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162 条记录 (耗时 0.022 秒)

    Magnetron plasma processing apparatus
    1.
    发明授权
    Magnetron plasma processing apparatus 有权
    磁控管等离子体处理装置

    公开(公告)号：US07686918B2

    公开(公告)日：2010-03-30

    申请号：US11016997

    申请日：2004-12-21

    申请人： Hidenori Sato ,  Daisuke Hayashi

    发明人： Hidenori Sato ,  Daisuke Hayashi

    IPC分类号： C23F1/00 ,  H01L21/306

    CPC分类号： H01J37/3266 ,  H01J37/32623 ,  H01J37/32633 ,  H01J37/3405

    摘要： A magnetron plasma processing apparatus has a baffle plate interposed between a processing space and a gas exhaust port so as to confine a plasma in the processing space in a processing chamber. The baffle plate has through holes allowing the processing space and the gas exhaust port to communicate with each other. The baffle plate is provided along lines of magnetic force of a magnetic field at a position where the plate is located.

    摘要翻译： 磁控管等离子体处理装置具有插入处理空间和排气口之间的挡板，以将等离子体限制在处理室中的处理空间中。 挡板具有允许处理空间和排气口彼此连通的通孔。 挡板沿着板所在的位置处的磁场的磁力线设置。

    Magnetron plasma processing apparatus
    2.
    发明申请
    Magnetron plasma processing apparatus 有权
    磁控管等离子体处理装置

    公开(公告)号：US20050103440A1

    公开(公告)日：2005-05-19

    申请号：US11016997

    申请日：2004-12-21

    申请人： Hidenori Sato ,  Daisuke Hayashi

    发明人： Hidenori Sato ,  Daisuke Hayashi

    IPC分类号： H01J37/32 ,  H01L21/306

    CPC分类号： H01J37/3266 ,  H01J37/32623 ,  H01J37/32633 ,  H01J37/3405

    摘要： A magnetron plasma processing apparatus has a baffle plate interposed between a processing space and a gas exhaust port so as to confine a plasma in the processing space in a processing chamber. The baffle plate has through holes allowing the processing space and the gas exhaust port to communicate with each other. The baffle plate is provided along lines of magnetic force of a magnetic field at a position where the plate is located.

    摘要翻译： 磁控管等离子体处理装置具有插入处理空间和排气口之间的挡板，以将等离子体限制在处理室中的处理空间中。 挡板具有允许处理空间和排气口彼此连通的通孔。 挡板沿着板所在的位置处的磁场的磁力线设置。

    Magnetron plasma processing apparatus
    3.
    发明授权
    Magnetron plasma processing apparatus 有权
    磁控管等离子体处理装置

    公开(公告)号：US08034212B2

    公开(公告)日：2011-10-11

    申请号：US12705486

    申请日：2010-02-12

    申请人： Hidenori Sato ,  Daisuke Hayashi

    发明人： Hidenori Sato ,  Daisuke Hayashi

    IPC分类号： H01L21/306 ,  C23F1/00

    CPC分类号： H01J37/3266 ,  H01J37/32623 ,  H01J37/32633 ,  H01J37/3405

    摘要： A magnetron plasma processing apparatus has a baffle plate interposed between a processing space and a gas exhaust port so as to confine a plasma in the processing space in a processing chamber. The baffle plate has through holes allowing the processing space and the gas exhaust port to communicate with each other. The baffle plate is provided along lines of magnetic force of a magnetic field at a position where the plate is located.

    摘要翻译： 磁控管等离子体处理装置具有插入处理空间和排气口之间的挡板，以将等离子体限制在处理室中的处理空间中。 挡板具有允许处理空间和排气口彼此连通的通孔。 挡板沿着板所在的位置处的磁场的磁力线设置。

    Gas flow path structure and substrate processing apparatus
    7.
    发明授权
    Gas flow path structure and substrate processing apparatus 有权
    气体流路结构和基板处理装置

    公开(公告)号：US08623172B2

    公开(公告)日：2014-01-07

    申请号：US12749642

    申请日：2010-03-30

    申请人： Daisuke Hayashi

    发明人： Daisuke Hayashi

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  C23C16/455 ,  C23C16/50 ,  C23C16/503

    CPC分类号： H01J37/32568

    摘要： A substrate processing apparatus includes: a depressurizable processing chamber 11; a shaft 26 supporting a facing electrode 24 provided within the processing chamber 11 while allowing the facing electrode 24 to be movable with respect to a mounting electrode 12; a first ring-shaped bellows 31 concentrically installed at an outer peripheral portion of the shaft 26; and a second bellows 32 concentrically installed at an outer peripheral portion of the first bellows 31. The first bellows 31 absorbs a displacement of the facing electrode 24 with respect to a wall surface 13 at a penetration portion where the shaft 26 penetrates the wall surface 13 of the processing chamber 11, and seals the inside of the processing chamber 11 against the ambient atmosphere around the shaft 26. A ring-shaped gas flow path 35 is formed by the first bellows 31 and the second bellows 32.

    摘要翻译： 基板处理装置包括：可减压处理室11; 轴26，其支撑设置在处理室11内的面对电极24，同时允许面对电极24能够相对于安装电极12移动; 同心地安装在轴26的外周部分的第一环形波纹管31; 以及同心地安装在第一波纹管31的外周部分的第二波纹管32.第一波纹管31在轴26穿透壁表面13的穿透部分吸收面对电极24相对于壁表面13的位移 并且密封处理室11的内部抵靠围绕轴26的环境大气。环形气体流路35由第一波纹管31和第二波纹管32形成。

    Material gas concentration control system
    8.
    发明授权
    Material gas concentration control system 有权
    物质气体浓度控制系统

    公开(公告)号：US08459290B2

    公开(公告)日：2013-06-11

    申请号：US12610019

    申请日：2009-10-30

    申请人： Masakazu Minami ,  Daisuke Hayashi ,  Yuhei Sakaguchi ,  Katsumi Nishimura ,  Masaki Inoue ,  Kotaro Takijiri

    发明人： Masakazu Minami ,  Daisuke Hayashi ,  Yuhei Sakaguchi ,  Katsumi Nishimura ,  Masaki Inoue ,  Kotaro Takijiri

    IPC分类号： B05C11/00

    CPC分类号： G05D11/132 ,  Y10T137/0396 ,  Y10T137/2499 ,  Y10T137/2509 ,  Y10T137/2708

    摘要： A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.

    摘要翻译： 一种材料气体浓度控制系统，用于保持包含罐的混合气体中的材料气体的浓度恒定以容纳材料，输入用于将所容纳的材料蒸发到罐中的载气的输入管线和输出的出口管线 所述混合气体由在所述罐中的所述原料气体和所述载气组成，还包括配置在所述入口管路中的第一阀，测量所述混合气体中的原料气体的浓度的浓度测定部， 控制第一阀的开度的部分，使得由浓度测量部测量的材料气体的测量浓度变为预先确定的设定浓度。

    Projector that operates in a brightness priority mode and in a contrast priority mode
    9.
    发明授权
    Projector that operates in a brightness priority mode and in a contrast priority mode 有权
    在亮度优先模式和对比度优先模式下运行的投影机

    公开(公告)号：US08398248B2

    公开(公告)日：2013-03-19

    申请号：US12699449

    申请日：2010-02-03

    申请人： Masakazu Kawamura ,  Daisuke Hayashi

    发明人： Masakazu Kawamura ,  Daisuke Hayashi

    IPC分类号： G03B21/14

    CPC分类号： G03B21/2053

    摘要： A projector includes: an illuminating device including a light source device, a first lens array that comprises first regions located at four corners in the first lens array when viewed along a system optical axis and second regions located between the two first regions, and a second lens array; a light modulating device; a projection optical system; a light control device; and a mode selection device. The light control device blocks part of the plural partial light beams by causing first and second light shields to integrally operate, when the brightness priority mode is selected. The light control device always blocks part of the partial light beams with the first light shields and blocks part of the partial light beams by causing the second light shields to operate independently from the first light shields.

    摘要翻译： 投影仪包括：照明装置，包括光源装置，第一透镜阵列，其包括当沿着系统光轴观察时位于第一透镜阵列中的四个角处的第一区域和位于两个第一区域之间的第二区域;以及第二透镜阵列 镜头阵列 光调制装置; 投影光学系统; 光控装置; 和模式选择装置。 当选择亮度优先模式时，光控制装置通过使第一和第二光屏蔽一体地操作来阻挡多个部分光束的一部分。 光控制装置总是通过使第二光屏独立于第一遮光罩来操作，通过第一遮光罩来阻挡部分光束并阻挡部分光束的一部分。

    Cooling block forming electrode
    10.
    发明授权
    Cooling block forming electrode 有权
    冷却块形成电极

    公开(公告)号：US08319141B2

    公开(公告)日：2012-11-27

    申请号：US12876597

    申请日：2010-09-07

    申请人： Toshifumi Ishida ,  Daisuke Hayashi

    发明人： Toshifumi Ishida ,  Daisuke Hayashi

    IPC分类号： B23K9/00 ,  F02M3/10 ,  F28F7/00

    CPC分类号： H05H1/46 ,  H01J37/32009 ,  H01J37/32724

    摘要： The present invention is a cooling block that forms an electrode for generating a plasma for use in a plasma process, and includes a channel for a cooling liquid, the cooling block comprising: a first base material and a second base material respectively made of aluminum, at least one of the first and second base materials having a recess for forming a channel for a cooling liquid; and a diffusion bonding layer, in which zinc is diffused in aluminum, and an anti-corrosion layer of a zinc oxide film, the layers being formed by interposing zinc between the first and second base materials, and by bonding the first and second base materials with zinc interposed therebetween in a heating atmosphere containing oxygen.

    摘要翻译： 本发明是一种冷却块，其形成用于产生用于等离子体处理的等离子体的电极，并且包括用于冷却液体的通道，所述冷却块包括：分别由铝制成的第一基材和第二基材， 所述第一和第二基底材料中的至少一个具有用于形成用于冷却液体的通道的凹部; 以及锌在铝中扩散的扩散接合层和氧化锌膜的防腐蚀层，所述层通过在第一和第二基底材料之间插入锌而形成，并且通过将第一和第二基底材料 在含有氧的加热气氛中夹有锌。