摘要:
In a compression data editing apparatus, a smooth switching (edition) having no noise is enabled to be performed. A code train 10 is supplied to an MPEG decoding circuit 2 and is delayed by a fixed time and, after that, it is decoded into an audio signal. In this instance, the operation is temporarily stopped for a block which is repeated. When an offset value extracted by an offset extracting circuit 3 lies within a predetermined range, the repeat pulse is detected and supplied to the circuit 2. A flag is set to a frame in which the pulse is detected. In the circuit 2, the decoding is temporarily stopped in the code block which corresponds to the pulse and was recorded at the second time. The decoding is restarted after the next block was inputted. In the circuit 2, the supplied code train 10 is supplied to, for example, a synthesis filter of 512 taps and is converted into the audio signal. Therefore, data of 256 samples near the boundary of the adjacent blocks is mutually influenced and a correct audio signal 14 is outputted.
摘要:
This invention enables coded audio data to be reliably decoded even if an audio signal coded in blocks not in synchronism with the frames or fields of a video signal is decoded on the basis of these frames of fields. By filling an integral number of coded audio blocks in the period of time corresponding to one frame or field of the video signal, this invention forms an array of coded audio blocks in synchronism with the frames or fields of the video signal before transmission. This avoids separating a coded block in transmitted data at a frame or field boundary, and enables the coded audio data to be reliably decoded so as to prevent the occurrence of a period of time in which decoded data is missing even if a switching operation is carried out on the basis of the frames or fields of the video signal.
摘要:
The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor 107, a lower electrode 113 placed within a processing chamber of the vacuum reactor and having a wafer 112 to be etched mounted on the upper surface thereof, bias supplying units 118 and 120 for supplying high frequency power for forming a bias potential to the lower electrode 113, a gas supply means 111 for feeding reactive gas into the processing chamber, an electric field supplying means 101 through 103 for supplying a magnetic field for generating plasma in the processing chamber, and a control unit 127 for controlling the distribution of ion energy in the plasma being incident on the wafer 112 via the high frequency power.
摘要:
The present invention provides a T cell activator comprising an antigen-bound phospholipid membrane, wherein the phospholipid membrane comprises a phospholipid having an acyl group having one unsaturated bond and 14 to 24 carbon atoms or a hydrocarbon group having one unsaturated bond and 14 to 24 carbon atoms, and a phospholipid membrane stabilizer, and wherein the antigen is bound to the surface of the phospholipid membrane.
摘要:
The invention provides a semiconductor fabrication method comprising a deposition step for depositing a laminated film on a semiconductor substrate having a region in which a mask pattern is formed sparsely and a region in which the mask pattern is formed densely, a lithography step s1 for forming a mask pattern, a cleaning step S11C for removing deposits in the apparatus, a trimming step S3 for trimming the mask pattern, and dry etching steps S4 and S5 for transferring the mask pattern on the laminated film, wherein a seasoning step S11S followed by a deposition step S2 is introduced either before or after the trimming step S3.
摘要:
Because of environmental pollution prevention laws, PFC (perfluorocarbon) and HFC (hydrofluorocarbon), both etching gases for silicon oxide and silicon nitride films, are expected to be subjected to limited use or become difficult to obtain in the future. An etching gas containing fluorine atoms is introduced into a plasma chamber. In a region where plasma etching takes place, the fluorine-containing gas plasma is made to react with solid-state carbon in order to produce molecular chemical species such as CF4, CF2, CF3 and C2F4 for etching. This method assures a high etch rate and high selectivity while keeping a process window wide.
摘要翻译:由于环境污染防治法,PFC(全氟化碳)和HFC(氢氟碳化合物)两种氧化硅和氮化硅膜的蚀刻气体预计将受到有限的使用或将来难以获得。 含有氟原子的蚀刻气体被引入到等离子体室中。 在进行等离子体蚀刻的区域中,使含氟气体等离子体与固态碳反应,以产生分子化学物质,例如CF 4,CF 2, SUB 3,CF 3 3和C 2 F 4 S 3用于蚀刻。 该方法确保了高蚀刻速率和高选择性,同时保持了工艺窗口宽。
摘要:
A precoated skin material for an automobile interior part comprising (a) a skin material for an automobile interior part and (b) a one-pack type thermally crosslinkable polymer composition comprising (i) a thermoplastic olefinic polymer having a carboxylic acid group or an acid anhydride group, (ii) a latent curing agent, (iii) a carbonyl compound as a solvent and (iv) a tackifier, which composition is coated on the back surface of the skin material, wherein the latent curing agent is a solid polyamine having a melting point of 80 to 200° C. which form hydrolyzable reaction products by a condensation reaction with the carbonyl compound used as the solvent, or a hydrolyzable reaction product of a diamine with a carbonyl compound.
摘要:
A plasma processing apparatus in which power consumption is reduced, which can generate uniform plasma in a large range and in which minute processing in high etching selectivity and in high aspect ratio is enabled is disclosed. High density plasma is generated in a vacuum vessel housing a processed sample utilizing an electron cyclotron resonance phenomenon caused by an electromagnetic wave in an ultra-high frequency band and a magnetic field and the surface of the processed sample is etched using this plasma. An electromagnetic wave in an ultra-high frequency band for generating plasma is radiated from a planar conductive plate consisting of graphite or silicon which is arranged opposite to the surface of the processed sample into space inside the vacuum vessel. High density plasma in the low degree of dissociation can be generated by using an electromagnetic wave in an ultra-high frequency band and as a result, the controllability of etching reaction can be enhanced. Further, a radical effective in etching can be increased by reaction between the surface of a planar conductive plate for radiating an electromagnetic wave and plasma.
摘要:
The invention relates to a moisture-curable primer composition comprising a reaction product between a maleic anhydride-modified styrene-ethylene-butene-styrene copolymer and an epoxysilane compound. This primer composition is particularly useful for the bonding of polyolefin adherents.
摘要:
In an information storage system including a rotating recording medium having a number of information tracks, a head positioning mechanism for switching access position between adjacent tracks and a plurality of buffer memories each capable of storing one track of data, an alternate record area for storing data in substitution for an error data block is provided at an end of each of the tracks of the recording medium, and if an error data block is detected by a read-after-write check of the data during the rotation of the disc after the data has been written in one of the tracks from one of the buffer memories during the previous rotation of the disc, the data from the other buffer memory is written in the adjacent track or the data is read from the adjacent track and checked during a disc rotation waiting time required before the data write operation to the alternate record area is started.