Plasma display panel and method for manufacturing the same
    3.
    发明申请
    Plasma display panel and method for manufacturing the same 失效
    等离子显示面板及其制造方法

    公开(公告)号:US20050062419A1

    公开(公告)日:2005-03-24

    申请号:US10942053

    申请日:2004-09-16

    申请人: Sang Lee Joong Kim

    发明人: Sang Lee Joong Kim

    CPC分类号: H01J11/40 H01J11/12

    摘要: The present invention relates to a plasma display panel and method for manufacturing the same in which electron discharge characteristic is improved and a voltage margin can be secured. According to a first embodiment of the present invention, a plasma display panel including a plurality of a pair of display electrodes formed and arranged parallely on an upper plate, a plurality of address electrodes formed on a lower plate and arranged to be crossed to the display electrodes, a barrier rib defined a discharge space on the lower plate, and fluorescent body formed between the barrier ribs, includes further: a number of discharge cells having the discharge space; and an alkali metal layer formed in the discharge cells for supplying electrons to the discharge space.

    摘要翻译: 等离子体显示面板及其制造方法技术领域本发明涉及等离子体显示面板及其制造方法,其中电子放电特性得到改善并且可以确保电压余量。 根据本发明的第一实施例,一种等离子体显示面板,包括多个平行地形成并且平行地布置在上板上的显示电极,多个地址电极形成在下板上,并布置成与显示器交叉 电极,限定了下板上的放电空间的隔壁和形成在隔壁之间的荧光体,还包括:具有放电空间的多个放电单元; 以及在放电单元中形成的用于向放电空间提供电子的碱金属层。

    Plasma display panel
    4.
    发明申请
    Plasma display panel 失效
    等离子显示面板

    公开(公告)号:US20050007017A1

    公开(公告)日:2005-01-13

    申请号:US10885598

    申请日:2004-07-08

    申请人: Joong Kim Sang Lee

    发明人: Joong Kim Sang Lee

    IPC分类号: H01J17/49

    摘要: There is disclosed a plasma display panel that is adaptive for evenly depositing a phosphorus layer by forming a buffer layer before the phosphorus layer is formed within a discharge cell of a rear surface substrate. A plasma display panel including a front substrate where a common sustain electrode and scan sustain electrodes are formed and light is emitted and a rear substrate where discharge cells are formed by barrier ribs and address electrodes are formed for address discharge, and wherein the rear substrate is bonded with the front substrate by frit glass, according to an embodiment of the present invention includes a phosphorus layer deposited on a buffer layer and the upper part of the buffer layer in a discharge cell between the barrier ribs.

    摘要翻译: 公开了一种等离子体显示面板,其适于通过在将磷层形成在背面基板的放电单元之前形成缓冲层来均匀地沉积磷层。 一种等离子体显示面板,其特征在于,具有前面基板,形成共同的维持电极和扫描维持电极,发出光,通过隔壁和寻址电极形成放电单元的背面基板,其中后部基板为 根据本发明的实施例,通过熔结玻璃与前基板结合的方法包括沉积在缓冲层上的磷层和位于阻挡肋之间的放电单元中的缓冲层的上部。

    Apparatus and method for driving a plasma display panel
    6.
    发明申请
    Apparatus and method for driving a plasma display panel 审中-公开
    用于驱动等离子体显示面板的装置和方法

    公开(公告)号:US20050134532A1

    公开(公告)日:2005-06-23

    申请号:US10980823

    申请日:2004-11-04

    摘要: The present invention relates to a plasma display panel, and more particularly, to an apparatus and method for driving a plasma display panel. According to an embodiment of the present invention, the apparatus for driving the plasma display panel includes a temperature sensor that senses a temperature of the plasma display panel, an erase signal tilt control unit that controls a tilt of an erase signal for erasing charges within a cell of the plasma display panel depending on the sensed temperature, and a driving unit that supplies an initialization signal for initializing the cell, an address signal for selecting the cell and a sustain signal for generating a sustain discharge in the cell to the plasma display panel after the charges within the cell are erased using the erase signal. Accordingly, a stabilized discharge can be implemented in such a manner that an ambient temperature is sensed when the plasma display panel is driven, an erase signal is controlled according to the sensed ambient temperature, and the controlled erase signal is applied.

    摘要翻译: 等离子体显示面板技术领域本发明涉及等离子体显示面板,更具体地,涉及一种用于驱动等离子体显示面板的装置和方法。 根据本发明的实施例,用于驱动等离子体显示面板的装置包括:感测等离子体显示面板的温度的温度传感器;擦除信号倾斜控制单元,其控制擦除信号的倾斜,以擦除等离子体显示面板内的电荷 等离子体显示面板的单元,以及提供用于初始化单元的初始化信号的驱动单元,用于选择单元的地址信号和用于在单元中产生维持放电的维持信号到等离子体显示面板 在使用擦除信号擦除单元内的电荷之后。 因此,可以以这样的方式实现稳定的放电,即当驱动等离子体显示面板时感测到环境温度,根据感测到的环境温度控制擦除信号,并施加受控的擦除信号。

    LIQUID CRYSTAL DISPLAY DEVICE
    7.
    发明申请
    LIQUID CRYSTAL DISPLAY DEVICE 审中-公开
    液晶显示装置

    公开(公告)号:US20070046856A1

    公开(公告)日:2007-03-01

    申请号:US11552289

    申请日:2006-10-24

    IPC分类号: G02F1/1335

    摘要: An LCD device has scratch-resistant property without using a protection sheet and can provide enhanced brightness. The LCD device includes a light path regulating member. The member includes a first prism sheet having first prisms of which apex has a round shape. The first prism sheet concentrates light supplied from a lamp to output the concentrated light. An anti-glare polarizing plate uniformly polarizes polarized planes of the concentrated light and provides the polarized light to the lower substrate. The anti-glare polarizing plate is arranged below the lower substrate of an LCD panel, and an uppermost prism sheet of optical sheets is non-matte-treated and has round-treated apexes. In spite of the absence of the protection sheet, the scratch-resistant property of the uppermost prism sheet and the brightness of the LCD panel may be enhanced.

    摘要翻译: 液晶显示装置具有耐刮擦性能,不使用保护片,可提供更高的亮度。 LCD装置包括光路调节部件。 该构件包括具有顶点具有圆形形状的第一棱镜的第一棱镜片。 第一棱镜片集中从灯提供的光以输出集中的光。 抗眩光偏光板使聚光的偏振面均匀地偏振,并向下基板提供偏振光。 防眩光偏振板配置在LCD面板的下基板的下方,最上方的光学片棱镜片未经磨光处理,具有圆形处理的顶点。 尽管不存在保护片,但是可以提高最上面的棱镜片的耐擦伤性和LCD面板的亮度。

    Reactor for thin film deposition and method for depositing thin film on wafer using the reactor
    8.
    发明申请
    Reactor for thin film deposition and method for depositing thin film on wafer using the reactor 审中-公开
    用于薄膜沉积的反应器和使用反应器在晶片上沉积薄膜的方法

    公开(公告)号:US20050158469A1

    公开(公告)日:2005-07-21

    申请号:US11080748

    申请日:2005-03-15

    摘要: A reactor for thin film deposition and a thin film deposition method using the reactor are provided. The reactor includes: a reactor block which receives a wafer transferred through a wafer transfer slit; a wafer block which is installed in the reactor block to receive the wafer thereon; a top plate disposed to cover the reactor block; a shower head which is mounted on the bottom of the top plate and diffuses gas toward the wafer; and an exhaust unit which exhausts the gas from the reactor block. A first supply pipeline which supplies a first reactant gas and/or an inert gas to the wafer; a second supply pipeline which supplies a second reactant gas and/or an inert gas to the wafer; and a plasma generator which generates plasma between the wafer block and shower head are included. The shower head includes: a first supply path connected to the first supply pipeline; a plurality of first diffuse holes formed in the bottom of the shower head at a constant interval; a first main path formed parallel to the plane of the shower head and connecting the plurality of first diffuse holes and the first supply path; a second supply path connected to the second supply pipeline; a plurality of second diffuse holes formed in the bottom of the shower head at a constant interval as the plurality of the first diffuse holes; and a second main path formed parallel to the plane of the shower head at a different height from the second main path and connecting the plurality of second diffuse holes and the second supply path.

    摘要翻译: 提供了一种用于薄膜沉积的反应器和使用该反应器的薄膜沉积方法。 反应器包括:反应器块,其接收通过晶片传送狭缝转移的晶片; 晶片块,其安装在反应器块中以在其上接收晶片; 设置成覆盖反应器块的顶板; 淋浴头,其安装在顶板的底部并将气体向晶片扩散; 以及从反应器块排出气体的排气单元。 一种向晶片提供第一反应气体和/或惰性气体的第一供应管线; 第二供应管线,其向所述晶片供给第二反应气体和/或惰性气体; 并且包括在晶片块和淋浴头之间产生等离子体的等离子体发生器。 淋浴头包括:连接到第一供应管道的第一供应路径; 以恒定的间隔形成在所述淋浴喷头的底部的多个第一扩散孔; 第一主路径,其平行于所述淋浴头的平面形成,并且连接所述多个第一扩散孔和所述第一供给路径; 连接到第二供应管线的第二供应路径; 多个第二扩散孔,作为多个第一扩散孔以恒定的间隔形成在所述淋浴喷头的底部; 以及第二主路径,其与所述淋浴喷头的平面平行,与所述第二主路径不同的高度,并且连接所述多个第二扩散孔和所述第二供应路径。

    Novel rumen bacteria variants and process for preparing succinic acid employing the same
    9.
    发明申请
    Novel rumen bacteria variants and process for preparing succinic acid employing the same 有权
    新型瘤胃细菌变异体及使用其制备琥珀酸的方法

    公开(公告)号:US20070054387A1

    公开(公告)日:2007-03-08

    申请号:US10580556

    申请日:2004-05-20

    申请人: Sang Lee Sang Lee

    发明人: Sang Lee Sang Lee

    IPC分类号: C12P7/46 C12N1/20

    CPC分类号: C12P7/46 C12N1/20 C12R1/01

    摘要: The present invention relates to novel rumen bacterial mutants resulted from the disruption of a lactate dehydrogenase gene (ldhA) and a pyruvate formate-lyase gene (pfl) (which are involved in the production of lactic acid, formic acid and acetic acid) from rumen bacteria; a novel bacterial mutant (Mannheimia sp. LPK7) having disruptions of a lactate dehydrogenase gene (ldhA), a pyruvate formate-lyase gene (pfl), a phosphotransacetylase gene (pta), and a acetate kinase gene (ackA); a novel bacterial mutant (Mannheimia sp. LPK4) having disruptions of a lactate dehydrogenase gene (ldhA), a pyruvate formate-lyase gene (pfl) and a phosphoenolpyruvate carboxylase gene (ppc) involved in the immobilization of CO2 in a metabolic pathway of producing succinic acid; and a method for producing succinic acid, which is characterized by the culture of the above mutants in anaerobic conditions. The inventive bacterial mutants have the property of producing succinic acid at high concentration while producing little or no organic acids, as compared to the prior wild-type strains of producing various organic acids. Thus, the inventive bacterial mutants are useful as strains for the industrial production of succinic acid.

    摘要翻译: 本发明涉及由瘤胃中的乳酸脱氢酶基因(ldhA)和丙酮酸甲酸裂解酶基因(pfl)(其涉及乳酸,甲酸和乙酸的生产)的破坏而产生的新型瘤胃细菌突变体 菌; 具有乳酸脱氢酶基因(ldhA),丙酮酸甲酸裂解酶基因(pfl),磷酸转乙酰酶基因(pta)和乙酸激酶基因(ackA)的破坏的新型细菌突变体(曼氏血清型LPK7); 具有破坏乳酸脱氢酶基因(ldhA),丙酮酸甲酸裂合酶基因(pfl)和磷酸烯醇丙酮酸羧化酶基因(ppc)的新型细菌突变体(曼氏原乳杆菌LPK4)涉及将CO 2固定在生产代谢途径中 琥珀酸; 以及生产琥珀酸的方法,其特征在于在厌氧条件下培养上述突变体。 与生产各种有机酸的现有野生型菌株相比,本发明的细菌突变体具有以高浓度生产琥珀酸的同时产生很少或不含有机酸的性质。 因此,本发明的细菌突变体可用作工业生产琥珀酸的菌株。

    Shower head and method of fabricating the same
    10.
    发明申请
    Shower head and method of fabricating the same 审中-公开
    淋浴头及其制造方法

    公开(公告)号:US20060201428A1

    公开(公告)日:2006-09-14

    申请号:US11436473

    申请日:2006-05-18

    IPC分类号: C23F1/00 C23C16/00

    摘要: Provided is a shower head used in a reactor for thin film deposition, and a method of fabricating the shower head. The shower head for injecting gases onto a wafer mounted on a wafer block includes: a first supply path supplying a first reaction gas and a second supply path supplying a second reaction gas; a first main path connected to the first supply path and in the plane of the shower head, a plurality of first sub-paths diverging from the first main path in the plane of the shower head, a plurality of first diffuse holes formed regularly spaced on a bottom surface of the shower head, and a plurality of first diffuse paths connecting the plurality of first sub-paths to the plurality of first diffuse holes; a second main path connected to the second supply path in the plane of the shower head and not contacting the first main path, a plurality of second sub-paths diverging from the second main path in the plane of the shower head, a plurality of second diffuse holes formed regularly spaced on a bottom surface of the shower head, and a plurality of second diffuse paths connecting the plurality of second sub-paths and the plurality of second diffuse holes; and a sealing unit sealing open ends of the first and second main paths and open ends of the first and second sub-paths formed in the shower head.

    摘要翻译: 本发明提供一种用于薄膜沉积用反应器的淋浴喷头及其制造方法。 用于将气体喷射到安装在晶片块上的晶片上的喷头包括:供应第一反应气体的第一供应路径和供应第二反应气体的第二供应路径; 连接到第一供应路径并且在淋浴喷头的平面中的第一主路径,从喷淋头的平面中的第一主路径发散的多个第一子路径,多个第一扩散孔,其规则间隔开地形成 淋浴头的底面以及将多个第一子路径连接到多个第一扩散孔的多个第一漫射路径; 第二主路径,其连接到所述淋浴喷头的平面中的所述第二供应路径,并且不接触所述第一主路径;多个第二子路径,其从所述淋浴喷头的平面中的所述第二主路径发散;多个第二主路径, 在喷淋头的底面上规则间隔地形成的扩散孔以及连接多个第二子路径和多个第二扩散孔的多个第二漫射路径; 以及密封单元,密封形成在所述淋浴喷头中的所述第一和第二子路径的所述第一主路径和所述第二主路径的开放端部。