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    Particle density measuring probe and particle density measuring equipment
    1.
    发明授权
    Particle density measuring probe and particle density measuring equipment 有权
    颗粒密度测量探头和颗粒密度测量设备

    公开(公告)号：US07782463B2

    公开(公告)日：2010-08-24

    申请号：US11987264

    申请日：2007-11-28

    申请人： Masanu Hori ,  Seigo Takashima ,  Hiroyuki Kano ,  Shoji Den

    发明人： Masanu Hori ,  Seigo Takashima ,  Hiroyuki Kano ,  Shoji Den

    IPC分类号： G01N21/00 ,  G01B9/02 ,  G01J3/45 ,  H05B31/26 ,  H01J7/24

    CPC分类号： H05H1/0037 ,  G01N21/15 ,  G01N21/68

    摘要： Disclosed is a particle density measuring probe for measuring the density of atoms or molecules in a plasma atmosphere by absorption spectroscopy. The probe has a cylindrical light guiding member provided in the plasma atmosphere. At the front end of the light guiding member, there is provided a reflection plate for reflecting light that has propagated through the cylindrical light guiding member. Behind the reflection plate, in a cross section perpendicular to the longitudinal direction of the light guiding member, a part devoid of a portion of wall surface is provided by a predetermined length in the longitudinal direction. A plasma introducing portion allows mutual contact between light passing through this part devoid of a portion of wall surface and atoms or molecules in the plasma atmosphere. The probe has a main body that guides light in an axial direction by total reflection by a side wall, and that is located behind the plasma introducing portion.

    摘要翻译： 公开了一种用于通过吸收光谱法测量等离子体气氛中的原子或分子的密度的颗粒密度测量探针。 探针具有设置在等离子体气氛中的圆柱形导光构件。 在导光构件的前端设置有用于反射已经传播通过圆柱形导光构件的光的反射板。 在反射板的后方，在与导光部件的纵向垂直的截面中，没有壁面的一部分的部分在长度方向上设置规定的长度。 等离子体引入部分允许通过该部分没有壁表面的一部分的光与等离子体气氛中的原子或分子之间的相互接触。 探针具有通过侧壁的全反射引导轴向的光的主体，位于等离子体导入部的后方。

    Particle density measuring probe and particle density measuring equipment
    2.
    发明申请
    Particle density measuring probe and particle density measuring equipment 有权
    颗粒密度测量探头和颗粒密度测量设备

    公开(公告)号：US20090237667A1

    公开(公告)日：2009-09-24

    申请号：US11987264

    申请日：2007-11-28

    申请人： Masanu Hori ,  Seigo Takashima ,  Hiroyuki Kano ,  Shoji Den

    发明人： Masanu Hori ,  Seigo Takashima ,  Hiroyuki Kano ,  Shoji Den

    IPC分类号： G01N21/00

    CPC分类号： H05H1/0037 ,  G01N21/15 ,  G01N21/68

    摘要： Disclosed is a particle density measuring probe for measuring the density of atoms or molecules in a plasma atmosphere by absorption spectroscopy. The probe has a cylindrical light guiding member provided in the plasma atmosphere. At the front end of the light guiding member, there is provided a reflection plate for reflecting light that has propagated through the cylindrical light guiding member. Behind the reflection plate, in a cross section perpendicular to the longitudinal direction of the light guiding member, a part devoid of a portion of wall surface is provided by a predetermined length in the longitudinal direction. A plasma introducing portion allows mutual contact between light passing through this part devoid of a portion of wall surface and atoms or molecules in the plasma atmosphere. The probe has a main body that guides light in an axial direction by total reflection by a side wall, and that is located behind the plasma introducing portion.

    摘要翻译： 公开了一种用于通过吸收光谱法测量等离子体气氛中的原子或分子的密度的颗粒密度测量探针。 探针具有设置在等离子体气氛中的圆柱形导光构件。 在导光构件的前端设置有用于反射已经传播通过圆柱形导光构件的光的反射板。 在反射板的后方，在与导光部件的纵向垂直的截面中，没有壁面的一部分的部分在长度方向上设置规定的长度。 等离子体引入部分允许通过该部分没有壁表面的一部分的光与等离子体气氛中的原子或分子之间的相互接触。 探针具有通过侧壁的全反射引导轴向的光的主体，位于等离子体导入部的后方。

    Light source
    3.
    发明授权
    Light source 有权
    光源

    公开(公告)号：US08310673B2

    公开(公告)日：2012-11-13

    申请号：US12450402

    申请日：2008-03-24

    申请人： Masaru Hori ,  Hiroyuki Kano ,  Shoji Den

    发明人： Masaru Hori ,  Hiroyuki Kano ,  Shoji Den

    IPC分类号： G01J3/30

    CPC分类号： H05H1/0025 ,  G01N21/15 ,  G01N21/3103 ,  G01N2021/158 ,  G01N2201/023 ,  G01N2201/0233 ,  G01N2201/061

    摘要： To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere.The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode. The light source further includes a hole 47 axially penetrating the center portions of the first electrode, the insulating spacer, and the second electrode; and an electric discharge gas passage for introducing an electric discharge gas, along the inner wall of the cooling medium passage, to the back surface of the lens so that the electric discharge gas is reflected by thepslens and flows through the hole.

    摘要翻译： 提供一种实现等离子体气氛的粒子密度的精确测定而不干扰等离子体气氛的状态的光源。 本发明的光源包括管状壳体12; 用于使冷却介质流过其中的冷却介质通道30，所述通道沿着所述壳体的内壁设置; 设置在所述壳体的前端的透镜50; 第一电极44和第二电极45，其设置在壳体内并且在透镜之前垂直于壳体的轴线并且彼此平行; 以及设置在第一电极和第二电极之间的绝缘间隔件46。 光源还包括轴向穿过第一电极，绝缘间隔物和第二电极的中心部分的孔47; 以及放电气体通道，用于沿着冷却介质通道的内壁将放电气体引导到透镜的背面，使得放电气体被透镜反射并流过孔。

    LIGHT SOURCE
    6.
    发明申请
    LIGHT SOURCE 有权
    光源

    公开(公告)号：US20100201978A1

    公开(公告)日：2010-08-12

    申请号：US12450402

    申请日：2008-03-24

    申请人： Masaru Hori ,  Hiroyuki Kano ,  Shoji Den

    发明人： Masaru Hori ,  Hiroyuki Kano ,  Shoji Den

    IPC分类号： G01N21/31

    CPC分类号： H05H1/0025 ,  G01N21/15 ,  G01N21/3103 ,  G01N2021/158 ,  G01N2201/023 ,  G01N2201/0233 ,  G01N2201/061

    摘要： To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere.The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode. The light source further includes a hole 47 axially penetrating the center portions of the first electrode, the insulating spacer, and the second electrode; and an electric discharge gas passage for introducing an electric discharge gas, along the inner wall of the cooling medium passage, to the back surface of the lens so that the electric discharge gas is reflected by the lens and flows through the hole.

    摘要翻译： 提供一种实现等离子体气氛的粒子密度的精确测定而不干扰等离子体气氛的状态的光源。 本发明的光源包括管状壳体12; 用于使冷却介质流过其中的冷却介质通道30，所述通道沿着所述壳体的内壁设置; 设置在所述壳体的前端的透镜50; 第一电极44和第二电极45，其设置在壳体内并且在透镜之前垂直于壳体的轴线并且彼此平行; 以及设置在第一电极和第二电极之间的绝缘间隔件46。 光源还包括轴向穿过第一电极，绝缘间隔物和第二电极的中心部分的孔47; 以及放电气体通道，用于沿着冷却介质通道的内壁将放电气体引导到透镜的背面，使得放电气体被透镜反射并流过孔。

    Plasma Generator
    7.
    发明申请
    Plasma Generator 审中-公开
    等离子发生器

    公开(公告)号：US20080029030A1

    公开(公告)日：2008-02-07

    申请号：US10589568

    申请日：2005-01-26

    申请人： Toshio Goto ,  Masaru Hori ,  Shoji Den ,  Mikio Nagai

    发明人： Toshio Goto ,  Masaru Hori ,  Shoji Den ,  Mikio Nagai

    IPC分类号： H01L21/205 ,  H01L21/304 ,  H01L21/3065 ,  H05H1/24

    CPC分类号： H05H1/46 ,  H05H2001/4622 ,  H05H2001/463

    摘要： [Object] To stably generate plasma at atmospheric pressure.[Solving Means] There are provided a tubular casing 10 into which a gas and a microwave are introduced, a hole 30 provided in a bottom surface of this casing, and a columnar conductor 40 which is provided in an axis direction of the casing, a bottom surface of the conductor 40 having a contour placed inside the contour of the hole. A minute gap A formed between the contour of a bottom surface 41 of the conductor 40 and the contour of the hole, a coaxial waveguide formed of the conductor and the casing, and an insulating film 22 formed at least on a contour portion forming the hole at the minute gap are provided. In the structure described above, the microwave is guided to the minute gap by the coaxial waveguide, and the gas is made to pass through the minute gap, so that the gas is placed in a plasma state at the minute gap. The microwave is a pulse wave and is duty-controlled, and the contour portion forming the hole 30 is cooled with a cooling medium from the inside of an electrode 20. Accordingly, the increase in plasma temperature can be prevented, and as a result, stable plasma can be generated.

    摘要翻译： [对象]在大气压下稳定地产生等离子体。 [解决方案]设置有引入气体和微波的管状壳体10，设置在该壳体的底面的孔30和沿壳体的轴线方向设置的柱状导体40， 导体40的底表面具有放置在孔的轮廓内的轮廓。 形成在导体40的底面41的轮廓和孔的轮廓之间的微小间隙A，由导体形成的同轴波导和壳体，以及至少形成在形成孔的轮廓部分上的绝缘膜22 提供了微小间隙。 在上述结构中，通过同轴波导将微波引导到微小间隙，使气体通过微小间隙，使得气体在微小间隙处被置于等离子体状态。 微波是脉冲波并且是负责控制的，并且形成孔30的轮廓部分从电极20的内部用冷却介质冷却。因此，可以防止等离子体温度的升高，结果， 可以产生稳定的等离子体。

    Surface treating method and surface-treating apparatus
    8.
    发明申请
    Surface treating method and surface-treating apparatus 审中-公开
    表面处理方法和表面处理装置

    公开(公告)号：US20070034601A1

    公开(公告)日：2007-02-15

    申请号：US10550020

    申请日：2003-09-22

    申请人： Toshio Goto ,  Masaru Hori ,  Nobuo Ishii ,  Shoji Den

    发明人： Toshio Goto ,  Masaru Hori ,  Nobuo Ishii ,  Shoji Den

    IPC分类号： C03C15/00 ,  H01L21/302 ,  B44C1/22

    CPC分类号： C23F4/00 ,  B23H5/08 ,  C23F3/06 ,  H01L21/3065 ,  H01L21/31055

    摘要： The surface of a material for an electronic device is flattened by irradiating the surface of the material with at least part of plasma components, while supplying a liquid to the surface of the material for an electronic device. There are provided a method of treating the surfaces for favorably flattening the surface of the material for an electronic device or of the substrate for an electronic device, while suppressing damage to the material or to the substrate, and an apparatus for treating the surfaces.

    摘要翻译： 用于电子设备的材料的表面通过用至少部分等离子体部件照射材料的表面而平坦化，同时将液体供应到用于电子设备的材料的表面。 提供了一种处理表面以有利地平坦化用于电子设备的材料的表面或用于电子设备的基板的方法，同时抑制对材料或基板的损坏，以及用于处理表面的设备。

    Plasma source and plasma processing apparatus
    9.
    发明授权
    Plasma source and plasma processing apparatus 有权
    等离子体源和等离子体处理装置

    公开(公告)号：US07632379B2

    公开(公告)日：2009-12-15

    申请号：US10558692

    申请日：2004-05-28

    申请人： Toshio Goto ,  Masaru Hori ,  Nobuo Ishii ,  Shoji Den

    发明人： Toshio Goto ,  Masaru Hori ,  Nobuo Ishii ,  Shoji Den

    IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00

    CPC分类号： B82Y30/00 ,  B82Y40/00 ,  C01B32/162 ,  H01J37/32009 ,  H01J37/32596

    摘要： A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).

    摘要翻译： 等离子体源（1）由供应气体的室（2）和设置在室（2）的气体流出侧的中空阴极电极构件（4）构成，并且具有多个 的气体可以流过的电极孔（3）。 在这种等离子体源（1）中，可以在中空阴极电极部件（4）的电极孔（3）中进行微阴极等离子体放电。

    Plasma source and plasma processing apparatus
    10.
    发明申请
    Plasma source and plasma processing apparatus 有权
    等离子体源和等离子体处理装置

    公开(公告)号：US20070017636A1

    公开(公告)日：2007-01-25

    申请号：US10558692

    申请日：2004-05-28

    申请人： Toshio Goto ,  Masaru Hori ,  Nobuo Ishii ,  Shoji Den

    发明人： Toshio Goto ,  Masaru Hori ,  Nobuo Ishii ,  Shoji Den

    IPC分类号： C23F1/00 ,  H01L21/306

    CPC分类号： B82Y30/00 ,  B82Y40/00 ,  C01B32/162 ,  H01J37/32009 ,  H01J37/32596

    摘要： A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).

    摘要翻译： 等离子体源（1）由供应气体的室（2）和设置在室（2）的气体流出侧的中空阴极电极构件（4）组成，并且具有多个 的气体可以流过的电极孔（3）。 在这种等离子体源（1）中，可以在中空阴极电极部件（4）的电极孔（3）中进行微阴极等离子体放电。