TRANSPARENT CONDUCTIVE MATERIALS AND COATINGS, METHODS OF PRODUCTION AND USES THEREOF
    52.
    发明申请
    TRANSPARENT CONDUCTIVE MATERIALS AND COATINGS, METHODS OF PRODUCTION AND USES THEREOF 审中-公开
    透明导电材料和涂料,其生产方法及其用途

    公开(公告)号:WO2008147789A2

    公开(公告)日:2008-12-04

    申请号:PCT/US2008064291

    申请日:2008-05-21

    Abstract: Transparent conductive materials, articles and films are described herein a) that are easily and efficiently produced, b) can be produced prior to application or in situ, c) are easily applied to surfaces and substrates or formed into articles, d) can be produced and used with materials and methods that are generally accepted by the flat panel display (FPD) industry, along with other industries that produce and utilize microelectronics, e) can be tailored to be photoimageable and patternable using accepted photolithography techniques, f) have superior optical properties and have superior film forming properties, including better adhesion to other adjacent layers, the ability to be laid down in very or ultra thin layers and the ability to remain transparent when laid down as thicker layers. Methods of producing and using these transparent conductive materials are also disclosed.

    Abstract translation: 透明导电材料,制品和膜在本文中描述a)容易且有效地制备,b)可以在施用之前或原位制备,c)易于施加到表面和基材上或形成制品,d)可以生产 并且与使用平板显示器(FPD)行业普遍接受的材料和方法一起使用,以及生产和利用微电子的其他行业,e)可以使用公认的光刻技术来定制成可光成像和可图案化,f)具有优异的光学 性能并且具有优异的成膜性能,包括对其它相邻层的更好的附着力,在非常或超薄层中放置的能力以及当铺设成更厚的层时保持透明的能力。 还公开了制造和使用这些透明导电材料的方法。

    SYSTEM FOR AND METHOD OF PLANARIZING THE CONTACT REGION OF A VIA BY USE OF A CONTINUOUS INLINE VACUUM DEPOSITION PROCESS
    54.
    发明申请
    SYSTEM FOR AND METHOD OF PLANARIZING THE CONTACT REGION OF A VIA BY USE OF A CONTINUOUS INLINE VACUUM DEPOSITION PROCESS 审中-公开
    通过使用连续的真空沉积工艺对威尼斯联系区域进行平面化的系统和方法

    公开(公告)号:WO2006081352A3

    公开(公告)日:2007-04-19

    申请号:PCT/US2006002775

    申请日:2006-01-26

    Abstract: A multi-layer electronic device can be formed to include an insulative substrate (212), a first vapor deposited conductor layer (312) on the insulative substrate (212), a first vapor deposited insulator layer (314) on the first conductor layer (312), the first insulator layer (314) having at least one via hole (316) therein, and a vapor deposited conductive filler (320) in the via hole (316) of the first insulator layer (314). Desirably, the conductive filler (320) is deposited in the via hole (316) of the first insulator layer (314) such that the surface of the conductive filler (320) opposite the first conductor layer (312) is substantially planar with the surface of the first insulator layer (314) opposite the first conductor layer (312).

    Abstract translation: 多层电子器件可以形成为在绝缘基板(212)上包括绝缘基板(212),第一蒸镀导体层(312),第一导体层上的第一蒸镀绝缘体层(314) 312),其中具有至少一个通孔(316)的第一绝缘体层(314)和在第一绝缘体层(314)的通孔(316)中的气相沉积导电填料(320)。 期望地,导电填料(320)沉积在第一绝缘体层(314)的通孔(316)中,使得与第一导体层(312)相对的导电填料(320)的表面与表面 与第一导体层(312)相对的第一绝缘体层(314)。

    INTEGRATED THIN FILM CAPACITOR/INDUCTOR/INTERCONNECT SYSTEM AND METHOD
    57.
    发明申请
    INTEGRATED THIN FILM CAPACITOR/INDUCTOR/INTERCONNECT SYSTEM AND METHOD 审中-公开
    集成薄膜电容器/电感器/互连系统和方法

    公开(公告)号:WO02025709A2

    公开(公告)日:2002-03-28

    申请号:PCT/US2001/029575

    申请日:2001-09-21

    Abstract: A system and method for the fabrication of high reliability capacitors (1011), inductors (1012), and multi-layer interconnects (1013) (including resistors (1014)) on various thin film hybrid substrate surfaces (0501) is disclosed. The disclosed method first employs a thin metal layer (0502) deposited and patterned on the substrate (0501). This thin patterned layer (0502) is used to provide both lower electrodes for capacitor structures (0603) and interconnects (0604) between upper electrode components. Next, a dielectric layer (0705) is deposited over the thin patterned layer (0502) and the dielectric layer (0705) is patterned to open contact holes (0806) to the thin patterned layer. The upper electrode layers (0907, 0908, 1009, 1010) are then deposited and patterned on top of the dielectric (0705).

    Abstract translation: 公开了用于在各种薄膜混合基板表面(0501)上制造高可靠性电容器(1011),电感器(1012)和多层互连(1013)(包括电阻器(1014))的系统和方法。 所公开的方法首先采用在衬底(0501)上沉积和图案化的薄金属层(0502)。 该薄图案层(0502)用于为上电极组件之间的电容器结构(0603)和互连(0604)提供两个下电极。 接下来,在薄的图案化层(0502)上沉积电介质层(0705),并且对电介质层(0705)进行图案化以将薄的图案化层的接触孔(0806)打开。 然后将上电极层(0907,0908,1009,1010)沉积并图案化在电介质(0705)的顶部。

    APPARATUS AND METHOD FOR MACHINING CONDUCTIVE STRUCTURES ON SUBSTRATES
    58.
    发明申请
    APPARATUS AND METHOD FOR MACHINING CONDUCTIVE STRUCTURES ON SUBSTRATES 审中-公开
    在基板上加工导电结构的装置和方法

    公开(公告)号:WO1994019726A1

    公开(公告)日:1994-09-01

    申请号:PCT/US1994002185

    申请日:1994-02-24

    Abstract: The present invention is an apparatus and method for machining a laminate structure (10) to form a selected shape. The method includes forming a first layer (26) on a substrate (24). A first protective structure (12) is defined that is attached to each of the first layer (26) and the substrate (24). At least a portion of the protective structure (12) has the selected shape. The laminate structure (10) is then machined along the first protective structure (12) thereby forming at least a portion of a selected shape.

    Abstract translation: 本发明是用于加工层压结构(10)以形成选定形状的装置和方法。 该方法包括在基底(24)上形成第一层(26)。 定义了附接到第一层(26)和基底(24)中的每一个的第一保护结构(12)。 保护结构(12)的至少一部分具有选定的形状。 然后,层压结构(10)沿着第一保护结构(12)加工,从而形成至少一部分所选形状。

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