Acousto-optic modulator
    1.
    发明授权
    Acousto-optic modulator 失效
    声光调制器

    公开(公告)号:US06307665B1

    公开(公告)日:2001-10-23

    申请号:US09273758

    申请日:1999-03-22

    CPC classification number: G02F1/332 G02F1/0316 G02F1/11 G02F1/113

    Abstract: An acousto-optic modulator including an ultrasonic medium for controlling light from an optical source through diffraction, two transducers each having one electrode formed on one side thereof, the electrodes being for generating an acousto-elastic wave, and a conductive adhesive layer interposed between the ultrasonic medium and each of the sides of the transducers opposite to the sides on which the electrodes are installed, in order to adhere each of the transducers to the ultrasonic medium.

    Abstract translation: 一种声光调制器,包括用于通过衍射控制来自光源的光的超声波介质,两个换能器,每个换能器的一侧形成有一个电极,所述电极用于产生声弹性波,以及导电粘合剂层, 超声波介质和传感器的与安装有电极的侧面相对的侧面,以便将每个换能器粘附到超声波介质上。

    Acoustic-optic modulator having two transducers
    2.
    发明授权
    Acoustic-optic modulator having two transducers 失效
    具有两个换能器的声光调制器

    公开(公告)号:US5900966A

    公开(公告)日:1999-05-04

    申请号:US911700

    申请日:1997-08-15

    CPC classification number: G02F1/332 G02F1/0316 G02F1/11 G02F1/113

    Abstract: An acousto-optic modulator having an ultrasonic medium for controlling light from a light source by diffracting the light and a transducer portion having electrodes for generating an acoustic wave in the ultrasonic medium, wherein the transducer portion includes two transducers each having an electrode. The AOM is provided with two electrodes by using two transducers, thereby facilitating impedance matching with a driver. The two transducers may be installed so that their polarization directions are opposite to each other, thereby obtaining maximum power transfer to the ultrasonic medium.

    Abstract translation: 一种声光调制器,其具有用于通过衍射光来控制来自光源的光的超声介质和具有用于在超声波介质中产生声波的电极的换能器部分,其中,所述换能器部分包括两个具有电极的换能器。 通过使用两个换能器,AOM设置有两个电极,从而有助于与驱动器的阻抗匹配。 可以安装两个换能器使得它们的偏振方向彼此相反,从而获得对超声介质的最大功率传递。

    Method of fabricating phase shift mask
    3.
    发明授权
    Method of fabricating phase shift mask 失效
    制造相移掩模的方法

    公开(公告)号:US06333129B2

    公开(公告)日:2001-12-25

    申请号:US09295352

    申请日:1999-04-21

    CPC classification number: G03F1/29

    Abstract: A method of fabricating a phase shift mask is provided in which light shield film patterns for setting a phase shift region and a phase non-shift region are simultaneously formed on a substrate. A groove is formed in the substrate set as the phase shift region. The light shield film pattern, which contacts the groove and is formed on a region of the substrate set as the phase non-shift region, is removed. A phase shift layer can be formed between the substrate and the light shield film pattern. In this case, regions set by the light shield film pattern become opposite to when the phase shift layer is not formed. That is, a phase shift region is changed into a phase non-shift region, and the phase non-shift region is changed into the phase shift region. As described above, the phase shift region and the phase non-shift region are simultaneously set when the light shield film pattern is formed, thus preventing the position of the phase shift or non-shift region from being shifted due to sequential formation of the phase shift and non-shift regions.

    Abstract translation: 提供一种制造相移掩模的方法,其中在衬底上同时形成用于设置相移区域和相位非移位区域的光屏蔽膜图案。 在衬底组中形成有作为相移区域的沟槽。 除去接触凹槽并形成在作为相位非移位区域的基板的区域上的遮光膜图案。 可以在基板和遮光膜图案之间形成相移层。 在这种情况下,由遮光膜图案设定的区域与没有形成相移层时相反。 也就是说,相移区域被改变为相位非移位区域,并且相位非移位区域变为相移区域。 如上所述,当形成遮光膜图形时,相移区域和相位非移位区域被同时设置,从而防止相移或非移位区域的位置由于相位的顺序形成而偏移 移位和非移位区域。

    Photo mask of semiconductor device and method for manufacturing the same
    4.
    发明授权
    Photo mask of semiconductor device and method for manufacturing the same 失效
    半导体器件的光掩模及其制造方法

    公开(公告)号:US06296975B1

    公开(公告)日:2001-10-02

    申请号:US09426762

    申请日:1999-10-26

    CPC classification number: G03F1/54

    Abstract: A photo mask of a semiconductor device includes a transmission preventing layer formed of a molybdenum alloy, which is a solid solution of a metal atom such as chrome in molybdenum, on a light transmitting substrate. Also, the molybdenum alloy may be a molybdenum vanadium alloy, a molybdenum niobium alloy, a molybdenum tantalum alloy, or a molybdenum tungsten alloy, which is a solid solution of vanadium, niobium, tantalum, or tungsten in molybdenum, respectively. The photo mask provides high resolution during a photolithography process by obtaining a thinner transmission preventing layer.

    Abstract translation: 半导体器件的光掩模包括由钼合金形成的防透光层,其是钼等金属原子的固溶体在透光性基板上。 此外,钼合金可以分别是钼中的钒,铌,钽或钨的固溶体的钼钒合金,钼铌合金,钼钽合金或钼钨合金。 光掩模通过获得较薄的防止传播层在光刻过程中提供高分辨率。

    Non-volatile memory devices suitable for LCD driver applications
    7.
    发明授权
    Non-volatile memory devices suitable for LCD driver applications 有权
    非易失性存储器件适用于LCD驱动器应用

    公开(公告)号:US07547940B2

    公开(公告)日:2009-06-16

    申请号:US11623829

    申请日:2007-01-17

    Applicant: Yong-hoon Kim

    Inventor: Yong-hoon Kim

    CPC classification number: H01L27/115 H01L27/11519

    Abstract: Non-volatile memory devices according to embodiments of the present invention include an EEPROM transistor in a first portion of a semiconductor substrate, an access transistor in a second portion of the semiconductor substrate and an erase transistor in a third portion of the semiconductor substrate. The second portion of the semiconductor substrate extends adjacent a first side of the first portion of the semiconductor substrate and the third portion of the semiconductor substrate extends adjacent a second side of the first portion of the semiconductor substrate. The first and second sides of the first portion of the semiconductor substrate may be opposite sides of the first portion of the semiconductor substrate. The access transistor has a first source/drain terminal electrically connected to a first source/drain terminal of the EEPROM transistor and the erase transistor has a first source/drain terminal electrically connected to a second source/drain terminal of the access transistor.

    Abstract translation: 根据本发明的实施例的非易失性存储器件包括在半导体衬底的第一部分中的EEPROM晶体管,半导体衬底的第二部分中的存取晶体管和半导体衬底的第三部分中的擦除晶体管。 半导体衬底的第二部分在半导体衬底的第一部分的第一侧附近延伸,并且半导体衬底的第三部分相邻于半导体衬底的第一部分的第二侧延伸。 半导体衬底的第一部分的第一和第二侧可以是半导体衬底的第一部分的相对侧。 存取晶体管具有电连接到EEPROM晶体管的第一源极/漏极端子的第一源极/漏极端子,并且擦除晶体管具有电连接到存取晶体管的第二源极/漏极端子的第一源极/漏极端子。

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