SYSTEMS, METHODS AND INTERFACES FOR EVALUATING AN ONLINE ENTITY PRESENCE
    4.
    发明申请
    SYSTEMS, METHODS AND INTERFACES FOR EVALUATING AN ONLINE ENTITY PRESENCE 有权
    用于评估在线实体存在的系统,方法和接口

    公开(公告)号:US20140095598A1

    公开(公告)日:2014-04-03

    申请号:US13630035

    申请日:2012-09-28

    IPC分类号: H04L29/08

    摘要: A method for evaluating an online entity presence includes receiving a set of social media information for at least one entity and calculating a social media measurement where the social media measurement is associated with the set of social media information. The method further includes receiving a set of online profile information for the at least one entity, the set of online profile information being associated with one or more non-social media online profiles, and calculating an online profile measurement wherein the online profile measurement is associated with the set of online profile information. The method further includes calculating a reach value, the reach value being associated with the social media measurement and the online profile measurement and providing a reach score to a user where the reach score associated with the reach value.

    摘要翻译: 一种用于评估在线实体存在的方法包括:接收用于至少一个实体的一组社交媒体信息,并且计算社交媒体测量与所述一组社交媒体信息相关联的社交媒体测量。 该方法还包括接收用于至少一个实体的一组在线简档信息,所述在线简档信息的集合与一个或多个非社交媒体在线简档相关联,以及计算在线简档测量,其中在线简档测量相关联 与一组在线个人资料信息。 该方法还包括计算一个达到值,该达到值与该社交媒体测量相关联,以及在线个人资料测量,并向该用户提供一个达到分数,该达成分与该达到值相关联。

    REDUCING MOIRÉ PATTERNS
    5.
    发明申请
    REDUCING MOIRÉ PATTERNS 有权
    减少运动模式

    公开(公告)号:US20130142450A1

    公开(公告)日:2013-06-06

    申请号:US13309493

    申请日:2011-12-01

    IPC分类号: G06T5/00

    摘要: Among other disclosed subject matter, a computer-implemented method includes receiving illustrated content. The illustrated content includes half-tone content. The method includes blurring at least part of the illustrated content. The blurring is performed according to a blur radius. The method includes downscaling the blurred illustrated content to an output size.

    摘要翻译: 在其他公开的主题中,计算机实现的方法包括接收所说明的内容。 所示内容包括半色调内容。 该方法包括模糊所示内容的至少一部分。 模糊是根据模糊半径进行的。 该方法包括将模糊的图示内容缩减为输出尺寸。

    Methods of forming nanodots using spacer patterning techniques and structures formed thereby
    6.
    发明授权
    Methods of forming nanodots using spacer patterning techniques and structures formed thereby 失效
    使用间隔图案化技术和由此形成的结构形成纳米点的方法

    公开(公告)号:US08388854B2

    公开(公告)日:2013-03-05

    申请号:US11968091

    申请日:2007-12-31

    IPC分类号: C23F1/00

    摘要: Methods and associated structures of forming a microelectronic device are described. Those methods may include forming a first block on a nanodot material, forming a first spacer on the first block, removing the first block to form a free standing spacer, removing exposed portions of the nanodot material and then the free standing spacer to form nanowires, forming a second block at an angle to a length of the nanowires, forming a second spacer on the second block, forming a second free standing spacer on the nanowires by removing the second block, and removing exposed portions of the nanowires and then the second free standing spacer to form an ordered array of nanodots.

    摘要翻译: 描述形成微电子器件的方法和相关结构。 这些方法可以包括在纳点物质上形成第一块,在第一块上形成第一间隔物,去除第一块以形成自由间隔物,去除纳米点材料的暴露部分,然后除去自由基间隔物以形成纳米线, 在与所述纳米线的长度成一定角度地形成第二块,在所述第二块上形成第二间隔物,通过去除所述第二块在所述纳米线上形成第二自由间隔物,以及去除所述纳米线的暴露部分,然后除去所述第二自由基 形成有序阵列的纳米点。

    Method to introduce uniaxial strain in multigate nanoscale transistors by self aligned SI to SIGE conversion processes and structures formed thereby
    7.
    发明授权
    Method to introduce uniaxial strain in multigate nanoscale transistors by self aligned SI to SIGE conversion processes and structures formed thereby 有权
    通过自对准SI将SIGNA转换过程和结构形成的多晶纳米级晶体管中的单轴应变的方法

    公开(公告)号:US08288233B2

    公开(公告)日:2012-10-16

    申请号:US11864726

    申请日:2007-09-28

    IPC分类号: H01L21/8244

    摘要: Methods of forming a microelectronic structure are described. Embodiments of those methods may include providing a gate electrode comprising a top surface and first and second laterally opposite sidewalls, wherein a hard mask is disposed on the top surface, a source drain region disposed on opposite sides of the gate electrode, and a spacer disposed on the first and second laterally opposed sidewalls of the gate electrode, forming a silicon germanium layer on exposed portions of the top surface and the first and second laterally opposite sidewalls of the source drain region and then oxidizing a portion of the silicon germanium layer, wherein a germanium portion of the silicon germanium layer is forced down into the source drain region to convert a silicon portion of the source drain region into a silicon germanium portion of the source drain region.

    摘要翻译: 描述形成微电子结构的方法。 这些方法的实施例可以包括提供包括顶表面和第一和第二横向相对的侧壁的栅电极,其中硬掩模设置在顶表面上,源极漏极区域设置在栅电极的相对侧上, 在栅电极的第一和第二横向相对的侧壁上,在源漏区的顶表面和第一和第二横向相对的侧壁的暴露部分上形成硅锗层,然后氧化硅锗层的一部分,其中 硅锗层的锗部分被迫下降到源极漏极区域中,以将源极区域的硅部分转换成源极漏极区域的硅锗部分。