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公开(公告)号：US4618469A
公开(公告)日：1986-10-21
申请号：US607476
申请日：1984-05-07
CPC分类号： D01F6/40 , C08K3/0091 , D01F1/07
摘要： The present invention discloses a flame-retardant acrylic synthetic fiber comprising acrylonitrile and a vinyl monomer copolymerizable therewith and containing a finely divided inorganic tin compound. The fiber has high flame retardancy, outstanding gloss and transparency, and satisfactory whiteness and dyeability.
摘要翻译： 本发明公开了一种包含丙烯腈和可与其共聚并含有细碎无机锡化合物的乙烯基单体的阻燃丙烯酸类合成纤维。 该纤维具有高阻燃性，优异的光泽和透明度，以及令人满意的白度和染色性。
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公开(公告)号：US06162747A
公开(公告)日：2000-12-19
申请号：US147256
申请日：1998-11-10
CPC分类号： D02G3/443 , D01F1/07 , D03D15/12 , Y10S428/921 , Y10T428/2913 , Y10T428/2927 , Y10T428/2929 , Y10T442/313 , Y10T442/3171
摘要： A flame retardant cloth, used for example in interiors as a material for curtains, comprises (A) 60-40 parts by weight of fiber which contains 8-70 wt. % of halogen chemically bonded to a polymer and 1-8 wt. % of Sb compound not chemically bonded to a polymer, and has a shirnkage factor at 240.degree. C. of not less than 40% under a load of 300 mg/metric count yarn count (17), and (B) 60-40 parts by weight of polyester fiber, which compounded making a total of 100 parts by weight. This cloth can retain its high fire retardance even after it has been subjected to a process using a binder, such as pigment printing, and enables the range of application of a compound flame retadant fiber product comprising polyester fiber and halogen-containing fiber to be further widened.
摘要翻译： PCT No.PCT / JP97 / 01594 Sec。 371日期：1998年11月10日 102（e）1998年11月10日日期PCT提交1997年5月12日PCT公布。 公开号WO97 / 43474 日期：1997年11月20日一种阻燃布，例如用作窗帘材料的内部，包括（A）60-40重量份含有8-70重量％ 化学键合到聚合物上的卤素的％和1-8wt。 ％的Sb化合物与化合物没有化学键合，并且在300mg /计量纱数（17）的负载下，在240℃下具有不低于40％的遮光因子，（B）60-40份 的聚酯纤维，其混合总共为100重量份。 即使在使用诸如颜料印刷的粘合剂进行处理之后，该布也可以保持其高阻燃性，并且能够使包含聚酯纤维和含卤素纤维的复合阻燃纤维制品的应用范围进一步扩大 扩大了
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公开(公告)号：US5981407A
公开(公告)日：1999-11-09
申请号：US180285
申请日：1998-11-10
CPC分类号： D03D15/12 , D01F1/07 , D02G3/443 , Y10T428/294 , Y10T428/2958 , Y10T428/2967 , Y10T442/3049 , Y10T442/313 , Y10T442/3984 , Y10T442/419
摘要： Provided is a flame-retardant fabric comprising (A) from 16 to 45 parts by weight of a halogen-containing fiber containing from 11 to 67% by weight of a halogen chemically bound to a polymer and from 4 to 30% by weight of an Sb compound not chemically bound to a polymer, (B) from 10 to 36 parts by weight of a polyvinyl alcohol fiber, and (C) from 60 to 40 parts by weight of a polyester fiber, which are compounded to total 100 parts by weight. The flame-retardant fabric of the present invention has an excellent heat resistance, an excellent processability and a high flame retardance. This fabric can improve the feeling after high-temperature processing such as transfer printing and further widen the range of application of a polyester fiber product.
摘要翻译： PCT No.PCT / JP97 / 01597 Sec。 371日期：1998年11月10日 102（e）1998年11月10日日期PCT提交1997年5月12日PCT公布。 第WO97 / 43475号公报 日期1997年11月20日提供阻燃织物，其包含（A）16至45重量份含有11至67重量％的与聚合物化学键合的卤素和4至30重量份的含卤素纤维 未与化合物结合的Sb化合物的重量％，（B）10〜36重量份的聚乙烯醇纤维，（C）60〜40重量份的聚酯纤维， 共100重量份。 本发明的阻燃性织物具有优异的耐热性，优异的加工性和高阻燃性。 这种织物可以改善转印后的高温加工后的感觉，进一步拓宽了聚酯纤维制品的应用范围。
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4.发明授权Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method 有权基板处理装置，基板处理方法，基板保持机构和基板保持方法公开(公告)号：US08795032B2
公开(公告)日：2014-08-05
申请号：US12457175
申请日：2009-06-03
申请人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
发明人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
IPC分类号： B24B51/00
CPC分类号： B24B37/345 , H01L21/30625 , H01L21/67219 , H01L21/67739 , H01L21/67742 , H01L21/67754 , Y10T137/0318 , Y10T137/8593
摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.
摘要翻译： 公开了一种用于处理衬底的设备。 该装置包括：抛光部，其被配置为对基板进行抛光;移动机构，被配置为传送基板;以及清洁部，其构造成清洁和干燥被研磨的基板。 清洗部具有多个用于清洗多个基板的清洗线。 多个清洁线具有多个清洁模块和用于传送基板的多个传送机器人。
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5.发明授权Substrate holding apparatus, substrate holding method, and substrate processing apparatus 有权基板保持装置，基板保持方法和基板处理装置公开(公告)号：US08777198B2
公开(公告)日：2014-07-15
申请号：US13398216
申请日：2012-02-16
申请人： Masahiko Sekimoto , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
发明人： Masahiko Sekimoto , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
IPC分类号： B23Q1/00
CPC分类号： H01L21/67086 , H01L21/67051 , H01L21/687
摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.
摘要翻译： 基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。 基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。 基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。
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公开(公告)号：US08487284B2
公开(公告)日：2013-07-16
申请号：US13356563
申请日：2012-01-23
CPC分类号： B29C59/165 , A61L27/04 , A61L27/50 , A61L29/02 , A61L29/14 , A61L31/022 , A61L31/14 , A61L2400/18 , B29C2035/0827 , B29L2031/753 , B29L2031/7534 , B29L2031/7542
摘要： The present invention provides endovascular devices and the methods of making and using the same. The endovascular device is a prohealing endovascular device that comprises a super hydrophilic surface. The super hydrophilic surface is generated by a method comprising a step of irradiating a surface of the endovascular device with a high energy radiation for a period of time to cause the surface to become super hydrophilic.
摘要翻译： 本发明提供血管内装置及其制造和使用方法。 血管内装置是包括超亲水表面的预热血管内装置。 超级亲水性表面通过包括以高能量辐射照射血管内装置的表面一段时间以使表面变得超亲水的步骤的方法产生。
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公开(公告)号：US07796873B2
公开(公告)日：2010-09-14
申请号：US12044102
申请日：2008-03-07
申请人： Yukio Uenaka , Takahiro Ogawa
发明人： Yukio Uenaka , Takahiro Ogawa
IPC分类号： G03B17/00
CPC分类号： H04N5/23248 , H04N5/23287
摘要： An anti-shake apparatus (an image-stabilization apparatus) of a photographing device comprises a movable unit and a controller. The movable unit has an imaging device and is movable and rotatable for an anti-shake operation. The controller controls the movable unit for the anti-shake operation. The controller calculates a hand-shake angle caused by roll. The controller controls whether the anti-shake operation is performed for correcting hand-shake caused by roll, on the basis of the hand-shake angle caused by roll.
摘要翻译： 拍摄装置的防抖装置（图像稳定装置）包括可移动单元和控制器。 可移动单元具有成像装置，并且可移动并且可旋转以进行防抖操作。 控制器控制可动单元进行防抖操作。 控制器计算由滚动导致的手抖动角度。 控制器根据由滚动导致的手抖动角度来控制是否执行用于校正由滚动导致的手抖动的防抖操作。
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8.发明申请Substrate processing apparatus, substrate transfer apparatus, substrate clamp apparatus, and chemical liquid treatment apparatus 审中-公开基板处理装置，基板输送装置，基板夹紧装置和药液处理装置公开(公告)号：US20090067959A1
公开(公告)日：2009-03-12
申请号：US11665963
申请日：2007-02-21
申请人： Nobuyuki Takahashi , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
发明人： Nobuyuki Takahashi , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
IPC分类号： H01L21/67
CPC分类号： H01L21/67219 , B24B37/345 , H01L21/6719 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/67766 , H01L21/68707
摘要： The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections (3a, 3b) each for polishing a semiconductor wafer (W), and a swing transporter (7) for transferring the wafer (W). The swing transporter (7) includes a wafer clamp mechanism (112) adapted to clamp the wafer (W), a vertically moving mechanism (104, 106) for vertically moving the wafer clamp mechanism (112) along a frame (102) of a casing of the polishing section (3a), and a swing mechanism (108, 110) for swinging the wafer clamp mechanism (112) about a shaft adjacent to the frame (102).
摘要翻译： 本发明涉及能够提高基板处理的节拍时间的基板处理装置。 作为基板处理装置的研磨装置包括：用于研磨半导体晶片（W）的多个研磨部（3a，3b）和用于转印晶片（W）的摆动传送装置（7）。 摆动传送器（7）包括适于夹紧晶片（W）的晶片夹紧机构（112），用于沿着晶片夹持机构（102）的框架（102）垂直移动的垂直移动机构（104,106） 抛光部分（3a）的外壳和用于使晶片夹紧机构（112）围绕与框架（102）相邻的轴摆动的摆动机构（108,110）。
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公开(公告)号：US20090048753A1
公开(公告)日：2009-02-19
申请号：US12162223
申请日：2006-01-31
申请人： Takahiro Ogawa , Helge Westerfeld
发明人： Takahiro Ogawa , Helge Westerfeld
IPC分类号： B60T8/1755
CPC分类号： B60T8/1706 , B60T8/1766 , B60T8/261 , B60T8/3225 , B60T2230/03 , B60T2240/06
摘要： To reliably control and prevent rear wheel lifting caused by an abrupt brake operation.An amount of change in vehicle body deceleration is computed on the basis of detection signals of wheel velocity sensors 45 and 46 (S102), it is determined whether or not that computed value exceeds a predetermined value K1 (S104), and when it is determined that the computed value exceeds the predetermined value K1, then it is determined that there is the potential for rear wheel lifting, reduction of a pressure increase gradient of wheel cylinder pressure is performed (S106) until the amount of change in vehicle body deceleration falls below the predetermined value K1, and lifting of the rear wheel is reliably controlled.
摘要翻译： 可靠地控制和防止由突然制动操作引起的后轮提升。 基于车轮速度传感器45和46的检测信号计算车身减速度的变化量（S102），判定该计算值是否超过规定值K1（S104），并且当确定 计算值超过预定值K1，则确定存在后轮提升的可能性，执行轮缸压力的压力增加梯度的减小（S106），直到车体减速度的变化量低于 可靠地控制预定值K1和后轮的提升。
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公开(公告)号：US20060243204A1
公开(公告)日：2006-11-02
申请号：US11454790
申请日：2006-06-19
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
CPC分类号： H01L21/67161 , C23C18/1628 , C23C18/1893 , C25D7/123 , C25D17/001 , C25D17/08 , H01L21/67051 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/6723 , H01L21/67742 , H01L21/67751 , H01L21/67766 , H01L21/67781 , H01L21/68707 , H01L21/68721 , Y10S134/902 , Y10T279/11
摘要： The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.
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