公开(公告)号：US20160104731A1

公开(公告)日：2016-04-14

申请号：US14974002

申请日：2015-12-18

Applicant: STATS ChipPAC, Ltd.

Inventor： Seng Guan Chow ,  Lee Sun Lim ,  Rui Huang ,  Xu Sheng Bao ,  Ma Phoo Pwint Hlaing

IPC: H01L27/146 ,  H01L21/768 ,  B81C1/00 ,  H01L31/0203 ,  H01L25/16

CPC classification number: H01L27/1469 ,  B81C1/0023 ,  H01L21/76898 ,  H01L25/165 ,  H01L25/167 ,  H01L27/14618 ,  H01L27/14634 ,  H01L27/14636 ,  H01L31/0203 ,  H01L2224/73265 ,  H01L2924/01322 ,  H01L2924/13091 ,  H01L2924/1461 ,  H01L2224/48091 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device has a substrate containing a transparent or translucent material. A spacer is mounted to the substrate. A first semiconductor die has an active region and first conductive vias electrically connected to the active region. The active region can include a sensor responsive to light received through the substrate. The first die is mounted to the spacer with the active region positioned over an opening in the spacer and oriented toward the substrate. An encapsulant is deposited over the first die and substrate. An interconnect structure is formed over the encapsulant and first die. The interconnect structure is electrically connected through the first conductive vias to the active region. A second semiconductor die having second conductive vias can be mounted to the first die with the first conductive vias electrically connected to the second conductive vias.

Abstract translation: 半导体器件具有含有透明或半透明材料的衬底。 衬垫安装到衬底上。 第一半导体管芯具有有源区和电连接到有源区的第一导电通孔。 有源区域可以包括响应于通过衬底接收的光的传感器。 第一管芯安装到间隔件上，其中有源区域位于间隔件中的开口上方并朝向衬底。 密封剂沉积在第一裸片和衬底上。 在密封剂和第一模具上形成互连结构。 互连结构通过第一导电通孔电连接到有源区。 具有第二导电通孔的第二半导体管芯可以被安装到第一管芯，其中第一导电通孔电连接到第二导电通孔。

公开(公告)号：US09620557B2

公开(公告)日：2017-04-11

申请号：US14974002

申请日：2015-12-18

Applicant: STATS ChipPAC, Ltd.

Inventor： Seng Guan Chow ,  Lee Sun Lim ,  Rui Huang ,  Xu Sheng Bao ,  Ma Phoo Pwint Hlaing

IPC: H01L21/768 ,  H01L27/146 ,  B81C1/00 ,  H01L25/16 ,  H01L31/0203

CPC classification number: H01L27/1469 ,  B81C1/0023 ,  H01L21/76898 ,  H01L25/165 ,  H01L25/167 ,  H01L27/14618 ,  H01L27/14634 ,  H01L27/14636 ,  H01L31/0203 ,  H01L2224/73265 ,  H01L2924/01322 ,  H01L2924/13091 ,  H01L2924/1461 ,  H01L2224/48091 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device has a substrate containing a transparent or translucent material. A spacer is mounted to the substrate. A first semiconductor die has an active region and first conductive vias electrically connected to the active region. The active region can include a sensor responsive to light received through the substrate. The first die is mounted to the spacer with the active region positioned over an opening in the spacer and oriented toward the substrate. An encapsulant is deposited over the first die and substrate. An interconnect structure is formed over the encapsulant and first die. The interconnect structure is electrically connected through the first conductive vias to the active region. A second semiconductor die having second conductive vias can be mounted to the first die with the first conductive vias electrically connected to the second conductive vias.

公开(公告)号：US09397058B2

公开(公告)日：2016-07-19

申请号：US14563448

申请日：2014-12-08

Applicant: STATS ChipPAC, Ltd.

Inventor： Xusheng Bao ,  Ma Phoo Pwint Hlaing ,  Jian Zuo

IPC: H01L23/00 ,  H01L23/31 ,  H01L23/532 ,  H01L23/525

CPC classification number: H01L24/11 ,  H01L23/3114 ,  H01L23/525 ,  H01L23/5329 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L24/94 ,  H01L2224/02313 ,  H01L2224/0239 ,  H01L2224/024 ,  H01L2224/0332 ,  H01L2224/034 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/035 ,  H01L2224/03505 ,  H01L2224/0361 ,  H01L2224/03632 ,  H01L2224/0401 ,  H01L2224/05011 ,  H01L2224/05012 ,  H01L2224/05024 ,  H01L2224/05073 ,  H01L2224/05086 ,  H01L2224/05088 ,  H01L2224/05093 ,  H01L2224/05094 ,  H01L2224/05095 ,  H01L2224/05096 ,  H01L2224/05155 ,  H01L2224/05164 ,  H01L2224/05166 ,  H01L2224/05169 ,  H01L2224/05171 ,  H01L2224/05181 ,  H01L2224/05187 ,  H01L2224/05557 ,  H01L2224/05558 ,  H01L2224/05583 ,  H01L2224/05624 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/05687 ,  H01L2224/1111 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11466 ,  H01L2224/118 ,  H01L2224/11849 ,  H01L2224/11916 ,  H01L2224/13006 ,  H01L2224/13011 ,  H01L2224/13022 ,  H01L2224/13024 ,  H01L2224/13078 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/13553 ,  H01L2224/1357 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/94 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/301 ,  H01L2924/01013 ,  H01L2924/0105 ,  H01L2924/01028 ,  H01L2924/01079 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/00014 ,  H01L2924/00013 ,  H01L2924/01074 ,  H01L2924/01007 ,  H01L2924/01023 ,  H01L2924/04941 ,  H01L2924/014 ,  H01L2924/01082 ,  H01L2224/11 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor wafer with a first conductive layer formed over a surface of the semiconductor wafer. A first insulating layer is formed over the surface of the semiconductor wafer and first conductive layer. A second conductive layer is formed over the first insulating layer and first conductive layer. A second insulating layer is formed over the first insulating layer and second conductive layer. A plurality of openings is formed in the second insulating layer in a bump formation area of the semiconductor wafer to expose the second conductive layer and reduce adverse effects of electro-migration. The openings are separated by portions of the second insulating layer. A UBM layer is formed over the openings in the second insulating layer in the bump formation area electrically connected to the second conductive layer. A bump is formed over the UBM layer.

公开(公告)号：US20150091165A1

公开(公告)日：2015-04-02

申请号：US14563448

申请日：2014-12-08

Applicant: STATS ChipPAC, Ltd.

Inventor： Xusheng Bao ,  Ma Phoo Pwint Hlaing ,  Jian Zuo

IPC: H01L23/00

CPC classification number: H01L24/11 ,  H01L23/3114 ,  H01L23/525 ,  H01L23/5329 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L24/94 ,  H01L2224/02313 ,  H01L2224/0239 ,  H01L2224/024 ,  H01L2224/0332 ,  H01L2224/034 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/035 ,  H01L2224/03505 ,  H01L2224/0361 ,  H01L2224/03632 ,  H01L2224/0401 ,  H01L2224/05011 ,  H01L2224/05012 ,  H01L2224/05024 ,  H01L2224/05073 ,  H01L2224/05086 ,  H01L2224/05088 ,  H01L2224/05093 ,  H01L2224/05094 ,  H01L2224/05095 ,  H01L2224/05096 ,  H01L2224/05155 ,  H01L2224/05164 ,  H01L2224/05166 ,  H01L2224/05169 ,  H01L2224/05171 ,  H01L2224/05181 ,  H01L2224/05187 ,  H01L2224/05557 ,  H01L2224/05558 ,  H01L2224/05583 ,  H01L2224/05624 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/05687 ,  H01L2224/1111 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11466 ,  H01L2224/118 ,  H01L2224/11849 ,  H01L2224/11916 ,  H01L2224/13006 ,  H01L2224/13011 ,  H01L2224/13022 ,  H01L2224/13024 ,  H01L2224/13078 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/13553 ,  H01L2224/1357 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/94 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/301 ,  H01L2924/01013 ,  H01L2924/0105 ,  H01L2924/01028 ,  H01L2924/01079 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/00014 ,  H01L2924/00013 ,  H01L2924/01074 ,  H01L2924/01007 ,  H01L2924/01023 ,  H01L2924/04941 ,  H01L2924/014 ,  H01L2924/01082 ,  H01L2224/11 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor wafer with a first conductive layer formed over a surface of the semiconductor wafer. A first insulating layer is formed over the surface of the semiconductor wafer and first conductive layer. A second conductive layer is formed over the first insulating layer and first conductive layer. A second insulating layer is formed over the first insulating layer and second conductive layer. A plurality of openings is formed in the second insulating layer in a bump formation area of the semiconductor wafer to expose the second conductive layer and reduce adverse effects of electro-migration. The openings are separated by portions of the second insulating layer. A UBM layer is formed over the openings in the second insulating layer in the bump formation area electrically connected to the second conductive layer. A bump is formed over the UBM layer.

Abstract translation: 半导体器件具有在半导体晶片的表面上形成有第一导电层的半导体晶片。 在半导体晶片和第一导电层的表面上形成第一绝缘层。 在第一绝缘层和第一导电层上形成第二导电层。 在第一绝缘层和第二导电层上形成第二绝缘层。 在半导体晶片的凸块形成区域中的第二绝缘层中形成多个开口以暴露第二导电层并减少电迁移的不利影响。 开口由第二绝缘层的一部分分开。 UBM层形成在电连接到第二导电层的凸块形成区域中的第二绝缘层的开口上方。 在UBM层上形成凸点。