公开(公告)号：US20220161307A1

公开(公告)日：2022-05-26

申请号：US17102882

申请日：2020-11-24

申请人： Dajun Zhou ,  Kaiping Li ,  Robert D. Miller ,  Richard J. Siemen ,  Yongiun Zhou

发明人： Dajun Zhou ,  Kaiping Li ,  Robert D. Miller ,  Richard J. Siemen ,  Yongiun Zhou

IPC分类号： B21D22/02

摘要： A stamping machine configured to shape a sheet material including an upper binder including first teeth, a lower binder including second teeth, and a punch. A first cylinder is positioned between a lower binder and a support surface. A second cylinder is positioned between the upper binder and the lower binder. A cushion pin is positioned at the support surface that is configured to contact and control movement of the lower binder relative to the punch. A force exerted by the second cylinder is greater than that exerted by the first cylinder, and the force exerted by the cushion pin is greater than that exerted by the second cylinder. The first and second cylinders and the cushion pin are used to control when the first and second teeth are permitted to engage the sheet material, which assists in preventing or minimizing spring back of the sheet material through post-stretching.

公开(公告)号：USD838325S1

公开(公告)日：2019-01-15

申请号：US29560584

申请日：2016-04-08

申请人： Robert D. Miller

设计人： Robert D. Miller

公开(公告)号：US09194877B2

公开(公告)日：2015-11-24

申请号：US12837191

申请日：2010-07-15

申请人： Steven A. Hofstadler ,  Jose R. Gutierrez ,  James C. Hannis ,  Jared J. Drader ,  Rex O. Bare ,  Jeffrey C. Smith ,  Paul J. Gleason ,  Jared Nathanson ,  Ronald K. Bergold ,  Robert D. Miller ,  Kevin S. Oberkramer

发明人： Steven A. Hofstadler ,  Jose R. Gutierrez ,  James C. Hannis ,  Jared J. Drader ,  Rex O. Bare ,  Jeffrey C. Smith ,  Paul J. Gleason ,  Jared Nathanson ,  Ronald K. Bergold ,  Robert D. Miller ,  Kevin S. Oberkramer

IPC分类号： C12M1/34 ,  C12M3/00 ,  G01N35/00 ,  B01L7/00

CPC分类号： C12Q1/686 ,  B01L7/52 ,  C12Q1/6806 ,  G01N27/72 ,  G01N35/00871 ,  G01N35/0092 ,  G01N35/0095 ,  G01N35/0098 ,  G01N35/025 ,  G01N35/026 ,  G01N2035/00534

摘要： The present invention provides systems and methods for analysis of samples, particularly biological and environmental sample to detect biomolecules of interest contained therein. A variety of system components are described herein, including, but not limited to, components for sample handling, mixing of materials, sample processing, transfer of materials, and analysis of materials. The invention further provides mechanisms for combining and integrating the different components and for housing, moving, and storing system components or the system as a whole. The systems may include any one or more or all of these components. The system finds particular use when employed for analysis of nucleic acid molecule using mass spectrometry, however, the invention is not limited such specific uses.

摘要翻译： 本发明提供用于分析样品，特别是生物和环境样品以检测其中所含感兴趣的生物分子的系统和方法。 本文描述了各种系统组件，包括但不限于用于样品处理，材料混合，样品处理，材料转移和材料分析的组件。 本发明还提供了用于组合和集成不同部件并且用于整体地容纳，移动和存储系统部件或系统的机构。 这些系统可以包括这些组件中的任何一个或多个或全部。 当使用质谱法分析核酸分子时，该系统特别有用，但本发明不限于此。

公开(公告)号：US08609430B2

公开(公告)日：2013-12-17

申请号：US13595189

申请日：2012-08-27

申请人： Steven A. Hofstadler ,  Jared J. Drader ,  Jose R. Gutierrez ,  Paul J. Gleason ,  Rex O. Bare ,  Robert D. Miller ,  Jeffrey C. Smith

发明人： Steven A. Hofstadler ,  Jared J. Drader ,  Jose R. Gutierrez ,  Paul J. Gleason ,  Rex O. Bare ,  Robert D. Miller ,  Jeffrey C. Smith

IPC分类号： G01N9/00 ,  G01N33/00

CPC分类号： G01N1/10 ,  G01N1/02 ,  G01N35/0098 ,  G01N35/025 ,  G01N2035/00524

摘要： Sample processing units useful for mixing and purifying materials, such as fluidic materials are provided. A sample processing unit typically includes a container configured to contain a sample comprising magnetically responsive particles, and one or more magnets that are in substantially fixed positions relative to the container. A sample processing unit also generally includes a conveyance mechanism configured to convey the container to and from a position that is within magnetic communication with the magnet, e.g., such that magnetically responsive particles with captured analytes can be retained within the container when other materials are added to and/or removed from the container. Further, a sample processing unit also typically includes a rotational mechanism that is configured to rotate the container, e.g., to effect mixing of sample materials disposed within the container. Related carrier mechanisms, sample processing stations, systems, and methods are also provided.

公开(公告)号：US08481423B2

公开(公告)日：2013-07-09

申请号：US11857760

申请日：2007-09-19

申请人： John C. Arnold ,  Griselda Bonilla ,  William J. Cote ,  Geraud Dubois ,  Daniel C. Edelstein ,  Alfred Grill ,  Elbert Huang ,  Robert D. Miller ,  Satya V. Nitta ,  Sampath Purushothaman ,  E. Todd Ryan ,  Muthumanickam Sankarapandian ,  Terry A. Spooner ,  Willi Volksen

发明人： John C. Arnold ,  Griselda Bonilla ,  William J. Cote ,  Geraud Dubois ,  Daniel C. Edelstein ,  Alfred Grill ,  Elbert Huang ,  Robert D. Miller ,  Satya V. Nitta ,  Sampath Purushothaman ,  E. Todd Ryan ,  Muthumanickam Sankarapandian ,  Terry A. Spooner ,  Willi Volksen

IPC分类号： H01L21/4763

CPC分类号： H01L21/76808 ,  H01L21/02063 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02274 ,  H01L21/02304 ,  H01L21/02348 ,  H01L21/02362 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/31633 ,  H01L21/76814 ,  H01L21/76826 ,  H01L21/76831

摘要： Methods of minimizing or eliminating plasma damage to low k and ultra low k organosilicate intermetal dielectric layers are provided. The reduction of the plasma damage is effected by interrupting the etch and strip process flow at a suitable point to add an inventive treatment which protects the intermetal dielectric layer from plasma damage during the plasma strip process. Reduction or elimination of a plasma damaged region in this manner also enables reduction of the line bias between a line pattern in a photoresist and a metal line formed therefrom, and changes in the line width of the line trench due to a wet clean after the reactive ion etch employed for formation of the line trench and a via cavity. The reduced line bias has a beneficial effect on electrical yields of a metal interconnect structure.

公开(公告)号：US20130110467A1

公开(公告)日：2013-05-02

申请号：US13284025

申请日：2011-10-28

申请人： Robert E. Feller ,  Andre Knoesen ,  Robert D. Miller

发明人： Robert E. Feller ,  Andre Knoesen ,  Robert D. Miller

IPC分类号： G06F15/00

CPC分类号： G01N21/05 ,  G01N21/274 ,  G01N21/553

摘要： A device, including sample and reference channels through which first and second solutions flow, respectively, the first solution including an analyte, the channels having a metal film in contact with the first and second solutions, the metal film configured with a linker to selectively bind the analyte; a light source whose output is modulated by an optical system, so that light is directed from the optical system alternately towards the sample and reference channels, surface plasmons within the metal film being created; a first photodetector that monitors the strength of the output from the light source; a second photodetector that collects optical signals reflected from the metal film; electronics that monitors output from the first and the second photodetectors, thereby detecting a noise-compensated difference in signals from the two channels; and a computer processor that determines, from analysis of the noise-compensated difference, presence of the analyte in the first solution.

摘要翻译： 一种装置，包括第一和第二溶液分别通过其流动的样品和参考通道，第一溶液包括分析物，通道具有与第一和第二溶液接触的金属膜，金属膜配置有接头以选择性地结合 分析物; 其光输出被光学系统调制的光源，使得光从光学系统交替地朝向样品和参考通道引导，在金属膜内形成表面等离子体; 第一光电检测器，其监测来自光源的输出的强度; 第二光电检测器，其收集从金属膜反射的光信号; 监视来自第一和第二光电检测器的输出的电子装置，从而检测来自两个通道的信号的噪声补偿差分; 以及计算机处理器，其从噪声补偿差分的分析确定第一解决方案中分析物的存在。

公开(公告)号：US08227336B2

公开(公告)日：2012-07-24

申请号：US12356105

申请日：2009-01-20

申请人： Daniel C. Edelstein ,  Elbert E. Huang ,  Robert D. Miller

发明人： Daniel C. Edelstein ,  Elbert E. Huang ,  Robert D. Miller

IPC分类号： H01L23/522 ,  G03F7/20

CPC分类号： H01L23/528 ,  G03F7/00 ,  G03F7/2022 ,  H01L21/0271 ,  H01L21/31144 ,  H01L21/7682 ,  H01L21/76826 ,  H01L21/76834 ,  H01L21/76883 ,  H01L23/5222 ,  H01L23/53238 ,  H01L23/53295 ,  H01L29/0649 ,  H01L2924/0002 ,  H01L2924/00

摘要： A structure is provided with a self-aligned resist layer on a surface of metal interconnects for use in forming air gaps in an insulator material and method of fabricating the same. The non-lithographic method includes applying a resist on a structure comprising at least one metal interconnect formed in an insulator material. The method further includes blanket-exposing the resist to energy and developing the resist to expose surfaces of the insulator material while protecting the metal interconnects. The method further includes forming air gaps in the insulator material by an etching process, while the metal interconnects remain protected by the resist.

摘要翻译： 在金属互连件的表面上设置有用于形成绝缘体材料中的气隙的自对准抗蚀剂层的结构及其制造方法。 非平版印刷方法包括在包括形成在绝缘体材料中的至少一个金属互连的结构上施加抗蚀剂。 该方法还包括将抗蚀剂覆盖曝光到能量并显影抗蚀剂以暴露绝缘体材料的表面，同时保护金属互连。 该方法还包括通过蚀刻工艺在绝缘体材料中形成气隙，同时金属互连保持被抗蚀剂保护。

公开(公告)号：US20120058552A1

公开(公告)日：2012-03-08

申请号：US13221608

申请日：2011-08-30

申请人： Steven A. Hofstadler ,  Jared J. Drader ,  Jose R. Gutierrez ,  Paul J. Gleason ,  Rex O. Bare ,  Robert D. Miller ,  Jeffrey C. Smith

发明人： Steven A. Hofstadler ,  Jared J. Drader ,  Jose R. Gutierrez ,  Paul J. Gleason ,  Rex O. Bare ,  Robert D. Miller ,  Jeffrey C. Smith

IPC分类号： C12M1/00 ,  H01J49/26 ,  G01F23/00 ,  G01N31/22 ,  G01N9/00 ,  G01K1/00 ,  G01R27/08 ,  C07H21/00 ,  G01L7/00

CPC分类号： G01N1/10 ,  G01N1/02 ,  G01N35/0098 ,  G01N35/025 ,  G01N2035/00524

摘要： Sample processing units useful for mixing and purifying materials, such as fluidic materials are provided. A sample processing unit typically includes a container configured to contain a sample comprising magnetically responsive particles, and one or more magnets that are in substantially fixed positions relative to the container. A sample processing unit also generally includes a conveyance mechanism configured to convey the container to and from a position that is within magnetic communication with the magnet, e.g., such that magnetically responsive particles with captured analytes can be retained within the container when other materials are added to and/or removed from the container. Further, a sample processing unit also typically includes a rotational mechanism that is configured to rotate the container, e.g., to effect mixing of sample materials disposed within the container. Related carrier mechanisms, sample processing stations, systems, and methods are also provided.

摘要翻译： 提供了用于混合和净化材料（如流体材料）的样品处理单元。 样品处理单元通常包括被配置为容纳包含磁响应颗粒的样品和相对于容器处于基本固定位置的一个或多个磁体的容器。 样品处理单元还通常包括输送机构，其构造成将容器输送到与磁体磁连通的位置，例如使得当添加其它材料时，具有捕获的分析物的磁响应颗粒可以保留在容器内 到和/或从容器中取出。 此外，样品处理单元还通常包括旋转机构，其被配置为旋转容器，例如以实现设置在容器内的样品材料的混合。 还提供了相关的载体机构，样品处理站，系统和方法。

公开(公告)号：US07993817B2

公开(公告)日：2011-08-09

申请号：US12356100

申请日：2009-01-20

申请人： Daniel C. Edelstein ,  Elbert E. Huang ,  Robert D. Miller

发明人： Daniel C. Edelstein ,  Elbert E. Huang ,  Robert D. Miller

IPC分类号： G03F7/26

CPC分类号： H01L23/53238 ,  G03F7/00 ,  G03F7/2022 ,  H01L21/0274 ,  H01L21/76826 ,  H01L21/76849 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： A structure is provided with a self-aligned resist layer on an insulator surface and non-lithographic method of fabricating the same. The non-lithographic method includes applying a resist on a structure comprising at least one of interconnects formed in an insulator material. The method further comprises exposing the resist to energy and developing the resist to expose surfaces of the interconnects. The method further comprises depositing metal cap material on the exposed surfaces of the interconnects.

摘要翻译： 在绝缘体表面上设置有自对准抗蚀剂层的结构和其非制造方法。 非平版印刷方法包括在包括形成在绝缘体材料中的互连中的至少一个的结构上施加抗蚀剂。 该方法还包括将抗蚀剂暴露于能量并显影抗蚀剂以暴露互连的表面。 该方法还包括将金属帽材料沉积在互连件的暴露表面上。

公开(公告)号：US20110101489A1

公开(公告)日：2011-05-05

申请号：US12986531

申请日：2011-01-07

申请人： Daniel C. Edelstein ,  Stephen M. Gates ,  Alfred Grill ,  Michael Lane ,  Robert D. Miller ,  Deborah A. Neumayer ,  Son Van Nguyen

发明人： Daniel C. Edelstein ,  Stephen M. Gates ,  Alfred Grill ,  Michael Lane ,  Robert D. Miller ,  Deborah A. Neumayer ,  Son Van Nguyen

IPC分类号： H01L23/522

CPC分类号： H01L31/103 ,  Y10T428/31663

摘要： A low-k dielectric material with increased cohesive strength for use in electronic structures including interconnect and sensing structures is provided that includes atoms of Si, C, O, and H in which a fraction of the C atoms are bonded as Si—CH3 functional groups, and another fraction of the C atoms are bonded as Si—R—Si, wherein R is phenyl, —[CH2]n— where n is greater than or equal to 1, HC═CH, C═CH2, C≡C or a [S]n linkage, where n is a defined above.

摘要翻译： 提供了一种用于包括互连和感测结构的电子结构中具有增强的内聚强度的低k电介质材料，其包括其中一部分C原子键合为Si-CH 3官能团的Si，C，O和H的原子 ，并且C原子的另一部分键合为Si-R-Si，其中R是苯基， - [CH 2] n - ，其中n大于或等于1，HC = CH，C = CH 2，C≡C或 一个[S] n连接，其中n是上面定义的。