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公开(公告)号:US09196765B2
公开(公告)日:2015-11-24
申请号:US14716233
申请日:2015-05-19
申请人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号: H01L31/0236 , C23C14/34 , H01L31/20
CPC分类号: H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译: 描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法,包括具有金字塔纳米结构重复图案的纳米结构太阳能电池,为具有改进的PCE的低成本薄膜太阳能电池提供。
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公开(公告)号:US09070803B2
公开(公告)日:2015-06-30
申请号:US13105422
申请日:2011-05-11
申请人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号: H01L31/00 , H01L31/0352 , B82Y20/00 , H01L31/0224 , H01L31/0236 , H01L31/0376 , H01L31/0392 , H01L31/075 , H01L31/076 , H01L31/20 , H01L31/0463
CPC分类号: H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
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公开(公告)号:US08980751B2
公开(公告)日:2015-03-17
申请号:US13014508
申请日:2011-01-26
申请人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
发明人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/42
摘要: Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
摘要翻译: 可以通过暴露于受控组合物的气体气氛中的来自能量源的真空紫外(VUV)辐射来去除衬底上的聚合材料。 在这种去除之后,还描述了用于纳米压印的附加蚀刻技术。
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公开(公告)号:US20110277827A1
公开(公告)日:2011-11-17
申请号:US13105422
申请日:2011-05-11
申请人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号: H01L31/06 , H01L31/0216 , H01L31/0236 , B82Y99/00
CPC分类号: H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译: 描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法,包括具有金字塔纳米结构重复图案的纳米结构太阳能电池,为具有改进的PCE的低成本薄膜太阳能电池提供。
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公开(公告)号:US20110183521A1
公开(公告)日:2011-07-28
申请号:US13014508
申请日:2011-01-26
申请人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
发明人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
IPC分类号: H01L21/311 , H01J37/20
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/42
摘要: Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
摘要翻译: 可以通过暴露于受控组合物的气体气氛中的来自能量源的真空紫外(VUV)辐射来去除衬底上的聚合材料。 在这种去除之后,还描述了用于纳米压印的另外的蚀刻技术。
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公开(公告)号:US20150255640A1
公开(公告)日:2015-09-10
申请号:US14716233
申请日:2015-05-19
申请人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号: H01L31/0236 , H01L31/20 , C23C14/34
CPC分类号: H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译: 描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法,包括具有金字塔纳米结构重复图案的纳米结构太阳能电池,为具有改进的PCE的低成本薄膜太阳能电池提供。
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公开(公告)号:US20120214066A1
公开(公告)日:2012-08-23
申请号:US13398442
申请日:2012-02-16
申请人: Michael N. Miller , Fen Wan , Vikramjit Singh , Darren D. Donaldson , Gerard M. Schmid , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Michael N. Miller , Fen Wan , Vikramjit Singh , Darren D. Donaldson , Gerard M. Schmid , Sidlgata V. Sreenivasan , Frank Y. Xu
CPC分类号: B82Y30/00 , H01M4/134 , H01M4/1395 , H01M4/386
摘要: A silicon nanowire array including a multiplicity of silicon nanowires extending from a silicon substrate. Cross-sectional shape of the silicon nanowires and spacing between the silicon nanowires can be selected to maximize the ratio of the surface area of the silicon nanowires to the volume of the nanowire array. Methods of forming the silicon nanowire array include a nanoimprint lithography process to form a template for the silicon nanowire array and an electroless etching process to etch the template formed by the nanoimprint lithography process.
摘要翻译: 一种硅纳米线阵列,包括从硅衬底延伸的多个硅纳米线。 可以选择硅纳米线的横截面形状和硅纳米线之间的间隔,以最大化硅纳米线的表面积与纳米线阵列的体积的比率。 形成硅纳米线阵列的方法包括形成硅纳米线阵列的模板的纳米压印光刻工艺和蚀刻由纳米压印光刻工艺形成的模板的无电蚀刻工艺。
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公开(公告)号:US20110277833A1
公开(公告)日:2011-11-17
申请号:US13105695
申请日:2011-05-11
IPC分类号: H01L31/0224 , H01L31/0232
CPC分类号: H01L31/0682 , H01L31/022441 , H01L31/18 , Y02E10/547
摘要: Variations of interdigitated backside contact (IBC) solar cells having patterned areas formed using nano imprint lithography are described.
摘要翻译: 描述了具有使用纳米压印光刻形成的图案区域的叉指背面接触(IBC)太阳能电池的变化。
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公开(公告)号:US08968620B2
公开(公告)日:2015-03-03
申请号:US13095514
申请日:2011-04-27
申请人: Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人: Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
CPC分类号: B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译: 通过选择模板和/或衬底厚度(Tt和/或Tb),模板和/或衬底背压(Pt和/或Pb)的控制来控制模板和衬底之间的横向应变和横向应变比(dt / db) )和/或材料刚度的选择。
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公开(公告)号:US08877073B2
公开(公告)日:2014-11-04
申请号:US12604866
申请日:2009-10-23
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , Y10T156/10
摘要: Systems, methods, and processes for forming imprint lithography templates from a multi-layer substrate are described. The multi-layer substrate may include a block copolymer layer positioned on a substrate layer. The block copolymer layer may include two or more domains. At least one domain may have a different composition sensitivity than another domain such that the domains have different reactions to a specific process. Reaction of the domains to the specific process may provide a pattern in the block copolymer layer. The pattern may be transferred into the substrate layer to form the imprint lithography template.
摘要翻译: 描述了用于从多层基板形成压印光刻模板的系统,方法和工艺。 多层基材可以包括位于基材层上的嵌段共聚物层。 嵌段共聚物层可以包括两个或更多个结构域。 至少一个结构域可能具有与另一个结构域不同的组成敏感性,使得这些结构域对特定过程具有不同的反应。 结构域与特定方法的反应可以提供嵌段共聚物层中的图案。 该图案可以被转移到基底层中以形成压印光刻模板。
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