METHOD OF DICING
    5.
    发明申请
    METHOD OF DICING 审中-公开
    方法

    公开(公告)号:US20080160724A1

    公开(公告)日:2008-07-03

    申请号:US11945896

    申请日:2007-11-27

    IPC分类号: H01L21/304

    摘要: Provided is a method of dicing a wafer where a plurality of semiconductor device regions is formed on a front side of the wafer, the semiconductor device regions being separated by scribe lanes, the method comprising dicing the wafer by irradiating a laser beam on a backside of the wafer along the scribe lanes. A laser beam is irradiated from an opposite side of the semiconductor device regions of the wafer so that thermal influence on the semiconductor device regions is minimized to improve the strength of a semiconductor chip. Furthermore, a third tape is used to maintain an arrangement of the semiconductor chips so as to minimize adherence problems caused by the laser beam.

    摘要翻译: 本发明提供一种切割晶片的方法,其中在晶片的正面形成有多个半导体器件区域,半导体器件区域被划线分隔开,该方法包括通过在背面侧照射激光束来对晶片进行切割 沿着划线的晶圆。 从晶片的半导体器件区域的相对侧照射激光束,使得对半导体器件区域的热影响最小化,以提高半导体芯片的强度。 此外,使用第三带来保持半导体芯片的布置,以便最小化由激光束引起的粘附问题。