Imprint lithography template
    10.
    发明授权
    Imprint lithography template 有权
    印刷光刻模板

    公开(公告)号:US08877073B2

    公开(公告)日:2014-11-04

    申请号:US12604866

    申请日:2009-10-23

    摘要: Systems, methods, and processes for forming imprint lithography templates from a multi-layer substrate are described. The multi-layer substrate may include a block copolymer layer positioned on a substrate layer. The block copolymer layer may include two or more domains. At least one domain may have a different composition sensitivity than another domain such that the domains have different reactions to a specific process. Reaction of the domains to the specific process may provide a pattern in the block copolymer layer. The pattern may be transferred into the substrate layer to form the imprint lithography template.

    摘要翻译: 描述了用于从多层基板形成压印光刻模板的系统,方法和工艺。 多层基材可以包括位于基材层上的嵌段共聚物层。 嵌段共聚物层可以包括两个或更多个结构域。 至少一个结构域可能具有与另一个结构域不同的组成敏感性,使得这些结构域对特定过程具有不同的反应。 结构域与特定方法的反应可以提供嵌段共聚物层中的图案。 该图案可以被转移到基底层中以形成压印光刻模板。