Abstract:
This invention provides free-standing structures, functionalized free-standing structures and functional devices that are flexible, including nano- and micromachined flexible fabrics comprising woven networks and mesh networks. The present invention provides processing methods for making and functionalizing flexible free-standing structures having a wide range of integrated materials, devices and device components. The methods of the present invention are capable of providing large area functional electronic, optoelectronic, fluidic, and electromechanical devices and device arrays which exhibit good device performance in stretched, bent and/or deformed configurations. The method includes forming sacrificial layers (120. 150) under first and second patterned structural layers ( 130, 170). and removing the sacrificial layers to form a free-standing fabric (200) with interconnected structural elements that are independently displaceable.
Abstract:
Transparent conductive materials, articles and films are described herein a) that are easily and efficiently produced, b) can be produced prior to application or in situ, c) are easily applied to surfaces and substrates or formed into articles, d) can be produced and used with materials and methods that are generally accepted by the flat panel display (FPD) industry, along with other industries that produce and utilize microelectronics, e) can be tailored to be photoimageable and patternable using accepted photolithography techniques, f) have superior optical properties and have superior film forming properties, including better adhesion to other adjacent layers, the ability to be laid down in very or ultra thin layers and the ability to remain transparent when laid down as thicker layers. Methods of producing and using these transparent conductive materials are also disclosed.
Abstract:
A multi-layer electronic device can be formed to include an insulative substrate (212), a first vapor deposited conductor layer (312) on the insulative substrate (212), a first vapor deposited insulator layer (314) on the first conductor layer (312), the first insulator layer (314) having at least one via hole (316) therein, and a vapor deposited conductive filler (320) in the via hole (316) of the first insulator layer (314). Desirably, the conductive filler (320) is deposited in the via hole (316) of the first insulator layer (314) such that the surface of the conductive filler (320) opposite the first conductor layer (312) is substantially planar with the surface of the first insulator layer (314) opposite the first conductor layer (312).
Abstract:
Method for manufacturing a parylene-based electrode array that includes an underlying parylene layer, one or more patterned electrode layers comprising a conductive material such as a metal, and one or more overlying parylene layers. The overlying parylene is etched away or otherwise processed to expose the electrodes where stimulation or recording is to occur. All other conductive material in the device is occluded from the environment by the two layers of parylene surrounding it.
Abstract:
The invention relates to a method for producing a moulded component (2A-2G) comprising an integrated conductor strip (10), wherein a conductor strip (10) is produced on a carrier component (4) particularly by flame injection or cold gas injection. The surface of the carrier component (4) is treated in a selective manner corresponding to a predetermined path of the conductor strip (10) so that the surface areas thereof have different adhesions. A germ layer is applied to the path of the conductor strip (10), whereupon the conductor strip (10) is subsequently placed thereon. It is therefore possible to produce a moulded component (2A-2G) comprising an integrated conductive strip mould in a very flexible and economical manner. In automobile industries, special requests from the clients can be met in a fast and efficient manner by altering the layout of the conductor strip.
Abstract:
A system and method for the fabrication of high reliability capacitors (1011), inductors (1012), and multi-layer interconnects (1013) (including resistors (1014)) on various thin film hybrid substrate surfaces (0501) is disclosed. The disclosed method first employs a thin metal layer (0502) deposited and patterned on the substrate (0501). This thin patterned layer (0502) is used to provide both lower electrodes for capacitor structures (0603) and interconnects (0604) between upper electrode components. Next, a dielectric layer (0705) is deposited over the thin patterned layer (0502) and the dielectric layer (0705) is patterned to open contact holes (0806) to the thin patterned layer. The upper electrode layers (0907, 0908, 1009, 1010) are then deposited and patterned on top of the dielectric (0705).
Abstract:
The present invention is an apparatus and method for machining a laminate structure (10) to form a selected shape. The method includes forming a first layer (26) on a substrate (24). A first protective structure (12) is defined that is attached to each of the first layer (26) and the substrate (24). At least a portion of the protective structure (12) has the selected shape. The laminate structure (10) is then machined along the first protective structure (12) thereby forming at least a portion of a selected shape.
Abstract:
A multilayer printed circuit board has a metal base (1) with openings (12), the surface of the base and the walls of the openings being covered with an insulation layer (8) obtained by means of applying and mechanical processing, in turn, on both sides, a coating of a powder epoxy composition. An insulation relief (16) of a photo sensitive composition is obtained on the insulation coating, which is then filled with a metal by vacuum deposition. Conductors (4) and contact points (5) of the layer (3) of conducting pattern are obtained by removing the metal from the protruding parts of the relief (16). Then insulation relief (18) is formed corresponding to the location of the contact points (11) and of the commutation bars (10) connecting the layers (3, 6) of the conducting patterns, and is covered with a metal layer. After the removal of the metal from the protruding parts an insulation layer (9) is obtained in which are located the commutation bars (10) and the contact points (11). Then an insulation relief (19) is formed corresponding to the configuration of the layer (6) of the conducting pattern, the metal is applied and mechanically processed so as to obtain conductors (7) with contact points (8) of the layer (6) of the conducting pattern.