Substrate and mask aligning apparatus
    5.
    发明授权
    Substrate and mask aligning apparatus 有权
    基板和掩模对准装置

    公开(公告)号:US07788061B2

    公开(公告)日:2010-08-31

    申请号:US12178767

    申请日:2008-07-24

    IPC分类号: G01C17/00

    摘要: A substrate and mask aligning apparatus includes a controlling portion 70 for calculating moving data that are applied to eliminate a difference between a present superposed state of the through holes 52 of the mask 50, which comes into contact with the substrate 20 that is loaded on the stage 30, on the pads 22 of the substrate 20 and a scheduled superposed state on the basis of image data from the shooting section 40, 42 and then executing repeatedly an operation to move the stage 30 on the basis of the calculated moving data of the stage.

    摘要翻译: 基板和掩模对准装置包括控制部分70,用于计算移动数据,该移动数据被应用以消除掩模50的通孔52的当前重叠状态之间的差异。 基于来自拍摄部40,42的图像数据,在基板20的焊盘22上设置阶段30,并且基于计划的重叠状态,然后基于计算出的移动数据重复执行使台30移动的操作 阶段。

    Board for mounting semiconductor chip
    8.
    发明授权
    Board for mounting semiconductor chip 失效
    板用于安装半导体芯片

    公开(公告)号:US5744224A

    公开(公告)日:1998-04-28

    申请号:US550995

    申请日:1995-10-31

    摘要: A semiconductor chip mounting board includes a base material made of resin; a metallized pattern formed on a surface of the base material which defines a die-pad area on which a semiconductor chip is to be mounted; and the metallized pattern comprising a plurality of zigzag shaped pattern lines along imaginary straight line segments radially, outwardly extending from a central position of the die-pad area. The metallized pattern may be a plurality of zigzag shaped pattern portions along imaginary concentric circles having a center at a central position of the die-pad area. Otherwise, the metallized pattern may be a plurality of closed loop shaped frames which are overlapped on each other in a zigzag manner.

    摘要翻译: 半导体芯片安装板包括由树脂制成的基材; 形成在所述基材的表面上的金属化图案,所述表面限定将要安装半导体芯片的芯片焊盘区域; 并且所述金属化图案包括沿着沿着所述芯片区域的中心位置向外延伸的沿着假想直线段的多个锯齿形图案线。 金属化图案可以是沿着具有在芯片区域的中心位置处的中心的沿着虚拟同心圆的多个锯齿形图案部分。 否则,金属化图案可以是以Z字形方式彼此重叠的多个闭环形框架。

    SUBSTRATE AND MASK ALIGNING APPARATUS
    10.
    发明申请
    SUBSTRATE AND MASK ALIGNING APPARATUS 有权
    基板和掩码设备

    公开(公告)号:US20090030640A1

    公开(公告)日:2009-01-29

    申请号:US12178767

    申请日:2008-07-24

    IPC分类号: G01P21/00

    摘要: A substrate and mask aligning apparatus includes a controlling portion 70 for calculating moving data that are applied to eliminate a difference between a present superposed state of the through holes 52 of the mask 50, which comes into contact with the substrate 20 that is loaded on the stage 30, on the pads 22 of the substrate 20 and a scheduled superposed state on the basis of image data from the shooting section 40, 42 and then executing repeatedly an operation to move the stage 30 on the basis of the calculated moving data of the stage.

    摘要翻译: 基板和掩模对准装置包括控制部分70,用于计算移动数据,该移动数据被应用以消除掩模50的通孔52的当前重叠状态之间的差异。 基于来自拍摄部40,42的图像数据,在基板20的焊盘22上设置阶段30,并且基于计划的重叠状态,然后基于计算出的移动数据重复执行使台30移动的操作 阶段。