公开(公告)号：US10688437B2

公开(公告)日：2020-06-23

申请号：US16122454

申请日：2018-09-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cha-won Koh ,  Oleg Feygenson ,  Jung-hyeon Kim ,  Hyun-woo Kim ,  Eun-sung Kim

IPC: B01D61/42 ,  G03F7/26 ,  B01D63/06 ,  B01D61/46 ,  G03F7/16 ,  H01L21/027 ,  B01D29/58 ,  B01D29/15

Abstract: A filter structure for chemical solution used in manufacturing an integrated circuit includes: a first membrane structure comprising a plurality of membrane units, each comprising a cathode comprising a plurality of first openings, an anode comprising a plurality of second openings, and an insulating layer between the cathode and the anode; and a filter housing configured to receive the first membrane structure therein, the filter housing comprising an inlet through which the chemical solution is introduced and an outlet through which the chemical solution is discharged. The first membrane structure is configured such that when an electric field is applied between the cathode and the anode while the chemical solution introduced through the inlet passes through the first membrane structure, impurities having both positively charged particles and negatively charged particles in the chemical solution are trapped in the first membrane structure.

公开(公告)号：US09653294B2

公开(公告)日：2017-05-16

申请号：US14957777

申请日：2015-12-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-sung Kim ,  Dae-yong Kang ,  Seung-chul Kwon ,  Shi-yong Yi

IPC: H01L21/302 ,  H01L21/033 ,  H01L21/308 ,  H01L21/311 ,  H01L21/3213 ,  H01L27/108

CPC classification number: H01L21/0337 ,  H01L21/0332 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139 ,  H01L27/10855

Abstract: The present inventive concept provides a method of forming a fine pattern including forming a plurality of pillar-shaped guides that are regularly arranged on a feature layer.

公开(公告)号：US10352964B2

公开(公告)日：2019-07-16

申请号：US15415034

申请日：2017-01-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyeong-mi Lee ,  Jeong-ju Park ,  Shi-yong Yi ,  Eun-sung Kim ,  Seung-chul Kwon ,  Sang-ouk Kim ,  Young-joo Choi

IPC: G01Q70/14 ,  G01Q60/28 ,  H01L21/67 ,  G01Q60/42 ,  H01L27/108

Abstract: A method of forming a micropattern, a substrate surface inspection apparatus, a cantilever set for an atomic force microscope, and a method of analyzing a surface of a semiconductor substrate, and a probe tip the method including forming pinning patterns on a semiconductor substrate; forming a neutral pattern layer in spaces between the pinning patterns; and inspecting a surface of a guide layer that includes the pinning patterns and the neutral pattern layer by using an atomic force microscope (AFM).

公开(公告)号：US09070824B2

公开(公告)日：2015-06-30

申请号：US13729820

申请日：2012-12-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jae-young Choi ,  Seung-hyun Baik ,  Seung-hyun Hong ,  Won-young Kim ,  Eun-sung Kim ,  Young-hee Lee

IPC: H01L35/22 ,  H01L35/16 ,  H01L35/32 ,  H01L35/34 ,  H01L35/18

CPC classification number: H01L35/22 ,  C01B32/184 ,  H01L35/16 ,  H01L35/32 ,  H01L35/34 ,  Y02P20/133

Abstract: A heterogeneous laminate including: graphene; and a thermoelectric inorganic compound disposed on the graphene.

Abstract translation: 异质层压板包括：石墨烯; 以及设置在石墨烯上的热电无机化合物。

公开(公告)号：US20130295772A1

公开(公告)日：2013-11-07

申请号：US13719995

申请日：2012-12-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eun-sung Kim ,  Kyoung-seon Kim ,  Jae-woo Nam ,  Chul-ho Shin ,  Shi-young Yi

IPC: H01L21/308

CPC classification number: H01L21/308 ,  G03F1/00 ,  G03F1/70 ,  G03F7/0002 ,  G03F7/2024 ,  G03F7/203 ,  G03F7/70466 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/0337

Abstract: A method of forming patterns includes forming a photoresist film on a substrate. The photoresist film is exposed with a first dose of light to form a first area and a second area in the photoresist film. A first hole and a second hole are formed by removing the first area and the second area with a first developer. The photoresist film is re-exposed with a second dose of the light to form a third area in the photoresist film between the first hole and the second hole. A third hole is formed between the first hole and the second hole by removing the third area with a second developer.

Abstract translation: 形成图案的方法包括在基板上形成光致抗蚀剂膜。 光致抗蚀剂膜用第一剂量的光曝光以在光致抗蚀剂膜中形成第一区域和第二区域。 通过用第一显影剂去除第一区域和第二区域来形成第一孔和第二孔。 用第二剂量的光再次曝光光致抗蚀剂膜，以在第一孔和第二孔之间的光致抗蚀剂膜中形成第三区域。 通过用第二显影剂除去第三区域，在第一孔和第二孔之间形成第三孔。

公开(公告)号：US20190232227A1

公开(公告)日：2019-08-01

申请号：US16122454

申请日：2018-09-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cha-won Koh ,  Oleg Feygenson ,  Jung-hyeon Kim ,  Hyun-woo Kim ,  Eun-sung Kim

IPC: B01D61/42 ,  B01D63/06 ,  G03F7/26

Abstract: A filter structure for chemical solution used in manufacturing an integrated circuit includes: a first membrane structure comprising a plurality of membrane units, each comprising a cathode comprising a plurality of first openings, an anode comprising a plurality of second openings, and an insulating layer between the cathode and the anode; and a filter housing configured to receive the first membrane structure therein, the filter housing comprising an inlet through which the chemical solution is introduced and an outlet through which the chemical solution is discharged. The first membrane structure is configured such that when an electric field is applied between the cathode and the anode while the chemical solution introduced through the inlet passes through the first membrane structure, impurities having both positively charged particles and negatively charged particles in the chemical solution are trapped in the first membrane structure.

公开(公告)号：US08986554B2

公开(公告)日：2015-03-24

申请号：US13719995

申请日：2012-12-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-sung Kim ,  Kyoung-seon Kim ,  Jae-woo Nam ,  Chul-ho Shin ,  Shi-young Yi

IPC: H01B13/00 ,  H01L21/308 ,  G03F1/00 ,  H01L21/027 ,  H01L21/033

CPC classification number: H01L21/308 ,  G03F1/00 ,  G03F1/70 ,  G03F7/0002 ,  G03F7/2024 ,  G03F7/203 ,  G03F7/70466 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/0337

Abstract: A method of forming patterns includes forming a photoresist film on a substrate. The photoresist film is exposed with a first dose of light to form a first area and a second area in the photoresist film. A first hole and a second hole are formed by removing the first area and the second area with a first developer. The photoresist film is re-exposed with a second dose of the light to form a third area in the photoresist film between the first hole and the second hole. A third hole is formed between the first hole and the second hole by removing the third area with a second developer.

Abstract translation: 形成图案的方法包括在基板上形成光致抗蚀剂膜。 光致抗蚀剂膜用第一剂量的光曝光以在光致抗蚀剂膜中形成第一区域和第二区域。 通过用第一显影剂去除第一区域和第二区域来形成第一孔和第二孔。 用第二剂量的光再次曝光光致抗蚀剂膜，以在第一孔和第二孔之间的光致抗蚀剂膜中形成第三区域。 通过用第二显影剂除去第三区域，在第一孔和第二孔之间形成第三孔。