公开(公告)号：US20090179357A1

公开(公告)日：2009-07-16

申请号：US11989776

申请日：2006-08-10

申请人： Masami Murakami ,  Shunsuke Oike ,  Yoshito Kurano ,  Makoto Aritsuka ,  Hiroko Wachi

发明人： Masami Murakami ,  Shunsuke Oike ,  Yoshito Kurano ,  Makoto Aritsuka ,  Hiroko Wachi

IPC分类号： B29C67/00

CPC分类号： H01L21/31695 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/02343 ,  H01L21/02348 ,  H01L21/02359 ,  H01L21/67207 ,  H01L21/67745

摘要： There are provided a method for producing porous silica and a porous silica film having low specific dielectric constant and high mechanical strength, that are preferably applicable to optical functional materials, electronic functional materials or the like, and a method for producing an interlayer insulating film, a semiconductor material and a semiconductor apparatus and a producing apparatus, which use the porous silica film. A solution containing a hydrolysis-condensation product of alkoxysilanes and a surfactant is dried to form a composite to which are then applied in the following order an ultraviolet ray irradiation treatment and a hydrophobic treatment with the use of an organic silicon compound having an alkyl group. By forming the composite by drying the solution on a substrate, the porous silica film is obtained.

摘要翻译： 提供一种多孔二氧化硅的制造方法和比较介电常数高，机械强度高的多孔二氧化硅膜，优选适用于光功能材料，电子功能材料等，以及制造层间绝缘膜的方法， 使用多孔二氧化硅膜的半导体材料和半导体装置及制造装置。 将包含烷氧基硅烷和表面活性剂的水解缩合产物的溶液干燥以形成复合材料，然后按照以下顺序施加紫外线照射处理和使用具有烷基的有机硅化合物的疏水处理。 通过在基材上干燥溶液形成复合体，得到多孔二氧化硅膜。

公开(公告)号：US07807267B2

公开(公告)日：2010-10-05

申请号：US10526688

申请日：2003-09-08

申请人： Kazuo Kohmura ,  Shunsuke Oike ,  Takeshi Kubota ,  Masami Murakami ,  Yoshito Kurano

发明人： Kazuo Kohmura ,  Shunsuke Oike ,  Takeshi Kubota ,  Masami Murakami ,  Yoshito Kurano

IPC分类号： B32B9/04

CPC分类号： H01L21/02126 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/31695 ,  Y10T428/31663

摘要： The present invention relates to a method for modifying a porous film mainly having Si—O bonds wherein a thermal treatment is conducted without using a metal catalyst by bringing an organic silicon compound into contact with the porous film. The organic silicon compound includes one or more Si—X—Si bond unit (wherein X represents O, NR, CnH2n, or C6H4; R represents CmH2m+1 or C6H5; m is an integer between 1 and 6; and n is 1 or 2) and two or more Si-A bond units (wherein A represents H, OH, OCeH2e+1 or a halogen atom and can be the same or different within a single molecule; and e is an integer between 1 and 6). Since the porous film obtained by this method is excellent in the hydrophobic property and the mechanical strength, it can be used as an optically functional material or an electronically functional material. The porous film is especially useful as a semiconductor material, and can be preferably used as an interlayer insulating film in a semiconductor device.

摘要翻译： 本发明涉及一种用于改性主要具有Si-O键的多孔膜的方法，其中通过使有机硅化合物与多孔膜接触而不使用金属催化剂进行热处理。 有机硅化合物包括一个或多个Si-X-Si键单元（其中X表示O，NR，C n H 2n或C 6 H 4; R表示C m H 2n + 1或C 6 H 5; m为1至6的整数; n为1或 2）和两个或更多个Si-A键单元（其中A表示H，OH，OCeH 2e + 1或卤素原子，并且在单分子内可以相同或不同; e为1至6之间的整数）。 由于通过该方法获得的多孔膜的疏水性和机械强度优异，因此可以用作光学功能材料或电子功能材料。 多孔膜特别可用作半导体材料，并且可以优选用作半导体器件中的层间绝缘膜。

公开(公告)号：US20060040110A1

公开(公告)日：2006-02-23

申请号：US10526688

申请日：2003-09-08

申请人： Kazuo Kohmura ,  Shunsuke Oike ,  Takeshi Kubota ,  Masami Murakami ,  Yoshito Kurano

发明人： Kazuo Kohmura ,  Shunsuke Oike ,  Takeshi Kubota ,  Masami Murakami ,  Yoshito Kurano

IPC分类号： B05D1/40 ,  B32B13/04

CPC分类号： H01L21/02126 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/31695 ,  Y10T428/31663

摘要： The present invention relates to a method for modifying a porous film mainly having Si—O bonds wherein a thermal treatment is conducted without using a metal catalyst by bringing an organic silicon compound into contact with the porous film. The organic silicon compound includes one or more Si—X—Si bond unit (wherein X represents O, NR, CnH2n, or C6H4; R represents CmH2m+1 or C6H5; m is an integer between 1 and 6; and n is 1 or 2) and two or more Si-A bond units (wherein A represents H, OH, OCeH2e+1 or a halogen atom and can be the same or different within a single molecule; and e is an integer between 1 and 6). Since the porous film obtained by this method is excellent in the hydrophobic property and the mechanical strength, it can be used as an optically functional material or an electronically functional material. The porous film is especially useful as a semiconductor material, and can be preferably used as an interlayer insulating film in a semiconductor device.

摘要翻译： 本发明涉及一种用于改性主要具有Si-O键的多孔膜的方法，其中通过使有机硅化合物与多孔膜接触而不使用金属催化剂进行热处理。 有机硅化合物包括一个或多个Si-X-Si键单元（其中X表示O，NR，C n H 2n H 2n或C 6， R 4表示C m H 2 m + 1或C 6 H 5， m是1和6之间的整数; n是1或2）和两个或更多个Si-A键单元（其中A表示H，OH，OC 2e + 1或卤素原子，并且可以在单分子内相同或不同; e为1至6之间的整数）。 由于通过该方法获得的多孔膜的疏水性和机械强度优异，因此可以用作光学功能材料或电子功能材料。 多孔膜特别可用作半导体材料，并且可以优选用作半导体器件中的层间绝缘膜。

公开(公告)号：US20090206453A1

公开(公告)日：2009-08-20

申请号：US11884358

申请日：2006-02-15

申请人： Nobutoshi Fujii ,  Kazuo Kohmura ,  Hidenori Miyoshi ,  Hirofumi Tanaka ,  Shunsuke Oike ,  Masami Murakami ,  Takeshi Kubota ,  Yoshito Kurano

发明人： Nobutoshi Fujii ,  Kazuo Kohmura ,  Hidenori Miyoshi ,  Hirofumi Tanaka ,  Shunsuke Oike ,  Masami Murakami ,  Takeshi Kubota ,  Yoshito Kurano

IPC分类号： H01L29/00 ,  B05D7/22 ,  B32B3/26

CPC分类号： H01L21/76826 ,  C01B33/12 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02214 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/31608 ,  H01L21/31695 ,  Y10T428/249994

摘要： A hydrophobic compound having at least one each of hydrophobic group (an alkyl group having 1 to 6 carbon atoms or a —C6H5 group) and polymerizable group (a hydrogen atom, a hydroxyl group or a halogen atom) is allowed to undergo a gas-phase polymerization reaction, under reduced pressure (of not more than 30 kPa), in the presence of a raw porous silica film and to thus form a modified porous silica film wherein a hydrophobic polymer thin film is formed on the inner walls of holes present in the raw porous silica film. The resulting porous silica film has a low relative dielectric constant and a low refractive index and the silica film is likewise improved in the mechanical strength and hydrophobicity. A semiconductor device is produced using the porous silica film.

摘要翻译： 具有疏水性基团（具有1〜6个碳原子的烷基或-C 6 H 5基团）和可聚合基团（氢原子，羟基或卤素原子）中的至少一种的疏水化合物被允许进行气 - 在减压（不大于30kPa）的条件下，在原料多孔二氧化硅膜的存在下进行相聚合反应，从而形成改性多孔二氧化硅膜，其中在存在于孔中的孔的内壁上形成疏水性聚合物薄膜 原料多孔二氧化硅膜。 所得到的多孔二氧化硅膜的相对介电常数低，折射率低，二氧化硅膜的机械强度和疏水性同样提高。 使用多孔二氧化硅膜制造半导体器件。

公开(公告)号：US06852299B2

公开(公告)日：2005-02-08

申请号：US09959505

申请日：2001-04-26

申请人： Kazuo Kohmura ,  Akihiro Okabe ,  Takeshi Kubota ,  Yoshito Kurano ,  Masami Murakami

发明人： Kazuo Kohmura ,  Akihiro Okabe ,  Takeshi Kubota ,  Yoshito Kurano ,  Masami Murakami

IPC分类号： B01J20/10 ,  C01B33/12 ,  C01B33/159 ,  C01B33/18 ,  C08J9/00 ,  C09C1/30 ,  C09D183/02 ,  C09D183/08 ,  H01L21/316 ,  C08G77/24

CPC分类号： C01B33/124 ,  B01J20/103 ,  B01J20/2809 ,  B82Y30/00 ,  C01P2002/70 ,  C01P2004/61 ,  C01P2004/64 ,  C01P2006/16 ,  C01P2006/17 ,  C01P2006/60 ,  C01P2006/80 ,  C01P2006/90 ,  C08J9/0004 ,  C08J2300/14 ,  C09C1/3045 ,  C09D183/02 ,  C09D183/08 ,  H01L21/31695 ,  Y10T428/264 ,  Y10T428/265

摘要： Water-repellent porous silica having uniform pores, which comprises silica skeleton wherein fluorine atoms are fixed through covalent bonds and which has an alkali metal content of not more than 10 ppb, is synthesized. By the water-repellent porous silica, a water-repellent porous silica film having uniform pores, which is applicable to a light functional material or an electron functional material, a process for preparing the same and uses thereof can be provided.

摘要翻译： 合成具有均匀孔隙的疏水性多孔二氧化硅，其包含二氧化硅骨架，其中氟原子通过共价键固定并且碱金属含量不超过10ppb。 通过防水多孔二氧化硅，可以提供适用于光功能材料或电子功能材料的具有均匀孔隙的防水多孔二氧化硅膜，其制备方法及其用途。

公开(公告)号：US20070006776A1

公开(公告)日：2007-01-11

申请号：US10554233

申请日：2004-04-26

申请人： Shunsuke Oike ,  Kazuo Kohmura ,  Masami Murakami ,  Takeshi Kubota

发明人： Shunsuke Oike ,  Kazuo Kohmura ,  Masami Murakami ,  Takeshi Kubota

IPC分类号： C09D183/04

CPC分类号： H01L21/02216 ,  C09D183/04 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/31695

摘要： The coating liquid for forming porous silica according to the present invention is characterized by preferably containing a partial hydrolysis-condensation product of an alkoxysilane compound, a surfactant and an organic ampholyte, and by having a metal content of not more than 50 ppb. Conventional coating liquids for forming porous silica have such a problem that porous silica films formed therefrom may have poor regularity in micropore alignment when the shelf life of the coating liquids are long. On the contrary, the coating liquid for forming porous silica of the present invention is excellent in self-life stability. Namely, the quality of porous silica formed therefrom is hardly affected by the length of self-life period of the coating liquid. Consequently, the coating liquid is expected to contribute to the stable preparation of porous silica films which cause no shift in capacitance or voltage when exposed to an electric field, have regularly aligned uniform micropores, and are preferably used as an optically functional material or an electronically functional material.

公开(公告)号：US07291215B2

公开(公告)日：2007-11-06

申请号：US10554233

申请日：2004-04-26

申请人： Shunsuke Oike ,  Kazuo Kohmura ,  Masami Murakami ,  Takeshi Kubota

发明人： Shunsuke Oike ,  Kazuo Kohmura ,  Masami Murakami ,  Takeshi Kubota

IPC分类号： C09D183/02 ,  C01B33/12

CPC分类号： H01L21/02216 ,  C09D183/04 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/31695

摘要： The coating liquid for forming porous silica according to the present invention is characterized by preferably containing a partial hydrolysis-condensation product of an alkoxysilane compound, a surfactant and an organic ampholyte, and by having a metal content of not more than 50 ppb. Conventional coating liquids for forming porous silica have such a problem that porous silica films formed therefrom may have poor regularity in micropore alignment when the shelf life of the coating liquids are long. On the contrary, the coating liquid for forming porous silica of the present invention is excellent in self-life stability. Namely, the quality of porous silica formed therefrom is hardly affected by the length of self-life period of the coating liquid. Consequently, the coating liquid is expected to contribute to the stable preparation of porous silica films which cause no shift in capacitance or voltage when exposed to an electric field, have regularly aligned uniform micropores, and are preferably used as an optically functional material or an electronically functional material.

摘要翻译： 根据本发明的用于形成多孔二氧化硅的涂布液的特征在于优选含有烷氧基硅烷化合物，表面活性剂和有机两性电解质的部分水解缩合产物，并且金属含量不超过50ppb。 用于形成多孔二氧化硅的常规涂布液具有这样的问题，即当涂布液的保质期长时，由其形成的多孔二氧化硅膜在微孔对准中的规则性差。 相反，本发明的多孔二氧化硅的形成用涂布液的自身寿命稳定性优异。 也就是说，由其形成的多孔二氧化硅的质量几乎不受涂布液的自身寿命期的影响。 因此，期望涂料液体有助于多孔二氧化硅膜的稳定制备，其在暴露于电场时不会发生电容或电压偏移，具有规则排列的均匀微孔，并且优选用作光学功能材料或电子 功能材料。

公开(公告)号：US20100196255A1

公开(公告)日：2010-08-05

申请号：US12733848

申请日：2008-09-22

申请人： Nobuhiko Horiuchi ,  Kenichi Sugimoto ,  Masami Murakami ,  Kenji Iwata

发明人： Nobuhiko Horiuchi ,  Kenichi Sugimoto ,  Masami Murakami ,  Kenji Iwata

IPC分类号： C01B7/01 ,  B01J23/72 ,  B01J23/10

CPC分类号： B01J23/83 ,  B01J21/08 ,  B01J35/10 ,  B01J35/1019 ,  B01J35/1038 ,  B01J35/1042 ,  B01J35/1047 ,  B01J35/1061 ,  B01J35/108 ,  B01J37/0201 ,  B01J37/0236 ,  C01B7/04

摘要： A catalyst has high activity and is suitable for use in producing chlorine by oxidizing hydrogen chloride with oxygen. The catalyst includes copper, an alkali metal and a rare earth and has pores of which pores having a diameter of 5 to 15 nm have a pore volume of 0.4 to 2.0 ml/g.

摘要翻译： 催化剂具有高活性，适用于通过用氧氧化氯化氢来生产氯。 催化剂包括铜，碱金属和稀土，并且具有直径为5至15nm的孔的孔具有0.4至2.0ml / g的孔体积。

公开(公告)号：US08623782B2

公开(公告)日：2014-01-07

申请号：US13202266

申请日：2010-02-15

申请人： Masami Murakami ,  Ken Maeda ,  Yuya Goto

发明人： Masami Murakami ,  Ken Maeda ,  Yuya Goto

IPC分类号： B01J23/70 ,  B01J23/72 ,  B01J21/00 ,  B01J23/02 ,  B01J23/06 ,  B01J23/04 ,  B01J23/00

CPC分类号： C07C29/154 ,  B01J23/002 ,  B01J23/72 ,  B01J23/80 ,  B01J35/002 ,  B01J35/1014 ,  B01J37/0009 ,  B01J37/031 ,  B01J37/06 ,  B01J37/18 ,  B01J2523/00 ,  Y02P20/52 ,  C07C31/04 ,  B01J2523/17 ,  B01J2523/27 ,  B01J2523/31 ,  B01J2523/41 ,  B01J2523/48

摘要： There is provided by the present invention a process for preparing a copper-based catalyst having good catalytic activity, markedly excellent durability and good reproducibility. The process for preparing a copper-based catalyst of the invention is a process for preparing a catalyst composed of metal oxides containing copper oxide as an essential component and is characterized by comprising the following steps: (1) a step of bringing an acidic metal salt solution containing copper and a precipitant solution into contact with each other to obtain a slurry solution containing a precipitate of a catalyst precursor, and (2) a step of continuously bringing the slurry solution and a wash liquid into contact with each other to wash the precipitate, with substantially keeping the suspended state.

摘要翻译： 本发明提供了具有良好的催化活性，显着优异的耐久性和良好的再现性的铜基催化剂的制备方法。 制备本发明的铜基催化剂的方法是一种制备由含有氧化铜作为必要组分的金属氧化物组成的催化剂的方法，其特征在于包括以下步骤：（1）使酸性金属盐 含有铜和沉淀剂溶液的溶液彼此接触以获得含有催化剂前体沉淀物的浆液，和（2）连续使浆液和洗涤液彼此接触以洗涤沉淀物的步骤 ，基本保持暂停状态。

公开(公告)号：US20130015039A1

公开(公告)日：2013-01-17

申请号：US13619650

申请日：2012-09-14

申请人： Masami Murakami ,  Jianguo Wang

发明人： Masami Murakami ,  Jianguo Wang

IPC分类号： B65G37/00

CPC分类号： B65G35/06 ,  B62D65/18 ,  B65G37/02

摘要： A carriage-type conveying apparatus with a workpiece support base and an elevating drive has a passive shaft interlocked with the elevating drive and a lock to prevent descent of the workpiece support base A power source carriage capable of traveling synchronously with the conveying carriage is aside of a traveling path of the conveying carriage at a workpiece support height changing position so as to be reciprocable along the traveling path. The power source carriage has a transmission shaft driven by a power source and a separable interlock to interlock the passive shaft and a transmission shaft with each other.

摘要翻译： 具有工件支撑基座和升降驱动器的托架式输送装置具有与升降驱动器联锁的被动轴和用于防止工件支撑基座下降的锁定件能够与输送托架同步行进的电源托架是 输送托架在工件支撑高度改变位置处的行进路径，以便沿着行进路径往复运动。 电源托架具有由动力源驱动的传动轴和可分离的联动装置，以将被动轴与传动轴互相联锁。