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公开(公告)号：US5046800A
公开(公告)日：1991-09-10
申请号：US594775
申请日：1990-10-09
CPC分类号： G02B6/13
摘要： Disclosed is a planar optical waveguide that is manufacturable by the compression molding or embossing of a multilayer film of polymeric material. In one embodiment, the waveguide comprises a core layer of relatively high refractive index included between cladding layers of lower refractive index. The waveguiding channels are bounded by regions where the cladding layers are in contact and from which core material has been excluded.
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公开(公告)号：US5115487A
公开(公告)日：1992-05-19
申请号：US653461
申请日：1991-02-08
CPC分类号： H01J29/88 , C03C25/1055 , Y10T428/2929 , Y10T428/2933 , Y10T428/2962 , Y10T428/2964
摘要： Siloxane compounds formed by the reaction of a hydridosiloxane with vinylsiloxane are employed in a wide variety of uses, e.g., coatings for optical fibers and flexible layers for touch screen cathode ray tubes. These siloxane materials are substantially improved through treatment with a lower alkene such as ethylene to prevent hydrogen evolution and undesirable crosslinking.
摘要翻译： 通过氢硅氧烷与乙烯基硅氧烷的反应形成的硅氧烷化合物用于各种用途，例如用于光纤的涂层和用于触摸屏阴极射线管的柔性层。 这些硅氧烷材料通过用低级烯烃如乙烯处理来显着改善，以防止析氢和不期望的交联。
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公开(公告)号：US4372834A
公开(公告)日：1983-02-08
申请号：US275426
申请日：1981-06-19
IPC分类号： C01B33/107 , C01G17/04 , B01J19/08
CPC分类号： C01G17/04 , C01B33/10778
摘要： Silicon tetrachloride is processed to ultrahigh purity by subjecting it to a specific succession of purification steps. These steps include the photochlorination of the SiCl.sub.4 using a reactor that allows a long residence time for the SiCl.sub.4. After photochlorination, highly volatile products such as HCl are removed and the remaining impurities are then separated by a distillation technique.
摘要翻译： 通过使四氯化硅进行特定的纯化步骤，将四氯化硅加工成超高纯度。 这些步骤包括使用允许SiCl 4的长停留时间的反应器对SiCl 4进行光氯化。 在光氯化后，除去高挥发性产物如HCl，然后通过蒸馏技术分离剩余的杂质。
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公开(公告)号：US4173475A
公开(公告)日：1979-11-06
申请号：US801783
申请日：1977-05-31
CPC分类号： G03F7/001
摘要： A latent-imaging photopolymer system for recording thick refractive index patterns is disclosed. The system utilizes a porous matrix which has been sensitized by chemisorption of a photosensitive polymerization initiator. The sensitized matrix is exposed to light in the desired pattern. This light destroys initiator to impress the pattern. Then the pores are filled with a monomer composition. Finally the entire filled matrix is irradiated to induce polymerization initiation by the sensitizer remaining after the initial exposure. Polymerization produces locally induced refractive index gradients corresponding to the pattern of the light in the initial exposure step.
摘要翻译： 公开了一种用于记录厚折射率图案的潜像成像光聚合物系统。 该系统利用已经通过光敏聚合引发剂的化学吸附而致敏的多孔基质。 致敏基质以所需的图案曝光。 这种光摧毁了发起者的印象。 然后用单体组合物填充孔。 最后，照射完全填充的基质，以在初次暴露后残留的敏化剂引发聚合引发。 在初始曝光步骤中聚合产生对应于光图案的局部诱导折射率梯度。
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公开(公告)号：US4132608A
公开(公告)日：1979-01-02
申请号：US775770
申请日：1977-03-09
CPC分类号： C09D5/4469
摘要： A water-based polymeric coating comprising a novolak resin is deposited electrolytically from a solution of a novolak resin upon a conductive substrate at an initial current density ranging from 10-30 milliamperes per square centimeter. The resultant coating, after cross linking by subsequent chemical treatment, is flexible, firmly adherent and evidences good thermal stability and insulation characteristics, so suggesting its use as a cover coat for printed circuits.
摘要翻译： 包含酚醛清漆树脂的水性聚合物涂层以10-30毫安/平方厘米的初始电流密度从酚醛清漆树脂的溶液中电解沉积在导电基材上。 所得涂层在通过后续化学处理交联后是柔性的，牢固粘附的并且证明了良好的热稳定性和绝缘特性，因此表明其用作印刷电路的覆盖层。
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6.发明授权Manufacture of vitreous silica product via a sol-gel process using a polymer additive 失效使用聚合物添加剂通过溶胶 - 凝胶法生产玻璃状二氧化硅产品
公开(公告)号：US5240488A
公开(公告)日：1993-08-31
申请号：US930125
申请日：1992-08-14
申请人： Edwin A. Chandross , Debra A. Fleming , David W. Johnson, Jr. , John B. MacChesney , Frederick W. Walz, Jr.
发明人： Edwin A. Chandross , Debra A. Fleming , David W. Johnson, Jr. , John B. MacChesney , Frederick W. Walz, Jr.
IPC分类号： B29C39/02 , B29K67/00 , B29L11/00 , C03B8/02 , C03B19/12 , C03B20/00 , C03B37/012 , C03B37/016 , C03C1/00 , G02B6/00
CPC分类号： C03B37/016 , C03B19/12 , C03B37/01211 , C03C1/006 , Y02P40/57 , Y10S65/901
摘要： Lowered cost fabrication including preparation of large bodies of void-free, high-silica glass, depends upon gellation of an aqueous sol of colloidal silica particles, followed by drying and firing of such gel. Freedom from cracks in the dried gel is the consequence of included polymeric material which wets the particles. The polymeric material is removed by thermal decomposition attended upon temperature attained in firing.
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公开(公告)号：US4774188A
公开(公告)日：1988-09-27
申请号：US144736
申请日：1988-01-15
申请人： Edwin A. Chandross
发明人： Edwin A. Chandross
CPC分类号： C09K11/06 , H05K1/0269 , H05K1/0373 , H05K2203/161 , Y10S428/901 , Y10T428/31529
摘要： Circuit boards with advantageous properties are produced through the addition of a fluorescent dye. The presence of the dye allows an expeditious inspection of the metallic pattern on the circuit board by induced fluorescence.
摘要翻译： 通过添加荧光染料产生具有有利特性的电路板。 染料的存在允许通过诱导荧光快速检查电路板上的金属图案。
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公开(公告)号：US4708884A
公开(公告)日：1987-11-24
申请号：US875475
申请日：1986-06-18
申请人： Edwin A. Chandross , Robert E. Dean , Patrick K. Gallagher , Roland A. Levy , Frank Schrey , Gerald Smolinsky
发明人： Edwin A. Chandross , Robert E. Dean , Patrick K. Gallagher , Roland A. Levy , Frank Schrey , Gerald Smolinsky
IPC分类号： C23C16/40 , H01L21/316 , B05D3/14
CPC分类号： H01L21/02164 , C23C16/402 , H01L21/02129 , H01L21/02216 , H01L21/02274 , H01L21/31608 , H01L21/31612
摘要： Conformal layers of a silicon oxide, such as silicon dioxide, are deposited at temperatures below 600 degrees C. through the decomposition of compounds such as diacetoxyditertiarybutoxysilane. The required temperatures do not significantly affect temperature-sensitive structures. Therefore, it is possible to form silicon oxide regions in the processing of devices having these structures. More generally, lowered-temperature processing can be applied to the deposition of other materials which include silicon oxide. For example, borophosphosilicate glasses can be deposited by chemical vapor deposition processing involving flash-evaporation of a mixture of liquid precursor reagents.
摘要翻译： 诸如二氧化硅的氧化硅的保形层在低于600℃的温度下通过诸如二乙酰氧基二乙氧基丙氧基硅烷的化合物的分解沉积。 所需温度不会对温度敏感结构产生显着影响。 因此，可以在具有这些结构的器件的处理中形成氧化硅区域。 更一般地，降温处理可以应用于包括氧化硅的其它材料的沉积。 例如，硼磷硅酸盐玻璃可以通过化学气相沉积处理进行沉积，包括闪蒸蒸发液体前体试剂的混合物。
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公开(公告)号：US4597985A
公开(公告)日：1986-07-01
申请号：US722433
申请日：1985-04-15
IPC分类号： C23C16/40 , H01L21/316 , B05D3/14
CPC分类号： H01L21/02164 , C23C16/402 , H01L21/02216 , H01L21/02271 , H01L21/02274 , H01L21/31608 , H01L21/31612
摘要： Conformal layers of a silicon oxide, such as silicon dioxide, are deposited at temperatures below 600 degrees C. through the decomposition of compounds such as diacetoxyditertiarybutoxysilane. The required temperatures do not significantly affect temperature-sensitive structures. Therefore, it is possible to form silicon oxide regions in the processing of devices having these structures.
摘要翻译： 诸如二氧化硅的氧化硅的保形层在低于600℃的温度下通过诸如二乙酰氧基二乙氧基丙氧基硅烷的化合物的分解沉积。 所需温度不会对温度敏感结构产生显着影响。 因此，可以在具有这些结构的器件的处理中形成氧化硅区域。
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公开(公告)号：US4551416A
公开(公告)日：1985-11-05
申请号：US489796
申请日：1983-04-29
IPC分类号： C08K5/00 , C07F7/18 , C07J51/00 , C08K5/32 , C08L33/00 , C08L33/02 , G03C1/72 , G03C5/08 , G03F7/004 , G03F7/039 , G03F7/20 , H01L21/027 , G03C5/00
CPC分类号： C07F7/1804 , C07F7/1856 , C07J51/00 , G03F7/0045
摘要： Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.
摘要翻译： 对紫外线辐射敏感并且表现出优异对比度的感光体由基础可溶性聚合物形成，例如与基础不溶性物质如邻二甲基苄基酯物理混合的聚（甲基丙烯酸甲酯 - 共 - 甲基丙烯酸）。 碱不溶性酯在照射时分解，以在照射区域中形成碱溶性实体。 然后这些照射的部分可溶于用于显影所需图像的碱性溶液中。
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