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83 条记录 (耗时 0.042 秒)

    Device with diaphragm valve
    3.
    发明授权
    Device with diaphragm valve 有权
    带隔膜阀的设备

    公开(公告)号：US08584703B2

    公开(公告)日：2013-11-19

    申请号：US12949623

    申请日：2010-11-18

    申请人： Boris Kobrin ,  Iuliu I. Blaga ,  William Nielsen ,  Shize D. Qi ,  Ezra Van Gelder

    发明人： Boris Kobrin ,  Iuliu I. Blaga ,  William Nielsen ,  Shize D. Qi ,  Ezra Van Gelder

    IPC分类号： F16K11/20

    CPC分类号： F16K99/0001 ,  B01F11/0071 ,  B01F13/0059 ,  B32B7/02 ,  B32B9/04 ,  B33Y80/00 ,  F16K99/0015 ,  F16K99/0059 ,  F16K2099/008 ,  F16K2099/0084 ,  F16K2099/0094 ,  Y10T137/0318 ,  Y10T137/2213 ,  Y10T137/86453 ,  Y10T137/87249 ,  Y10T156/1039 ,  Y10T428/31504

    摘要： This invention provides composite plastic articles and methods of making them. The articles can be fluidic or microfluidic devices having fluidic conduits and, optionally, pneumatic conduits that regulate flow in the fluidic conduits. The articles comprise a first substrate coated with a layer of a material that comprises, or onto which have been introduced, reactive groups. For example, the substrate can be a plastic coated with an oxide or a siloxane onto which hydroxyl groups have been introduced. These articles are covalently bonded with other articles comprising reactive groups on their surfaces, for example, polysiloxanes treated to have silanol groups. Certain articles have specified locations on their surfaces that are not bonded to the other piece. For example, the coating can be removed from these locations before bonding. Such locations can be useful as functional elements of various devices, such as valve seats in valves of microfluidic devices.

    摘要翻译： 本发明提供复合塑料制品及其制造方法。 制品可以是具有流体导管的流体或微流体装置，以及可选地调节流体管道中的流动的气动导管。 制品包括涂覆有材料层的第一基材，其包含或已经引入反应性基团的材料层。 例如，基底可以是涂覆有已经引入羟基的氧化物或硅氧烷的塑料。 这些制品与其表面上包含反应性基团的其它制品共价键合，例如被处理为具有硅烷醇基团的聚硅氧烷。 某些物品在其表面上指定了未粘结到另一件的位置。 例如，可以在粘合之前从这些位置去除涂层。 这样的位置可以用作各种装置的功能元件，例如微流体装置的阀中的阀座。

    Composite Plastic Articles
    4.
    发明申请
    Composite Plastic Articles 有权
    复合塑料制品

    公开(公告)号：US20110126911A1

    公开(公告)日：2011-06-02

    申请号：US12949623

    申请日：2010-11-18

    申请人： Boris Kobrin ,  Iuliu I. Blaga ,  William Nielsen ,  Shize D. Qi ,  Ezra Van Gelder

    发明人： Boris Kobrin ,  Iuliu I. Blaga ,  William Nielsen ,  Shize D. Qi ,  Ezra Van Gelder

    IPC分类号： F17D1/00 ,  B32B9/04 ,  B32B37/14 ,  B29C47/00 ,  B32B38/06 ,  B32B38/10 ,  F15C1/04 ,  F16K31/48

    CPC分类号： F16K99/0001 ,  B01F11/0071 ,  B01F13/0059 ,  B32B7/02 ,  B32B9/04 ,  B33Y80/00 ,  F16K99/0015 ,  F16K99/0059 ,  F16K2099/008 ,  F16K2099/0084 ,  F16K2099/0094 ,  Y10T137/0318 ,  Y10T137/2213 ,  Y10T137/86453 ,  Y10T137/87249 ,  Y10T156/1039 ,  Y10T428/31504

    摘要： This invention provides composite plastic articles and methods of making them. The articles can be fluidic or microfluidic devices having fluidic conduits and, optionally, pneumatic conduits that regulate flow in the fluidic conduits. The articles comprise a first substrate coated with a layer of a material that comprises, or onto which have been introduced, reactive groups. For example, the substrate can be a plastic coated with an oxide or a siloxane onto which hydroxyl groups have been introduced. These articles are covalently bonded with other articles comprising reactive groups on their surfaces, for example, polysiloxanes treated to have silanol groups. Certain articles have specified locations on their surfaces that are not bonded to the other piece. For example, the coating can be removed from these locations before bonding. Such locations can be useful as functional elements of various devices, such as valve seats in valves of microfluidic devices.

    摘要翻译： 本发明提供复合塑料制品及其制造方法。 制品可以是具有流体导管的流体或微流体装置，以及可选地调节流体管道中的流动的气动导管。 制品包括涂覆有材料层的第一基材，其包含或已经引入反应性基团的材料层。 例如，基底可以是涂覆有已经引入羟基的氧化物或硅氧烷的塑料。 这些制品与其表面上包含反应性基团的其它制品共价键合，例如被处理为具有硅烷醇基团的聚硅氧烷。 某些物品在其表面上指定了未粘结到另一件的位置。 例如，可以在粘合之前从这些位置去除涂层。 这样的位置可以用作各种装置的功能元件，例如微流体装置的阀中的阀座。

    Fabrication of nanostructured devices
    6.
    发明授权
    Fabrication of nanostructured devices 有权
    纳米结构器件的制造

    公开(公告)号：US08318386B2

    公开(公告)日：2012-11-27

    申请号：US12462625

    申请日：2009-08-06

    申请人： Boris Kobrin

    发明人： Boris Kobrin

    IPC分类号： G03F7/00 ,  H01L21/027

    CPC分类号： G03B27/00 ,  G03B9/10 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2035

    摘要： Embodiments of the invention relate to methods useful in the fabrication of nanostructured devices for optics, energy generation, displays, consumer electronics, life sciences and medicine, construction and decoration. Instead of nanostructuring using colloids of particles, special vacuum deposition methods, laser interference systems (holography), and other low-throughput limited surface area techniques, we suggest to use nanotemplate created by novel nanolithography method, “Rolling mask” lithography. This method allows fast and inexpensive fabrication of nanostructures on large areas of substrate materials in conveyor-type continuous process. Such nanotemplate is then used for selective deposition of functional materials. One of embodiments explains deposition of functional materials in the exposed and developed areas of the substrate. Another embodiment uses selective deposition of the functional material on top of such template. Alternatively, nanotemplate is deposited and patterned on functional material, and then used as an etch mask to transfer nanostructure into the functional material using dry or wet etching process.

    摘要翻译： 本发明的实施例涉及用于制造用于光学，能量产生，显示器，消费电子，生命科学和医学，建筑和装饰的纳米结构设备的方法。 我们建议使用新型纳米光刻法制成的纳米模板，而不是使用粒子的胶体，特殊的真空沉积方法，激光干涉系统（全息术）和其他低通量限制表面积技术进行纳米结构化。 该方法允许在输送机型连续过程中在大面积的基底材料上快速且廉价地制造纳米结构。 然后将这种纳米模板用于功能材料的选择性沉积。 实施例中的一个解释了功能材料在衬底的暴露和显影区域中的沉积。 另一个实施例使用功能材料的选择性沉积在这种模板的顶部。 或者，将纳米模板沉积并在功能材料上图案化，然后用作蚀刻掩模，以使用干蚀刻或湿蚀刻工艺将纳米结构转移到功能材料中。

    Method and apparatus for anisotropic etching
    9.
    发明申请
    Method and apparatus for anisotropic etching 有权
    各向异性蚀刻的方法和装置

    公开(公告)号：US20100173494A1

    公开(公告)日：2010-07-08

    申请号：US12587078

    申请日：2009-10-01

    申请人： Boris Kobrin

    发明人： Boris Kobrin

    IPC分类号： H01L21/3065 ,  C23F1/08 ,  H01L21/306

    CPC分类号： H01L21/0337

    摘要： We suggest a method of anisotropic etching of the substrates, where ultra-thin and conformable layers of materials are used to passivate sidewalls of the etched features. According to an exemplary embodiment such sidewall passivation layer is a Self-assembled monolayer (SAM) material deposited in-situ etching process from a vapor phase. According to another exemplary embodiment such sidewall passivation layer is an inorganic-based material deposited using Atomic Layer Deposition (ALD) method. SAM or ALD layers deposition can be carried out in a pulsing regime alternating with an sputtering and/or etching processes using process gasses with or without plasma. Alternatively, SAM deposition process is carried out continuously, while etch or sputtering process turns on in a pulsing regime. Alternatively, SAM deposition process and etch or sputtering processes are carried out continuously. Both types of suggested passivation materials give advantage over state-of-the-art methods in ability to carefully control thickness and uniformity of the layers, thus enable anisotropic etching process for high aspect ratio nanosize features.

    摘要翻译： 我们建议对基板进行各向异性蚀刻的方法，其中使用超薄和适形的材料层来钝化蚀刻特征的侧壁。 根据示例性实施例，这种侧壁钝化层是从气相沉积原位蚀刻工艺的自组装单层（SAM）材料。 根据另一示例性实施例，这种侧壁钝化层是使用原子层沉积（ALD）方法沉积的基于无机的材料。 SAM或ALD层沉积可以使用具有或不具有等离子体的工艺气体在与溅射和/或蚀刻工艺交替的脉冲状态下进行。 或者，SAM沉积工艺是连续进行的，而蚀刻或溅射工艺在脉冲状态下开启。 或者，SAM沉积工艺和蚀刻或溅射工艺是连续执行的。 两种类型的建议的钝化材料都有优于现有技术的方法，以便仔细地控制层的厚度和均匀性，因此能够实现高纵横比纳米尺度特征的各向异性蚀刻工艺。