日：2007-02-21

申请人： Nobuyuki Takahashi ,  Hiroaki Nishida ,  Hiroomi Torii ,  Soichi Isobe ,  Tadakazu Sone ,  Ryuichi Kosuge ,  Hiroyuki Kaneko ,  Hiroshi Sotozaki ,  Takao Mitsukura ,  Takahiro Ogawa ,  Kenichi Sugita

发明人： Nobuyuki Takahashi ,  Hiroaki Nishida ,  Hiroomi Torii ,  Soichi Isobe ,  Tadakazu Sone ,  Ryuichi Kosuge ,  Hiroyuki Kaneko ,  Hiroshi Sotozaki ,  Takao Mitsukura ,  Takahiro Ogawa ,  Kenichi Sugita

IPC分类号： H01L21/67

CPC分类号： H01L21/67219 ,  B24B37/345 ,  H01L21/6719 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67766 ,  H01L21/68707

摘要： The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections (3a, 3b) each for polishing a semiconductor wafer (W), and a swing transporter (7) for transferring the wafer (W). The swing transporter (7) includes a wafer clamp mechanism (112) adapted to clamp the wafer (W), a vertically moving mechanism (104, 106) for vertically moving the wafer clamp mechanism (112) along a frame (102) of a casing of the polishing section (3a), and a swing mechanism (108, 110) for swinging the wafer clamp mechanism (112) about a shaft adjacent to the frame (102).

摘要翻译： 本发明涉及能够提高基板处理的节拍时间的基板处理装置。 作为基板处理装置的研磨装置包括：用于研磨半导体晶片（W）的多个研磨部（3a，3b）和用于转印晶片（W）的摆动传送装置（7）。 摆动传送器（7）包括适于夹紧晶片（W）的晶片夹紧机构（112），用于沿着晶片夹持机构（102）的框架（102）垂直移动的垂直移动机构（104,106） 抛光部分（3a）的外壳和用于使晶片夹紧机构（112）围绕与框架（102）相邻的轴摆动的摆动机构（108,110）。

公开(公告)号：US20090048753A1

公开(公告)日：2009-02-19

申请号：US12162223

申请日：2006-01-31

申请人： Takahiro Ogawa ,  Helge Westerfeld

发明人： Takahiro Ogawa ,  Helge Westerfeld

IPC分类号： B60T8/1755

CPC分类号： B60T8/1706 ,  B60T8/1766 ,  B60T8/261 ,  B60T8/3225 ,  B60T2230/03 ,  B60T2240/06

摘要： To reliably control and prevent rear wheel lifting caused by an abrupt brake operation.An amount of change in vehicle body deceleration is computed on the basis of detection signals of wheel velocity sensors 45 and 46 (S102), it is determined whether or not that computed value exceeds a predetermined value K1 (S104), and when it is determined that the computed value exceeds the predetermined value K1, then it is determined that there is the potential for rear wheel lifting, reduction of a pressure increase gradient of wheel cylinder pressure is performed (S106) until the amount of change in vehicle body deceleration falls below the predetermined value K1, and lifting of the rear wheel is reliably controlled.

摘要翻译： 可靠地控制和防止由突然制动操作引起的后轮提升。 基于车轮速度传感器45和46的检测信号计算车身减速度的变化量（S102），判定该计算值是否超过规定值K1（S104），并且当确定 计算值超过预定值K1，则确定存在后轮提升的可能性，执行轮缸压力的压力增加梯度的减小（S106），直到车体减速度的变化量低于 可靠地控制预定值K1和后轮的提升。

公开(公告)号：US20080226277A1

公开(公告)日：2008-09-18

申请号：US12044085

申请日：2008-03-07

申请人： Yukio UENAKA ,  Takahiro OGAWA

发明人： Yukio UENAKA ,  Takahiro OGAWA

IPC分类号： G03B17/00

CPC分类号： G03B17/00

摘要： An anti-shake apparatus (an image-stabilization apparatus) of a photographing device comprises a movable unit and a controller. The movable unit has an imaging device and is movable and rotatable for an anti-shake operation. The controller controls the movable unit for the anti-shake operation. The controller obtains information regarding a resolution at the edge of a lens that is used for an imaging operation of the imaging device. The controller controls a degree of the anti-shake operation that is performed for correcting hand-shake caused by roll on the basis of the resolution at the edge of the lens.

摘要翻译： 拍摄装置的防抖装置（图像稳定装置）包括可移动单元和控制器。 可移动单元具有成像装置，并且可移动并且可旋转以进行防抖操作。 控制器控制可动单元进行防抖操作。 控制器获得关于用于成像装置的成像操作的透镜的边缘处的分辨率的信息。 控制器控制基于透镜边缘处的分辨率来校正由辊引起的手抖动的防抖操作的程度。

公开(公告)号：US20060243204A1

公开(公告)日：2006-11-02

申请号：US11454790

申请日：2006-06-19

申请人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motoshima ,  Akira Owatari ,  Naoki Dai

发明人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motoshima ,  Akira Owatari ,  Naoki Dai

IPC分类号： B05C3/02 ,  B05C19/02

CPC分类号： H01L21/67161 ,  C23C18/1628 ,  C23C18/1893 ,  C25D7/123 ,  C25D17/001 ,  C25D17/08 ,  H01L21/67051 ,  H01L21/67126 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/6723 ,  H01L21/67742 ,  H01L21/67751 ,  H01L21/67766 ,  H01L21/67781 ,  H01L21/68707 ,  H01L21/68721 ,  Y10S134/902 ,  Y10T279/11

摘要： The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.

公开(公告)号：US06274609B1

公开(公告)日：2001-08-14

申请号：US09463211

申请日：2000-01-21

申请人： Shinichi Yasueda ,  Tadashi Terai ,  Takahiro Ogawa ,  Yoshinori Ii

发明人： Shinichi Yasueda ,  Tadashi Terai ,  Takahiro Ogawa ,  Yoshinori Ii

IPC分类号： A61K3141

CPC分类号： A61K9/0019 ,  A61K9/0048 ,  A61K9/08 ,  A61K31/41 ,  A61K47/10 ,  A61K47/26 ,  A61K47/32 ,  A61K47/38 ,  A61K47/44

摘要： In order to promote solubilization or suspension of 4-oxo-8-[4-(4-phenylbutoxy)benzoylamino]-2-(tetrazol-5-yl)-4H-1-benzopyran or its hydrate (pranlukast) in water, at least one component selected from surfactants, water-soluble cellulose derivatives and water-soluble vinyl polymers is formulated together with pranlukast. Thus, it is possible to provide an aqueous liquid pharmaceutical composition containing higher concentration of pranlukast and having good properties.

摘要翻译： 为了促进4-氧代-8- [4-（4-苯基丁氧基）苯甲酰基氨基] -2-（四唑-5-基）-4H-1-苯并吡喃或其水合物（普鲁司特）在水中的溶解或悬浮， 与普兰司他一起配制至少一种选自表面活性剂，水溶性纤维素衍生物和水溶性乙烯基聚合物的组分。 因此，可以提供含有较高浓度的普鲁司特并具有良好性能的含水液体药物组合物。

公开(公告)号：US5917714A

公开(公告)日：1999-06-29

申请号：US86228

申请日：1998-05-28

申请人： Takahiro Ogawa

发明人： Takahiro Ogawa

IPC分类号： H02M1/00 ,  H02M3/335 ,  H04N5/63

CPC分类号： H02M3/33523 ,  H02M1/32 ,  H02M2001/0032 ,  H04N5/63 ,  Y02B70/16

摘要： A switching power supply which takes out an output current from a secondary winding when a switching circuit for switching a current flowing through a primary winding is turned off and supplies a DC output to a load device having a control input for decreasing an amount of consumption power thereof. The switching power supply includes a voltage reduction detection circuit for detecting a voltage generated at the secondary winding when the switching circuit is in an on-state and for outputting to the control input a reduction signal representing reduction of an input voltage of the primary winding side when the detected voltage is out of a predetermined range.

摘要翻译： 一种开关电源，当用于切换流过初级绕组的电流的开关电路截止时，从次级绕组取出输出电流，并将DC输出提供给具有用于减少消耗功率量的控制输入的负载装置 其中。 开关电源包括电压降低检测电路，用于当开关电路处于导通状态时检测次级绕组产生的电压，并且向控制输入端输出表示初级绕组侧的输入电压降低的减小信号 当检测到的电压超出预定范围时。