摘要:
An ultrasonic sensor which has a thin planar sheet of material forming a Lamb wave propagation medium, the sheet having a thickness which is no greater than about twenty microns. The sensor also includes a Lamb wave generator for generating Lamb waves in the propagation medium and an output device for producing an electrical signal representative of the propagation characteristics of the Lamb waves propagating along the propagation medium. A measuring device is included in the sensor to measure selected characteristics of the output electrical signal. The propagation medium has some physical characteristics that are determined by the value of a measurand acting on the medium and the determined physical characteristics determine the propagation characteristics of the Lamb waves which are propagated along the medium. When the sensor is acted on by a measurand to determine the physical characteristics of the propagation medium, the characteristics of the electrical signal are also determined. The measuring device measures the electrical signal and provides an indication of the measurand value. Several sensing arrangements are also disclosed as well as methods for making the planar propagation medium.
摘要:
An ultrasonic sensor which has a thin planar sheet of material forming a Lamb wave propagation medium, the sheet having a thickness which is no greater than about twenty microns. The sensor also includes a Lamb wave generator for generating Lamb waves in the propagation medium and an output device for producing an electrical signal representative of the propagation characteristics of the Lamb waves propagating along the propagation medium. A measuring device is included in the sensor to measure selected characteristics of the output electrical signal. The propagation medium has some physical characteristics that are determined by the value of a measurand acting on the medium and the determined physical characteristics determine the propagation characteristics of the Lamb waves which are propagated along the medium. When the sensor is acted on by a measurand to determine the physical characteristics of the propagation medium, the characteristics of the electrical signal are also determined. The measuring device measures the electrical signal and provides an indication of the measurand value. Several sensing arrangements are also disclosed as well as methods for making the planar propagation medium.
摘要:
An ultrasonic structure which has a thin planar sheet of material forming a Lamb wave propagation medium The propagation medium is coated with a gel. The structure may also include a Lamb wave generator for generating Lamb waves in the propagation medium and an output device for producing an electrical signal representative of the propagation characteristics of the Lamb waves propagating along the propagation medium. A measuring device can be included to measure selected characteristics of the output electrical signal. The propagation medium has some physical characteristics that are determined by the value of a measurand acting on the medium and the determined physical characteristics determine the propagation characteristics of the Lamb waves which are propagated along the medium. When the sensor is acted on by a measurand to determine the physical characteristics of the propagation medium, the characteristics of the electrical signal are also determined. The measuring device measures the electrical signal and provides an indication of the measurand value.
摘要:
A method of controlling operation of an indirectly-heated cathode (IHC) ion source comprises a step of measuring a rate of loss of cathode weight of the IHC ion source that occurs during operation using a first cathode configuration and under a first set of operation conditions. A maximum weight loss for the first cathode configuration is determined, and a cathode lifetime is calculated based upon the rate of cathode weight loss and the maximum weight loss. A further method comprises receiving a minimum source bias power value for operation of a cathode in a first configuration, measuring a rate of decrease in source bias power for a cathode in the first configuration, and calculating a lifetime of the cathode based upon the minimum source bias power and rate of decrease in source bias power.
摘要:
A microstructure suitable for use as a surgical instrument. The microstructure includes a silicon substrate having body and horn portions. The horn portion may include a blade with a forward edge. A piezoelectric actuator may be mechanically coupled to the body portion.
摘要:
An integrated microfabricated instrument for manipulation, reaction and detection of microliter to picoliter samples. The instrument is suited for biochemical reactions, particularly DNA-based reactions such as the polymerase chain reaction, that require thermal cycling since the inherently small size of the instrument facilitates rapid cycle times. The integrated nature of the instrument provides accurate, contamination-free processing. The instrument may include reagent reservoirs, agitators and mixers, heaters, pumps, and optical or electromechanical sensors. Ultrasonic Lamb-wave devices may be used as sensors, pumps and agitators.
摘要:
A tactile sensing device for use in robotics and medical prosthetics includes a transparent sheet-like element and a second resilient sheet-like element positioned adjacent the first transparent element. A light detection and imaging means is positioned to observe the interface between the two elements. A light source is provided to illuminate the interior of one of the two elements. Any object pressing against the resilient element deforms the same into contact with the transparent element. Areas of contact caused by the pressing object produce a lighted area that can be detected by the light detecting means. The output from the light detecting means may be processed by a computer and an image of the contact area produced by the pressing object can be displayed on a monitor or processed to operate an electro-mechanical control.
摘要:
Provided are various embodiments of an adjustment circuit, having a base layer and a piezoelectric layer juxtaposed relative to the base layer and including a first electrode such that when the piezoelectric layer is stressed a polarization charge appears between the base layer and one side of the piezoelectric layer and an opposite polarization charge appears on an opposite side of the piezoelectric layer.
摘要:
A plasma processing apparatus includes a process chamber housing defining a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate plasma in the process chamber, and a biasing system. The biasing system is configured to bias the platen to attract ions from the plasma towards the workpiece during a first processing time interval and configured to bias the platen to repel ions from the platen towards interior surfaces of the process chamber housing during a cleaning time interval. The cleaning time interval is separate from the first processing time interval and occurring after the first processing time interval.
摘要:
Provided are various embodiments of an adjustment circuit, having a base layer and a piezoelectric layer juxtaposed relative to the base layer and including a first electrode such that when the piezoelectric layer is stressed a polarization charge appears between the base layer and one side of the piezoelectric layer and an opposite polarization charge appears on an opposite side of the piezoelectric layer.