Power MISFET, semiconductor device and DC/DC converter
    6.
    发明授权
    Power MISFET, semiconductor device and DC/DC converter 有权
    电源MISFET,半导体器件和DC / DC转换器

    公开(公告)号:US08319289B2

    公开(公告)日:2012-11-27

    申请号:US12005918

    申请日:2007-12-27

    摘要: A technique for suppressing lowering of withstand voltage and lowering of breakdown resistance and reducing a feedback capacitance of a power MISFET is provided. A lateral power MISFET that comprises a trench region whose insulating layer is formed shallower than an HV-Nwell layer is provided in the HV-Nwell layer (drift region) formed on a main surface of a semiconductor substrate in a direction from the main surface to the inside. The lateral power MISFET has an arrangement on a plane of the main surface including a source layer (source region) and a drain layer (drain region) arranged at opposite sides to each other across a gate electrode (first conducting layer), and a dummy gate electrode (second conducting layer) that is different from the gate electrode is arranged between the gate electrode and the drain layer.

    摘要翻译: 提供了用于抑制耐压降低和击穿电阻降低并降低功率MISFET的反馈电容的技术。 在半导体衬底的主表面上形成的HV-Nwell层(漂移区域)中,沿着从主表面到主体表面的方向,设置包括其绝缘层形成为比HV-Nwell层浅的沟槽区域的横向功率MISFET 里面。 横向功率MISFET具有在主表面的平面上的布置,包括在栅极电极(第一导电层)上彼此相对设置的源极层(源极区域)和漏极层(漏极区域) 与栅电极不同的栅电极(第二导电层)配置在栅电极和漏极层之间。