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    Imaging optics
    1.
    发明授权
    Imaging optics 有权
    成像光学

    公开(公告)号：US09201226B2

    公开(公告)日：2015-12-01

    申请号：US13438591

    申请日：2012-04-03

    申请人： Ulrich Loering ,  Ralf Mueller ,  Hans-Juergen Mann ,  Norman Baer

    发明人： Ulrich Loering ,  Ralf Mueller ,  Hans-Juergen Mann ,  Norman Baer

    IPC分类号： G03B27/54 ,  G02B17/06 ,  G02B5/00 ,  G02B27/00 ,  G03F7/20

    CPC分类号： G02B17/0657 ,  G02B5/005 ,  G02B27/0018 ,  G03F7/70233 ,  G03F7/70275

    摘要： An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The through-opening has an internal region of a smallest opening width in the mirror body. The through-opening expands from the internal region towards both edge regions of the mirror body. A disturbing influence of unused light portions is reduced or eliminated completely.

    摘要翻译： 成像光学器件包括多个反射镜，其反射成像光以将物平面中的物场成像到图像平面中的图像场。 至少一个反射镜的镜体具有用于成像光通过的通孔。 通孔具有镜体中最小开口宽度的内部区域。 通孔从内部区域向镜体的两个边缘区域扩展。 未使用的光部分的干扰影响被完全消除或消除。

    IMAGING OPTICS
    2.
    发明申请
    IMAGING OPTICS 有权
    成像光学

    公开(公告)号：US20120208115A1

    公开(公告)日：2012-08-16

    申请号：US13438591

    申请日：2012-04-03

    申请人： Ulrich Loering ,  Ralf Mueller ,  Hans-Juergen Mann ,  Norman Baer

    发明人： Ulrich Loering ,  Ralf Mueller ,  Hans-Juergen Mann ,  Norman Baer

    IPC分类号： G03F7/20 ,  G03B27/70 ,  G02B5/08 ,  F21V7/00 ,  B82Y40/00

    CPC分类号： G02B17/0657 ,  G02B5/005 ,  G02B27/0018 ,  G03F7/70233 ,  G03F7/70275

    摘要： An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The through-opening has an internal region of a smallest opening width in the mirror body. The through-opening expands from the internal region towards both edge regions of the mirror body. A disturbing influence of unused light portions is reduced or eliminated completely.

    摘要翻译： 成像光学器件包括多个反射镜，其反射成像光以将物平面中的物场成像到图像平面中的图像场。 至少一个反射镜的镜体具有用于成像光通过的通孔。 通孔具有镜体中最小开口宽度的内部区域。 通孔从内部区域向镜体的两个边缘区域扩展。 未使用的光部分的干扰影响被完全消除或消除。

    Symmetrical objective having four lens groups for microlithography
    3.
    发明授权
    Symmetrical objective having four lens groups for microlithography 有权
    具有用于微光刻的四个透镜组的对称物镜

    公开(公告)号：US07697211B2

    公开(公告)日：2010-04-13

    申请号：US12257156

    申请日：2008-10-23

    申请人： David R. Shafer ,  Aurelian Dodoc ,  Johannes Zellner ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Holger Walter ,  Ulrich Loering ,  Daniel Kraehmer ,  Gerhard Fuerter

    发明人： David R. Shafer ,  Aurelian Dodoc ,  Johannes Zellner ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Holger Walter ,  Ulrich Loering ,  Daniel Kraehmer ,  Gerhard Fuerter

    IPC分类号： G02B27/30

    CPC分类号： G02B13/143 ,  G02B13/26 ,  G03F7/70241

    摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

    摘要翻译： 本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台 。 在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。 用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位 到所述透镜系统的光轴。

    LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
    6.
    发明申请
    LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME 有权
    图像投影目标和校正其图像缺陷的方法

    公开(公告)号：US20120019800A1

    公开(公告)日：2012-01-26

    申请号：US13245116

    申请日：2011-09-26

    申请人： Ulrich Loering ,  Vladan Blahnik ,  Wilhelm Ulrich ,  Daniel Kraehmer ,  Norbert Wabra

    发明人： Ulrich Loering ,  Vladan Blahnik ,  Wilhelm Ulrich ,  Daniel Kraehmer ,  Norbert Wabra

    IPC分类号： G03F7/20 ,  G02B17/08 ,  G03B27/52 ,  G02B3/00

    CPC分类号： G03F7/70341 ,  G03F7/7015

    摘要： A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

    摘要翻译： 用于将要布置在投影物镜的物平面中的图案成像到要布置在投影物镜的像平面中的基板上的光刻投影物镜包括沿着投影物镜的光轴布置的多个光学元件 。 光学元件包括光学元件之后的物体平面上的第一组和最后一个光学元件，该光学元件跟随第一组并且邻近于图像平面并且限定投影物镜的出射表面并且被布置在 与图像平面的距离。 投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置，其在浸入操作期间至少定位最后一个光学元件，使得由干扰引起的像差至少部分地被补偿。

    SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY
    7.
    发明申请
    SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 有权
    具有四个用于微结构的镜片组的对称目标

    公开(公告)号：US20090080086A1

    公开(公告)日：2009-03-26

    申请号：US12257156

    申请日：2008-10-23

    申请人： David R. Shafer ,  Aurelian Dodoc ,  Johannes Zellner ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Holger Walter ,  Ulrich Loering ,  Daniel Kraehmer ,  Gerhard Fuerter

    发明人： David R. Shafer ,  Aurelian Dodoc ,  Johannes Zellner ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Holger Walter ,  Ulrich Loering ,  Daniel Kraehmer ,  Gerhard Fuerter

    IPC分类号： G02B27/18 ,  G02B11/28 ,  G02B11/04

    CPC分类号： G02B13/143 ,  G02B13/26 ,  G03F7/70241

    摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

    摘要翻译： 本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台 。 在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。 用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位 到所述透镜系统的光轴。

    PROJECTION OBJECTIVE WITH DIAPHRAGMS
    10.
    发明申请
    PROJECTION OBJECTIVE WITH DIAPHRAGMS 有权
    投影目标与石墨片

    公开(公告)号：US20110285979A1

    公开(公告)日：2011-11-24

    申请号：US13107011

    申请日：2011-05-13

    申请人： Nils Dieckmann ,  Alexander Wolf ,  Christian Holland ,  Ulrich Loering ,  Franz Sorg

    发明人： Nils Dieckmann ,  Alexander Wolf ,  Christian Holland ,  Ulrich Loering ,  Franz Sorg

    IPC分类号： G03B27/72 ,  G02B17/08 ,  G02B27/18

    CPC分类号： G03F7/70941 ,  G02B27/0043

    摘要： A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element. Each of the false light diaphragms is fashioned in such a way that the false light diaphragm screens at least a part of the edge region against radiation running outside the imaging beam path.

    摘要翻译： 用于将布置在投影物镜的物平面中的物体成像为位于投影物镜的像平面中的物体的图像的投影物镜具有多个透明光学元件和用于将光学元件保持在规定位置的保持装置 投影物镜的成像光束路径。 每个光学元件具有位于成像光束路径中的光学有用区域和位于光学有用区域外部的边缘区域。 分配给光学元件的保持装置的至少一个保持元件作用在接触区域的边缘区域。 至少一个光学元件被分配有具有布置在光学元件的正上游的假光膜的膜片装置和直接布置在光学元件的下游的第二假光膜。 每个假光隔膜以这样的方式形成，使得假光隔膜将至少一部分边缘区域屏蔽到抵抗在成像光束路径外部运行的辐射。