Seeding process in zone recrystallization
    4.
    发明授权
    Seeding process in zone recrystallization 失效
    区域重结晶中的播种过程

    公开(公告)号:US4944835A

    公开(公告)日:1990-07-31

    申请号:US330458

    申请日:1989-03-30

    IPC分类号: C30B13/00 C30B13/16

    摘要: An improved method of forming seed openings for zone-melting and recrystallization of polysilicon film on an insulator over silicon (SOI) is described. This method comprises forming a narrow discontinuous pattern of seed openings formed by an overlapping sub-pattern of discontinuous shaped openings. Alternatively, in an edge bead seed embodiment, a resist is removed from an SOI precursor structure, comprising an insulator on an Si wafer, thus exposing the peripheral edge of the insulator. The exposed insulator is then also removed to provide a peripheral edge seed opening to the underlying Si wafer.

    摘要翻译: 描述了一种用于在硅上的绝缘体上形成用于多晶硅膜的区域熔融和重结晶的种子开口的改进方法(SOI)。 该方法包括形成由不连续形状的开口的重叠子图形形成的种子开口的窄不连续图案。 或者,在边缘珠种子实施例中,从SOI前体结构去除抗蚀剂,其包括在Si晶片上的绝缘体,从而暴露绝缘体的周边边缘。 然后也去除暴露的绝缘体,以向下面的Si晶片提供外围边缘种子开口。