公开(公告)号：US5078495A

公开(公告)日：1992-01-07

申请号：US478568

申请日：1990-02-12

申请人： Tatsuo Harada ,  Toshiei Kurosaki ,  Tsuneo Terasawa ,  Toshiaki Kita

发明人： Tatsuo Harada ,  Toshiei Kurosaki ,  Tsuneo Terasawa ,  Toshiaki Kita

IPC分类号： G01J3/18 ,  G02B5/18

CPC分类号： G01J3/1804 ,  G01J2003/1847

摘要： A plane grating, particularly for a monochronomator, is provided with varied-spaced straight and parallel grooves in a light beam path to compensate for other light affecting components, for example a spherical mirror used for collimating or focusing the light beam. The angle of incidence with respect to the light for each of the grooves may vary and the angle of diffraction with respect to the light for each groove may be required to vary with the imperfection of collimation and focusing of the beam. The grooves are varied in their spacing to compensate for the variation of both incidence and diffraction direction.

摘要翻译： 特别是用于单声道同步器的平面光栅在光束路径中设置有不同间隔的直的和平行的凹槽，以补偿其它影响光的部件，例如用于准直或聚焦光束的球面镜。 相对于每个凹槽的光的入射角可以变化，并且可能需要相对于每个凹槽的光的衍射角度随着光束的准直和聚焦的不完善而变化。 凹槽的间距是变化的，以补偿入射和衍射方向的变化。

公开(公告)号：US4983039A

公开(公告)日：1991-01-08

申请号：US370034

申请日：1989-06-22

申请人： Tatsuo Harada ,  Toshiei Kurosaki ,  Toshiaki Kita ,  Tsuneo Terasawa

发明人： Tatsuo Harada ,  Toshiei Kurosaki ,  Toshiaki Kita ,  Tsuneo Terasawa

IPC分类号： G01J3/18 ,  G01J3/00 ,  G01J3/04 ,  G01J3/28 ,  G01J3/30 ,  G01J3/443 ,  G01J9/00 ,  G03F7/20 ,  H01S3/137 ,  H01S3/225

CPC分类号： G03F7/70575 ,  G01J3/04 ,  G01J3/28 ,  G01J9/00 ,  H01S3/137 ,  G01J2003/047 ,  G01J2003/1847 ,  G01J2003/2866 ,  G01J3/0294 ,  G01J3/1804 ,  G01J3/2803 ,  H01S3/225

摘要： A spectrometer is disclosed, in which plural entrance slits are mounted, and a reference light passing through one entrance slit and the light to be measured passing through the other entrance slit are simultaneously focused on a photo-sensitive surface of a detector through a diffraction grating and a focusing optical system, to measure the wavelength of the light to be measured precisely by using the reference light as a standard.

摘要翻译： 公开了一种光谱仪，其中安装有多个入口狭缝，并且通过一个入口狭缝的参考光和通过另一个入口狭缝的被测光同时通过衍射光栅聚焦在检测器的光敏表面上 以及聚焦光学系统，通过使用参考光作为标准，精确地测量要测量的光的波长。

公开(公告)号：US4597669A

公开(公告)日：1986-07-01

申请号：US539760

申请日：1983-10-07

申请人： Tsuneo Terasawa ,  Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka

发明人： Tsuneo Terasawa ,  Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka

IPC分类号： G01B11/00 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G01N21/86

CPC分类号： G03F9/70 ,  H01L21/30

摘要： A pattern detector according to the present invention adopts a processing method wherein means is provided anew with which the intensity distribution of light reflected from or transmitted through an illuminated specimen is photoelectrically converted, and a pattern position is detected at high speed from the ratio between the primary moment and integral value of a detection signal thus derived, whereupon a symmetry calculation is executed within a narrow range around the detected value, whereby the pattern position is found fast and precisely.

摘要翻译： 根据本发明的图案检测器采用一种处理方法，其中重新提供装置，其中从被照射的样品反射或透射的光的光强分布被光电转换，并且以高速的比例检测图案位置 这样得到的检测信号的初始矩和积分值，由此在检测值附近的窄范围内执行对称计算，从而快速且精确地找到图案位置。

公开(公告)号：US5235400A

公开(公告)日：1993-08-10

申请号：US418525

申请日：1989-10-10

申请人： Tsuneo Terasawa ,  Norio Hasegawa ,  Toshihiko Tanaka ,  Hiroshi Fukuda ,  Toshiei Kurosaki

发明人： Tsuneo Terasawa ,  Norio Hasegawa ,  Toshihiko Tanaka ,  Hiroshi Fukuda ,  Toshiei Kurosaki

IPC分类号： G01N21/45 ,  G01N21/956 ,  G03F7/20

CPC分类号： G03F7/70866 ,  G01N21/956 ,  G01N21/45

摘要： A method of and an apparatus for detecting a defect on a phase-shifting mask for use in a projection aligner in which either or both of respective intensities of transmitted and reflected light beams from the mask illuminated with light are used for detecting a defect on the mask.

摘要翻译： 一种用于检测用于投影对准器的相移掩模上的缺陷的方法和装置，其中使用由光照射的掩模的透射和反射光束的各个强度中的任一个或两个来检测 面具。

公开(公告)号：US4504726A

公开(公告)日：1985-03-12

申请号：US327627

申请日：1981-12-04

申请人： Sumio Hosaka ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Yoshio Kawamura ,  Tsuneo Terasawa

发明人： Sumio Hosaka ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Yoshio Kawamura ,  Tsuneo Terasawa

IPC分类号： B23K26/08 ,  B23K26/12 ,  B41M5/24 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/428

CPC分类号： B23K26/0861 ,  B23K26/12 ,  B23K26/1224 ,  B23K26/123 ,  B41M5/24 ,  G03F1/76 ,  G03F7/704 ,  G03F7/70875 ,  H01L21/30

摘要： A pattern generator in which a workpiece to be machined into a desired pattern shape is held in vacuum and is irradiated with a laser beam condensed to be fine, while scanning the laser beam so as to depict the desired pattern shape, whereby the workpiece is directly machined in conformity with the desired pattern shape. As the workpiece, one in which a shading film (for example, chromium film) is deposited on a transparent glass substrate is employed, and it is irradiated with the laser beam in the vacuum, whereby the irradiated parts of the shading film are vaporized to fabricate a shading mask pattern of good quality.

摘要翻译： 一种图案发生器，其中待加工成所需图案形状的工件被保持在真空中并且被激光束照射以被精细地聚焦，同时扫描激光束以便描绘所需的图案形状，由此工件直接 根据所需的图案形状加工。 作为工件，使用在透明玻璃基板上沉积遮光膜（例如，铬膜）的工件，并在真空中照射激光束，使遮光膜的照射部分蒸发至 制作质量好的遮光罩图案。

公开(公告)号：US4441206A

公开(公告)日：1984-04-03

申请号：US330778

申请日：1981-12-14

申请人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Sumio Hosaka ,  Yoshio Kawamura ,  Tsuneo Terasawa

发明人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Sumio Hosaka ,  Yoshio Kawamura ,  Tsuneo Terasawa

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G06K9/20 ,  G06K9/00 ,  H04N7/00

CPC分类号： G03F9/7088 ,  H01L21/30

摘要： A pattern detecting apparatus is disclosed which comprises, in order to detect the center of a positioning pattern on a sample with high accuracy in a wide range, means for illuminating the positioning pattern, means for defining an illumination range in which the positioning pattern is illuminated, means for focusing reflected light from the positioning pattern on a predetermined image plane, means for electrically detecting a bright and dark image on the image plane in accordance with positions on the image plane, means for removing a signal corresponding to the outside of the illumination range from the output signal of the detecting means and for holding, in place of the removed signal, a level of the output signal produced within the illumination range, and means for detecting a position of the center of the positioning pattern from the output signal of the holding means.

摘要翻译： 公开了一种图案检测装置，其包括为了在宽范围内高精度地检测样品上的定位图案的中心，用于照亮定位图案的装置，用于限定定位图案被照亮的照明范围的装置 用于将来自定位图案的反射光聚焦在预定图像平面上的装置，用于根据图像平面上的位置电学检测图像平面上的亮和暗图像的装置，用于去除对应于照明外部的信号的装置 范围从检测装置的输出信号，并且代替去除的信号，保持在照明范围内产生的输出信号的电平，以及用于从位置图的输出信号中检测定位图案的中心的位置的装置 持有手段。

公开(公告)号：US4798470A

公开(公告)日：1989-01-17

申请号：US927939

申请日：1986-11-07

申请人： Shigeo Moriyama ,  Toshiei Kurosaki ,  Tsuneo Terasawa ,  Shinji Okazaki ,  Yoshio Kawamura

发明人： Shigeo Moriyama ,  Toshiei Kurosaki ,  Tsuneo Terasawa ,  Shinji Okazaki ,  Yoshio Kawamura

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7026 ,  G03F9/7076 ,  G03F9/7084

摘要： A pattern printing method includes a step of printing a pattern on a wafer on the basis of a target mark provided on the surface of the wafer which is opposite to the surface thereof on which the pattern is to be printed. Also disclosed is a pattern printing apparatus which comprises detecting means for detecting a target mark provided on the surface of a wafer which is opposite to the surface thereof on which a pattern is to be printed, and pattern printing means for printing the pattern on the pattern printing surface of the wafer on the basis of mark position data obtained by the detecting means.

摘要翻译： 图案印刷方法包括基于设置在与要印刷图案的表面相对的晶片表面上的目标标记在晶片上印刷图案的步骤。 还公开了一种图案打印装置，其包括检测装置，用于检测设置在与其上要印刷图案的表面相对的晶片表面上的目标标记，以及用于在图案上印刷图案的图案印刷装置 基于由检测装置获得的标记位置数据，晶片的印刷表面。

公开(公告)号：US4614432A

公开(公告)日：1986-09-30

申请号：US545642

申请日：1983-10-26

申请人： Shinji Kuniyoshi ,  Tsuneo Terasawa ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka ,  Akihiro Takanashi

发明人： Shinji Kuniyoshi ,  Tsuneo Terasawa ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka ,  Akihiro Takanashi

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F9/70

摘要： A pattern detector for precise position measurement of a wafer, used in a mask aligner used in manufacturing a semiconductor device is disclosed. A positioning pattern on the wafer is magnified and projected by a magnifying optical system and the magnified projected image is precisely detected to determine a position of the positioning pattern. As a light to form the magnified projected image, plurality of monochromatic lights of different wavelengths are available through optical filters and the magnifying optical systems are arranged one for each of the monochromatic lights. By selecting one of the optical filters, the magnified projected image of the positioning pattern is formed by the monochromatic light having an optimum wavelength to the wafer and the precise position of the positioning pattern on the wafer can be detected.

摘要翻译： 公开了一种用于在用于制造半导体器件的掩模对准器中使用的用于晶片的精确位置测量的图案检测器。 晶片上的定位图案由放大光学系统放大和投影，并且精确地检测放大的投影图像以确定定位图案的位置。 作为形成放大投影图像的光，通过光学滤光器可以获得不同波长的多个单色光，并且放大光学系统针对每个单色光布置一个。 通过选择一个滤光器，通过对晶片具有最佳波长的单色光来形成定位图案的放大投影图像，并且可以检测晶片上的定位图案的精确位置。

公开(公告)号：US4477183A

公开(公告)日：1984-10-16

申请号：US445079

申请日：1982-11-29

申请人： Yoshio Kawamura ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Tsuneo Terasawa

发明人： Yoshio Kawamura ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Tsuneo Terasawa

IPC分类号： H01L21/30 ,  G02B7/28 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7026 ,  G02B7/28 ,  G03F9/7057

摘要： An automatic focusing apparatus according to the present invention is constructed of a base on which a substrate is placed, detection means for detecting a pressure of air which is caused to flow out of an interspace between the substrate and an orifice by spurting the air from the orifice toward the substrate, reference pressure generation means for generating a reference pressure which is necessary for setting a standard distance between the substrate and the orifice, a pressure transducer which receives pressure signals from said detection means and said reference pressure generation means and which converts a pressure difference between these pressure signals into an electric signal, base drive means for moving the substrate in parallel with the orifice on the basis of the output signal from said pressure transducer, and offset signal generation means for generating a signal which, when superposed on the output signal from said pressure transducer, serves to shift the substrate from the standard distance.

摘要翻译： 根据本发明的自动对焦装置由放置基板的基座构成，检测装置用于检测从基板和孔之间的空隙流出的空气的压力， 基准压力产生装置，用于产生设置基板和孔口之间的标准距离所必需的参考压力;压力传感器，其接收来自所述检测装置和所述基准压力产生装置的压力信号， 这些压力信号之间的压力差成为电信号;基础驱动装置，用于基于来自所述压力传感器的输出信号与所述孔平行地移动所述基板，以及偏移信号产生装置，用于产生当叠加在所述压力信号上时， 来自所述压力传感器的输出信号用于使衬底移动 标准距离。

公开(公告)号：US09063098B2

公开(公告)日：2015-06-23

申请号：US13549482

申请日：2012-07-15

申请人： Tsuneo Terasawa ,  Osamu Suga

发明人： Tsuneo Terasawa ,  Osamu Suga

IPC分类号： G03F1/84 ,  G01N21/88 ,  G01N21/956

CPC分类号： G03F1/22 ,  G01N21/8806 ,  G01N21/95 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84

摘要： There is provided a method of high-sensitively detecting both of a phase defect existing in a mask blank and a phase defect remaining after manufacturing an EUVL mask. When the mask blank is inspected, EUV light having illumination NA to be within an inner NA but a larger value is irradiated. When the EUVL mask is inspected, by using a dark-field imaging optical system including a center shielding portion for shielding EUV light and a linear shielding portion for shielding the EUV light whose width is smaller than a diameter of the center shielding portion, the center shielding portion and the linear shielding portion being included in a pupil plane, the EUV light having illumination NA as large as or smaller than the width of the linear shielding portion is irradiated.

摘要翻译： 提供了一种高灵敏度地检测存在于掩模坯料中的相位缺陷和在制造EUVL掩模之后剩余的相缺陷的方法。 当检查掩模毛坯时，照射具有NA内但NA值越大的EUV光。 当检查EUVL掩模时，通过使用包括用于屏蔽EUV光的中心屏蔽部分和用于屏蔽宽度小于中心屏蔽部分的直径的EUV光的线性屏蔽部分的暗视场成像光学系统，中心 屏蔽部分和线性屏蔽部分包括在光瞳平面中，照射具有大于或等于线状屏蔽部分的宽度的照明NA的EUV光。