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公开(公告)号:US20210175447A1
公开(公告)日:2021-06-10
申请号:US17177457
申请日:2021-02-17
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Masakatsu OHNO , Kayo KUMAKURA , Hiroyuki WATANABE , Seiji YASUMOTO , Satoru IDOJIRI , Hiroki ADACHI
IPC: H01L51/00 , H01L51/52 , H01L27/32 , H01L27/12 , H01L29/786
Abstract: The yield of a separation process is improved. The mass productivity of a display device which is formed through a separation process is improved. A layer is formed over a substrate with use of a material including a resin or a resin precursor. Next, a resin layer is formed by performing heat treatment on the layer. Next, a layer to be separated is formed over the resin layer. Then, the layer to be separated and the substrate are separated from each other. The heat treatment is performed in an atmosphere containing oxygen or while supplying a gas containing oxygen.
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公开(公告)号:US20180076401A1
公开(公告)日:2018-03-15
申请号:US15810249
申请日:2017-11-13
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Tatsuya SAKUISHI , Yutaka UCHIDA , Hiroki ADACHI , Saki EGUCHI , Junpei YANAKA , Kayo KUMAKURA , Seiji YASUMOTO , Kohei YOKOYAMA , Akihiro CHIDA
CPC classification number: H01L51/0097 , B32B7/02 , B32B7/06 , B32B7/12 , B32B15/08 , B32B15/18 , B32B15/20 , B32B17/00 , B32B17/06 , B32B27/20 , B32B27/286 , B32B27/30 , B32B27/325 , B32B27/34 , B32B27/36 , B32B27/365 , B32B37/02 , B32B37/10 , B32B37/1292 , B32B37/18 , B32B38/10 , B32B2250/05 , B32B2255/20 , B32B2260/021 , B32B2260/046 , B32B2264/102 , B32B2307/202 , B32B2307/40 , B32B2307/50 , B32B2307/536 , B32B2307/558 , B32B2310/0843 , B32B2315/08 , B32B2457/20 , H01L51/003 , H01L51/5253 , H01L2251/5338 , Y02E10/549 , Y02P70/521
Abstract: A flexible device is provided. The hardness of a bonding layer of the flexible device is set to be higher than Shore D of 70, or preferably higher than or equal to Shore D of 80. The coefficient of expansion of a flexible substrate of the flexible device is set to be less than 58 ppm/° C., or preferably less than or equal to 30 ppm/° C.
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公开(公告)号:US20200067027A1
公开(公告)日:2020-02-27
申请号:US16493104
申请日:2018-03-06
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Seiji YASUMOTO , Kayo KUMAKURA , Yuka SATO , Satoru IDOJIRI , Hiroki ADACHI , Kenichi OKAZAKI
Abstract: A high-yield fabricating method of a semiconductor device including a peeling step is provided.A peeling method includes a step of stacking and forming a first material layer and a second material layer over a substrate and a step of separating the first material layer and the second material layer from each other. The second material layer is formed over the substrate with the first material layer therebetween. The first material layer includes a first compound layer in contact with the second material layer and a second compound layer positioned closer to the substrate side than the first compound layer is. The first compound layer has the highest oxygen content among the layers included in the first material layer. The second compound layer has the highest nitrogen content among the layers included in the first material layer. The second material layer includes a resin. In the step of separating, the first material layer and the second material layer are separated from each other by irradiation of an interface between the first material layer and the second material layer or the vicinity of the interface with light.
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公开(公告)号:US20150059987A1
公开(公告)日:2015-03-05
申请号:US14468662
申请日:2014-08-26
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Kayo KUMAKURA , Tomoya AOYAMA , Akihiro CHIDA , Kohei YOKOYAMA , Masakatsu OHNO , Satoru IDOJIRI , Hisao IKEDA , Hiroki ADACHI , Yoshiharu HIRAKATA , Shingo EGUCHI , Yasuhiro JINBO
IPC: B32B43/00
CPC classification number: B32B43/006 , B26D1/04 , B26D2001/006 , B32B38/10 , B32B2457/00 , G02B6/00 , H01L21/67092 , H01L27/1248 , H01L27/3258 , H01L27/3262 , H01L51/56 , H01L2221/68327 , H01L2227/323 , H01L2251/5338 , Y10T156/1126 , Y10T156/1132 , Y10T156/1168 , Y10T156/1184 , Y10T156/1933 , Y10T156/1944 , Y10T156/1961 , Y10T156/1967
Abstract: A processing apparatus of a stack is provided. The stack includes two substrates attached to each other with a gap provided between their end portions. The processing apparatus includes a fixing mechanism that fixes part of the stack, a plurality of adsorption jigs that fix an outer peripheral edge of one of the substrates of the stack, and a wedge-shaped jig that is inserted into a corner of the stack. The plurality of adsorption jigs include a mechanism that allows the adsorption jigs to move separately in a vertical direction and a horizontal direction. The processing apparatus further includes a sensor sensing a position of the gap between the end portion in the stack. A tip of the wedge-shaped jig moves along a chamfer formed on an end surface of the stack. The wedge-shaped jig is inserted into the gap between the end portions in the stack.
Abstract translation: 提供堆叠的处理装置。 堆叠包括彼此附接的两个基板,其间隙设置在它们的端部之间。 处理装置包括:固定机构,其固定堆叠的一部分;多个吸附夹具,其固定堆叠的一个基板的外周边缘;以及楔形夹具,其插入到堆叠的角部。 多个吸附夹具包括允许吸附夹具在垂直方向和水平方向上分开移动的机构。 处理装置还包括传感器,其感测堆叠中的端部之间的间隙的位置。 楔形夹具的尖端沿着形成在堆叠的端表面上的倒角移动。 楔形夹具插入到堆叠中的端部之间的间隙中。
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公开(公告)号:US20140306288A1
公开(公告)日:2014-10-16
申请号:US14246407
申请日:2014-04-07
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Hiroki ADACHI , Kayo KUMAKURA
IPC: H01L29/786 , H01L21/84
CPC classification number: H01L29/78603 , H01L21/84 , H01L27/1218 , H01L27/1222 , H01L27/1262 , H01L29/78606 , H01L2021/775
Abstract: Provided is a flexible device with fewer defects caused by a crack or a flexible device having high productivity. A semiconductor device including: a display portion over a flexible substrate, including a transistor and a display element; a semiconductor layer surrounding the display portion; and an insulating layer over the transistor and the semiconductor layer. When seen in a direction perpendicular to a surface of the flexible substrate, an end portion of the substrate is substantially aligned with an end portion of the semiconductor layer, and an end portion of the insulating layer is positioned over the semiconductor layer.
Abstract translation: 提供了一种具有由裂纹引起的缺陷或具有高生产率的柔性装置的柔性装置。 一种半导体器件,包括:柔性基板上的显示部分,包括晶体管和显示元件; 围绕显示部的半导体层; 以及在晶体管和半导体层上的绝缘层。 当在与柔性基板的表面垂直的方向上观察时,基板的端部与半导体层的端部大致对准,绝缘层的端部位于半导体层的上方。
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公开(公告)号:US20170334187A1
公开(公告)日:2017-11-23
申请号:US15610890
申请日:2017-06-01
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Kayo KUMAKURA , Tomoya AOYAMA , Akihiro CHIDA , Kohei YOKOYAMA , Masakatsu OHNO , Satoru IDOJIRI , Hisao IKEDA , Hiroki ADACHI , Yoshiharu HIRAKATA , Shingo EGUCHI , Yasuhiro JINBO
IPC: B32B43/00 , H01L21/67 , H01L51/56 , G02B6/00 , B26D1/04 , B26D1/00 , H01L27/32 , H01L27/12 , B32B38/10
CPC classification number: B32B43/006 , B26D1/04 , B26D2001/006 , B32B38/10 , B32B2457/00 , G02B6/00 , H01L21/67092 , H01L27/1248 , H01L27/3258 , H01L27/3262 , H01L51/56 , H01L2221/68327 , H01L2227/323 , H01L2251/5338 , Y10T156/1126 , Y10T156/1132 , Y10T156/1168 , Y10T156/1179 , Y10T156/1184 , Y10T156/1928 , Y10T156/1933 , Y10T156/1944 , Y10T156/1961 , Y10T156/1967 , Y10T156/1989
Abstract: A processing apparatus of a stack is provided. The stack includes two substrates attached to each other with a gap provided between their end portions. The processing apparatus includes a fixing mechanism that fixes part of the stack, a plurality of adsorption jigs that fix an outer peripheral edge of one of the substrates of the stack, and a wedge-shaped jig that is inserted into a corner of the stack. The plurality of adsorption jigs include a mechanism that allows the adsorption jigs to move separately in a vertical direction and a horizontal direction. The processing apparatus further includes a sensor sensing a position of the gap between the end portion in the stack. A tip of the wedge-shaped jig moves along a chamfer formed on an end surface of the stack. The wedge-shaped jig is inserted into the gap between the end portions in the stack.
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公开(公告)号:US20170021394A1
公开(公告)日:2017-01-26
申请号:US15302260
申请日:2015-04-13
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Masakatsu OHNO , Kayo KUMAKURA , Satoru IDOJIRI , Yoshiharu HIRAKATA , Kohei YOKOYAMA
CPC classification number: B08B1/006 , B08B11/00 , B25J11/0085 , B25J15/0206 , B32B37/0046 , B32B37/02 , B32B38/162 , B32B38/18 , B32B39/00 , H01L21/02 , H01L21/02096 , H01L21/67046 , H01L21/67092 , H01L21/7806
Abstract: An object is to eliminate a harmful effect when a film is bonded by wiping an adhering sealant (30a). Characterized is a wiping device (200) including a stage (230) that supports a sheet-like member (220), a wiping means (210) that wipes an adhering object (30a) adhering on a peripheral portion of the sheet-like member (220), a wiping cloth (241) that is attachably and detachably provided for the wiping means (210), and a solvent (261) that adheres to the wiping cloth (241), in which the wiping means (210) is provided with the wiping cloth (241), makes the solvent (261) adhere to the wiping cloth (241), and wipes the adhering object (30a), or a stack manufacturing apparatus (1000) including such a wiping device (200).
Abstract translation: 目的是通过擦拭粘合的密封剂(30a)来粘合薄膜来消除有害影响。 特征在于包括支撑片状构件(220)的台(230)的擦拭装置(200),擦拭附着在片状构件(220)的周边部分上的粘附物(30a)的擦拭装置 (220),可擦拭装置(210)可拆卸地设置的擦拭布(241)和粘附到所述擦拭布(241)的溶剂(261),其中设置有擦拭装置(210) 通过擦拭布(241)将溶剂(261)粘附到擦拭布(241)上,并擦拭粘附物(30a)或包括这种擦拭装置(200)的叠层制造装置(1000)。
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公开(公告)号:US20150314424A1
公开(公告)日:2015-11-05
申请号:US14696515
申请日:2015-04-27
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Kayo KUMAKURA , Satoru IDOJIRI , Masakatsu OHNO , Koichi TAKESHIMA , Yoshiharu HIRAKATA , Kohei YOKOYAMA
CPC classification number: B25B11/005 , B29C53/18 , B29L2007/002 , H01L21/68742 , H01L21/6875
Abstract: A film-like member is supported in a flat shape by vacuum suction. A plurality of lift pins are arranged in a planar configuration and bear a film-like member placed on their upper ends. Tubular pads made of rubber for holding the film-like member by vacuum suction are attached to upper portions of the lift pins. The height of the lift pins can be adjusted by a screw fastening mechanism. The deformation of the film-like member can be corrected to a flat or concavely curved shape by suction from the pads. When the correction cannot be achieved by suction alone, the correction may be supplemented by ejection of air from a nozzle.
Abstract translation: 膜状构件通过真空抽吸被支撑为平坦的形状。 多个提升销布置成平面构造并且承载放置在其上端的薄膜状构件。 由橡胶制成的用于通过真空吸附保持膜状构件的管状垫被附接到提升销的上部。 提升销的高度可以通过螺钉固定机构进行调整。 膜状构件的变形可以通过从衬垫的抽吸来校正为平坦或凹形弯曲的形状。 当仅通过抽吸不能实现校正时,可以通过从喷嘴喷出空气来补充校正。
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公开(公告)号:US20200235323A1
公开(公告)日:2020-07-23
申请号:US16842820
申请日:2020-04-08
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Masakatsu OHNO , Kayo KUMAKURA , Hiroyuki WATANABE , Seiji YASUMOTO , Satoru IDOJIRI , Hiroki ADACHI
Abstract: The yield of a separation process is improved. The mass productivity of a display device which is formed through a separation process is improved. A layer is formed over a substrate with use of a material including a resin or a resin precursor. Next, a resin layer is formed by performing heat treatment on the layer. Next, a layer to be separated is formed over the resin layer. Then, the layer to be separated and the substrate are separated from each other. The heat treatment is performed in an atmosphere containing oxygen or while supplying a gas containing oxygen.
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公开(公告)号:US20160243812A1
公开(公告)日:2016-08-25
申请号:US15147020
申请日:2016-05-05
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Kayo KUMAKURA , Tomoya AOYAMA , Akihiro CHIDA , Kohei YOKOYAMA , Masakatsu OHNO , Satoru IDOJIRI , Hisao IKEDA , Hiroki ADACHI , Yoshiharu HIRAKATA , Shingo EGUCHI , Yasuhiro JINBO
CPC classification number: B32B43/006 , B26D1/04 , B26D2001/006 , B32B38/10 , B32B2457/00 , G02B6/00 , H01L21/67092 , H01L27/1248 , H01L27/3258 , H01L27/3262 , H01L51/56 , H01L2221/68327 , H01L2227/323 , H01L2251/5338 , Y10T156/1126 , Y10T156/1132 , Y10T156/1168 , Y10T156/1184 , Y10T156/1933 , Y10T156/1944 , Y10T156/1961 , Y10T156/1967
Abstract: A processing apparatus of a stack is provided. The stack includes two substrates attached to each other with a gap provided between their end portions. The processing apparatus includes a fixing mechanism that fixes part of the stack, a plurality of adsorption jigs that fix an outer peripheral edge of one of the substrates of the stack, and a wedge-shaped jig that is inserted into a corner of the stack. The plurality of adsorption jigs include a mechanism that allows the adsorption jigs to move separately in a vertical direction and a horizontal direction. The processing apparatus further includes a sensor sensing a position of the gap between the end portion in the stack. A tip of the wedge-shaped jig moves along a chamfer formed on an end surface of the stack. The wedge-shaped jig is inserted into the gap between the end portions in the stack.
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