公开(公告)号：US4780781A

公开(公告)日：1988-10-25

申请号：US779469

申请日：1985-09-24

申请人： Masaaki Sano ,  Katsuya Mitsuoka ,  Makoto Morijiri ,  Shinji Narishige ,  Masanobu Hanazono ,  Toshihiro Yoshida

发明人： Masaaki Sano ,  Katsuya Mitsuoka ,  Makoto Morijiri ,  Shinji Narishige ,  Masanobu Hanazono ,  Toshihiro Yoshida

IPC分类号： C22C19/07 ,  C25D3/56 ,  C25D7/00 ,  G11B5/31 ,  H01F10/16 ,  H01F41/26 ,  G11B5/147

CPC分类号： G11B5/31

摘要： A thin film magnetic head comprising a lower magnetic film, an upper magnetic film which is formed over the lower magnetic film and in which one end is come into contact with one end of the lower magnetic film and the other end faces the other end of the lower magnetic film through a magnetic gap and thereby forming a magnetic circuit which has a magnetic gap in a part thereof, together with the lower magnetic film, and a conductor coil forming a coil of a predetermined number of turns and passing between the upper and lower magnetic films and crossing the magnetic circuit. Each of the upper and lower magnetic films is formed of a Co-Ni-Fe ternary alloy having a face-centered cubic crystal structure. Also, uniaxial anisotropy is alternately and perpendicularly given in every layer of a predetermined thickness stacked in the direction of thickness of the film.

摘要翻译： 一种薄膜磁头，包括下部磁性膜，上部磁性膜，形成在下部磁性膜的上方，并且一端与下部磁性膜的一端接触，另一端面向下部磁性膜的另一端 通过磁隙下降磁性膜，从而形成与下部磁性膜一起形成有磁性间隙的磁路，以及形成规定圈数的线圈的导体线圈，并且通过上下 磁性膜并穿过磁路。 上下磁性膜由具有面心立方晶体结构的Co-Ni-Fe三元合金形成。 另外，在膜的厚度方向堆叠的规定厚度的各层中交替地，垂直地赋予单轴各向异性。

公开(公告)号：US4592801A

公开(公告)日：1986-06-03

申请号：US639012

申请日：1984-08-09

申请人： Shinichi Hara ,  Shinji Narishige ,  Tsuneo Yoshinari ,  Mistuo Sato ,  Katsuya Mitsuoka ,  Makoto Morijiri ,  Masanobu Hanazono ,  Tetsuo Kobayashi

发明人： Shinichi Hara ,  Shinji Narishige ,  Tsuneo Yoshinari ,  Mistuo Sato ,  Katsuya Mitsuoka ,  Makoto Morijiri ,  Masanobu Hanazono ,  Tetsuo Kobayashi

IPC分类号： G11B5/31 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  B44C1/22 ,  C03C15/00 ,  C03C25/06 ,  C23F1/02

CPC分类号： H01L21/31116 ,  H01L21/302 ,  G11B5/3116 ,  G11B5/3163

摘要： A method of patterning a thin film by dry etching is disclosed in which, in order for a thin alumina film to have a predetermined pattern, the thin alumina film is selectively removed by carrying out the ion beam etching which uses a carbon fluoride gas, while using a photoresist film as a mask.

摘要翻译： 公开了一种通过干蚀刻图案化薄膜的方法，其中为了使氧化铝薄膜具有预定图案，通过进行使用氟化碳气体的离子束蚀刻来选择性地除去薄氧化铝膜，同时 使用光致抗蚀剂膜作为掩模。

公开(公告)号：US4971896A

公开(公告)日：1990-11-20

申请号：US280828

申请日：1988-12-07

申请人： Takashi Kawabe ,  Ataru Kobayashi ,  Moriaki Fuyama ,  Makoto Morijiri ,  Eiji Ashida ,  Masatoshi Tsuchiya ,  Tetsuya Okai ,  Masanobu Hanazono ,  Shinichi Hara ,  Shinji Narishige ,  Hiroshi Ikeda

发明人： Takashi Kawabe ,  Ataru Kobayashi ,  Moriaki Fuyama ,  Makoto Morijiri ,  Eiji Ashida ,  Masatoshi Tsuchiya ,  Tetsuya Okai ,  Masanobu Hanazono ,  Shinichi Hara ,  Shinji Narishige ,  Hiroshi Ikeda

IPC分类号： G03F7/00 ,  G11B5/31

CPC分类号： G11B5/3163 ,  G03F7/0035 ,  Y10S430/165

摘要： A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.

摘要翻译： 在具有台阶部的基底上形成薄膜图案的方法。 该方法包括在基底上形成给定材料的薄膜的第一步骤，第二步骤，在包括台阶部分的下部的第一部分中的一个上形成在所述薄膜上的第一光致抗蚀剂膜的预定图案，以及 第二部分，包括台阶部分的上部;第三步骤，在所述第一和第二部分中的另一个上在所述薄膜上形成第二光致抗蚀剂膜的预定图案;以及第四步骤，将所述薄片 给定材料的膜使用掩模，所述第一和第二部分形成在所述薄膜上形成的第一和第二光致抗蚀剂图案。

公开(公告)号：US4766009A

公开(公告)日：1988-08-23

申请号：US004279

申请日：1987-01-06

申请人： Midori Imura ,  Makoto Morijiri ,  Masanobu Hanazono ,  Shinichi Kazui

发明人： Midori Imura ,  Makoto Morijiri ,  Masanobu Hanazono ,  Shinichi Kazui

IPC分类号： C23C18/14 ,  B23K26/14 ,  C23C18/16 ,  C23C18/40 ,  C23F1/00 ,  C23F1/02 ,  C23F4/04 ,  H05K3/06 ,  H05K3/18 ,  H05K3/22 ,  B05D3/06

CPC分类号： C23C18/1669 ,  B23K26/146 ,  C23C18/161 ,  C23C18/1612 ,  C23F1/02 ,  H05K3/225 ,  H05K2203/107 ,  H05K2203/173 ,  H05K2203/175 ,  H05K3/068 ,  H05K3/187

摘要： A selective working method in which the surface to be worked of a workpiece is locally irradiated with energy beams and an electroless plating solution or an electroless etching solution is contacted with the irradiated workpiece surface, with the electroless plating solution or the electroless etching solution flowing continuously in the substantially same direction of as the direction of an irradiation of energy beams. The electroless plating of the electroless etching can be conducted selectively by this method. Above selective working method is best suited for the formation or correction (repair, filling up etc.) of micro-patterns on the workpiece such as metals, semi-conductors, insulators, etc.

摘要翻译： 使用能量束局部照射被加工物的表面和化学镀溶液或无电解蚀刻溶液的选择性加工方法与被照射的工件表面接触，化学镀溶液或无电解蚀刻溶液连续流动 在与能量束的照射方向基本相同的方向上。 无电解蚀刻的化学镀可以通过该方法选择性地进行。 上述选择性加工方法最适合于金属，半导体，绝缘子等工件上的微图案的形成或校正（修复，填充等）。

公开(公告)号：US4659587A

公开(公告)日：1987-04-21

申请号：US786056

申请日：1985-10-10

申请人： Midori Imura ,  Makoto Morijiri ,  Masanobu Hanazono ,  Shinichi Kazui ,  Youzi Miura ,  Hiroyuki Ogino

发明人： Midori Imura ,  Makoto Morijiri ,  Masanobu Hanazono ,  Shinichi Kazui ,  Youzi Miura ,  Hiroyuki Ogino

IPC分类号： C23C18/16 ,  H05K3/18 ,  H05K3/40 ,  H05K3/46

CPC分类号： C23C18/1608 ,  C23C18/1612 ,  C23C18/1667 ,  C23C18/1868 ,  C23C18/1879 ,  C23C18/1882 ,  C23C18/204 ,  C23C18/206 ,  C23C18/2066 ,  C23C18/405 ,  H05K3/185 ,  H05K2203/107 ,  H05K3/4038 ,  H05K3/4644

摘要： In a selective electroless plating process suitable for formation and correction of a minute pattern by plating film, irradiation of the surface of a workpiece with a laser beam serves to selectively activate the surface of the workpiece to allow an electroless plating film to deposited on only the activated portions. The portion of the workpiece where plating is effected is irradiated with a radiation energy beam to form a damaged portion, which is contact with a plating bath during and/or after the irradiation to selectively from a plating film on the damaged portion. The portion of a workpiece where a pole as the connector part of a multilayer wiring board is to be formed is irradiated with a laser beam and allowed to have a pole selectively formed only thereon.

摘要翻译： 在适于通过镀膜形成和校正微小图案的选择性化学镀方法中，用激光束照射工件表面用于选择性地激活工件的表面，以允许化学镀膜仅沉积在 激活部分。 用辐射能量束照射进行电镀的工件的部分，以形成受损部分，该损伤部分在照射期间和/或之后与电镀槽接触，以选择性地从损坏部分上的镀膜上。 要形成作为多层布线板的连接器部分的极的工件的部分被激光束照射，并且允许具有仅在其上选择性地形成的极。

公开(公告)号：US5296979A

公开(公告)日：1994-03-22

申请号：US963039

申请日：1992-10-19

申请人： Takashi Kawabe ,  Moriaki Fuyama ,  Shinji Narishige ,  Masatoshi Tsuchiya ,  Eiji Ashida ,  Makoto Morijiri ,  Hideki Yamazaki ,  Yutaka Sugita ,  Hiroshi Fukui ,  Tadayuki Iwakura ,  Makoto Aihara ,  Makoto Saito ,  Shunichiro Kuwatsuka ,  Hiroshi Ikeda ,  Yokuo Saitoh

发明人： Takashi Kawabe ,  Moriaki Fuyama ,  Shinji Narishige ,  Masatoshi Tsuchiya ,  Eiji Ashida ,  Makoto Morijiri ,  Hideki Yamazaki ,  Yutaka Sugita ,  Hiroshi Fukui ,  Tadayuki Iwakura ,  Makoto Aihara ,  Makoto Saito ,  Shunichiro Kuwatsuka ,  Hiroshi Ikeda ,  Yokuo Saitoh

IPC分类号： G11B5/012 ,  G11B5/31

CPC分类号： G11B5/012 ,  G11B5/3116

摘要： A magnetic disc apparatus includes a magnetic disc for recording information; a thin film magnetic head including a magnetic pole structure having an upper magnetic pole tip and a lower magnetic pole tip arranged to provide a magnetic gap at respective end portions thereof for writing and reading information in and from the magnetic disc; a device for rotating the magnetic disc; and a device for positioning the thin film magnetic head; the upper and lower magnetic pole tips having different contours at the respective end portions as viewed from a side confronting the magnetic disc wherein the difference (.DELTA.CW in .mu.m) in the width, along the magnetic gap, of the upper magnetic pole tip and the width, along the magnetic gap, of the lower magnetic pole tip satisfies the relation0

摘要翻译： 磁盘装置包括用于记录信息的磁盘; 包括具有上磁极端头和下磁极端头的磁极结构的薄膜磁头，其布置成在其各个端部处提供磁隙以在磁盘中写入和读取信息; 用于旋转磁盘的装置; 以及用于定位薄膜磁头的装置; 所述上磁极尖端和下磁极尖在相应端部处具有不同的轮廓，从与磁盘相对的一侧观察，其中沿着上部的磁隙的宽度（（delta）CW）（（m））） 磁极尖端和下磁极尖端的磁隙的宽度满足磁道密度Tr为每英寸1800或更多磁道的磁盘的关系0 <（Delta）CW <= 5000 / Tr。

公开(公告)号：US5245493A

公开(公告)日：1993-09-14

申请号：US495908

申请日：1990-03-20

申请人： Takashi Kawabe ,  Moriaki Fuyama ,  Shinji Narishige ,  Eizi Ashida ,  Makoto Morijiri ,  Masanori Tanabe ,  Hiroshi Fukui ,  Yutaka Sugita ,  Hiroshi Ikeda ,  Masaaki Hayashi ,  Kazuo Nakagoshi ,  Kanji Kawakami ,  Yokuo Saitoh ,  Shunichiro Kuwatsuka

发明人： Takashi Kawabe ,  Moriaki Fuyama ,  Shinji Narishige ,  Eizi Ashida ,  Makoto Morijiri ,  Masanori Tanabe ,  Hiroshi Fukui ,  Yutaka Sugita ,  Hiroshi Ikeda ,  Masaaki Hayashi ,  Kazuo Nakagoshi ,  Kanji Kawakami ,  Yokuo Saitoh ,  Shunichiro Kuwatsuka

IPC分类号： G11B5/012 ,  G11B5/31 ,  G11B5/39

CPC分类号： G11B5/3919 ,  G11B5/012 ,  G11B5/3116 ,  G11B5/313 ,  G11B5/3163 ,  G11B5/3903 ,  G11B5/3967

摘要： A magnetic head for reading from and/or writing to a magnetic information storage medium has a substrate on which a plurality of thin films are formed in sequence. The films provide a magnetic circuit having a magnetic gap, a bottom pole piece and a top pole piece overlying said bottom pole piece. The top pole piece is formed as a tip portion adjoining the magnetic gap and a rear portion which makes magnetic contact with the tip portion. The rear portion is formed in the sequence after the tip portion. To ensure accurate thickness and width of the tip portion, a non-magnetic protective film is formed on the tip portion after the tip portion is formed and before the rear portion is formed.

公开(公告)号：US5241440A

公开(公告)日：1993-08-31

申请号：US908607

申请日：1992-06-29

申请人： Eizi Ashida ,  Moriaki Fuyama ,  Hideki Yamazaki ,  Shinji Narishige ,  Makoto Morijiri ,  Takashi Kawabe ,  Shunichiro Kuwatsuka ,  Saburo Suzuki ,  Eisei Togawa

发明人： Eizi Ashida ,  Moriaki Fuyama ,  Hideki Yamazaki ,  Shinji Narishige ,  Makoto Morijiri ,  Takashi Kawabe ,  Shunichiro Kuwatsuka ,  Saburo Suzuki ,  Eisei Togawa

IPC分类号： G11B5/31

CPC分类号： G11B5/313 ,  G11B5/3163

摘要： A thin film magnetic head including conductor coils, a plurality of insulating layers to interpose and insulate the conductor coils and a magnetic gap layer between upper and lower magnetic cores, in which another insulating layer is provided on a stepped region formed by end faces of the plurality of insulating layers.

摘要翻译： 一种薄膜磁头，包括导体线圈，多个绝缘层，用于将导体线圈插入并绝缘，以及在上下磁芯之间的磁隙层，其中另一绝缘层设置在由 多个绝缘层。

公开(公告)号：US07159304B2

公开(公告)日：2007-01-09

申请号：US10778079

申请日：2004-02-17

申请人： Masatoshi Arasawa ,  Haruko Tanaka ,  Makoto Morijiri ,  Koichi Nishioka ,  Shuichi Kojima ,  Masayasu Kagawa

发明人： Masatoshi Arasawa ,  Haruko Tanaka ,  Makoto Morijiri ,  Koichi Nishioka ,  Shuichi Kojima ,  Masayasu Kagawa

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： B82Y25/00 ,  B82Y10/00 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3166 ,  G11B5/3903 ,  G11B5/3906 ,  G11B5/398 ,  G11B2005/3996 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： Multiple thin films of spin-valve GMR sensor are formed in a trapezoidal cross-sectional shape by laminating an antiferromagnetic layer, a pinned magnetic layer, a nonmagnetic conductive layer, a free magnetic layer and a nonmagnetic protective layer on a lower insulated gap layer. The amount of etching of the lower insulated gap layer produced in the process of patterning the spin-valve giant magnetoresistive layers into the multiple thin films of spin-valve GMR sensor is 10 nm or less. Further, the angle θ which the tangent line of each side face of the multiple thin films to the middle line of the free magnetic layer in its thickness direction forms with respect to the middle line of the free magnetic layer becomes 45 degrees or more. This structure makes it possible to provide such a spin-valve giant magnetoresistive head that it meets the requirements for securing constant breakdown voltage and preventing instability of MR output voltage waveform.

摘要翻译： 通过在下绝缘间隙层上层叠反铁磁层，钉扎磁性层，非磁性导电层，自由磁性层和非磁性保护层，形成梯形截面形状的多个自旋阀GMR传感器薄膜。 在将自旋阀巨磁阻层图案化成自旋阀GMR传感器的多个薄膜的过程中产生的下绝缘间隙层的蚀刻量为10nm以下。 此外，相对于自由磁性层的中间线，多个薄膜的每个侧面的切线与自由磁性层的中间线在其厚度方向上形成的角度θ成为45度以上。 这种结构使得可以提供这样的自旋阀巨磁阻头，其满足确保恒定击穿电压的要求并防止MR输出电压波形的不稳定性。

公开(公告)号：US20050122622A1

公开(公告)日：2005-06-09

申请号：US10956976

申请日：2004-09-30

申请人： Yoji Maruyama ,  Tadayuki Iwakura ,  Makoto Morijiri ,  Shigekazu Ohtomo ,  Ichiro Ohdake

发明人： Yoji Maruyama ,  Tadayuki Iwakura ,  Makoto Morijiri ,  Shigekazu Ohtomo ,  Ichiro Ohdake

IPC分类号： G11B5/31 ,  G11B5/147

CPC分类号： G11B5/147

摘要： In one embodiment, a thin-film magnetic head with a write head has a lower core member made of a soft magnetic film, a planar upper core member made of a soft magnetic film, and a coil conductor positioned between the lower and upper core members. The rear end is equipped with a magnetic body, which at least magnetically joins the lower and upper core members. A magnetic pole piece is in contact with the lower core member and positioned toward an air bearing surface, which faces a recording medium. A first nonmagnetic film is provided between a pedestal magnetic pole piece and upper core member. The write head is structured so that the first nonmagnetic film constitutes a write gap. A second nonmagnetic film is provided above or below the first nonmagnetic film. The edge of the second nonmagnetic film is retracted from the air bearing surface. The upper core member's flare point is positioned toward the air bearing surface rather than the edge of the second nonmagnetic film.

摘要翻译： 在一个实施例中，具有写头的薄膜磁头具有由软磁膜制成的下芯构件，由软磁膜制成的平面上芯构件和位于下芯体和上芯体之间的线圈导体 。 后端配备有至少磁性地连接下部和上部芯部构件的磁性体。 磁极片与下芯部件接触并朝向面向记录介质的空气轴承表面定位。 第一非磁性膜设置在基座磁极片和上芯部件之间。 写头被构造成使得第一非磁性膜构成写入间隙。 在第一非磁性膜的上方或下方设置第二非磁性膜。 第二非磁性膜的边缘从空气支承表面缩回。 上芯体的扩口位于空气轴承表面而不是第二非磁性膜的边缘。