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公开(公告)号：US20060269951A1
公开(公告)日：2006-11-30
申请号：US11439812
申请日：2006-05-24
申请人： Michiko Taga , Bonnie Bassler , Douglas McKenzie
发明人： Michiko Taga , Bonnie Bassler , Douglas McKenzie
CPC分类号： C07K14/255 , C07K14/28 , G01N33/56911 , Y02A50/52
摘要： The present invention relates to the discovery of the lsr operon, the genes therein, and the polypeptides encoded by these genes. The present invention also includes strains with altered expression levels of the polypeptides encoded by the genes and the lsr operon relative to wild type cells. In some embodiments, the strains express a transporter that transports an autoinducer into the cell at a level higher than that of wild type cells. The present invention also includes methods for identifying compounds that modulate the transport of the autoinducer into cells.
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公开(公告)号：US20110151376A1
公开(公告)日：2011-06-23
申请号：US12646191
申请日：2009-12-23
申请人： M. Dalil Rahman , Douglas McKenzie , Huirong Yao , JoonYeon Cho , Yi Yi , Guanyang Lin
发明人： M. Dalil Rahman , Douglas McKenzie , Huirong Yao , JoonYeon Cho , Yi Yi , Guanyang Lin
CPC分类号： C09D165/00 , C08G2261/141 , C08G2261/1422 , C08G2261/3424 , C08G2261/42 , C08G2261/50 , C08G2261/76 , C08L65/00 , G03F7/091 , H01L21/0276 , H01L21/3081
摘要： The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): A-Bn (1) where A is a fused aromatic ring and B has a structure (2), where R1 is C1-C4alkyl and R2 is C1-C4alkylThe invention further relates to a process for forming an image using the composition.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含能够由交联剂交联的交联剂和可交联聚合物，其中可交联聚合物包含由结构（1）表示的单元：其中A是稠合芳族化合物 环和B具有结构（2），其中R 1是C 1 -C 4烷基，R 2是C 1 -C 4烷基。本发明还涉及使用该组合物形成图像的方法。
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公开(公告)号：US20090280435A1
公开(公告)日：2009-11-12
申请号：US12115776
申请日：2008-05-06
CPC分类号： G03F7/091
摘要： The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R1 to R9 is independently selected from H and C1-C6 alkyl, R′ and R″ is independently selected from H and C1-C6 alkyl, X is C1-C6 alkylene, Y is C1-C6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.
摘要翻译： 本发明涉及包含聚合物，交联剂和热酸发生剂的抗反射涂料组合物，其中聚合物包含至少一个结构单元（1），至少一个结构单元（2）和至少一个结构结构 （3），其中R 1至R 9独立地选自H和C 1 -C 6烷基，R'和R“独立地选自H和C 1 -C 6烷基，X是C 1 -C 6亚烷基，Y是C 1 -C 6亚烷基。 本发明还涉及一种用于对涂覆在抗反射涂层组合物上的光致抗蚀剂进行成像的方法。
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公开(公告)号：US06911293B2
公开(公告)日：2005-06-28
申请号：US10120952
申请日：2002-04-11
CPC分类号： G03F7/0048 , G03F7/0233 , G03F7/0236 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.
摘要翻译： 公开了一种光致抗蚀剂组合物，其包含：a）至少一种选自酚醛清漆树脂和聚羟基苯乙烯的成膜树脂; b）至少一种光敏化合物或光酸产生剂; 和c）包含至少一种选自缩醛和缩酮的溶剂的溶剂组合物。 还公开了一种光致抗蚀剂组合物，其包含聚碳酸酯树脂和包含至少一种选自缩醛和缩酮的溶剂的溶剂组合物。 还公开了一种用于对光致抗蚀剂组合物进行成像的方法，包括以下步骤：a）用任何上述光致抗蚀剂组合物涂覆合适的基材; b）烘烤基材以基本上除去溶剂; c）成像照射光刻胶膜; 以及d）用合适的显影剂除去成像曝光或替代地涂覆的基底的未曝光区域。
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5.发明授权Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride 失效使用苯并内酯环化合物和重氮磺酰氯的重氮酯制造正性光致抗蚀剂图像的方法
公开(公告)号：US5348842A
公开(公告)日：1994-09-20
申请号：US42362
申请日：1993-04-02
CPC分类号： G03F7/022 , Y10S430/168
摘要： A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on benzolactone ring has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.
摘要翻译： 一种光敏剂，其包含苯并内酯环化合物的重氮酯，例如酚酞或甲酚酞作为主链，其中至少一个苯甲酸内酯环上的羟基已经被重氮化磺酰氯酯化，重氮磺酰氯由60至100摩尔％ 4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。
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公开(公告)号：US20100151392A1
公开(公告)日：2010-06-17
申请号：US12332501
申请日：2008-12-11
申请人： M. Dalil Rahman , Yi Yi , Douglas McKenzie , Clement Anyadiegwu , Ping-Hung Lu
发明人： M. Dalil Rahman , Yi Yi , Douglas McKenzie , Clement Anyadiegwu , Ping-Hung Lu
CPC分类号： G03F7/091 , C08G61/02 , C08G2261/342 , C08L83/04 , C09D165/00
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer, a linking component, a crosslinker, and an acid generator. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及包含聚合物，连接组分，交联剂和酸产生剂的有机旋涂可涂抗反射涂料组合物。 本发明还涉及用于对本发明组合物进行成像的方法。
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公开(公告)号：US20090246691A1
公开(公告)日：2009-10-01
申请号：US12060307
申请日：2008-04-01
申请人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
发明人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
CPC分类号： G03F7/091
摘要： The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2. where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure. 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.
摘要翻译： 本发明涉及一种抗反射组合物，其包含热酸产生剂和环氧聚合物，其包含至少一个结构单元1，至少一个结构单元，其中R1至R12独立地选自氢和C1-C4烷基， 结构体。 1具有选自顺式，反式或其混合物的构型，x和y是聚合物中单体单元的摩尔％。 本发明还涉及一种用于制造微电子器件的方法。
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8.发明授权公开(公告)号：US06610465B2
公开(公告)日：2003-08-26
申请号：US09833226
申请日：2001-04-11
IPC分类号： G03F732
CPC分类号： B01J20/28033 , B01J20/28004 , B01J20/28028 , B01J20/2803 , B01J20/28085 , B01J47/018 , B01J47/133 , C08F6/02 , C08F6/16 , G03F7/0395
摘要： The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).
摘要翻译： 本发明提供一种适用于光致抗蚀剂组合物的成膜树脂的制造方法，包括以下步骤：（a）在成膜剂中提供成膜树脂的溶液; （b）提供以下两个过滤片：（i）含有固定有微粒过滤助剂和粒状离子交换树脂颗粒的自支撑纤维基质的过滤片，其中颗粒助滤剂和离子交换树脂颗粒基本上分布 均匀地遍布所述基质的横截面; 和（ii）含有固定有颗粒助滤剂和粘合剂树脂的纤维自支撑基质的过滤片; （c）用步骤（a）的溶剂冲洗步骤（b）的过滤片; 和（d）使成膜树脂的溶液通过步骤（c）的冲洗过的滤纸。
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9.发明授权Stable metal compounds as hardmasks and filling materials, their compositions and methods of use 有权稳定的金属化合物作为硬掩模和填充材料，其组成和使用方法公开(公告)号：US09296922B2
公开(公告)日：2016-03-29
申请号：US14015222
申请日：2013-08-30
申请人： Huirong Yao , Salem K. Mullen , Elizabeth Wolfer , Douglas McKenzie , JoonYeon Cho , Munirathna Padmanaban
发明人： Huirong Yao , Salem K. Mullen , Elizabeth Wolfer , Douglas McKenzie , JoonYeon Cho , Munirathna Padmanaban
IPC分类号： C07F7/08 , G03F7/075 , C09D185/00 , H01L21/033 , C08G77/58 , G03F7/09
CPC分类号： C09D185/00 , C07F7/08 , C08G77/58 , G03F7/0752 , G03F7/091 , G03F7/094 , H01L21/0332 , H01L21/0337 , H01L21/0338
摘要： The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to compounds having the following structure (I) wherein M is a metal and n is 1 to 20, and wherein at least one of R1, R2, R3, and R4 is i) and at least at least one of R1, R2, R3, and R4 is ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable compositions of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate.
摘要翻译： 本发明涉及新颖的可溶性多配体取代的金属氧化物化合物，以形成具有改进的稳定性的金属氧化物膜以及由它们制备的组合物及其使用方法。 具体地说，本发明涉及具有以下结构（I）的化合物，其中M是金属，n是1至20，并且其中R 1，R 2，R 3和R 4中的至少一个是i）和至少一个 R1，R2，R3和R4是ii），其中i）是具有至少2个碳的含硅有机部分，和ii）是有机部分。 本发明还涉及溶解在溶剂中的结构（I）化合物的可旋涂组合物。 本发明还涉及使用该可旋涂组合物在图案化基材上形成涂层的方法。
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10.发明授权Spin-on compositions of soluble metal oxide carboxylates and methods of their use 有权可溶性金属氧化物羧酸盐的旋转组合物及其使用方法公开(公告)号：US09201305B2
公开(公告)日：2015-12-01
申请号：US13930711
申请日：2013-06-28
申请人： M. Dalil Rahman , Venkata Gopal Reddy Chada , Huirong Yao , Clement Anyadiegwu , Douglas McKenzie
发明人： M. Dalil Rahman , Venkata Gopal Reddy Chada , Huirong Yao , Clement Anyadiegwu , Douglas McKenzie
IPC分类号： H01L21/033 , G03F7/09 , H01L21/027 , C23C18/06 , C23C18/12 , C23C18/14
CPC分类号： G03F7/092 , C23C18/06 , C23C18/1216 , C23C18/14 , G03F7/09 , G03F7/091 , H01L21/0276
摘要： The present disclosure relates to spin-on compositions containing at least one metal oxide dicarboxylate and an organic solvent into which the metal oxide dicarboxylate is soluble or colloidally stable. The dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film. The present disclosure also relates to method of using the spin-on compositions.
摘要翻译： 本公开内容涉及含有至少一种金属氧化物二羧酸盐和有机溶剂的旋涂组合物，其中金属氧化物二羧酸盐可溶于或胶体稳定。 二羧酸盐能够在热处理期间分解，得到固化的金属氧化物膜。 本公开还涉及使用旋涂组合物的方法。
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