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    Method of removing smear from via holes
    2.
    发明授权
    Method of removing smear from via holes 失效
    从通孔去除涂片的方法

    公开(公告)号：US06766811B2

    公开(公告)日：2004-07-27

    申请号：US10213619

    申请日：2002-08-07

    申请人： Toshihisa Shimo ,  Kyoko Kumagai ,  Toshiki Inoue ,  Yoshifumi Kato ,  Takashi Yoshida ,  Masanobu Hidaka

    发明人： Toshihisa Shimo ,  Kyoko Kumagai ,  Toshiki Inoue ,  Yoshifumi Kato ,  Takashi Yoshida ,  Masanobu Hidaka

    IPC分类号： H01L21302

    CPC分类号： H05K3/0055 ,  H01L2924/0002 ,  H05K3/0035 ,  H05K3/421 ,  H05K2201/0394 ,  H05K2203/0796 ,  H01L2924/00

    摘要： An aqueous solution containing sulfuric acid and hydrogen peroxide is used for a soft etchant in a soft etching step in a smear removing process performed prior to a catalyst applying process for chemical copper plating after formation of via holes through an insulating layer of a multi-layer substrate by irradiation of laser. The concentration of sulfuric acid is 2.4 times or less than the concentration of hydrogen peroxide. Preferably, the concentration of sulfuric acid is in a range of 9 to 90 g/l, and the concentration of sulfuric acid is lower than the concentration of hydrogen peroxide. More preferably, the concentration of sulfuric acid is in a range of 9 to 18 g/l, and the concentration of hydrogen peroxide is in a range of 33 to 38.5 g/l. As a result, smear can be certainly removed without excessively etching a conductive layer in the smear removing process.

    摘要翻译： 含硫酸和过氧化氢的水溶液在软蚀刻步骤中用于软蚀刻剂，在用于化学镀铜的催化剂施加过程之后，在通过多层绝缘层形成通孔之后， 基板通过激光照射。 硫酸的浓度是过氧化氢浓度的2.4倍以下。 优选地，硫酸的浓度在9〜90g / l的范围内，硫酸的浓度低于过氧化氢的浓度。 更优选的是，硫酸的浓度为9〜18g / l，过氧化氢的浓度为33〜38.5g / l。 结果，在涂抹去除过程中，可以肯定地除去涂层而不过度蚀刻导电层。

    Electrolytic plating method and device for a wiring board
    3.
    发明授权
    Electrolytic plating method and device for a wiring board 失效
    电镀方法及布线板装置

    公开(公告)号：US06783654B2

    公开(公告)日：2004-08-31

    申请号：US09805841

    申请日：2001-03-14

    申请人： Toshiki Inoue ,  Kyoko Kumagai

    发明人： Toshiki Inoue ,  Kyoko Kumagai

    IPC分类号： C25D338

    CPC分类号： H05K3/423 ,  C25D5/18 ,  C25D21/14 ,  H05K2201/09563 ,  H05K2203/1492 ,  Y10S204/09

    摘要： A plating bath which accommodates an insoluble anode and a printed-circuit board, and a copper dissolved bath which supplies copper ions are arranged. The insoluble anode is arranged as opposed to the printed-circuit board being a cathode, and a forward/reverse current is applied between both of the electrodes. Iron ions are added to a plating solution.

    摘要翻译： 配置容纳不溶性阳极和印刷电路板的电镀槽以及供给铜离子的铜溶解浴。 与作为阴极的印刷电路板相反地布置不溶性阳极，并且在两个电极之间施加正向/反向电流。 将铁离子加入镀液中。

    CURING-TYPE COATING-AGENT COMPOSITION
    4.
    发明申请
    CURING-TYPE COATING-AGENT COMPOSITION 有权
    固化型涂料组合物

    公开(公告)号：US20140228468A1

    公开(公告)日：2014-08-14

    申请号：US14343323

    申请日：2012-08-27

    申请人： Hiroaki Takashima ,  Kyoko Kumagai ,  Hidetaka Hayashi ,  Tetsuya Mitsuoka ,  Naoharu Ueda ,  Hisashi Muramatsu ,  Kazumasa Inata ,  Takeshi Fujita ,  Yasuyuki Sanai ,  Eiichi Okazaki ,  Satoshi Yoneda ,  Naomasa Furuta

    发明人： Hiroaki Takashima ,  Kyoko Kumagai ,  Hidetaka Hayashi ,  Tetsuya Mitsuoka ,  Naoharu Ueda ,  Hisashi Muramatsu ,  Kazumasa Inata ,  Takeshi Fujita ,  Yasuyuki Sanai ,  Eiichi Okazaki ,  Satoshi Yoneda ,  Naomasa Furuta

    IPC分类号： C09D4/00 ,  C09D7/12

    CPC分类号： C09D4/00 ,  C08F290/067 ,  C08G18/672 ,  C08G18/673 ,  C08G18/792 ,  C08K9/06 ,  C09D7/63 ,  C09D175/16

    摘要： A curing-type coating-agent composition according to the present invention contains: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuricring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C-1) (e.g., a reaction compound between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass, or Component (C-2) (e.g., a specific organosilicon compound) in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.1 to 10 parts by mass; an ultraviolet absorber serving as Component (E) in an amount of from 1 to 12 parts by mass; and an organic solvent serving as Component (F) in an amount of from 10 to 1,000 parts by mass; with respect to a sum of the Component (A), the Component (B), and the Component (C-1) or the Component (C-2) being taken as 100 parts by mass. The aforementioned composition demonstrates excellent wear resistance and weatherability as a coating agent for plastic substrate, or the like, which is employed outside.

    摘要翻译： 本发明的固化型涂布剂组合物含有20〜80质量份的成分（A）（例如异氰脲酸环的氨基甲酸酯（甲基）丙烯酸酯化合物））; 组分（B）（例如，不含任何氨基甲酸酯键的含异氰脲酸酯的三（甲基）丙烯酸酯化合物）的量为10〜70质量份; 组分（C-1）（例如，胶体二氧化硅和具有马来酰亚胺基团的烷氧基硅烷化合物之间的反应化合物）为1〜35质量份，或成分（C-2）（例如，特定的有机硅化合物 ）为5〜35质量份; 作为组分（D）的自由基聚合引发剂的量为0.1至10质量份; 作为组分（E）的紫外线吸收剂的量为1至12质量份; 和作为成分（F）的有机溶剂的量为10〜1000质量份; 相对于成分（A），成分（B）和成分（C-1）或成分（C-2）的合计为100质量份。 上述组合物表现出作为外部使用的塑料基材等的涂布剂的优异的耐磨性和耐候性。

    IN-LIQUID PLASMA FILM-FORMING APPARATUS, ELECTRODE FOR IN-LIQUID PLASMA, AND FILM-FORMING METHOD USING IN-LIQUID PLASMA
    7.
    发明申请
    IN-LIQUID PLASMA FILM-FORMING APPARATUS, ELECTRODE FOR IN-LIQUID PLASMA, AND FILM-FORMING METHOD USING IN-LIQUID PLASMA 有权
    液体等离子体成膜装置，液体等离子体电极和使用液体等离子体的成膜方法

    公开(公告)号：US20110229656A1

    公开(公告)日：2011-09-22

    申请号：US12671773

    申请日：2009-03-02

    申请人： Kenji Shibata ,  Toshihisa Shimo ,  Kyoko Kumagai ,  Hidetaka Hayashi ,  Shinya Okuda ,  Shinfuku Nomura ,  Hiromichi Toyota

    发明人： Kenji Shibata ,  Toshihisa Shimo ,  Kyoko Kumagai ,  Hidetaka Hayashi ,  Shinya Okuda ,  Shinfuku Nomura ,  Hiromichi Toyota

    IPC分类号： H05H1/48

    CPC分类号： C23C16/509 ,  C23C16/26 ,  C23C16/4485 ,  H01J37/32357

    摘要： In an in-liquid plasma film-forming apparatus having: a vessel 1 being capable of accommodating a substrate “S” and a liquid “L” including raw material therein; an electrode 2 for in-liquid plasma, electrode 2 which is disposed in the vessel 1; an electric power device 3 for supplying electricity to the electrode 2 for in-liquid plasma; the electrode 2 for in-liquid plasma is equipped with: a main electrode 21 having a discharging end 22; an auxiliary electrode 26 not only facing the discharging end 22 but also being disposed between the discharging end 22 and the substrate “S” that face each other; and a plasma generating unit 29 having a space that is demarcated by a surface 22a of the discharging end 22 and a surface 26a of the auxiliary electrode 26 facing the surface 22a, and being for generating plasma by means of electricity being supplied to the main electrode 21. And, a decomposed component of the raw material is deposited onto a surface of the substrate “S” by contacting the plasma, which has generated at the plasma generating unit 29, with the substrate “S.”By means of the present construction, it becomes feasible to generate plasma in liquid without ever using a second electrode that serves as a substrate.

    摘要翻译： 在液体等离子体成膜装置中，具有容纳基材“S”的容器1和包含原料的液体“L” 用于液体内等离子体的电极2，设置在容器1中的电极2; 用于向用于液体内等离子体的电极2供电的电力装置3; 用于液体内等离子体的电极2装备有：具有放电端22的主电极21; 辅助电极26不仅面向放电端22，而且还设置在放电端22和彼此相对的衬底“S”之间; 以及等离子体产生单元29，其具有由排放端22的表面22a和辅助电极26的面向表面22a的表面26a划分的空间，并且用于通过向主电极供电的方式产生等离子体 并且，通过使在等离子体产生单元29产生的等离子体与基板“S”接触，将原料的分解成分沉积在基板“S”的表面上。借助于本构造 在不用使用作为基板的第二电极的情况下，可以在液体中产生等离子体。

    Curing-type coating-agent composition
    8.
    发明授权
    Curing-type coating-agent composition 有权
    固化型包衣剂组合物

    公开(公告)号：US09403990B2

    公开(公告)日：2016-08-02

    申请号：US14343323

    申请日：2012-08-27

    申请人： Hiroaki Takashima ,  Kyoko Kumagai ,  Hidetaka Hayashi ,  Tetsuya Mitsuoka ,  Naoharu Ueda ,  Hisashi Muramatsu ,  Kazumasa Inata ,  Takeshi Fujita ,  Yasuyuki Sanai ,  Eiichi Okazaki ,  Satoshi Yoneda ,  Naomasa Furuta

    发明人： Hiroaki Takashima ,  Kyoko Kumagai ,  Hidetaka Hayashi ,  Tetsuya Mitsuoka ,  Naoharu Ueda ,  Hisashi Muramatsu ,  Kazumasa Inata ,  Takeshi Fujita ,  Yasuyuki Sanai ,  Eiichi Okazaki ,  Satoshi Yoneda ,  Naomasa Furuta

    IPC分类号： C09D4/00 ,  C09D7/12 ,  C08G18/67 ,  C08G18/79 ,  C08F290/06 ,  C09D175/16 ,  C08K9/06

    CPC分类号： C09D4/00 ,  C08F290/067 ,  C08G18/672 ,  C08G18/673 ,  C08G18/792 ,  C08K9/06 ,  C09D7/63 ,  C09D175/16

    摘要： A curing-type coating-agent composition according to the present invention contains: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuric ring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C-1) (e.g., a reaction compound between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass, or Component (C-2) (e.g., a specific organosilicon compound) in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.1 to 10 parts by mass; an ultraviolet absorber serving as Component (E) in an amount of from 1 to 12 parts by mass; and an organic solvent serving as Component (F) in an amount of from 10 to 1,000 parts by mass; with respect to a sum of the Component (A), the Component (B), and the Component (C-1) or the Component (C-2) being taken as 100 parts by mass. The aforementioned composition demonstrates excellent wear resistance and weatherability as a coating agent for plastic substrate, or the like, which is employed outside.

    摘要翻译： 本发明的固化型涂布剂组合物含有20〜80质量份的成分（A）（例如异氰脲酸环的氨基甲酸酯（甲基）丙烯酸酯化合物））; 组分（B）（例如，不含任何氨基甲酸酯键的含异氰脲酸酯的三（甲基）丙烯酸酯化合物）的量为10〜70质量份; 组分（C-1）（例如，胶体二氧化硅和具有马来酰亚胺基团的烷氧基硅烷化合物之间的反应化合物）为1〜35质量份，或成分（C-2）（例如，特定的有机硅化合物 ）为5〜35质量份; 作为组分（D）的自由基聚合引发剂的量为0.1至10质量份; 作为组分（E）的紫外线吸收剂的量为1至12质量份; 和作为成分（F）的有机溶剂的量为10〜1000质量份; 相对于成分（A），成分（B）和成分（C-1）或成分（C-2）的合计为100质量份。 上述组合物表现出作为外部使用的塑料基材等的涂布剂的优异的耐磨性和耐候性。

    MEMBER FOR VEHICLE AND MANUFACTURING PROCESS FOR THE SAME
    9.
    发明申请
    MEMBER FOR VEHICLE AND MANUFACTURING PROCESS FOR THE SAME 有权
    车辆及其制造工艺的成员

    公开(公告)号：US20150044477A1

    公开(公告)日：2015-02-12

    申请号：US14343336

    申请日：2012-08-27

    申请人： Hiroaki Takashima ,  Kyoko Kumagai ,  Hidetaka Hayashi ,  Tetsuya Mitsuoka ,  Naoharu Ueda ,  Hisashi Muramatsu ,  Kazumasa Inata ,  Takeshi Fujita ,  Yasuyuki Sanai ,  Eiichi Okazaki ,  Satoshi Yoneda ,  Naomasa Furuta

    发明人： Hiroaki Takashima ,  Kyoko Kumagai ,  Hidetaka Hayashi ,  Tetsuya Mitsuoka ,  Naoharu Ueda ,  Hisashi Muramatsu ,  Kazumasa Inata ,  Takeshi Fujita ,  Yasuyuki Sanai ,  Eiichi Okazaki ,  Satoshi Yoneda ,  Naomasa Furuta

    IPC分类号： C09D133/14 ,  C08K5/3492

    CPC分类号： C09D133/14 ,  C08J3/243 ,  C08J7/045 ,  C08J2433/06 ,  C08J2475/16 ,  C08J2483/02 ,  C08K5/3492 ,  Y10T428/31547

    摘要： A member for vehicle according to the present invention includes a resinous substrate, and a protective film being formed on a surface of the resinous substrate partially at least. The protective film is made by curing a curing-type coating-agent composition containing: Component (A) (e.g., an isocyanuric ring-containing urethane(meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., anisocyanuricring-containing urethane(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C) including a specific organosilicon compound in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.1 to 10 parts by mass; an ultraviolet absorber serving as Component (E) in an amount of from 1 to 12 parts by mass; and an organic solvent serving as Component (F) in an amount of from 10 to 1,000 parts by mass; with respect to a sum of the Component (A), the Component (B), and the Component (C) being taken as 100 parts by mass. Said protective film demonstrates excellent wear resistance and weatherability.

    摘要翻译： 根据本发明的车辆用部件包括树脂基板和至少部分地形成在树脂基板的表面上的保护膜。 保护膜通过固化含有20〜80质量份的组分（A）（例如，含异氰脲酸酯环的氨基甲酸酯（甲基）丙烯酸酯化合物））的固化型包衣剂组合物来制备; 组分（B）（例如不含任何氨基甲酸酯键的含异氰脲酸酯的氨基甲酸酯（甲基）丙烯酸酯化合物）的量为10〜70质量份; 含有5〜35质量份的特定有机硅化合物的成分（C） 作为组分（D）的自由基聚合引发剂的量为0.1至10质量份; 作为组分（E）的紫外线吸收剂的量为1至12质量份; 和作为成分（F）的有机溶剂的量为10〜1000质量份; 相对于成分（A），成分（B）和成分（C）的总和为100质量份。 所述保护膜具有优异的耐磨性和耐候性。