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公开(公告)号：US08115137B2
公开(公告)日：2012-02-14
申请号：US12997543
申请日：2008-06-12
申请人： Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Miyuki Masaki , Masaru Morita , Atsushi Yoshinouchi
发明人： Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Miyuki Masaki , Masaru Morita , Atsushi Yoshinouchi
CPC分类号： B23K26/0732 , B23K26/046 , B23K26/0665 , G02B27/0905 , G02B27/0966 , G02B27/48 , H01L21/02678
摘要： In laser annealing using a solid state laser, a focus position of a minor axial direction of a rectangular beam is easily corrected depending on positional variation of a laser irradiated portion of a semiconductor film. By using a minor-axis condenser lens 29 condensing incident light in a minor axial direction and a projection lens 30 projecting light, which comes from the minor-axis condenser lens 29, onto a surface of a semiconductor film 3, laser beam 1 is condensed on the surface of the semiconductor film 3 in the minor axial direction of a rectangular beam. The positional variation of a vertical direction of the semiconductor film 3 in a laser irradiated portion of the semiconductor film 3 is detected by a positional variation detector 31, and the minor-axis condenser lens 29 is moved in an optical axis direction based on a value of the detection.
摘要翻译： 在使用固态激光的激光退火中，根据半导体膜的激光照射部的位置变化容易校正矩形光束的小轴方向的聚焦位置。 通过使用将小轴聚光的次轴聚光透镜29和将来自短轴聚光透镜29的光投射到半导体膜3的表面上的投影透镜30，激光束1被冷凝 在半导体膜3的矩形梁的小轴向的表面上。 半导体膜3的激光照射部分中的半导体膜3的垂直方向的位置变化由位置变化检测器31检测，并且短轴聚光透镜29基于光轴方向在光轴方向上移动 的检测。
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公开(公告)号：US08575515B2
公开(公告)日：2013-11-05
申请号：US13002010
申请日：2009-06-17
申请人： Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Jun Izawa , Miyuki Masaki , Masaru Morita
发明人： Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Jun Izawa , Miyuki Masaki , Masaru Morita
IPC分类号： B23K26/00 , B23K26/02 , H01L21/268
CPC分类号： H01L21/268 , B23K26/0853 , B23K26/127 , B23K26/128 , B23K26/147 , B23K26/702 , B23K2103/56 , H01L21/02532 , H01L21/02675 , H01L21/67115
摘要： A laser annealing apparatus is provided that is capable of reducing irradiation unevenness of laser light caused by a refraction phenomenon of the laser light due to fluctuation in the temperature of inert gas. The laser annealing apparatus includes a gas supply unit for supplying inert gas G to at least a laser irradiation area of a workpiece, and a gas temperature controller for regulating the temperature of the inert gas G. The gas temperature controller controls the temperature of the inert gas G supplied to the laser irradiation area so as to decrease a temperature difference between the temperature of the inert gas G and the atmospheric temperature of a space (a room R) that is disposed outside the supply area of the inert gas so the temperature controlled inert gas surrounds the optical path of the laser light.
摘要翻译： 提供一种激光退火装置，其能够减少由于惰性气体的温度波动引起的激光的折射现象引起的激光的照射不均匀性。 激光退火装置包括用于向工件的至少激光照射区域供给惰性气体G的气体供给单元和用于调节惰性气体G的温度的气体温度控制器。气体温度控制器控制惰性气体的温度 气体G供应到激光照射区域，以便降低惰性气体G的温度与设置在惰性气体的供给区域之外的空间（室R）的气氛温度之间的温度差，从而控制温度 惰性气体围绕激光的光路。
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公开(公告)号：US08170072B2
公开(公告)日：2012-05-01
申请号：US12811818
申请日：2008-05-30
IPC分类号： H01S3/10
CPC分类号： B23K26/0608 , B23K26/0676 , B23K26/0738 , B23K26/082 , H01L21/02532 , H01L21/02678 , H01L21/02686 , H01L21/02691 , H01L21/268
摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.
摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。
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公开(公告)号：US20110108535A1
公开(公告)日：2011-05-12
申请号：US13002010
申请日：2009-06-17
申请人： Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Jun Izawa , Miyuki Masaki , Masaru Morita
发明人： Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Jun Izawa , Miyuki Masaki , Masaru Morita
IPC分类号： B23K26/00
CPC分类号： H01L21/268 , B23K26/0853 , B23K26/127 , B23K26/128 , B23K26/147 , B23K26/702 , B23K2103/56 , H01L21/02532 , H01L21/02675 , H01L21/67115
摘要： Provided is a laser annealing apparatus capable of reducing irradiation unevenness of laser light caused by a refraction phenomenon of laser light due to fluctuation in the temperature of inert gas.A laser annealing apparatus 1 includes a gas supply unit 10 for supplying inert gas G to at least a laser irradiation area of a workpiece 7 to be processed, and a gas temperature controller 15 for regulating the temperature of the inert gas G. The gas temperature controller 15 controls the temperature of the inert gas G supplied to the laser irradiation area so as to decrease the temperature difference between the temperature of the inert gas G and the atmospheric temperature of a space (a room R) that is disposed outside the supply area of the inert gas so as to surround the optical path of the laser light.
摘要翻译： 提供一种激光退火装置，其能够减少由于惰性气体的温度波动引起的激光折射现象引起的激光的照射不均匀性。 激光退火装置1包括用于将惰性气体G供给到待加工的工件7的至少激光照射区域的气体供给单元10和用于调节惰性气体G的温度的气体温度控制器15.气体温度 控制器15控制提供给激光照射区域的惰性气体G的温度，从而降低惰性气体G的温度与设置在供给区域外的空间（室R）的大气温度之间的温差 的惰性气体，以包围激光的光路。
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公开(公告)号：US20110008973A1
公开(公告)日：2011-01-13
申请号：US12811818
申请日：2008-05-30
IPC分类号： H01L21/268 , B23K26/06 , B23K26/067 , B23K26/00
CPC分类号： B23K26/0608 , B23K26/0676 , B23K26/0738 , B23K26/082 , H01L21/02532 , H01L21/02678 , H01L21/02686 , H01L21/02691 , H01L21/268
摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.
摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。
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公开(公告)号：US08598050B2
公开(公告)日：2013-12-03
申请号：US13001311
申请日：2009-06-19
IPC分类号： H01L21/00
CPC分类号： H01L21/02678 , B23K26/066 , B23K26/0738 , C30B1/023 , C30B29/06
摘要： Disclosed are a laser annealing method and apparatus capable of forming a crystalline semiconductor thin film on the entire surface of a substrate without sacrificing the uniformity of crystallinity in a seam portion in a long-axis direction of laser light, the crystalline semiconductor thin film having good properties and high uniformity to an extent that the seam portion is not visually recognizable. During the irradiation of a linear beam, portions corresponding to the edges of the linear beam are shielded by a mask 10 which is disposed on the optical path of a laser light 2, and the mask 10 is operated so that the amount of shielding is periodically increased and decreased.
摘要翻译： 公开了一种激光退火方法和装置，其能够在不牺牲激光长轴方向的接缝部分中的结晶度的均匀性的基板的整个表面上形成结晶半导体薄膜，该结晶半导体薄膜具有良好的 性能和高均匀性，使得接缝部分不能在视觉上识别。 在直线光束的照射期间，对应于直线光束的边缘的部分被设置在激光2的光路上的掩模10屏蔽，并且掩模10被操作以使屏蔽量周期性地 增加和减少。
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公开(公告)号：US08446924B2
公开(公告)日：2013-05-21
申请号：US13418653
申请日：2012-03-13
IPC分类号： H01S3/10
CPC分类号： B23K26/0608 , B23K26/0676 , B23K26/0738 , B23K26/082 , H01L21/02532 , H01L21/02678 , H01L21/02686 , H01L21/02691 , H01L21/268
摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.
摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。
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公开(公告)号：US20110097907A1
公开(公告)日：2011-04-28
申请号：US13001311
申请日：2009-06-19
IPC分类号： H01L21/268 , B23K26/06
CPC分类号： H01L21/02678 , B23K26/066 , B23K26/0738 , C30B1/023 , C30B29/06
摘要： Disclosed are a laser annealing method and apparatus capable of forming a crystalline semiconductor thin film on the entire surface of a substrate without sacrificing the uniformity of crystallinity in a seam portion in a long-axis direction of laser light, the crystalline semiconductor thin film having good properties and high uniformity to an extent that the seam portion is not visually recognizable.During the irradiation of a linear beam, portions corresponding to the edges of the linear beam are shielded by a mask 10 which is disposed on the optical path of a laser light 2, and the mask 10 is operated so that the amount of shielding is periodically increased and decreased.
摘要翻译： 公开了一种激光退火方法和装置，其能够在不牺牲激光长轴方向的接缝部分中的结晶度的均匀性的基板的整个表面上形成结晶半导体薄膜，该结晶半导体薄膜具有良好的 性能和高均匀性，使得接缝部分不能在视觉上识别。 在直线光束的照射期间，对应于直线光束的边缘的部分被设置在激光2的光路上的掩模10屏蔽，并且掩模10被操作以使屏蔽量周期性地 增加和减少。
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公开(公告)号：US09318425B2
公开(公告)日：2016-04-19
申请号：US13212467
申请日：2011-08-18
IPC分类号： H05K1/00 , H01L23/498 , H01L23/13 , H05K3/34 , H01L23/00
CPC分类号： H05K1/0296 , H01L23/13 , H01L23/49811 , H01L23/49822 , H01L23/49827 , H01L23/49833 , H01L23/4985 , H01L24/16 , H01L24/81 , H01L2224/0401 , H01L2224/05647 , H01L2224/1379 , H01L2224/13839 , H01L2224/13847 , H01L2224/16225 , H01L2224/16235 , H01L2224/81193 , H01L2224/81801 , H01L2924/01004 , H01L2924/01078 , H01L2924/01079 , H01L2924/12042 , H01L2924/15311 , H05K1/181 , H05K3/3436 , H05K2201/10287 , H05K2201/10378 , H05K2201/10424 , H05K2201/10719 , Y02P70/613 , H01L2924/00
摘要： A semiconductor device includes: a wiring board including a first electrode pad on a surface thereof; a circuit board disposed to stand on the wiring board, and including an interconnection connected to the first electrode pad; and a semiconductor package disposed to face the wiring board with the circuit board interposed therebetween, and including a second electrode pad on a surface thereof, the second electrode pad being connected to the interconnection.
摘要翻译： 半导体器件包括：布线板，其表面上包括第一电极焊盘; 电路板，被布置成站立在所述布线板上，并且包括连接到所述第一电极焊盘的互连; 以及半导体封装，其设置成与所述布线板面对所述电路板，并且在其表面上包括第二电极焊盘，所述第二电极焊盘连接到所述互连。
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公开(公告)号：US08118591B2
公开(公告)日：2012-02-21
申请号：US12280811
申请日：2007-03-15
IPC分类号： F27D5/00
CPC分类号： H01L21/324 , H01L21/67103
摘要： A heat shield plate for a substrate annealing apparatus is provided with a horizontally supported flat-plate-like substrate 1, a heater 5 positioned above the substrate to heat the upper surface of the substrate with radiation heat, and a heat shield plate 10 horizontally movable between a shielding position where the substrate is shielded from heater and an open position out of the shielding position. The heat shield plate 10 is composed of a structural member 12 made of a low thermal expansion material (carbon composite material) which is hardly deformed due to a temperature difference in the shielding position, and a heat insulating member 14 which covers the upper surface of the structural member and keeps the surface at an allowable temperature or below.
摘要翻译： 用于基板退火装置的隔热板设置有水平支撑的平板状基板1，位于基板上方的加热器5，以用辐射热加热基板的上表面，并且隔热板10水平移动 在基板被屏蔽的屏蔽位置和屏蔽位置之间的打开位置之间。 隔热板10由由遮蔽位置的温度差异而几何变形的低热膨胀性材料（碳复合材料）构成的结构体12，覆盖上述表面的绝热构件14 结构件并将表面保持在允许的温度或更低的温度。
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