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    Integrated circuit array
    1.
    发明申请
    Integrated circuit array 审中-公开
    集成电路阵列

    公开(公告)号：US20050224888A1

    公开(公告)日：2005-10-13

    申请号：US11116139

    申请日：2005-04-27

    申请人： Andrew Graham ,  Franz Hofmann ,  Wolfgang Honlein ,  Johannes Kretz ,  Franz Kreupl ,  Erhard Landgraf ,  Richard Luyken ,  Wolfgang Roesner ,  Thomas Schulz ,  Michael Specht

    发明人： Andrew Graham ,  Franz Hofmann ,  Wolfgang Honlein ,  Johannes Kretz ,  Franz Kreupl ,  Erhard Landgraf ,  Richard Luyken ,  Wolfgang Roesner ,  Thomas Schulz ,  Michael Specht

    IPC分类号： G11C13/02 ,  H01L29/78 ,  H01L51/00 ,  H01L51/30 ,  H01L29/76

    CPC分类号： G11C13/025 ,  B82Y10/00 ,  G11C2213/17 ,  H01L27/283 ,  H01L51/0048 ,  H01L51/0052 ,  H01L51/0512

    摘要： Integrated circuit array having field effect transistors (FETs) formed next to and/or above one another. The array has a substrate, a planarized first wiring plane with interconnects and first source/drain regions of the FETs, a planarized first insulator layer on the first wiring plane, a planarized gate region layer, which has patterned gate regions made of electrically conductive material and insulator material introduced therebetween, on the first insulated layer, a planarized second insulator layer on the gate region layer, holes formed through the second insulator layer, the gate regions, and the first insulator layer, a vertical nanoelement serving as a channel region in each of the holes, a second wiring plane with interconnects and second source/drain regions of the FETs, each nanoelement being arranged between the first and second wiring planes, and a gate insulating layer between the respective vertical nanoelement and the electrically conductive material of the gate regions.

    摘要翻译： 集成电路阵列具有形成在彼此之上和/或彼此之上的场效应晶体管（FET）。 阵列具有衬底，具有互连的平坦化的第一布线面和FET的第一源极/漏极区，在第一布线平面上的平坦化的第一绝缘体层，平坦化的栅极区域层，其具有由导电材料制成的图案化栅极区域 和介于其间的绝缘体材料，在所述第一绝缘层上，在所述栅极区域层上的平坦化的第二绝缘体层，穿过所述第二绝缘体层，所述栅极区域和所述第一绝缘体层形成的空穴，用作所述沟道区域中的沟道区域的垂直纳米元件 每个孔，具有互连的第二布线面和FET的第二源极/漏极区，每个纳米元件布置在第一和第二布线平面之间，并且在相应的垂直纳米元件和导电材料之间的栅极绝缘层 门区域。

    Substrate and method for producing a substrate
    3.
    发明申请
    Substrate and method for producing a substrate 有权
    基板及其制造方法

    公开(公告)号：US20050110088A1

    公开(公告)日：2005-05-26

    申请号：US10968846

    申请日：2004-10-18

    申请人： Franz Hofmann ,  Richard Luyken ,  Wolfgang Roesner ,  Michael Specht ,  Martin Stadele

    发明人： Franz Hofmann ,  Richard Luyken ,  Wolfgang Roesner ,  Michael Specht ,  Martin Stadele

    IPC分类号： H01L21/20 ,  H01L21/762 ,  H01L27/01

    CPC分类号： H01L21/76254

    摘要： Substrate having a first partial substrate with a carrier layer and a second partial substrate, which is bonded to the first partial substrate. The second partial substrate has an insulator layer, which is applied on the carrier layer and has at least two regions each having a different thickness, thereby forming a stepped surface of the insulator layer, and a semiconductor layer, which is applied to the stepped surface of the insulator layer and is formed at least partially epitaxially, wherein the semiconductor layer has a planar surface which is opposite to the stepped surface of the insulator layer. Transistors are formed on the semiconductor layer.

    摘要翻译： 衬底，具有第一部分衬底和载体层，第二部分衬底与第一部分衬底结合。 第二部分基板具有绝缘体层，其被施加在载体层上并且具有至少两个各自具有不同厚度的区域，从而形成绝缘体层的台阶表面，以及施加到台阶表面的半导体层 并且至少部分地外延形成，其中半导体层具有与绝缘体层的台阶表面相对的平面。 在半导体层上形成晶体管。

    Semiconductor memory component
    4.
    发明申请
    Semiconductor memory component 失效
    半导体存储器组件

    公开(公告)号：US20060267082A1

    公开(公告)日：2006-11-30

    申请号：US11438883

    申请日：2006-05-23

    申请人： Franz Hofmann ,  Richard Luyken ,  Wolfgang Roesner ,  Michael Specht ,  Martin Staedele

    发明人： Franz Hofmann ,  Richard Luyken ,  Wolfgang Roesner ,  Michael Specht ,  Martin Staedele

    IPC分类号： H01L29/76

    CPC分类号： H01L27/108 ,  H01L27/10802 ,  H01L27/1203

    摘要： A semiconductor memory component comprises at least one memory cell. The memory cell comprises a semiconductor body comprised of a body region, a drain region and a source region, a gate dielectric, and a gate electrode. The body region comprises a first conductivity type and a depression between the source and drain regions, and the source and drain regions comprise a second conductivity type. The gate electrode is arranged at least partly in the depression and is insulated from the body, source, and drain regions by the gate dielectric. The body region further comprises a first continuous region with a first dopant concentration and a second continuous region with a second dopant concentration greater than the first dopant concentration. The first continuous region adjoins the drain region, the depression and the source region, and the second region is arranged below the first region and adjoins the first region.

    摘要翻译： 半导体存储器组件包括至少一个存储单元。 存储单元包括由体区，漏区和源区组成的半导体本体，栅电介质和栅电极。 主体区域包括第一导电类型和源极和漏极区域之间的凹陷，并且源极和漏极区域包括第二导电类型。 栅电极至少部分地布置在凹陷中，并且通过栅极电介质与主体，源极和漏极区绝缘。 体区还包括具有第一掺杂剂浓度的第一连续区域和具有大于第一掺杂剂浓度的第二掺杂剂浓度的第二连续区域。 第一连续区域邻接漏极区域，凹陷部分和源极区域，并且第二区域布置在第一区域下方并与第一区域相邻。

    Method for producing a substrate
    8.
    发明授权
    Method for producing a substrate 有权
    制造基板的方法

    公开(公告)号：US07611928B2

    公开(公告)日：2009-11-03

    申请号：US10968846

    申请日：2004-10-18

    申请人： Franz Hofmann ,  Richard Johannes Luyken ,  Wolfgang Roesner ,  Michael Specht ,  Martin Stadele

    发明人： Franz Hofmann ,  Richard Johannes Luyken ,  Wolfgang Roesner ,  Michael Specht ,  Martin Stadele

    IPC分类号： H01L21/00

    CPC分类号： H01L21/76254

    摘要： Substrate having a first partial substrate with a carrier layer and a second partial substrate, which is bonded to the first partial substrate. The second partial substrate has an insulator layer, which is applied on the carrier layer and has at least two regions each having a different thickness, thereby forming a stepped surface of the insulator layer, and a semiconductor layer, which is applied to the stepped surface of the insulator layer and is formed at least partially epitaxially, wherein the semiconductor layer has a planar surface which is opposite to the stepped surface of the insulator layer. Transistors are formed on the semiconductor layer.

    摘要翻译： 衬底，具有第一部分衬底和载体层，第二部分衬底与第一部分衬底结合。 第二部分基板具有绝缘体层，其被施加在载体层上并且具有至少两个各自具有不同厚度的区域，从而形成绝缘体层的台阶表面，以及施加到台阶表面的半导体层 并且至少部分地外延形成，其中半导体层具有与绝缘体层的台阶表面相对的平面。 在半导体层上形成晶体管。

    Semiconductor memory component with body region of memory cell having a depression and a graded dopant concentration
    9.
    发明授权
    Semiconductor memory component with body region of memory cell having a depression and a graded dopant concentration 失效
    具有存储单元体区域的半导体存储器组件具有凹陷和渐变的掺杂剂浓度

    公开(公告)号：US07598543B2

    公开(公告)日：2009-10-06

    申请号：US11438883

    申请日：2006-05-23

    申请人： Franz Hofmann ,  Richard Johannes Luyken ,  Wolfgang Roesner ,  Michael Specht ,  Martin Staedele

    发明人： Franz Hofmann ,  Richard Johannes Luyken ,  Wolfgang Roesner ,  Michael Specht ,  Martin Staedele

    IPC分类号： H01L27/108

    CPC分类号： H01L27/108 ,  H01L27/10802 ,  H01L27/1203

    摘要： A semiconductor memory component comprises at least one memory cell. The memory cell comprises a semiconductor body comprised of a body region, a drain region and a source region, a gate dielectric, and a gate electrode. The body region comprises a first conductivity type and a depression between the source and drain regions, and the source and drain regions comprise a second conductivity type. The gate electrode is arranged at least partly in the depression and is insulated from the body, source, and drain regions by the gate dielectric. The body region further comprises a first continuous region with a first dopant concentration and a second continuous region with a second dopant concentration greater than the first dopant concentration. The first continuous region adjoins the drain region, the depression and the source region, and the second region is arranged below the first region and adjoins the first region.

    摘要翻译： 半导体存储器组件包括至少一个存储单元。 存储单元包括由体区，漏区和源区组成的半导体本体，栅电介质和栅电极。 主体区域包括第一导电类型和源极和漏极区域之间的凹陷，并且源极和漏极区域包括第二导电类型。 栅电极至少部分地布置在凹陷中，并且通过栅极电介质与主体，源极和漏极区绝缘。 体区还包括具有第一掺杂剂浓度的第一连续区域和具有大于第一掺杂剂浓度的第二掺杂剂浓度的第二连续区域。 第一连续区域邻接漏极区域，凹陷部分和源极区域，并且第二区域布置在第一区域下方并与第一区域相邻。

    High-density NROM-FINFET
    10.
    发明授权
    High-density NROM-FINFET 失效
    高密度NROM-FINFET

    公开(公告)号：US07208794B2

    公开(公告)日：2007-04-24

    申请号：US11073017

    申请日：2005-03-04

    申请人： Franz Hofmann ,  Erhard Landgraf ,  Richard Johannes Luyken ,  Wolfgang Roesner ,  Michael Specht

    发明人： Franz Hofmann ,  Erhard Landgraf ,  Richard Johannes Luyken ,  Wolfgang Roesner ,  Michael Specht

    IPC分类号： H01L29/76 ,  H01L29/788 ,  H01L29/792 ,  H01L29/94 ,  H01L31/119

    CPC分类号： H01L21/28273 ,  G11C16/0466 ,  H01L21/28282 ,  H01L21/845 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11568 ,  H01L27/1203 ,  H01L29/66795 ,  H01L29/66825 ,  H01L29/66833 ,  H01L29/785 ,  H01L29/7881 ,  H01L29/792 ,  Y10S257/903 ,  Y10S257/904 ,  Y10S257/905

    摘要： Semiconductor memory having memory cells, each including first and second conductively-doped contact regions and a channel region arranged between the latter, formed in a web-like rib made of semiconductor material and arranged one behind the other in this sequence in the longitudinal direction of the rib. The rib has an essentially rectangular shape with an upper side of the rib and rib side faces lying opposite. A memory layer is configured for programming the memory cell, arranged on the upper side of the rib spaced apart by a first insulator layer, and projects in the normal direction of the one rib side face over one of the rib side faces so that the one rib side face and the upper side of the rib form an edge for injecting charge carriers from the channel region into the memory layer. A gate electrode is spaced apart from the one rib side face by a second insulator layer and from the memory layer by a third insulator layer, electrically insulated from the channel region, and configured to control its electrical conductivity.

    摘要翻译： 具有存储单元的半导体存储器，每个存储单元包括第一和第二导电掺杂的接触区域和布置在其间的沟道区域，所述沟道区域形成在由半导体材料制成的网状肋状物中， 肋骨 肋具有基本上矩形的形状，肋的上侧和肋侧面相对。 存储层被配置为对存储单元进行编程，布置在由第一绝缘体层间隔开的肋的上侧，并且沿着一个肋侧面的一个肋侧面的法线方向突出，使得一个 肋侧面和肋的上侧形成用于将电荷载流子从沟道区域注入到存储层中的边缘。 栅电极通过第二绝缘体层与一个肋侧面间隔开，并且通过与沟道区电绝缘并且被配置为控制其导电性的第三绝缘体层与存储层隔开。