Verfahren zum Reinigen einer metallischen Oberfläche
    4.
    发明公开
    Verfahren zum Reinigen einer metallischen Oberfläche 审中-公开
    Verfahren zum Reinigen einer metallischenOberfläche

    公开(公告)号:EP1495815A1

    公开(公告)日:2005-01-12

    申请号:EP04015751.3

    申请日:2004-07-05

    摘要: Beschrieben ist ein Verfahren zur Eliminierung von an der Oberfläche eines Bauteils (1) lose haftenden oder hochstehenden Partikeln, die aus dem die Oberfläche des Bauteils (1) bildenden Metall, insbesondere Zinn oder einer Zinnlegierung, bestehen, bei welchem die Oberfläche des Bauteils (1) in einer Schutzgasatmosphäre (4) auf eine Prozeßtemperatur erwärmt wird, die gleich der Schmelztemperatur des die Oberfläche bildenden Metalls oder geringfügig niedriger als diese ist.

    摘要翻译: 粘附在部件表面上的用于除去由金属,特别是锡或锡合金制成的颗粒的方法包括将保护气体气氛中的组分的表面加热到与金属成型的熔融温度相同的工艺温度 表面或低于熔融温度。

    Non-cyanide electrode cleaning process
    5.
    发明公开
    Non-cyanide electrode cleaning process 失效
    非氰化物电极清洗工艺

    公开(公告)号:EP0430623A3

    公开(公告)日:1991-09-25

    申请号:EP90312836.1

    申请日:1990-11-26

    申请人: MOTOROLA, INC.

    IPC分类号: H01L21/48 C25F5/00

    摘要: An electrolytic process (70) employing a water solution of metal lactates or lactic acid and metal hydroxides, rapidly and safely removes metal plating bleed (42), residual oxides , stains or the like (39), plastic flash (36), resin bleed (36) and deflashing media (38), from electrodes (16) of electronic devices. Anodic etching (72) or a combination of cathodic (82) and anodic (72) etching (72) is preferred. Noble metals are selectively removed without cyanide compounds. For example, excess silver from spot plating on copper leadframes is etched away 2-3 times faster than the underlying copper. After cleaning the device leads (16) are bright, polished, stain-free and without scale, residual plating bleed (42), deflashing media (38), plastic flash or resin bleed (36). The process is effective, less hazardous, easy to use and economical.

    Processes for producing semiconductor devices
    6.
    发明公开
    Processes for producing semiconductor devices 失效
    用于生产半导体器件的方法

    公开(公告)号:EP0354800A3

    公开(公告)日:1990-12-27

    申请号:EP89308168.7

    申请日:1989-08-11

    IPC分类号: H01L21/50 H01L23/10

    摘要: Semiconductor devices are produced by a process involving the steps of obtaining a core-box resin molded item inte­grated with a lead frame by coating said lead frame on its portions expected to be in non-contact with said core-box resin molded item with an organic high molecu­lar substance having a melting or softening point higher than the molding temperature of the resin constituting said core-box resin molded item and soluble in a solvent which does not dissolve said core-box resin molded item, placing the thus coated lead frame in position within a mold and injecting the resin into the mold thereby carrying out injection or transfe molding and immersing the lead frame bearing core-box resin molded item obtained in the foregoing step in said solvent to remove by dissolving said organic high molecular substance. Thus, resin flash formed on the lead frame can be removed with facility of the formation of flash can be suppressed without damaging the resin molded portion, whereby a good electrical connection between the lead frame and the semiconductor element can be accomplished. Further processes of the invention involve the use of ultrasound to help remove flash and also choice of materials for the lead frame and resin box with linear expansion coefficients which differ by less than a selected amount so as to achieve a good mutual adhesion and humidity resistance.

    摘要翻译: 半导体器件通过以下步骤制造,该方法包括以下步骤:通过在预期与所述芯盒树脂模制品不接触的部分上涂覆所述引线框架以获得与引线框架一体化的芯盒树脂模塑件, 熔点或软化点高于构成所述芯盒树脂成型品的树脂的成型温度并溶解在不溶解所述芯盒树脂成型品的溶剂中的高分子物质,将这样涂覆的引线框架放置在位 在模具内并将树脂注入模具中,从而进行注射或转印成型,并将上述步骤中获得的引线框架轴承芯盒树脂模制品浸入所述溶剂中,以通过溶解所述有机高分子物质除去。 因此,可以抑制在引线框架上形成的树脂闪光,同时可以抑制闪光形成的设备,而不会损坏树脂模制部分,从而可以实现引线框架和半导体元件之间良好的电连接。 本发明的其它方法涉及使用超声波来帮助消除闪光,并且还可以选择具有线性膨胀系数的引线框架和树脂盒的材料,其中该膨胀系数的差异小于所选择的量,以便实现良好的相互粘附和耐湿性。