MAGNETIC MEMORY DEVICE
    1.
    发明申请

    公开(公告)号:US20220328083A1

    公开(公告)日:2022-10-13

    申请号:US17537937

    申请日:2021-11-30

    摘要: A magnetic memory device may include a substrate including a first region and a second region, a first interlayer insulating layer on the substrate, a first capping layer on the first interlayer insulating layer, the first capping layer covering the first and second regions of the substrate, a second interlayer insulating layer on a portion of the first capping layer covering the first region of the substrate, a bottom electrode contact included in the second interlayer insulating layer, a magnetic tunnel junction pattern on the bottom electrode contact, and a second capping layer on the second interlayer insulating layer, the second capping layer being in contact with the first capping layer on the second region of the substrate.

    ELECTRONIC DEVICE INCLUDING COIL FOR WIRELESS POWER TRANSMISSION

    公开(公告)号:US20220255353A1

    公开(公告)日:2022-08-11

    申请号:US17733607

    申请日:2022-04-29

    摘要: An electronic device is provided. The electronic device includes a substrate comprising a touch sensing circuit, which includes a first layer, a second layer overlapping with the first layer, a plurality of first electrode lines arranged on the first layer in a first direction, and a plurality of second electrode lines arranged on the second layer in a second direction that is vertical with respect to the first direction, a coil arranged to at least partially overlap with the substrate, a power transmission circuit for wirelessly transmitting power through the coil, a ground electrically connected to the power transmission circuit, and a control circuit electrically connected to the coil and the ground, wherein the control circuit can be configured to selectively connect the coil to the power transmission circuit or the ground.

    MAGNETIC MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME

    公开(公告)号:US20200020847A1

    公开(公告)日:2020-01-16

    申请号:US16286718

    申请日:2019-02-27

    IPC分类号: H01L43/02 H01L27/22 H01L43/12

    摘要: A magnetic memory device including a substrate including a cell region and a peripheral circuit region; a first interlayer insulating layer covering the cell region and the peripheral circuit region of the substrate; interconnection lines in the first interlayer insulating layer; a peripheral conductive line and a peripheral conductive contact on the first interlayer insulating layer on the peripheral circuit region, the peripheral conductive contact being between the peripheral conductive line and a corresponding one of the interconnection lines; a bottom electrode contact on the first interlayer insulating layer on the cell region and connected to a corresponding one of the interconnection lines; and a data storage pattern on the bottom electrode contact, wherein the peripheral conductive line is at a height between a top surface of the bottom electrode contact and a bottom surface of the bottom electrode contact.

    WALKING ASSISTANCE APPARATUS
    7.
    发明申请
    WALKING ASSISTANCE APPARATUS 审中-公开
    行车辅助装置

    公开(公告)号:US20150335515A1

    公开(公告)日:2015-11-26

    申请号:US14692257

    申请日:2015-04-21

    IPC分类号: A61H3/00 A61H1/02

    摘要: A walking assistance apparatus for preventing offset occurring in between a rotating axis of a hip joint of a user and a rotating shaft of the walking assistance apparatus may be provided. The walking assistance apparatus includes a waist fixing apparatus configured to be fixed to a waist of a user, a connecting guide mounted at the waist fixing apparatus and configured to slide in an extension direction of the waist fixing apparatus and rotate on a rotating shaft extending in a vertical direction perpendicular to the extension direction, a rail unit mounted at one side of the connecting guide, the rail unit extending in a vertical direction, and a hip joint configured to slide along the rail unit.

    摘要翻译: 可以提供一种用于防止在使用者的髋关节的旋转轴线和步行辅助装置的旋转轴之间发生偏移的行走辅助装置。 步行辅助装置包括:腰部固定装置,其被配置为固定在使用者的腰部;安装在腰部固定装置上的连接导引件,其构造成沿腰部固定装置的延伸方向滑动, 垂直于所述延伸方向的垂直方向,安装在所述连接引导件的一侧的轨道单元,所述轨道单元沿垂直方向延伸;以及髋关节,被配置为沿着所述轨道单元滑动。

    SEMICONDUCTOR DEVICE
    8.
    发明公开

    公开(公告)号:US20240324243A1

    公开(公告)日:2024-09-26

    申请号:US18473660

    申请日:2023-09-25

    IPC分类号: H10B61/00 H01L23/522

    CPC分类号: H10B61/22 H01L23/5226

    摘要: A semiconductor device includes a plurality of data storage patterns on a substrate, the plurality of data storage patterns spaced apart from each other in a first direction parallel to an upper surface of the substrate, a first upper conductive line on the plurality of data storage patterns, extending in the first direction and connected to the plurality of data storage patterns, a second upper conductive line on the first upper conductive line and extending in the first direction and a plurality of via contacts between the first upper conductive line and the second upper conductive line and spaced apart from each other in the first direction. The plurality of via contacts are arranged to be offset from the plurality of data storage patterns in the first direction.

    SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

    公开(公告)号:US20210296397A1

    公开(公告)日:2021-09-23

    申请号:US17019641

    申请日:2020-09-14

    IPC分类号: H01L27/22 H01L43/12 H01L43/02

    摘要: A method of fabricating a semiconductor device including providing a substrate; forming first and second lower conductive patterns, the and second lower conductive patterns being buried in an interlayer dielectric layer; forming a capping layer on the interlayer dielectric layer and a dummy layer on the capping layer; etching an exposed upper portion of the first lower conductive pattern to form a trench; forming a metal layer that covers the interlayer dielectric layer and the dummy layer such that the metal layer fills the trench; forming a magnetic tunnel junction layer on the metal layer; performing a patterning process to form a memory cell; and forming a first protective layer that covers a lateral surface of the memory cell, wherein, in the patterning process, the metal layer on the top surface of the interlayer dielectric layer is etched to form a first bottom electrode in the trench.