利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

47 条记录 (耗时 0.036 秒)

    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
    1.
    发明申请
    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis 有权
    用于测量衬底特性或制备用于分析的衬底的方法和系统

    公开(公告)号：US20050221229A1

    公开(公告)日：2005-10-06

    申请号：US11086048

    申请日：2005-03-22

    申请人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chuang

    发明人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chuang

    IPC分类号： A61N5/00 ,  G01N1/32 ,  G03C5/00 ,  G03F9/00 ,  G21G5/00 ,  H01J37/30

    CPC分类号： H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

    摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

    摘要翻译： 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
    2.
    发明授权
    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis 失效
    用于测量衬底特性或制备用于分析的衬底的方法和系统

    公开(公告)号：US08765496B2

    公开(公告)日：2014-07-01

    申请号：US12110759

    申请日：2008-04-28

    申请人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chin Chuang

    发明人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chin Chuang

    IPC分类号： H01L21/00

    CPC分类号： H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

    摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

    摘要翻译： 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

    METHODS AND SYSTEMS FOR MEASURING A CHARACTERISTIC OF A SUBSTRATE OR PREPARING A SUBSTRATE FOR ANALYSIS
    3.
    发明申请
    METHODS AND SYSTEMS FOR MEASURING A CHARACTERISTIC OF A SUBSTRATE OR PREPARING A SUBSTRATE FOR ANALYSIS 失效
    用于测量基板特性或制备用于分析的基板的方法和系统

    公开(公告)号：US20080264905A1

    公开(公告)日：2008-10-30

    申请号：US12110759

    申请日：2008-04-28

    申请人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy F. Garcia ,  Tzu Chin Chuang

    发明人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy F. Garcia ,  Tzu Chin Chuang

    IPC分类号： H01L21/306 ,  C23F1/00

    CPC分类号： H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

    摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

    摘要翻译： 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

    In-situ differential spectroscopy
    4.
    发明授权
    In-situ differential spectroscopy 失效
    原位差分光谱

    公开(公告)号：US08283631B2

    公开(公告)日：2012-10-09

    申请号：US12351215

    申请日：2009-01-09

    申请人： Mehdi Vaez-Iravani ,  Mehran Nasser-Ghodsi ,  Guoheng Zhao

    发明人： Mehdi Vaez-Iravani ,  Mehran Nasser-Ghodsi ,  Guoheng Zhao

    IPC分类号： G01N23/00 ,  G21K7/00 ,  H01J40/00

    CPC分类号： H01J37/244 ,  G01N2223/079 ,  G01N2223/086 ,  G01N2223/33 ,  H01J37/256 ,  H01J2237/24495 ,  H01J2237/2511 ,  H01J2237/2807

    摘要： A spectrometer having an electron beam generator for generating an electron beam that is directed at a sample. An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted stream from the sample, where the secondary emitted stream includes at least one of electrons and x-rays. An secondary emitted stream positioner positions the secondary emitted stream onto a detector array, which receives the secondary emitted stream and detects both the amounts and the received positions of the secondary emitted stream. A modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample. An extractor is in signal communication with both the modulator and the detector array, and extracts a differential signal that represents a difference between the signals that are received from the first position and the signals that are received from the second position.

    摘要翻译： 具有用于产生针对样品的电子束的电子束发生器的光谱仪。 电子束定位器将电子束引导到样品的位置，从而产生来自样品的二次发射流，其中二次发射流包括电子和X射线中的至少一个。 二次发射流定位器将二次发射流定位在检测器阵列上，检测器阵列接收二次发射流并检测二次发射流的量和接收位置。 调制器调制被引导到样品上的电子束，从而在样品上的第一位置和第二位置之间扫描电子束。 提取器与调制器和检测器阵列进行信号通信，并且提取表示从第一位置接收的信号与从第二位置接收的信号之间的差的差分信号。

    Methods and systems for creating a recipe for a defect review process
    5.
    发明授权
    Methods and systems for creating a recipe for a defect review process 有权
    用于创建缺陷审查过程的配方的方法和系统

    公开(公告)号：US07440086B2

    公开(公告)日：2008-10-21

    申请号：US11533597

    申请日：2006-09-20

    申请人： S. Mark Borowicz ,  Mehran Nasser-Ghodsi ,  Kenneth J. Krzeckzowski

    发明人： S. Mark Borowicz ,  Mehran Nasser-Ghodsi ,  Kenneth J. Krzeckzowski

    IPC分类号： G01N21/00

    CPC分类号： G05B19/41875 ,  G05B2219/31304 ,  G05B2219/37206 ,  G05B2219/37224 ,  G06Q50/04 ,  G06T7/0004 ,  G06T2207/30148 ,  Y02P90/10 ,  Y02P90/20 ,  Y02P90/22 ,  Y02P90/30

    摘要： Methods and systems for creating a recipe for a defect review process are provided. One method includes determining an identity of a specimen on which the defect review process will be performed. The method also includes identifying inspection results for the specimen based on the identity. In addition, the method includes creating the recipe for the defect review process based on the inspection results. One system includes a sensor configured to generate output responsive to an identity of a specimen on which the defect review process will be performed. The system also includes a processor configured to determine the identity of the specimen using the output, to identify inspection results for the specimen based on the identity, and to create the recipe for the defect review process based on the inspection results.

    摘要翻译： 提供了用于创建缺陷审查过程的配方的方法和系统。 一种方法包括确定将在其上执行缺陷评估处理的样本的身份。 该方法还包括基于身份识别样本的检查结果。 此外，该方法包括基于检查结果创建缺陷评估过程的配方。 一个系统包括被配置为响应于将在其上执行缺陷评估处理的样本的身份产生输出的传感器。 该系统还包括处理器，其被配置为使用输出来确定样本的身份，基于身份识别样本的检查结果，并且基于检查结果创建缺陷评估过程的配方。

    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
    6.
    发明授权
    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis 有权
    用于测量衬底特性或制备用于分析的衬底的方法和系统

    公开(公告)号：US07365321B2

    公开(公告)日：2008-04-29

    申请号：US11086048

    申请日：2005-03-22

    申请人： Mehran Nasser-Ghodsi ,  Mark Borowicz

    发明人： Mehran Nasser-Ghodsi ,  Mark Borowicz

    IPC分类号： H01J37/06

    CPC分类号： H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

    摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

    摘要翻译： 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

    AUGER ELEMENTAL IDENTIFICATION ALGORITHM
    9.
    发明申请
    AUGER ELEMENTAL IDENTIFICATION ALGORITHM 失效
    AUGER元素识别算法

    公开(公告)号：US20130341504A1

    公开(公告)日：2013-12-26

    申请号：US13913240

    申请日：2013-06-07

    申请人： Mark Neill ,  Mehran Nasser-Ghodsi ,  Christopher Sears

    发明人： Mark Neill ,  Mehran Nasser-Ghodsi ,  Christopher Sears

    IPC分类号： H01J49/00 ,  H01J49/44

    CPC分类号： H01J37/26 ,  G01N23/2276 ,  G01N2223/345 ,  G06K9/00563 ,  G06K9/6271 ,  H01J49/0036 ,  H01J49/44

    摘要： System and methods for decomposing an Auger electron spectrum into elemental and chemical components, includes conditioning and input spectrum to generate a normalized input spectrum; determining statistical correlation between the normalized input spectrum and stored elemental spectral signatures; and characterizing elemental or chemical species in the input spectrum from the statistical correlation, wherein said conditioning the input spectrum includes estimating a background signal of non-Auger electrons in the input spectrum and subtracting the estimated background signal from the input spectrum.

    摘要翻译： 将俄歇电子谱分解为元素和化学成分的系统和方法包括调节和输入光谱以产生归一化输入光谱; 确定归一化输入光谱和存储的基本光谱特征之间的统计相关性; 以及从所述统计相关性表征所述输入光谱中的元素或化学物质，其中所述调节所述输入光谱包括估计所述输入光谱中的非俄歇电子的背景信号并从所述输入光谱中减去所估计的背景信号。

    Electron generation and delivery system for contamination sensitive emitters
    10.
    发明授权
    Electron generation and delivery system for contamination sensitive emitters 有权
    用于污染敏感发射器的电子发射和传输系统

    公开(公告)号：US08530867B1

    公开(公告)日：2013-09-10

    申请号：US13457897

    申请日：2012-04-27

    申请人： Mehran Nasser-Ghodsi

    发明人： Mehran Nasser-Ghodsi

    IPC分类号： H01J37/073

    CPC分类号： H01J37/073 ,  H01J37/265 ,  H01J2237/022 ,  H01J2237/06341 ,  H01J2237/0653

    摘要： Contamination may be removed from a field emitter unit during operation of the emitter unit in an environment at a pressure that lies within a range between 10−6 torr and 10−8 torr. At regular predetermined intervals an electron beam from an emitter tip may be deflected away from a path through a beam defining aperture and onto an electron collector. An electron beam current to the electron collector may be determined and the emitter unit may be flash heated if the current to the electron collector is below a threshold. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

    摘要翻译： 在位于10-6托和10-8托之间的压力的环境中，在发射器单元操作期间，可以从场发射器单元去除污染物。 以规则的预定间隔，来自发射极尖端的电子束可以偏离通过光束限定孔径并且到电子收集器的路径。 可以确定到电子收集器的电子束电流，并且如果到电子收集器的电流低于阈值，则发射器单元可以被闪光加热。 要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。