Abstract:
A method for manufacturing and for testing an integrated circuit, including the steps of forming, on the upper portion of the integrated circuit (1), a passivation layer (19) comprising openings at the level of metal tracks (17) of the last interconnect stack of the integrated circuit; forming, in the openings, first pads (11) connected to second pads (13) formed on the passivation layer by conductive track sections, the first pads being intended for the connection of the integrated circuit; testing the integrated circuit by bringing test tips in contact with the second pads; and eliminating at least a portion of at least one of the conductive track sections.
Abstract:
The invention concerns a semiconductor package comprising a semiconductor die (3) attached to a support (2) having electrically conductive paths, (6) said semiconductor die having a bond-pad (4) electrically connected to an electrically conductive path (6) on said support by a wire-bond (7) of a first metallic composition, such as an alloy of copper, said wire-bond and said bond-pad being coated with a protection layer (40) of a second metallic composition, such as an alloy of nickel.
Abstract:
A surface-mounted shielded multicomponent assembly, comprising a wafer (1) on which several electronic components (2, 3, 4) are assembled; an insulating layer (30) conformally deposited on the structure with a thickness smaller than the height of the electronic components, comprising at least one opening (31) emerging on a contact (32) of said wafer; a conductive shielding layer (35) covering the insulating layer and said at least one opening; and a resin layer (6) covering the conductive layer.
Abstract:
A semiconductor device includes at least one first component (5) (for example, a first integrated circuit), having a front face provided with electrical connection pads. The first component is embedded in a support layer (2) is a position such that the front face of the first component is not covered and lies parallel to a first face of the support layer. An intermediate layer (8) is formed on the front face of the first component and on the first face of the support layer. An electrical connection network (9) within the intermediate layer selectively connects to the electrical connection pads of the first component. The device further includes at least one second component (11) (for example, a second integrate circuit, having one face placed above the intermediate layer and provided with electrical connection pads selectively connected to the electrical connection network. Electrical connection vias (17) pass through the support layer and selectively connect the electrical connection network to an external electrical connection formed on a second face of the support layer.
Abstract:
Method for fabricatingelectrical bonding pads of a wafer Method for fabricatingelectrical bonding pads on the electrical contact areas of a wafer, comprising the productionof first blocks (7) made of a solder material, the productionof second blocks(10) made of a solder material on these first blocks, and passage through an oven so as to shape the said blocks into approximately domed electrical bonding pads.