Substrate and method for producing a substrate
    1.
    发明申请
    Substrate and method for producing a substrate 有权
    基板及其制造方法

    公开(公告)号:US20050110088A1

    公开(公告)日:2005-05-26

    申请号:US10968846

    申请日:2004-10-18

    CPC分类号: H01L21/76254

    摘要: Substrate having a first partial substrate with a carrier layer and a second partial substrate, which is bonded to the first partial substrate. The second partial substrate has an insulator layer, which is applied on the carrier layer and has at least two regions each having a different thickness, thereby forming a stepped surface of the insulator layer, and a semiconductor layer, which is applied to the stepped surface of the insulator layer and is formed at least partially epitaxially, wherein the semiconductor layer has a planar surface which is opposite to the stepped surface of the insulator layer. Transistors are formed on the semiconductor layer.

    摘要翻译: 衬底,具有第一部分衬底和载体层,第二部分衬底与第一部分衬底结合。 第二部分基板具有绝缘体层,其被施加在载体层上并且具有至少两个各自具有不同厚度的区域,从而形成绝缘体层的台阶表面,以及施加到台阶表面的半导体层 并且至少部分地外延形成,其中半导体层具有与绝缘体层的台阶表面相对的平面。 在半导体层上形成晶体管。

    Method for producing a substrate
    2.
    发明授权
    Method for producing a substrate 有权
    制造基板的方法

    公开(公告)号:US07611928B2

    公开(公告)日:2009-11-03

    申请号:US10968846

    申请日:2004-10-18

    IPC分类号: H01L21/00

    CPC分类号: H01L21/76254

    摘要: Substrate having a first partial substrate with a carrier layer and a second partial substrate, which is bonded to the first partial substrate. The second partial substrate has an insulator layer, which is applied on the carrier layer and has at least two regions each having a different thickness, thereby forming a stepped surface of the insulator layer, and a semiconductor layer, which is applied to the stepped surface of the insulator layer and is formed at least partially epitaxially, wherein the semiconductor layer has a planar surface which is opposite to the stepped surface of the insulator layer. Transistors are formed on the semiconductor layer.

    摘要翻译: 衬底,具有第一部分衬底和载体层,第二部分衬底与第一部分衬底结合。 第二部分基板具有绝缘体层,其被施加在载体层上并且具有至少两个各自具有不同厚度的区域,从而形成绝缘体层的台阶表面,以及施加到台阶表面的半导体层 并且至少部分地外延形成,其中半导体层具有与绝缘体层的台阶表面相对的平面。 在半导体层上形成晶体管。

    Integrated circuit array
    3.
    发明申请
    Integrated circuit array 审中-公开
    集成电路阵列

    公开(公告)号:US20050224888A1

    公开(公告)日:2005-10-13

    申请号:US11116139

    申请日:2005-04-27

    摘要: Integrated circuit array having field effect transistors (FETs) formed next to and/or above one another. The array has a substrate, a planarized first wiring plane with interconnects and first source/drain regions of the FETs, a planarized first insulator layer on the first wiring plane, a planarized gate region layer, which has patterned gate regions made of electrically conductive material and insulator material introduced therebetween, on the first insulated layer, a planarized second insulator layer on the gate region layer, holes formed through the second insulator layer, the gate regions, and the first insulator layer, a vertical nanoelement serving as a channel region in each of the holes, a second wiring plane with interconnects and second source/drain regions of the FETs, each nanoelement being arranged between the first and second wiring planes, and a gate insulating layer between the respective vertical nanoelement and the electrically conductive material of the gate regions.

    摘要翻译: 集成电路阵列具有形成在彼此之上和/或彼此之上的场效应晶体管(FET)。 阵列具有衬底,具有互连的平坦化的第一布线面和FET的第一源极/漏极区,在第一布线平面上的平坦化的第一绝缘体层,平坦化的栅极区域层,其具有由导电材料制成的图案化栅极区域 和介于其间的绝缘体材料,在所述第一绝缘层上,在所述栅极区域层上的平坦化的第二绝缘体层,穿过所述第二绝缘体层,所述栅极区域和所述第一绝缘体层形成的空穴,用作所述沟道区域中的沟道区域的垂直纳米元件 每个孔,具有互连的第二布线面和FET的第二源极/漏极区,每个纳米元件布置在第一和第二布线平面之间,并且在相应的垂直纳米元件和导电材料之间的栅极绝缘层 门区域。

    Semiconductor memory component
    5.
    发明申请
    Semiconductor memory component 失效
    半导体存储器组件

    公开(公告)号:US20060267082A1

    公开(公告)日:2006-11-30

    申请号:US11438883

    申请日:2006-05-23

    IPC分类号: H01L29/76

    摘要: A semiconductor memory component comprises at least one memory cell. The memory cell comprises a semiconductor body comprised of a body region, a drain region and a source region, a gate dielectric, and a gate electrode. The body region comprises a first conductivity type and a depression between the source and drain regions, and the source and drain regions comprise a second conductivity type. The gate electrode is arranged at least partly in the depression and is insulated from the body, source, and drain regions by the gate dielectric. The body region further comprises a first continuous region with a first dopant concentration and a second continuous region with a second dopant concentration greater than the first dopant concentration. The first continuous region adjoins the drain region, the depression and the source region, and the second region is arranged below the first region and adjoins the first region.

    摘要翻译: 半导体存储器组件包括至少一个存储单元。 存储单元包括由体区,漏区和源区组成的半导体本体,栅电介质和栅电极。 主体区域包括第一导电类型和源极和漏极区域之间的凹陷,并且源极和漏极区域包括第二导电类型。 栅电极至少部分地布置在凹陷中,并且通过栅极电介质与主体,源极和漏极区绝缘。 体区还包括具有第一掺杂剂浓度的第一连续区域和具有大于第一掺杂剂浓度的第二掺杂剂浓度的第二连续区域。 第一连续区域邻接漏极区域,凹陷部分和源极区域,并且第二区域布置在第一区域下方并与第一区域相邻。

    Vertical impedance sensor arrangement and method for producing a vertical impedance sensor arrangement
    8.
    发明申请
    Vertical impedance sensor arrangement and method for producing a vertical impedance sensor arrangement 审中-公开
    垂直阻抗传感器布置和垂直阻抗传感器布置方法

    公开(公告)号:US20050100938A1

    公开(公告)日:2005-05-12

    申请号:US10939319

    申请日:2004-09-09

    IPC分类号: C12Q1/68 G01N33/543

    CPC分类号: G01N33/54386 G01N27/3276

    摘要: Vertical impedance sensor arrangement including a substrate, a first electrically conductive structure having a first uncovered surface and being arranged in and/or on the substrate, a spacer arranged above the substrate and/or at least partially on the first electrically conductive structure, a second electrically conductive structure having a second uncovered surface and being arranged on the spacer, and capture molecules, which are immobilized on the first and on the second uncovered surface, are set up such that particles to be detected hybridize with the capture molecules. The spacer is formed separately from the substrate, and the thickness of the spacer is defined by means of a deposition method.

    摘要翻译: 垂直阻抗传感器布置包括基底,具有第一未覆盖表面并布置在基底中和/或基底上的第一导电结构,布置在基底上和/或至少部分地在第一导电结构上的间隔物,第二 具有第二未覆盖表面并布置在间隔物上的导电结构,并且被固定在第一和第二未覆盖表面上的捕获分子被设置成使得待检测的颗粒与捕获分子杂交。 间隔物与衬底分开形成,并且通过沉积方法限定间隔物的厚度。

    Semiconductor memory component with body region of memory cell having a depression and a graded dopant concentration
    10.
    发明授权
    Semiconductor memory component with body region of memory cell having a depression and a graded dopant concentration 失效
    具有存储单元体区域的半导体存储器组件具有凹陷和渐变的掺杂剂浓度

    公开(公告)号:US07598543B2

    公开(公告)日:2009-10-06

    申请号:US11438883

    申请日:2006-05-23

    IPC分类号: H01L27/108

    摘要: A semiconductor memory component comprises at least one memory cell. The memory cell comprises a semiconductor body comprised of a body region, a drain region and a source region, a gate dielectric, and a gate electrode. The body region comprises a first conductivity type and a depression between the source and drain regions, and the source and drain regions comprise a second conductivity type. The gate electrode is arranged at least partly in the depression and is insulated from the body, source, and drain regions by the gate dielectric. The body region further comprises a first continuous region with a first dopant concentration and a second continuous region with a second dopant concentration greater than the first dopant concentration. The first continuous region adjoins the drain region, the depression and the source region, and the second region is arranged below the first region and adjoins the first region.

    摘要翻译: 半导体存储器组件包括至少一个存储单元。 存储单元包括由体区,漏区和源区组成的半导体本体,栅电介质和栅电极。 主体区域包括第一导电类型和源极和漏极区域之间的凹陷,并且源极和漏极区域包括第二导电类型。 栅电极至少部分地布置在凹陷中,并且通过栅极电介质与主体,源极和漏极区绝缘。 体区还包括具有第一掺杂剂浓度的第一连续区域和具有大于第一掺杂剂浓度的第二掺杂剂浓度的第二连续区域。 第一连续区域邻接漏极区域,凹陷部分和源极区域,并且第二区域布置在第一区域下方并与第一区域相邻。