公开(公告)号：US5591262A

公开(公告)日：1997-01-07

申请号：US410315

申请日：1995-03-24

申请人： Hiroyoshi Sago ,  Hideya Kobari ,  Koji Ueda ,  Hidenori Miyamoto ,  Ryuzo Takatsuki

发明人： Hiroyoshi Sago ,  Hideya Kobari ,  Koji Ueda ,  Hidenori Miyamoto ,  Ryuzo Takatsuki

IPC分类号： G03F7/16 ,  B05C11/08 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  H01L21/683 ,  B05C7/00

CPC分类号： H01L21/67051 ,  Y10S134/902

摘要： The invention disclosed defined a vertically extending passage through the rotary center of an inner cup or the rotary center of a spinner in a notary chemical treater, disposes a stationary cleaning fluid nozzle in the passage, and injects the cleaning fluid from the nozzle to clean a lid of the rotary chemical treater and the underside of an object treatment within the treater. The underside of the lid and the underside of the objective part are efficiently cleaned, and the need for sealing the movable parts against the cleaning fluid is eliminated because the nozzle is stationary, ensuring the prevention of the cleaning fluid from leaking.

摘要翻译： 本发明公开了一种通过内杯的旋转中心或旋转器在公证化学处理器中的旋转中心的垂直延伸的通道，将固定的清洁流体喷嘴置于通道中，并将喷嘴从喷嘴喷射到清洁 旋转化学处理器的盖子和处理器内的物体处理的下侧。 盖子的下侧和目标部分的下侧被有效地清洁，并且由于喷嘴是静止的，消除了将可动部件密封在清洁流体上的需要，从而确保防止清洗液体泄漏。

公开(公告)号：US5972426A

公开(公告)日：1999-10-26

申请号：US005495

申请日：1998-01-12

申请人： Junji Kutsuzawa ,  Hiroyoshi Sago ,  Futoshi Shimai ,  Hidenori Miyamoto

发明人： Junji Kutsuzawa ,  Hiroyoshi Sago ,  Futoshi Shimai ,  Hidenori Miyamoto

IPC分类号： G03F7/16 ,  B05B1/14 ,  B05B13/04 ,  B05C5/02 ,  B05C11/08 ,  G02B5/20 ,  H01L21/027 ,  B05D3/12

CPC分类号： B05C5/0254 ,  B05C11/08 ,  B05C5/0208 ,  B05B13/04 ,  B05C5/027

摘要： A coating nozzle includes an elongate nozzle body having a coating solution reservoir defined longitudinally therein for being supplied with a coating solution from an external coating solution supply. The elongate nozzle body also has a coating solution holder defined therein and opening away from the coating solution reservoir, for holding a coating solution against falling off as droplets under surface tension of the coating solution. A plurality of passages are defined in the elongate nozzle body and held in communication with the coating solution reservoir and the coating solution holder, for supplying the coating solution from the coating solution reservoir to the coating solution holder.

摘要翻译： 涂布喷嘴包括细长的喷嘴体，其具有纵向地限定在其中的涂布溶液储存器，以从外部涂布溶液供应源供应涂布溶液。 细长喷嘴体还具有限定在其中的涂覆溶液保持器，并且远离涂覆溶液储存器，用于在涂布溶液的表面张力下保持涂布溶液不会作为液滴脱落。 多个通道被限定在细长喷嘴体中，并且与涂布液储存器和涂布液保持器保持连通，用于将涂布溶液从涂布液储存器提供到涂布溶液保持器。

公开(公告)号：US5332557A

公开(公告)日：1994-07-26

申请号：US5602

申请日：1993-01-19

申请人： Tsutomu Sahoda ,  Hideyuki Mizuki ,  Hidenori Miyamoto ,  Hisashi Hori ,  Hiroyoshi Sago

发明人： Tsutomu Sahoda ,  Hideyuki Mizuki ,  Hidenori Miyamoto ,  Hisashi Hori ,  Hiroyoshi Sago

IPC分类号： B01J19/00 ,  C03C17/25 ,  C23C18/12 ,  G05D23/22 ,  H01L21/00 ,  H01L21/324 ,  H01L21/677 ,  F28D21/00 ,  G05D23/19 ,  H05H1/24

CPC分类号： H01L21/67757 ,  G05D23/1934 ,  G05D23/22 ,  H01L21/67115 ,  Y10S422/906

摘要： A plurality of workpieces are supported on a workpiece holder disposed over an opening defined in a horizontal base plate and connected to an evacuating device. A reaction chamber, which is supported on an arm of a lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the reaction chamber defines a closed space which accommodates the workpieces therein and a lifted position in which the workpieces are exposed out of the reaction chamber. A heating device, which is supported on an arm of another lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the heating device surrounds the reaction chamber and a lifted position in which the reaction chamber is exposed out of the heating device.

摘要翻译： 多个工件被支撑在设置在水平基板中限定的开口上并连接到抽空装置的工件保持件上。 支撑在提升和降低装置的臂上的反应室可在下降位置之间相对于基板垂直移动，其中反应室限定容纳工件的封闭空间和提升位置， 工件暴露在反应室外。 支撑在另一升降装置的臂上的加热装置可相对于基板垂直移动，该下降位置在加热装置围绕反应室的下降位置和反应室暴露于其中的提升位置之间 离开加热装置。

公开(公告)号：US5769946A

公开(公告)日：1998-06-23

申请号：US627694

申请日：1996-03-29

申请人： Junji Kutsuzawa ,  Hiroyoshi Sago ,  Futoshi Shimai ,  Hidenori Miyamoto

发明人： Junji Kutsuzawa ,  Hiroyoshi Sago ,  Futoshi Shimai ,  Hidenori Miyamoto

IPC分类号： G03F7/16 ,  B05B1/14 ,  B05B13/04 ,  B05C5/02 ,  B05C11/08 ,  G02B5/20 ,  H01L21/027 ,  B05C3/02 ,  B05B13/02 ,  B05C3/00 ,  B05C5/00

CPC分类号： B05C5/0254 ,  B05C11/08 ,  B05C5/0208 ,  B05B13/04 ,  B05C5/027

摘要： A coating nozzle includes an elongate nozzle body having a coating solution reservoir defined longitudinally therein for being supplied with a coating solution from an external coating solution supply. The elongate nozzle body also has a coating solution holder defined therein and opening away from the coating solution reservoir, for holding a coating solution against falling off as droplets under surface tension of the coating solution. A plurality of passages are defined in the elongate nozzle body and held in communication with the coating solution reservoir and the coating solution holder, for supplying the coating solution from the coating solution reservoir to the coating solution holder. The arrangement of the reservoir, the solution holder and the passages in the elongate nozzle body assures that a uniform layer of coating solution is deposited by the nozzle on a surface of a planar substrate.

摘要翻译： 涂布喷嘴包括细长的喷嘴体，其具有纵向地限定在其中的涂布溶液储存器，以从外部涂布溶液供应源供应涂布溶液。 细长喷嘴体还具有限定在其中的涂覆溶液保持器，并且远离涂覆溶液储存器，用于在涂布溶液的表面张力下保持涂布溶液不会作为液滴脱落。 多个通道被限定在细长喷嘴主体中，并且与涂布液储存器和涂布液保持器保持连通，用于将涂布溶液从涂布液储存器提供到涂布溶液保持器。 储存器，溶液保持器和细长喷嘴体中的通道的布置确保了通过喷嘴将均匀的涂层溶液层沉积在平面基板的表面上。

公开(公告)号：US5879457A

公开(公告)日：1999-03-09

申请号：US783988

申请日：1997-01-14

申请人： Tsutomu Sahoda ,  Koji Ueda ,  Hiroki Endo ,  Hidenori Miyamoto

发明人： Tsutomu Sahoda ,  Koji Ueda ,  Hiroki Endo ,  Hidenori Miyamoto

IPC分类号： B05C11/08 ,  G03F7/16 ,  H01L21/00 ,  H01L21/027 ,  B05C5/00 ,  B05C13/00

CPC分类号： H01L21/6715 ,  B05C11/08

摘要： A rotating cup type liquid coating device with structure for suppressing pulsatory movement of the coated liquid when stopping rotation of the inner cup 3, includes a buffer space S formed for connecting an inner space of the inner cup 3 and an inner space of an outer cup 2 surrounding the inner cup, on an outer periphery of the inner cup 3 , through respective throttle portions 16, 17.

摘要翻译： 具有用于在停止内杯3的旋转时抑制被涂液体的脉动运动的结构的旋转杯式液体涂布装置包括形成为用于连接内杯3的内部空间和外杯的内部空间的缓冲空间S 2通过相应的节流部分16,17围绕内杯3在内杯3的外周上。

公开(公告)号：US5707687A

公开(公告)日：1998-01-13

申请号：US637357

申请日：1996-04-24

申请人： Koji Ueda ,  Hiroki Endo ,  Hidenori Miyamoto

发明人： Koji Ueda ,  Hiroki Endo ,  Hidenori Miyamoto

IPC分类号： B05D1/40 ,  B05C11/08 ,  G03F7/16 ,  H01L21/00 ,  H01L21/027 ,  B05D3/12 ,  B05C11/02 ,  B05D1/18

CPC分类号： H01L21/6715 ,  B05C11/08 ,  G03F7/162

摘要： A suction chuck and an inner cup are rotated in unison with each other to spread a coating solution uniformly over a planar object in the inner cup under centrifugal forces. Vent holes defined in an outer cup lid which closes an outer cup are held out of communication with vent holes defined in a ring-shaped closure member, so that the interior space in the outer cup is kept out of communication with the exterior space around the outer cup. The concentration of a solvent in the outer cup remains so high that no mist is produced in the outer cup. After the planar object has been coated and before the outer cup lid is opened, the ring-shaped closure member is turned to align the vent holes in the outer cup lid with the vent holes in the ring-shaped closure member, breaking any vacuum in the outer cup with ambient air introduced through the vent holes into the outer cup. Thereafter, the outer and inner cup lids are opened, and the coated planar object is taken out.

摘要翻译： 吸盘和内杯彼此一致地旋转，以在离心力下在内杯中的平面物体上均匀地涂覆涂布溶液。 限定在封闭外杯的外杯盖中的排气孔与环形封闭构件中限定的通气孔保持不连通，使得外杯中的内部空间与外围空间相连接 外杯。 外杯中的溶剂的浓度保持如此高，使得外杯中不产生雾。 在平面物体被涂覆之后并且在外杯盖打开之前，环形封闭构件被转动以使外杯盖中的通气孔与环形封闭构件中的通气孔对齐，从而破坏 具有环境空气的外杯通过通气孔引入外杯中。 此后，打开外杯盖和内杯盖，并取出涂覆的平面物体。

公开(公告)号：US06287067B1

公开(公告)日：2001-09-11

申请号：US08947543

申请日：1997-10-11

申请人： Hidenori Miyamoto ,  Susumu Okano ,  Koji Ueda ,  Taiichiro Aoki

发明人： Hidenori Miyamoto ,  Susumu Okano ,  Koji Ueda ,  Taiichiro Aoki

IPC分类号： B65H100

CPC分类号： H01L21/67161 ,  B23P21/004 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  Y10S414/135 ,  Y10S414/136

摘要： A processing unit structure 1 a plurality of processing units 2, . . . , assembled together continuously in a horizontal direction, wherein a transfer portion 3 is provided on the top of each processing unit 2, . . . , for transferring the plate-like material to be processed between adjacent one of the processing units. A transfer device, such as a shuttle (SH) is provided in each of the transfer portions 3. Each processing unit 2 performs a series of processes on the plate-like material and is constructed with processing blocks 4 and 4 and a transfer portion 3 in the form of a transfer robot (R) positioned between the processing blocks 4 and 4. Further, each processing unit 2. . . is independent from one another so that it is possible to selectively add and remove different ones of the processing units with respect to the processing unit structure 1.

摘要翻译： 处理单元结构1是多个处理单元2，...。 。 。 在水平方向上连续地组装在一起，其中传送部分3设置在每个处理单元2的顶部。 。 。 用于在相邻的一个处理单元之间传送待处理的板状材料。 在每个转印部分3中设置有诸如梭（SH）的转印装置。每个处理单元2对板状材料执行一系列处理，并且由处理块4和4以及转印部3 以位于处理块4和4之间的传送机器人（R）的形式。此外，每个处理单元2。 。 彼此独立，使得可以相对于处理单元结构1选择性地添加和去除处理单元中的不同处理单元。

公开(公告)号：US5706930A

公开(公告)日：1998-01-13

申请号：US637356

申请日：1996-04-24

申请人： Tsutomu Sahoda ,  Koji Ueda ,  Hidenori Miyamoto ,  Toru Arikawa

发明人： Tsutomu Sahoda ,  Koji Ueda ,  Hidenori Miyamoto ,  Toru Arikawa

IPC分类号： B65G49/07 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68 ,  B65G29/00

CPC分类号： H01L21/681 ,  H01L21/67796 ,  Y10S414/135

摘要： When a carrier arm is retracted, a semiconductor wafer carried thereon passes between three light-emitting elements and three light-detecting elements associated therewith. At this time, a controller determines six points on the outer circumferential edge of the semiconductor wafer based on signals from sensors made up of the light-emitting elements and the light-detecting elements. The controller selects three of the determined points, determines the center of a circumscribed circle passing through the selected three points, and regards the determined center as the center of the semiconductor wafer. Then, the controller controls movement of the semiconductor wafer toward a rotary-cup coating device, an evacuating drying device, or an edge cleaning device based on the center of the semiconductor wafer.

摘要翻译： 当承载臂缩回时，其上承载的半导体晶片通过三个发光元件和与其相关联的三个光检测元件。 此时，控制器基于由发光元件和光检测元件构成的传感器的信号来确定半导体晶片的外周边缘上的六个点。 控制器选择三个确定的点，确定通过所选三个点的外接圆的中心，并将确定的中心视为半导体晶片的中心。 然后，控制器基于半导体晶片的中心来控制半导体晶片朝向旋转杯式涂布装置，抽真空干燥装置或边缘清洁装置的移动。

公开(公告)号：US09299874B2

公开(公告)日：2016-03-29

申请号：US13878964

申请日：2011-10-12

申请人： Hidenori Miyamoto ,  Tadahiko Hirakawa ,  Koichi Misumi

发明人： Hidenori Miyamoto ,  Tadahiko Hirakawa ,  Koichi Misumi

IPC分类号： H01L31/18 ,  H01L21/67 ,  H01L21/677 ,  H01L31/032 ,  B05D1/26

CPC分类号： H01L31/18 ,  B05D1/26 ,  B05D2252/02 ,  B05D2252/04 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/6776 ,  H01L31/0322 ,  Y02E10/541 ,  Y02E10/543 ,  Y02P70/521

摘要： A coating apparatus including a coating part which has a nozzle which ejects a liquid material including an oxidizable metal from a tip portion, and a relative driving unit which moves a substrate and the nozzle in relation to each other so that the tip portion passes through the substrate, such that at least the tip portion of the nozzle provides an affinity control part which is formed so that affinity between the affinity control part and the liquid material is less than that between the liquid materials.

摘要翻译： 一种涂布装置，其具有涂布部，该涂布部具有从顶端部喷射包含可氧化金属的液体材料的喷嘴，以及相对驱动部，其相对于彼此移动基板和喷嘴，使得前端部穿过 使得喷嘴的至少尖端部分提供亲和力控制部分，该亲和控制部分形成为使亲和控制部分和液体材料之间的亲和力小于液体材料之间的亲和力。

公开(公告)号：US09186696B2

公开(公告)日：2015-11-17

申请号：US12874984

申请日：2010-09-02

申请人： Hidenori Miyamoto ,  Kenji Maruyama ,  Tadahiko Hirakawa ,  Koichi Misumi

发明人： Hidenori Miyamoto ,  Kenji Maruyama ,  Tadahiko Hirakawa ,  Koichi Misumi

IPC分类号： B05C11/00 ,  B05C11/10 ,  B05C5/00 ,  C23C16/52 ,  H01L21/67 ,  H01L21/677 ,  H01L31/0216 ,  H01L31/032 ,  H01L31/18 ,  B41J2/045

CPC分类号： B05C11/1015 ,  B05C5/005 ,  B41J2/04566 ,  C23C16/52 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/6776 ,  H01L31/02167 ,  H01L31/0322 ,  H01L31/18 ,  Y02E10/541 ,  Y02P70/521

摘要： A coating apparatus including a coating part which applies a liquid material including an oxidizable metal on a substrate, a chamber having a coating space in which the coating part applies the liquid material on the substrate and a transport space into which the substrate is transported, and a removal unit which removes the liquid material from the inside of the chamber when at least one of oxygen concentration and humidity inside the chamber exceeds a threshold value.

摘要翻译： 一种涂布装置，包括：涂布部，其将包含可氧化金属的液体材料涂布在基板上;具有涂布空间的室，其中所述涂布部将所述液体材料施加到所述基板上;以及输送空间，所述基板被输送到所述输送空间中;以及 当所述室内的氧浓度和湿度中的至少一个超过阈值时，所述去除单元从所述室的内部除去所述液体材料。