公开(公告)号：US07130017B2

公开(公告)日：2006-10-31

申请号：US11067315

申请日：2005-02-25

申请人： Albrecht Hof ,  Guenter Maul ,  Lothar Gail ,  Wilfried Schierholz ,  Eberhard Jost

发明人： Albrecht Hof ,  Guenter Maul ,  Lothar Gail ,  Wilfried Schierholz ,  Eberhard Jost

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03B27/52 ,  G03F7/70808

摘要： A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.

摘要翻译： 投影曝光装置配备有照明系统，掩模版，投影物镜和像平面。 设备的各个元件之间的间隙空间对于环境空间是开放的。 携带稀有气体或氮气流的气体净化装置布置在至少一个间隙空间中。 气体净化装置的形状和尺寸使得一个或多个间隙空间至少在很大程度上与围绕投影装置的环境空间密封。

公开(公告)号：US20050206860A1

公开(公告)日：2005-09-22

申请号：US11067315

申请日：2005-02-25

申请人： Albrecht Hof ,  Guenter Maul ,  Lothar Gail ,  Wilfried Schierholz ,  Eberhard Jost

发明人： Albrecht Hof ,  Guenter Maul ,  Lothar Gail ,  Wilfried Schierholz ,  Eberhard Jost

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70933 ,  G03B27/52 ,  G03F7/70808

摘要： A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.

摘要翻译： 投影曝光装置配备有照明系统，掩模版，投影物镜和像平面。 设备的各个元件之间的间隙空间对于环境空间是开放的。 携带稀有气体或氮气流的气体净化装置布置在至少一个间隙空间中。 气体净化装置的形状和尺寸使得一个或多个间隙空间至少在很大程度上与围绕投影装置的环境空间密封。

公开(公告)号：US06864988B2

公开(公告)日：2005-03-08

申请号：US10186600

申请日：2002-07-01

申请人： Albrecht Hof ,  Guenter Maul ,  Michael Muehlbeyer ,  Klaus Mehlkopp

发明人： Albrecht Hof ,  Guenter Maul ,  Michael Muehlbeyer ,  Klaus Mehlkopp

IPC分类号： G02B7/182 ,  G02B7/00 ,  G02B7/02 ,  G02B27/62 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027 ,  G01B9/02

CPC分类号： G03F7/70258 ,  G02B7/008 ,  G02B7/02 ,  G03F7/70833

摘要： An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.

摘要翻译： 具有多个光学元件的光学系统，特别是用于半导体光刻的曝光透镜具有至少一个负载耗散结构。 负载消散结构转移源自光学元件的力。 光学系统还具有独立于至少一个负载消散结构构造的测量结构。

公开(公告)号：US06276066B1

公开(公告)日：2001-08-21

申请号：US09354532

申请日：1999-07-15

申请人： Lothar Scheibl ,  Albrecht Hof

发明人： Lothar Scheibl ,  Albrecht Hof

IPC分类号： G01B300

CPC分类号： H02N2/04

摘要： A positioning device is provided with a spindle and a spindle nut cooperating therewith for the conversion of a rotary motion into a linear motion for a coarse adjustment, and a piezoelectric linear positioning element arranged in series with the spindle and spindle nut for fine adjustment. The piezoelectric linear positioning element is relieved of transverse forces and moments by a cardan joint that is arranged between an object seating and the spindle.

摘要翻译： 定位装置具有主轴和与其配合的主轴螺母，用于将旋转运动转换为用于粗调的直线运动;以及压电线性定位元件，其与主轴和主轴螺母串联布置以进行微调。 压电线性定位元件通过布置在物体座椅和主轴之间的万向节接头消除横向力和力矩。

公开(公告)号：US5343294A

公开(公告)日：1994-08-30

申请号：US898158

申请日：1992-06-15

申请人： Michael Kuchel ,  Albrecht Hof

发明人： Michael Kuchel ,  Albrecht Hof

IPC分类号： G01B11/25 ,  G01B9/00

CPC分类号： G06T7/0057 ,  G01B11/2531

摘要： The present invention relates to a method for evaluating fringe images, in particular, for topographic measurements. During a first step, several phase-displaced patterns are recorded sequentially in time, and the respective phase relations of these patterns are determined by evaluation in the spatial domain (14a, 14b, 15). During a second step, after the phase shifts have been determined accurately in this manner based on the video images themselves, a pixel-by-pixel evaluation of the phase-displaced pattern is performed in the time domain. The invention also includes computer hardware for performing the evaluation of the strip images in video real time.

摘要翻译： 本发明涉及一种用于评估边缘图像的方法，特别是用于地形测量。 在第一步骤中，在时间上顺序地记录几个相位移模式，并且通过在空间域（14a，14b，15）中的评估来确定这些模式的各自的相位关系。 在第二步骤中，在基于视频图像本身以这种方式精确地确定了相移之后，在时域中执行相移位图案的逐像素评估。 本发明还包括用于以视频实时执行条形图像的评估的计算机硬件。

公开(公告)号：US06750949B2

公开(公告)日：2004-06-15

申请号：US10193688

申请日：2002-07-12

申请人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

发明人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

IPC分类号： G03B2742

CPC分类号： G03F7/70258 ,  G02B7/008 ,  G02B7/02 ,  G03F7/70833

摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.

摘要翻译： 根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。

公开(公告)号：US06523443B1

公开(公告)日：2003-02-25

申请号：US09051629

申请日：1998-12-30

申请人： Albrecht Hof ,  Klaus Mehlkopp

发明人： Albrecht Hof ,  Klaus Mehlkopp

IPC分类号： B23B4100

CPC分类号： B24B13/06 ,  B23Q11/0032 ,  B23Q2230/004 ,  B24B13/00 ,  Y10T82/125 ,  Y10T82/143 ,  Y10T82/2502 ,  Y10T82/2533

摘要： The present invention is a process by which optical surfaces of lenses, particularly plastic progressive lenses and molding shells for producing lenses are manufactured directly in a single step according to didicidual data. A blank from which an optical surface or a molding shell is to be manufactured is held at the workpiece carrier of a spindle axis (Z axis) of a shaping machine and is directly turned into its final form by a turning tool which can move relative to the blank (in the X axis), i.e., transversely to the direction of displacement of the tool. During each rotation of the spindle, the turning tool is incrementally adjusted towards or away from the blank depending on the characteristic surface data, which may be predetermined or calculated on-line.

摘要翻译： 本发明是一种通过镜片的光学表面，特别是塑料渐变镜片和用于制造镜片的成型壳体的方法，其中根据专利数据直接制造单个步骤。 要制造光学表面或成型壳的坯料保持在成形机的主轴轴线（Z轴）的工件载体上，并且通过可相对于 坯料（在X轴上），即横向于工具的位移方向。 在主轴的每次旋转期间，根据可以在线预定或计算的特征表面数据，转动工具朝向或远离坯料递增地调节。

公开(公告)号：US5135309A

公开(公告)日：1992-08-04

申请号：US666247

申请日：1991-03-08

申请人： Michael Kuchel ,  Albrecht Hof

发明人： Michael Kuchel ,  Albrecht Hof

IPC分类号： G01B11/24 ,  G01B11/25 ,  G01C3/06

CPC分类号： G06T7/0057 ,  G01B11/2531

摘要： Several bar patterns are projected in sequence on the object (O) to be measured by time-division multiplexing, and images of the bar patterns are recorded by a camera (K). The phases of each bar pattern, as distorted by the object, are calculated for preselected image points by a computer connected with the camera. For each image point, the calculated phases for one of said bar patterns are compared to the phases calculated for at least one other of said bar patterns, thereby producing a beat frequency which can be used to determine height measurements in the direction of the camera axis (z). In order to increase the range of the height measurements, at least two beat frequencies of quite different effective wavelengths are generated and evaluated. Different systems are disclosed for generating the different beat frequencies. In one embodiment, the bar patterns are projected by three different projectors (P.sub.1, P.sub.2, P.sub.3) which are inclined at different angles relative to each other (.alpha..sub.1, .alpha..sub.2). In a second embodiment, only two projectors are used, but each projector has two gratings, the respective periods of which differ from each other only slightly.

摘要翻译： 通过时分多路复用将待测物体（O）上的几个条形图案依次投影，并通过照相机（K）记录条形图案。 通过与相机连接的计算机为预选图像点计算每个条形图案的由对象扭曲的相位。 对于每个图像点，将所述条形图案中的一个的计算的相位与针对所述条形图案中的至少另一个计算的相位进行比较，从而产生拍频，其可用于确定相机轴方向上的高度测量值 （z）。 为了增加高度测量的范围，产生和评估至少两个完全不同有效波长的拍频。 公开了用于产生不同拍频的不同系统。 在一个实施例中，条形图案由相对于彼此以不同角度（α1，α2）倾斜的三个不同的投影仪（P1，P2，P3）投射。 在第二实施例中，仅使用两个投影仪，但是每个投影仪具有两个光栅，其各自的周期彼此稍微不同。

公开(公告)号：US20120140241A1

公开(公告)日：2012-06-07

申请号：US13368541

申请日：2012-02-08

申请人： Albrecht Hof ,  Dietmar Neugebauer ,  Rolf Freimann

发明人： Albrecht Hof ,  Dietmar Neugebauer ,  Rolf Freimann

IPC分类号： G01B11/02 ,  G01B9/02 ,  G02B7/182 ,  G01B11/06

CPC分类号： G03F7/70833 ,  G01B9/02027 ,  G01B9/0209 ,  G01B11/2441 ,  G01B2290/15 ,  G03F7/70233 ,  G03F7/70258

摘要： An optical system, such as a microlithographic projection exposure apparatus, includes a first optical component, a second optical component, and a measurement arrangement for determining the relative position of the first optical component and the second optical component in six degrees of freedom. The measurement arrangement is adapted to determine the relative position of the first optical component and the second optical component over six different length measurement sections. The length measurement sections extend directly between the first optical component and the second optical component.

摘要翻译： 诸如微光刻投影曝光装置的光学系统包括第一光学部件，第二光学部件和用于在六个自由度中确定第一光学部件和第二光学部件的相对位置的测量装置。 测量装置适于确定六个不同长度测量部分上的第一光学部件和第二光学部件的相对位置。 长度测量部分直接在第一光学部件和第二光学部件之间延伸。

公开(公告)号：US20100153059A1

公开(公告)日：2010-06-17

申请号：US12594373

申请日：2008-03-11

申请人： Gerd Klose ,  Michael Arnz ,  Albrecht Hof ,  Helmut Krause ,  Ulrich Stroessner ,  Matthias Manger ,  Uwe Schellhorn ,  Karl-Heinz Bechstein

发明人： Gerd Klose ,  Michael Arnz ,  Albrecht Hof ,  Helmut Krause ,  Ulrich Stroessner ,  Matthias Manger ,  Uwe Schellhorn ,  Karl-Heinz Bechstein

IPC分类号： G06F15/00 ,  G01B21/20

CPC分类号： G01N21/95692 ,  G01N2021/95676 ,  G03F1/84

摘要： An apparatus for measuring the positions of marks on a mask is provided, said apparatus comprising a mask holder for holding the mask, a recording unit for recording the marks of the mask held by the mask holder, an actuating module for moving the mask holder and the recording unit relative to each other, and an evaluating module, which numerically calculates the gravity-induced sagging of the mask in the mask holder and determines the positions of the marks on the mask, based on the calculated sagging, the recordings made by the recording unit and the relative movement between the mask holder and the recording unit, wherein, prior to calculating said sagging, the present position of the mask in the mask holder is determined and is taken into consideration in said numerical calculation, and/or the geometrical dimensions of the mask are taken into consideration in said numerical calculation of sagging.

摘要翻译： 提供了一种用于测量掩模上的标记位置的装置，所述装置包括用于保持掩模的掩模保持器，用于记录由掩模保持器保持的掩模的标记的记录单元，用于移动掩模保持器的致动模块和 所述记录单元相对于所述记录单元，以及评估模块，其对所述掩模保持器中的所述掩模的重力引起的下垂进行数值计算，并基于所计算的下垂来确定所述掩模上的所述标记的位置， 记录单元和掩模保持器和记录单元之间的相对运动，其中，在计算所述下垂之前，确定掩模保持器中掩模的当前位置并在所述数值计算中被考虑，和/或几何 在下垂的数值计算中考虑到面罩的尺寸。