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1.发明授权公开(公告)号：US09291554B2
公开(公告)日：2016-03-22
申请号：US14170150
申请日：2014-01-31
CPC分类号： G01N21/4788 , G01B21/30 , G01N21/84 , G01N21/95607 , G01N2021/95615 , G03F7/70625 , G06F17/40 , G06F19/00
摘要： Electromagnetic modeling of finite structures and finite illumination for metrology and inspection are described herein. In one embodiment, a method for evaluating a diffracting structure involves providing a model of the diffracting structure. The method involves computing background electric or magnetic fields of an environment of the diffracting structure. The method involves computing scattered electric or magnetic fields from the diffracting structure using a scattered field formulation based on the computed background fields. The method further involves computing spectral information for the model of the diffracting structure based on the computed scattered fields, and comparing the computed spectral information for the model with measured spectral information for the diffracting structure. In response to a good model fit, the method involves determining a physical characteristic of the diffracting structure based on the model of the diffracting structure.
摘要翻译： 本文描述了用于计量和检验的有限结构和有限照明的电磁建模。 在一个实施例中，用于评估衍射结构的方法包括提供衍射结构的模型。 该方法涉及计算衍射结构环境的背景电场或磁场。 该方法涉及使用基于所计算的背景场的散射场拟合来计算衍射结构中的散射电场或磁场。 该方法还涉及基于计算的散射场计算衍射结构模型的光谱信息，并将所计算的模型光谱信息与用于衍射结构的测量光谱信息进行比较。 响应于良好的模型拟合，该方法包括基于衍射结构的模型确定衍射结构的物理特性。
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2.发明申请公开(公告)号：US20140222380A1
公开(公告)日：2014-08-07
申请号：US14170150
申请日：2014-01-31
IPC分类号： G01N21/27
CPC分类号： G01N21/4788 , G01B21/30 , G01N21/84 , G01N21/95607 , G01N2021/95615 , G03F7/70625 , G06F17/40 , G06F19/00
摘要： Electromagnetic modeling of finite structures and finite illumination for metrology and inspection are described herein. In one embodiment, a method for evaluating a diffracting structure involves providing a model of the diffracting structure. The method involves computing background electric or magnetic fields of an environment of the diffracting structure. The method involves computing scattered electric or magnetic fields from the diffracting structure using a scattered field formulation based on the computed background fields. The method further involves computing spectral information for the model of the diffracting structure based on the computed scattered fields, and comparing the computed spectral information for the model with measured spectral information for the diffracting structure. In response to a good model fit, the method involves determining a physical characteristic of the diffracting structure based on the model of the diffracting structure.
摘要翻译： 本文描述了用于计量和检验的有限结构和有限照明的电磁建模。 在一个实施例中，用于评估衍射结构的方法包括提供衍射结构的模型。 该方法涉及计算衍射结构环境的背景电场或磁场。 该方法涉及使用基于所计算的背景场的散射场拟合来计算衍射结构中的散射电场或磁场。 该方法还涉及基于计算的散射场计算衍射结构模型的光谱信息，并将所计算的模型光谱信息与用于衍射结构的测量光谱信息进行比较。 响应于良好的模型拟合，该方法包括基于衍射结构的模型确定衍射结构的物理特性。
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公开(公告)号：US09046474B2
公开(公告)日：2015-06-02
申请号：US13541176
申请日：2012-07-03
申请人： Hidong Kwak , Ward Dixon , Leonid Poslavsky , Torsten R. Kaack
发明人： Hidong Kwak , Ward Dixon , Leonid Poslavsky , Torsten R. Kaack
CPC分类号： G01N21/211 , G01N2021/213 , G01N2021/214
摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.
摘要翻译： 公开了具有改进的稳定性的椭偏仪系统和椭偏仪数据采集方法。 根据本公开，使用多个预定的离散分析器角度来收集用于单个测量的椭圆测量数据，并且基于在这些预定的离散分析器角度收集的椭偏仪数据执行数据回归。 使用多个离散分析仪角度进行单次测量可提高椭偏仪系统的稳定性。
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4.发明授权Metrology through use of feed forward feed sideways and measurement cell re-use 有权通过使用前馈饲料进行横向计量和测量细胞再利用公开(公告)号：US08930156B2
公开(公告)日：2015-01-06
申请号：US12502112
申请日：2009-07-13
申请人： Michael Adel , Leonid Poslavsky , John Fielden , John Madsen , Robert Peters
发明人： Michael Adel , Leonid Poslavsky , John Fielden , John Madsen , Robert Peters
CPC分类号： H01L22/12 , H01L22/20 , H01L22/30 , H01L2924/0002 , H01L2924/00
摘要： Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.
摘要翻译： 可以在半导体器件制造期间通过以下步骤来实现计量：a）对形成在部分制造的器件的层中的第一测试单元上的第一测量进行建模; b）对所述层中的第二测试单元执行第二测量; c）将第二测量中的信息馈送到第一测量的建模中; 并且在包括第一和第二测试单元的层上形成光刻图案之后，d）分别使用来自a）和b）的信息对第一和第二测试单元上的第三和第四测量进行建模。
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公开(公告)号：US09442063B2
公开(公告)日：2016-09-13
申请号：US13524053
申请日：2012-06-15
申请人： Ming Di , Torsten Kaack , Qiang Zhao , Xiang Gao , Leonid Poslavsky
发明人： Ming Di , Torsten Kaack , Qiang Zhao , Xiang Gao , Leonid Poslavsky
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： The present invention includes generating a three-dimensional design of experiment (DOE) for a plurality of semiconductor wafers, a first dimension of the DOE being a relative amount of a first component of the thin film, a second dimension of the DOE being a relative amount of a second component of the thin film, a third dimension of the DOE being a thickness of the thin film, acquiring a spectrum for each of the wafers, generating a set of optical dispersion data by extracting a real component (n) and an imaginary component (k) of the complex index of refraction for each of the acquired spectrum, identifying one or more systematic features of the set of optical dispersion data; and generating a multi-component Bruggeman effective medium approximation (BEMA) model utilizing the identified one or more systematic features of the set of optical dispersion data.
摘要翻译： 本发明包括生成多个半导体晶片的实验（DOE）的三维设计，DOE的第一维度是薄膜的第一分量的相对量，DOE的第二维度是相对的 量的第二分量，DOE的第三维度是薄膜的厚度，获取每个晶片的光谱，通过提取实数分量（n）和产生一组光散射数据 用于识别所述光学色散数据集合中的一个或多个系统特征的每个所获取的光谱的复折射率的虚分量（k）; 以及使用所述一组或多个光学色散数据的一个或多个系统特征来生成多分量Bruggeman有效中等近似（BEMA）模型。
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公开(公告)号：US09127927B2
公开(公告)日：2015-09-08
申请号：US13712734
申请日：2012-12-12
申请人： Jonathan Iloreta , Paul Aoyagi , Hanyou Chu , Jeffrey Chard , Peilin Jiang , Mikhail Sushchik , Leonid Poslavsky , Philip D. Flanner, III
发明人： Jonathan Iloreta , Paul Aoyagi , Hanyou Chu , Jeffrey Chard , Peilin Jiang , Mikhail Sushchik , Leonid Poslavsky , Philip D. Flanner, III
IPC分类号： G06F17/16 , G01B11/30 , G06F7/00 , G06F17/40 , G06F19/00 , G01B11/00 , H01L21/66 , G01B11/24 , G03F7/20
CPC分类号： G01B11/00 , G01B11/24 , G01B11/30 , G01B2210/56 , G03F7/70625 , G06F7/00 , G06F17/16 , G06F17/40 , G06F19/00 , H01L22/12
摘要： Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.
摘要翻译： 提供了用于评估衍射结构的优化散射测量技术。 在一个实施例中，一种方法包括相对于第一参数（包括衍射结构的几何参数）计算场矩阵的有限差分导数，计算相对于场矩阵的Jones矩阵的分析导数，计算 相对于第一参数的Jones矩阵的导数，以及相对于第二参数（包括非几何参数）计算Jones矩阵的有限差分导数。 在一个实施例中，一种方法包括生成对于元素具有泰勒级数逼近的传递矩阵，并且基于入射光和衍射结构之间的对称性将场矩阵分解为两个或更多个较小的矩阵。
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7.发明申请DYNAMIC REMOVAL OF CORRELATION OF HIGHLY CORRELATED PARAMETERS FOR OPTICAL METROLOGY 审中-公开用于光学计量学的高相关参数的相关动态移除公开(公告)号：US20140358488A1
公开(公告)日：2014-12-04
申请号：US14293221
申请日：2014-06-02
IPC分类号： G01N21/25
CPC分类号： G03F7/70616 , G01N21/255 , G03F1/44 , G03F7/70483 , G03F7/70516 , G03F7/70625
摘要： Dynamic removal of correlation of highly-correlated parameters for optical metrology is described. An embodiment of a method includes determining a model of a structure, the model including a set of parameters; performing optical metrology measurement of the structure, including collecting spectra data on a hardware element; during the measurement of the structure, dynamically removing correlation of two or more parameters of the set of parameters, an iteration of the dynamic removal of correlation including: generating a Jacobian matrix of the set of parameters, applying a singular value decomposition of the Jacobian matrix, selecting a subset of the set of parameters, and computing a direction of the parameter search based on the subset of parameters. If the model does not converge, performing one or more additional iterations of the dynamic removal of correlation until the model converges; and if the model does converge, reporting the results of the measurement.
摘要翻译： 描述了用于光学测量的高度相关参数的相关性的动态去除。 方法的实施例包括确定结构的模型，所述模型包括一组参数; 执行结构的光学测量测量，包括在硬件元件上收集光谱数据; 在结构测量期间，动态地去除该组参数中的两个或多个参数的相关性，相关动态去除的迭代包括：生成该组参数的雅可比矩阵，应用雅可比矩阵的奇异值分解 ，选择参数集合的子集，以及基于参数子集计算参数搜索的方向。 如果模型不收敛，则执行动态去除相关性的一个或多个附加迭代，直到模型收敛; 如果模型收敛，报告测量结果。
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公开(公告)号：US20120320377A1
公开(公告)日：2012-12-20
申请号：US13164130
申请日：2011-06-20
IPC分类号： G01J4/00
CPC分类号： G01N21/21 , G01J3/504 , G01N21/274
摘要： A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer.
摘要翻译： 一种通过提供校准装置来校准偏振光学系统中任何入射角的偏振器的方法，通过提供校准装置，该校准装置包括具有设置在其表面上的偏振器的衬底， 用于指示偏振器的偏振取向的衬底，将校准装置装载在具有指示器的期望位置的偏振光学系统中，确定极化取向和偏振光学系统的基准之间的初始角度，使用偏振光 光学系统以偏振方向和偏振光学系统的基准之间的多个已知角度，使用光谱绘制指示偏振器在偏振光学系统中的角度的曲线，以及当偏振器的角度在 期望的范围，调节偏振器的角度，并重复以下步骤 获取光谱，并绘制一个指示偏振片角度的曲线。
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公开(公告)号：US07362686B1
公开(公告)日：2008-04-22
申请号：US11000771
申请日：2004-12-01
CPC分类号： G01B11/06
摘要： A method of determining actual properties of layered media. An incident beam of light is directed towards the layered media, such that the incident beam of light is reflected from the layered media as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the layered media are estimated. A mathematical model of the layered media is solved with the estimated properties of the layered media to yield theoretical properties of the reflected beam of light. The mathematical model is solved using a diagonal T matrix algorithm. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light to yield a cost function. The estimated properties of the layered media are iteratively adjusted and the mathematical model is iteratively solved until the cost function is within a desired tolerance. The estimated properties of the layered media are reported as the actual properties of the layered media.
摘要翻译： 确定分层介质实际属性的方法。 入射光束被引向分层介质，使得入射光束作为反射光束从分层介质反射。 测量反射光束的实际特性，估算分层介质的性质。 分层介质的数学模型通过分层介质的估计性质来解决，以产生反射光束的理论特性。 使用对角T矩阵算法求解数学模型。 将反射光束的理论性质与反射光束的实际特性进行比较，以产生成本函数。 迭代地调整分层介质的估计性质，并且迭代地求解数学模型，直到成本函数在期望的公差内。 分层介质的估计性质被报告为分层介质的实际性质。
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公开(公告)号：US07321426B1
公开(公告)日：2008-01-22
申请号：US10859637
申请日：2004-06-02
CPC分类号： G01N21/211 , G01N21/8422
摘要： An optical metrology system includes model approximation logic for generating an optical model based on experimental data. By eliminating theoretical model generation, in which the fundamental equations of a test sample must be solved, the model approximation logic significantly reduces the computational requirements of the metrology system when measuring films formed on patterned base layers. The experimental model can be created by selecting an expected mathematical form for the final model, gathering experimental data, and compiling a lookup model. The lookup model can include the actual measurement data sorted by output (attribute) value, or can include “grating factors” that represent compensation factors that, when applied to standard monolithic model equations, compensate for the optical effects of grating layers.
摘要翻译： 光学测量系统包括用于基于实验数据生成光学模型的模型近似逻辑。 通过消除理论模型生成，其中必须解决测试样本的基本方程，当测量在图案化基底层上形成的膜时，模型近似逻辑显着降低了计量系统的计算要求。 可以通过选择最终模型的预期数学形式，收集实验数据和编译查找模型来创建实验模型。 查找模型可以包括通过输出（属性）值排序的实际测量数据，或者可以包括表示当应用于标准单片模型方程时补偿光栅层的光学效应的补偿因子的“光栅因子”。
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