Semiconductor memory device and manufacturing method thereof
    10.
    发明申请
    Semiconductor memory device and manufacturing method thereof 有权
    半导体存储器件及其制造方法

    公开(公告)号:US20060060912A1

    公开(公告)日:2006-03-23

    申请号:US11247328

    申请日:2005-10-12

    IPC分类号: H01L29/788

    摘要: A polysilicon film and the like are patterned to form n-diffusion layers on a silicon substrate. Subsequently, an outer edge of an Al2O3 film is made retreat to be smaller than that of a gate electrode by performing isotropic etching of the Al2O3 film, using a solution of sulfuric acid with hydrogen peroxide. A silicon oxide film, a silicon nitride film, the polysilicon film and the like are hardly removed although the solution of sulfuric acid with hydrogen peroxide exhibits higher etching rate to the Al2O3 film, enabling almost exclusive etching of the Al2O3 film at a high selectivity ratio. Subsequently, another polysilicon film is formed so as to fill spaces formed after the retreat of the Al2O3 film under the silicon oxide film. Subsequently, a sidewall insulating film is formed by remaining portions of the later polysilicon film in the spaces by performing RIE, oxidation, or the like of the later polysilicon film.

    摘要翻译: 图案化多晶硅膜等,以在硅衬底上形成n扩散层。 随后,通过对Al 2 O 3膜进行各向同性蚀刻,使Al 2 O 3膜的外边缘退回到小于栅电极的外边缘, 使用硫酸与过氧化氢的溶液进行反应。 尽管硫酸与过氧化氢的溶液表现出较高的蚀刻速率,但是Al 2 O 3 O 3不能除去氧化硅膜,氮化硅膜,多晶硅膜等, SUB>膜,使得能够以高选择比几乎独特地蚀刻Al 2 O 3膜。 随后,形成另外的多晶硅膜,以填充氧化硅膜下的Al 2 O 3 N 3膜后退形成的空间。 随后,通过进行稍后多晶硅膜的RIE,氧化等,在剩余的多晶硅膜的剩余部分中形成侧壁绝缘膜。