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公开(公告)号:US07699933B2
公开(公告)日:2010-04-20
申请号:US10515609
申请日:2003-05-09
申请人: Michael Lizenberg , Frank Lewis , Hartwig Müller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Lüttringhaus-Henkel , Matthias Bicker , Jürgen Klein
发明人: Michael Lizenberg , Frank Lewis , Hartwig Müller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Lüttringhaus-Henkel , Matthias Bicker , Jürgen Klein
CPC分类号: C23C16/54 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/4221 , B29C2791/001 , B65D23/02 , B65G29/00 , B65G2201/0244 , C23C14/046 , C23C14/505 , C23C16/045 , C23C16/401 , C23C16/458 , C23C16/511 , H01J37/32733
摘要: The invention relates to a method and a device which are used for the plasma treatment of work pieces. Said work piece is inserted into an at least partially evacuatable chamber of a treatment station (3) and the work piece is positioned inside the treatment station of retaining elements. At least one operating agent is at least partially impinged upon by a transporting device (44) which is displaced together with the treatment station on a closed and rotating transport path.
摘要翻译: 本发明涉及一种用于等离子体处理工件的方法和装置。 所述工件被插入到处理站(3)的至少部分可抽空的室中,并且工件位于保持元件的处理站内。 至少一个操作剂至少部分地被传送装置(44)撞击,传送装置(44)与处理站一起在封闭和旋转的传送路径上移动。
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公开(公告)号:US08961688B2
公开(公告)日:2015-02-24
申请号:US10515610
申请日:2003-05-09
申请人: Michael Lizenberg , Frank Lewin , Hartwig Müller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Lüttringhaus-Henkel , Matthias Bicker , Jürgen Klein , Marten Walther
发明人: Michael Lizenberg , Frank Lewin , Hartwig Müller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Lüttringhaus-Henkel , Matthias Bicker , Jürgen Klein , Marten Walther
IPC分类号: C23C16/452 , C23C16/511 , C23C16/52 , C23C16/44 , B08B7/00 , B08B9/42 , B29C49/42 , B65D23/02 , B65G29/00 , C08J9/00 , C23C14/04 , C23C14/50 , C23C14/56 , C23C16/04 , C23C16/40 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/54 , H01J37/32 , B05D1/00 , B29C49/02 , B29K77/00
CPC分类号: C23C16/4409 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/026 , B29C2049/027 , B29C2049/4221 , B29C2791/001 , B29K2077/00 , B29K2995/0067 , B65D23/02 , B65G29/00 , B65G2201/0244 , C08J9/0004 , C08J2300/14 , C23C14/046 , C23C14/505 , C23C14/56 , C23C16/045 , C23C16/401 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , H01J37/32733
摘要: Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (7) of a treatment station (3), which can be at least partly evacuated, and is positioned within the treatment station by means of a holding element. In order to simultaneously supply at least two chambers with at least one operating means, a flow of the operating means is branched at least once so as to form at least two partial flows (55).
摘要翻译: 公开了一种等离子体处理工件(5)的方法和装置。 所述工件被插入处理台(3)的腔室(7)中,其可被至少部分抽真空,并通过保持元件定位在处理站内。 为了同时供给具有至少一个操作装置的至少两个室,操作装置的流动至少分支一次以形成至少两个部分流(55)。
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公开(公告)号:US20060086320A1
公开(公告)日:2006-04-27
申请号:US10515606
申请日:2003-05-09
申请人: Michael Lizenberg , Frank Lewin , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttringhaus-Henkel , Matthias Bicker , Jurgen Klein
发明人: Michael Lizenberg , Frank Lewin , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttringhaus-Henkel , Matthias Bicker , Jurgen Klein
CPC分类号: C23C16/4409 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/4221 , B29C2791/001 , B65D23/02 , B65G29/00 , B65G2201/0244 , C08J9/0004 , C08J2300/14 , C23C14/046 , C23C14/505 , C23C14/56 , C23C16/045 , C23C16/401 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , H01J37/32733
摘要: Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (4) of a treatment station (17), which can be at least partly evacuated, and at least one part (18) of the treatment station is moved relative to another part (27, 35) thereof in order to help manipulate the workpieces. The movement is carried out in such a way that a shell-shaped chamber wall (18) is positioned relative to a floor (35) of the chamber and relative to a chamber lid (27).
摘要翻译: 公开了一种等离子体处理工件(5)的方法和装置。 所述工件插入处理台(17)的腔室(4)中,所述腔室可以被至少部分抽真空,并且处理站的至少一个部分(18)相对于其另一部分(27,35)移动 以帮助操纵工件。 该运动以这样的方式进行,使得壳形室壁(18)相对于室的底板(35)相对于室盖(27)定位。
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公开(公告)号:US20050233077A1
公开(公告)日:2005-10-20
申请号:US10515610
申请日:2003-05-09
申请人: Michael Lizenberg , Frank Lewi , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttinghaus-Henkel , Matthias Bicker , Jurgen Klein , Marten Walther
发明人: Michael Lizenberg , Frank Lewi , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttinghaus-Henkel , Matthias Bicker , Jurgen Klein , Marten Walther
IPC分类号: H05H1/46 , B05D7/24 , B08B7/00 , B08B9/42 , B29C49/42 , B65D1/00 , B65D23/02 , B65G29/00 , C03C17/00 , C08J9/00 , C23C14/04 , C23C14/50 , C23C14/56 , C23C16/04 , C23C16/40 , C23C16/44 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , C23C16/00
CPC分类号: C23C16/4409 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/026 , B29C2049/027 , B29C2049/4221 , B29C2791/001 , B29K2077/00 , B29K2995/0067 , B65D23/02 , B65G29/00 , B65G2201/0244 , C08J9/0004 , C08J2300/14 , C23C14/046 , C23C14/505 , C23C14/56 , C23C16/045 , C23C16/401 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , H01J37/32733
摘要: Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (7) of a treatment station (3), which can be at least partly evacuated, and is positioned within the treatment station by means of a holding element. In order to simultaneously supply at least two chambers with at least one operating means, a flow of the operating means is branched at least once so as to form at least two partial flows (55).
摘要翻译: 公开了一种等离子体处理工件(5)的方法和装置。 所述工件被插入处理台(3)的腔室(7)中,其可被至少部分抽真空,并通过保持元件定位在处理站内。 为了同时供给具有至少一个操作装置的至少两个室,操作装置的流动至少分支一次以形成至少两个部分流(55)。
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公开(公告)号:US20050227002A1
公开(公告)日:2005-10-13
申请号:US10515609
申请日:2003-05-09
申请人: Michael Lizenberg , Frank Lewi , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttringhaus-Henkel , Matthias Bicker , Jurgen Klein
发明人: Michael Lizenberg , Frank Lewi , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttringhaus-Henkel , Matthias Bicker , Jurgen Klein
IPC分类号: A61L2/14 , B01J19/08 , B05D7/24 , B08B7/00 , B08B9/42 , B29C49/42 , B65D23/02 , B65G29/00 , C03C17/00 , C23C14/04 , C23C14/50 , C23C16/04 , C23C16/40 , C23C16/44 , C23C16/458 , C23C16/511 , C23C16/54 , C23C16/00 , B05D7/22
CPC分类号: C23C16/54 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/4221 , B29C2791/001 , B65D23/02 , B65G29/00 , B65G2201/0244 , C23C14/046 , C23C14/505 , C23C16/045 , C23C16/401 , C23C16/458 , C23C16/511 , H01J37/32733
摘要: The invention relates to a method and a device which are used for the plasma treatment of work pieces. Said work piece is inserted into an at least partially evacuatable chamber of a treatment station (3) and the work piece is positioned inside the treatment station of retaining elements. At least one operating agent is at least partially impinged upon by a transporting device (44) which is displaced together with the treatment station on a closed arid rotating transport path.
摘要翻译: 本发明涉及一种用于等离子体处理工件的方法和装置。 所述工件被插入到处理站(3)的至少部分可抽空的室中,并且工件位于保持元件的处理站内。 至少一个操作剂至少部分地被传送装置(44)撞击,传送装置(44)与处理站一起在封闭的和转动的传送路径上移动。
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公开(公告)号:US06958097B2
公开(公告)日:2005-10-25
申请号:US10439090
申请日:2003-05-14
IPC分类号: B65D1/00 , B65B7/28 , B65D23/02 , B65D23/08 , C23C16/04 , C23C16/44 , C23C16/458 , C23C16/50 , C23C16/00
CPC分类号: C23C16/458 , B65B7/2835 , C23C16/045
摘要: A device for holding and vacuum-sealing a container as used in particular in the internal and/or external coating of containers. The device holds and vacuum-seals at least one container and has a sealing device for sealing the pouring opening in a defined end state also to comprise a holder with an introduction region, into which the wall region, which adjoins the pouring opening, together with the pouring opening, can be at least partially introduced, and a cage, which interacts with the holder and holds at least one clamping element in such a manner that, when force is applied to the cage in the direction in which the container is introduced into the defined end state, the clamping element can be guided out of a position in which it substantially releases the introduction region into a position in which it projects into the introduction region.
摘要翻译: 用于容纳和真空密封容器的装置,特别是在容器的内部和/或外部涂层中使用的装置。 该装置保持并真空密封至少一个容器,并且具有用于在限定的端部状态下密封倾倒开口的密封装置,还包括具有引入区域的保持器,邻近倾倒开口的壁区域与 可以至少部分地引入倾倒开口,以及保持架,其与保持器相互作用并保持至少一个夹紧元件,使得当沿着容器被引入的方向上施加到保持架上时 在限定的端部状态下,夹紧元件可以被引导到基本上将引入区域释放到其伸入引入区域的位置。
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公开(公告)号:US07399500B2
公开(公告)日:2008-07-15
申请号:US10637779
申请日:2003-08-07
IPC分类号: C23C16/511 , H05H1/24
CPC分类号: B05D7/50 , B05D1/60 , B05D1/62 , B05D7/02 , C23C16/0272 , C23C16/045 , C23C16/30 , C23C16/401 , C23C16/515 , Y10T428/31504 , Y10T428/31681
摘要: A process for applying alternating layers by chemical vapor deposition comprises the process steps of depositing an adhesion-promoter layer on a substrate and applying a barrier layer. Alternating layers comprising organic and inorganic materials are deposited alternately, and in this process the coating time for application of the adhesion-promoter layer is between 0.05 s and 4.0 s and the coating time for application of the inorganic barrier layer is between 0.1 s and 6.0 s. A composite material is also produced using the process.
摘要翻译: 通过化学气相沉积施加交替层的方法包括在衬底上沉积粘合促进剂层并施加阻挡层的工艺步骤。 包含有机和无机材料的交替层交替沉积,并且在该过程中,涂覆粘合促进剂层的涂布时间为0.05s至4.0s,并且施加无机阻挡层的涂布时间为0.1s至6.0 s。 还使用该方法生产复合材料。
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公开(公告)号:US07810448B2
公开(公告)日:2010-10-12
申请号:US10515514
申请日:2003-05-26
IPC分类号: C23C16/00 , C23F1/00 , H01L21/306
CPC分类号: C23C16/54 , B05D1/62 , B08B7/00 , B29C49/421 , B29C2049/4221 , B29C2791/001 , B65D23/02 , B65G2201/0244 , C08J9/0004 , C08J2300/14 , C23C16/029 , C23C16/045 , C23C16/402 , H01J37/32733
摘要: The invention relates to an apparatus and a method for the coating of hollow bodies, in particular for the internal coating of plastic drinks bottles by means of a PICVD. It is an object of the invention to ensure a flexible process sequence, a high throughput, an improved supply of fluid and a high-quality coating. The invention in particular proposes a rotary apparatus which comprises a treatment device with double reactors for receiving in each case at least one workpiece, a fluid supply apparatus and at least one fluid control device, which can be used to control the supply of fluid to the treatment device. It is preferable for the vacuum pumps to be arranged on the rotor such that they rotate therewith.
摘要翻译: 本发明涉及一种用于涂覆中空体的装置和方法,特别是通过PICVD对塑料饮料瓶的内部涂覆。 本发明的目的是确保灵活的工艺顺序,高产量,改进的流体供应和高质量涂层。 本发明特别提出了一种旋转装置,其包括具有双反应器的处理装置,每个反应器用于在每种情况下接收至少一个工件,流体供应装置和至少一个流体控制装置,其可用于控制向 治疗装置。 优选地,真空泵布置在转子上,使得它们与其一起旋转。
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公开(公告)号:US07074275B2
公开(公告)日:2006-07-11
申请号:US10892530
申请日:2004-07-15
IPC分类号: B05B13/06
CPC分类号: F16L39/04 , C23C16/045 , C23C16/54
摘要: The invention relates to an apparatus for coating hollow bodies, e.g. plastic drinks bottles. It is an object of the invention to provide an apparatus for treating workpieces which operates reliably and with low maintenance, can be flexibly adapted to the user's requirements or to the requirements of the desired process sequence, and which allows efficient evacuation. The apparatus according to the invention comprises at least one treatment device (101) for receiving at least one workpiece, a rotor on which the treatment device is arranged, a fluid rotary leadthrough for feeding at least one fluid onto the rotor and/or for discharging at least one fluid from the rotor, the fluid rotary leadthrough having a journal and a sleeve, which at least in sections are sealed off from one another, and the journal being arranged rotatably in the sleeve. The proposed radial arrangement is particularly unsusceptible to faults and entails little maintenance.
摘要翻译: 本发明涉及一种用于涂覆中空体的设备,例如, 塑料饮料瓶。 本发明的一个目的是提供一种用于处理可靠且维护性低的工件的装置,可以灵活地适应用户的要求或符合所需工艺顺序的要求,并且允许有效的撤离。 根据本发明的装置包括至少一个用于接收至少一个工件的处理装置(101),设置有处理装置的转子,用于将至少一种流体供给到转子和/或用于排出的流体旋转引导件 至少一个来自所述转子的流体,所述流体旋转引导件具有轴颈和套筒,所述轴颈至少部分彼此密封,并且所述轴颈可旋转地布置在所述套筒中。 所提出的径向布置对于故障特别不能察觉,并且不需要维护。
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公开(公告)号:US20060099340A1
公开(公告)日:2006-05-11
申请号:US10515514
申请日:2003-05-26
CPC分类号: C23C16/54 , B05D1/62 , B08B7/00 , B29C49/421 , B29C2049/4221 , B29C2791/001 , B65D23/02 , B65G2201/0244 , C08J9/0004 , C08J2300/14 , C23C16/029 , C23C16/045 , C23C16/402 , H01J37/32733
摘要: An apparatus and a method for the coating of hollow bodies, in particular for the internal coating of plastic drinks bottles by means of a PICVD is provided. The method ensures a flexible process sequence, a high throughput, an improved supply of fluid and a high-quality coating. The rotary apparatus includes a treatment device with double reactors for receiving in each case at least one workpiece, a fluid supply apparatus and at least one fluid control device, which can be used to control the supply of fluid to the treatment device. It is preferable for the vacuum pumps to be arranged on the rotor such that they rotate therewith.
摘要翻译: 提供一种用于涂覆中空体的装置和方法,特别是通过PICVD对塑料饮料瓶的内部涂覆。 该方法确保了灵活的工艺顺序,高产量,改善的流体供应和高质量的涂层。 旋转装置包括具有双反应器的处理装置,每个反应器用于在每种情况下接收至少一个工件,流体供应装置和至少一个流体控制装置,其可用于控制向处理装置供应流体。 优选地,真空泵布置在转子上,使得它们与其一起旋转。
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