公开(公告)号：EP0159873A2

公开(公告)日：1985-10-30

申请号：EP85302570.8

申请日：1985-04-12

Applicant: ELECTRO MATERIALS CORP. OF AMERICA

Inventor： Martin, Frank Wayne ,  St. John, Frank

IPC: B23K35/22 ,  C09D5/08 ,  H05K3/34

CPC classification number: H05K3/0076 ,  B23K35/224 ,  C09D5/008 ,  C09D157/00 ,  H05K3/3452 ,  H05K2201/0166 ,  H05K2203/0264 ,  C08L2666/02

Abstract: The invention concerns a coating composition which may be used to form a peelable solder mask. The coating composition comprises a mixture of vinylic resin, microcrystalline wax and solvent. Applied as a film coating, the coating composition can be used to provide a temporary mask to selected areas of a substrate, for example, a printed circuit, prior to exposure to a solder flux, the mask being readily peelable from the substrate.

Abstract translation: 本发明涉及可用于形成可剥离焊料掩模的涂料组合物。 涂料组合物包括乙烯基树脂，微晶蜡和溶剂的混合物。 作为膜涂层，涂料组合物可以用于在暴露于焊剂之前在衬底（例如印刷电路）的选定区域提供临时掩模，掩模容易从衬底剥离。

公开(公告)号：EP0117258A1

公开(公告)日：1984-09-05

申请号：EP83101752.0

申请日：1983-02-23

Applicant: IBM DEUTSCHLAND GMBH ,  International Business Machines Corporation

Inventor： Greschner, Johann, Dr. Dipl.-Phys. ,  Schwerdt, Friedrich ,  Trumpp, Hans-Joachim, Dr. Dipl.-Phys.

IPC: H05K3/00 ,  G03F7/26

CPC classification number: B29C59/14 ,  G03F7/00 ,  G03F7/11 ,  H05K3/0041 ,  H05K3/381 ,  H05K3/388 ,  H05K2201/0166 ,  H05K2201/2072 ,  Y10S428/901 ,  Y10T428/24479 ,  Y10T428/24521 ,  Y10T428/24612 ,  Y10T428/24917 ,  Y10T428/24942 ,  Y10T428/31

Abstract: Die Erfindung betrifft ein Verfahren zum Herstellen von haftfesten Metallschichten auf Kunststoffsubstraten durch Strukturieren der zu beschichtenden Substratoberfläche vor dem Metallisieren.
Auf die zu metallisierende Substratoberfläche (1) werden nacheinander eine Glasharzschicht (2) und eine Photoresistschicht (3) aufgetragen. Die Photoresistschicht (3) wird mittels reaktiven lonenätzens in einem CF 4 -Plasma mit relativ hoher Energiedichte aufgerauht. Die resultierende Rauhigkeit der Photoresistschicht (3) wird mittels reaktiven lonenätzens als Lochstruktur in die Glasharzschicht (2) übertragen. Diese dient als Maske in einem reaktiven lonenätzprozeß mit einem Sauerstoffplasma, bei dem Vertiefungen (4) vertikal in die Substratoberfläche (1) geätzt werden. Durch weiteres reaktives lonenätzen mit einem Sauerstoffplasma werden diese vertieft, und es wird eine Überhangstruktur (5) erzeugt. Auf der so vorbereiteten Substratoberfläche (1) werden nach Entfernen der Glasharzschicht (2) eine dünne Metallschicht (6) aufgesputtert und eine Metallschicht (7) stromlos abgeschieden. Es können auch unter Verwendung einer Photoresistmaske mittels Additivtechnik Leiterbahnen stromlos abgeschieden werden.
Durch die definierte Oberflächenstruktur des Substrats lassen sich die Haftfestigkeiten der aufmetallisierten Schichten um ein Vielfaches verbessern.

Abstract translation: 本发明通过对衬底进行构图表面之前，金属化待涂覆涉及用于在塑料衬底上强粘附性的金属涂层的制造方法。 玻璃树脂层（2）和光致抗蚀剂层（3）被依次施加到衬底待金属化的表面（1）。 光致抗蚀剂层（3）是通过在CF4等离子体具有相对高的能量密度的蚀刻的反应离子的手段粗糙化。 将得到的光致抗蚀剂层（3）的粗糙度是通过反应性离子蚀刻方式进行传输为穿孔结构到玻璃树脂层（2）。 这用作在反应性离子用氧等离子体蚀刻的掩模，其中，所述凹部（4）垂直于基板表面（1）被蚀刻。 通过进一步反应离子用氧等离子体蚀刻，这些是凹陷，并且它是产生的悬突结构（5）。 在如此制备的基板表面（1）由（6）去除玻璃树脂层（2）和无电沉积的金属层（7）的后溅射的薄金属层施加。 它可使用无电也使用光刻胶掩模的添加剂技术导体轨迹来沉积。 通过在衬底的限定的表面结构，该金属化层的粘合强度可以由多个被改善。

公开(公告)号：EP0009190B1

公开(公告)日：1982-04-28

申请号：EP79103349.1

申请日：1979-09-07

Applicant: International Business Machines Corporation

Inventor： Kenney, Eugene John ,  Lazzarini, Donald Joseph ,  Winters, Robert John

IPC: C08L63/04 ,  H05K3/28 ,  H05K3/34 ,  H01B3/42 ,  H01B3/40 ,  B23K35/22

CPC classification number: B23K35/224 ,  H05K3/285 ,  H05K2201/0166 ,  H05K2201/0209 ,  Y10T428/31511

公开(公告)号：EP3054350B1

公开(公告)日：2018-04-11

申请号：EP14866816.3

申请日：2014-12-10

Applicant: Goo Chemical Co., Ltd.

Inventor： SAKAI, Yoshio ,  HAMADA, Nobuhito ,  HIGUCHI, Michiya ,  MIYAKE, Tokuzan

IPC: G03F7/031 ,  G03F7/004 ,  G03F7/038

CPC classification number: G03F7/031 ,  G03F7/0042 ,  G03F7/0043 ,  G03F7/029 ,  G03F7/038 ,  G03F7/0385 ,  G03F7/0388 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/26 ,  G03F7/322 ,  H05K1/02 ,  H05K1/0274 ,  H05K1/0353 ,  H05K3/282 ,  H05K3/287 ,  H05K3/3452 ,  H05K2201/0166 ,  H05K2201/068

Abstract: A liquid solder resist composition contains a carboxyl group-containing resin, a photopolymerizable compound containing at least one compound selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer, a photopolymerization initiator, and a titanium dioxide. The photopolymerization initiator contains a bisacylphosphine oxide-based photopolymerization initiator, a first ±-hydroxyalkyl phenone-based photopolymerization initiator that is a liquid at 25°C, and a second ±-hydroxyalkyl phenone-based photopolymerization initiator that is a solid at 25°C.

公开(公告)号：EP3232267A4

公开(公告)日：2017-10-18

申请号：EP15868034

申请日：2015-08-17

Applicant: GOO CHEMICAL CO LTD

Inventor： SAKAI YOSHIO ,  HIGUCHI MICHIYA

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26 ,  H05K1/02 ,  H05K1/03 ,  H05K3/28

CPC classification number: G03F7/031 ,  G03F7/0042 ,  G03F7/0043 ,  G03F7/029 ,  G03F7/038 ,  G03F7/0385 ,  G03F7/0388 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/26 ,  G03F7/322 ,  H05K1/02 ,  H05K1/0274 ,  H05K1/0353 ,  H05K3/282 ,  H05K3/287 ,  H05K3/3452 ,  H05K2201/0166 ,  H05K2201/068

Abstract: A liquid solder resist composition contains a carboxyl group-containing resin, a photopolymerizable compound containing at least one compound selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer, a photopolymerization initiator, and a titanium dioxide. The photopolymerization initiator contains a bisacylphosphine oxide-based photopolymerization initiator, a first ±-hydroxyalkyl phenone-based photopolymerization initiator that is a liquid at 25°C, and a second ±-hydroxyalkyl phenone-based photopolymerization initiator that is a solid at 25°C.

公开(公告)号：EP3054350A4

公开(公告)日：2017-06-21

申请号：EP14866816

申请日：2014-12-10

Applicant: GOO CHEMICAL CO LTD

Inventor： SAKAI YOSHIO ,  HAMADA NOBUHITO ,  HIGUCHI MICHIYA ,  MIYAKE TOKUZAN

IPC: G03F7/031 ,  G03F7/004 ,  G03F7/038

CPC classification number: G03F7/031 ,  G03F7/0042 ,  G03F7/0043 ,  G03F7/029 ,  G03F7/038 ,  G03F7/0385 ,  G03F7/0388 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/26 ,  G03F7/322 ,  H05K1/02 ,  H05K1/0274 ,  H05K1/0353 ,  H05K3/282 ,  H05K3/287 ,  H05K3/3452 ,  H05K2201/0166 ,  H05K2201/068

Abstract: A liquid solder resist composition contains a carboxyl group-containing resin, a photopolymerizable compound containing at least one compound selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer, a photopolymerization initiator, and a titanium dioxide. The photopolymerization initiator contains a bisacylphosphine oxide-based photopolymerization initiator, a first ±-hydroxyalkyl phenone-based photopolymerization initiator that is a liquid at 25°C, and a second ±-hydroxyalkyl phenone-based photopolymerization initiator that is a solid at 25°C.

Abstract translation: 液体阻焊剂组合物含有含羧基树脂，含有选自光聚合性单体和光聚合性预聚物中的至少一种化合物的光聚合性化合物，光聚合引发剂和二氧化钛。 光聚合引发剂含有双酰基氧化膦系光聚合引发剂，在25℃下为液体的第一种±羟基烷基苯酮系光聚合引发剂，以及在25℃下为固体的第二种±羟基烷基苯酮系光聚合引发剂 。

公开(公告)号：EP3087811A1

公开(公告)日：2016-11-02

申请号：EP14812280.7

申请日：2014-11-27

Applicant: Nokia Technologies OY

Inventor： ALLEN, Mark ,  COTTON, Darryl ,  BOWER, Chris ,  ANDREW, Piers

IPC: H05K1/02 ,  H05K3/12

CPC classification number: H05K1/0283 ,  H05K3/1208 ,  H05K2201/0166 ,  H05K2203/308

Abstract: A method comprising forming a substrate scaffold structure for use in the fabrication of a reversibly deformable circuit board, the substrate scaffold structure comprising a predefined waveform topography onto which one or more scaffold-conforming thin film layers can be deposited for use in forming electronic circuit elements of the reversibly deformable circuit board, the waveform topography of the substrate scaffold structure predefined to facilitate operational reversible deformation of the circuit board.

公开(公告)号：EP0908559B8

公开(公告)日：2009-12-09

申请号：EP98118922.8

申请日：1998-10-07

Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.

Inventor： Gaku, Morio c/o Mitsubishi Gas Chemical Co., Inc. ,  Nozaki, Mitsuru c/o Mitsubishi Gas Chem. Co., Inc. ,  Saimen, Kenji c/o Kuraray Co., Ltd. ,  Esaki, Tamemaru c/o Kuraray Co., Ltd.

IPC: D21H13/24 ,  D21H17/53 ,  D21H25/06 ,  H05K1/00

CPC classification number: D21H13/24 ,  D21H17/53 ,  D21H25/06 ,  H05K1/0366 ,  H05K2201/0141 ,  H05K2201/0145 ,  H05K2201/0166 ,  H05K2201/0278 ,  H05K2201/0293 ,  Y10T428/24322 ,  Y10T442/2475

公开(公告)号：EP0793406B1

公开(公告)日：2005-12-28

申请号：EP97103255.2

申请日：1997-02-27

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takiguchi, Yoshikazu ,  Obiya, Hiroyuki ,  Takahashi, Toru ,  Shiroyama, Taisuke ,  Tazawa, Kenji

IPC: H05K3/00 ,  H05K3/46

CPC classification number: H05K3/0044 ,  H05K3/4644 ,  H05K2201/0166 ,  H05K2203/025 ,  Y10S428/901 ,  Y10T428/24917

公开(公告)号：EP1272550A1

公开(公告)日：2003-01-08

申请号：EP01918815.0

申请日：2001-03-16

Applicant: PPG Industries Ohio, Inc.

Inventor： LAWTON, Ernest, L. ,  VELPARI, Vedagiri ,  RICE, William, B. ,  ROBERTSON, Walter, J. ,  NOVICH, Bruce, E. ,  WU, Xiang ,  LAMMON-HILINSKI, Kami

IPC: C08J5/08 ,  H05K1/03 ,  C03C25/10

CPC classification number: C03C25/26 ,  C03C25/00 ,  C03C25/10 ,  C03C25/28 ,  C03C25/32 ,  C03C25/42 ,  C03C25/47 ,  C03C25/48 ,  C08J5/08 ,  H05K1/0366 ,  H05K3/0047 ,  H05K2201/0166 ,  H05K2201/0175 ,  H05K2201/0209 ,  H05K2201/0212 ,  H05K2201/0215 ,  H05K2201/0239 ,  H05K2201/0245 ,  H05K2201/0248 ,  H05K2201/0254 ,  H05K2201/029 ,  H05K2203/127 ,  Y10T428/2927 ,  Y10T428/2933 ,  Y10T428/2938 ,  Y10T428/2964 ,  Y10T442/20 ,  Y10T442/3049

Abstract: The present invention provides a fabric comprising at least one fiber strand comprising a plurality of fibers and having a resin compatible coating composition on at least a surface of the at least one fiber strand, wherein the at least one fiber strand has an Air Jet Transport Drag Force value of greater than 100,000 gram force per gram mass of strand as determined by a needle air jet nozzle unit having an internal air jet chamber having a diameter of 2 millimeters and a nozzle exit tube having a length of 20 centimeters at a strand feed rate of 274 meters per minute and an air pressure of 310 kiloPascals. The present invetion also provides a reinforced laminate comprising: (a) at least one matrix material; and (b) at least one fabric comprising at least one fiber strand comprising a plurality of fibers and having a resin compatible coating composition on at least a surface of the at least one fiber strand, wherein the at least one fiber strand has an Air Jet Transport Drag Force value of greater than 100,000 gram force per gram mass of strand as determined by a needle air jet nozzle unit having an internal air jet chamber having a diameter of 2 millimeters and a nozzle exit tube having a length of 20 centimeters at a strand feed rate of 274 meters per minute and an air pressure of 310 kiloPascals.